The Strategic Goods Control Bill, 2026

SPECIALISSUE

Kenya Gazene Supplenent No. 68 (National Assembly Bils No.15)

REPUBLICOFKENYA

KENYA GAZETTESUPPLEMENT

NATIONALASSEMBLYBILLS,2026

NAIROBl.24th March,2026

CONTENT

Bill for Introduetion into the National Assembly

The Strategic Goods Control Bill2026

PAGE

381

THESTRATEGICGOODS CONTROLBILL2026 ARRANGEMENTOFCLAUSES

Clause

PARTI-PRELIMINARY

• 1-Short title and commencement.
• 2-Interpretation.
• 3-Application.
• 4National Control List.

PARTII-THESTRATEGICGOODSCONTROL COMMITTEE

• 5-Establishment ofthe Strategic Goods Control Committee.
• 6Functions ofthe Committee.
• 7-Secretariat.
• 8-Director.

PARTIII-REGISTRATIONAND LICENSING

• 9-Registration.
• 10-Cancellation,suspension orrevocation of registration
• 1l-Register.
• 12-End-usecontroL
• 13-Shipment of goods specified in the National Control List.
• 14—Licensing.
• 15-Conditions for the issuance ofa licence.
• 16-Validity of licence.
• 17-Notification of lost or destroyed licence.
• 18-Fair hearing.
• 19-Suspension of licence.
• 20-Revocation oflicence.

• 21-Publication of revocation of general licence.
• 22-Notification to government agencies.
• 23-Administrative Appeals.

PARTIV-ENFORCEMENT,OFFENCESAND

PENALTIES

• 24-Compliance requirements.
• 25-Verification ofcompliance.
• 26-Inspector.
• 27-Access to places or premises.
• 28-Power to search conveyances.
• 29-Entry and search ofpremises without warrant.
• 30-List of items seized or detained.
• 31-Disposal ofseized strategicgoods.
• 32-Forfeiture ofstrategic goods when there isno prosecution.
• 33-Cost of holding seized strategic goods.
• 34No costs or damages arising from seizure to be
• recoverable.
• 35-Obstruction ofan inspector.
• 36Offences.
• 37-Reference to enforcement agencies.
• PARTV-MISCELLANEOUSPROVISIONS
• 38-General penalty.
• 39-Confidentiality.
• 40-Voluntary disclosure.
• 41-Protection frompersonal liability.
• 42-Limitation of actions.
• 43-Regulations.

PARTVI-CONSEQUENTIALAMENDMENTSAND SAVINGS

• 44-Amendment ofCap.114.

THESTRATEGICGOODSCONTROLBILL,2026 ABill for

AN ACT of Parliament to provide for the controlof the trade in strategie goods,technology and related services;to prevent the proliferation of nuclear, chemicalor biological weapons and their means of delivery:and for connected purposes

ENACTED by the Parliament ofKenya as follows

PARTI-PRELIMINARY

• 1.This Act may be cited as the Strategic Goods
• Control Act,2026,and shall come into operation on such date as the Cabinet Secretary may. by notice in the Gazerte. appoint.
• 2.In this Act,unless the context otherwise requires-

"brokermeans a person that provides brokering servicesrelated to conventional arms or if such services are offered in connection to weapons ofmass destruction or their means of delivery or if destined to military end-use in an embargoed destination or to prohibited restricted users;

brokering"means the selling or buying of a strategic good that is located in one foreign country and for the transfer of that strategicgood to another foreign country;

"Cabinet Secretary"means the Cabinet Secretary for

the time being responsible for matters relating to intermal security:

"certificate"means thecertificate ofregistration issued under section 9(4);

"chairperson" means the chairperson of the

Committee,

"Committee"means the Strategic Goods Control Committee established under section 5:

8:

Directormeans the Director appointed under section

"dual-use good"meansan itemsoftware or technology which can be used for both civil and military applications or in connection with the development, production,handling.operation,maintenance,storage Shon tile and comnenceinen Inepretaton detection,identification or dissemination of weapons of mass destruction or their means of delivery:

"end-user"means a person who is the owner ofa strategicgood;

"end-use controlmeans a procedure authorising the

establishment of controls over any item,software or technology,not listed in the National Control List,that is based on concerns related to weapons of mass destruction. their means of delivery,or military end-use in destinations subject to United Nations Security Council embargo,for prohibited and restricted end uses and end-users;

"exportmeans to take or cause to be taken a strategic

good out of Kenya including transmission of technology and software by electronic means:

"financingmeans making available or providing

funds or assets in connection with any uses related to weapons of mass destruction or their means of delivery.for military end-use in a destination subject to United Nations Security Council;

"general licence"means an authorisation to enable a

person engage in strategic trade with one or more countries under the conditions specified in the licence:

"global licence"means an authorisation to enable a person engage in strategic trade regarding one category of dual-use goods which may be valid for one ormore specific

cnd-uses or in one ormore countries:

"importmeans to bring or cause a strategic good to be brought into Kenya and includes the transmission of computer data by electronic means;

"in-country transfer"means the reallocation ofa strategic good previously exported from Kenya,from one means and includes the electronic transmission of software ortechnology:

"individual licence"means an authorisation to enable aperson to engage in strategic trade with respect to one cnd-user,consignee or covering one or more dual-use

goods,

26:

"licence"means a licence issued under section15;

"means of delivery"means missiles,rockets and other manned orunmanned systems capable of delivering nuclear,biologicalorchemical Lweapons and are specifically designed for such use;

"military end-use"means the

• (a)incorporation into conventional weapons and arms,
• (b)use of production,test or analytical equipment and its components for the development,production or maintenance of conventional weapons and arms;
• or
• (c)use of any unfinished products in a plant to produce conventional weapons and arms:

"military goods" include-

• (a)weapons, munitions, bombs, explosives, armaments,vessels,vehicles and aircraft designed or produced mamufactured for use in war,war-like articlesofwar,and
• (b)any component,-equipment,system,processes, software andtechnologyofwhatevernature capable of being used in the design,development, production, upgrading. refurbishment Or maintenance ofanythingcontemplated in paragraph(a);

"nationally controlled goodsmeans strategic goods or technology,tangible or intangible,that are placed under unilateral controls for reasons ofnational security,foreign policy.anti-terrorism,crime control or public health and safety:

"National Control List means the list set out in the Schedule;

"national security organ"means a national security organ specified in Article 239(1)of the Constitution;

"re-expor"means the exportation of a strategic good that waspreviously imported froma foreign country:

"register" means the register maintained in accordance

with section 11:

"relatedservice" transportation or the provision of technical services;

meansbrokering.financing.

service provider"means a broker,a person who funds,transporter or technical servicesprovider;

"Secretariatmeans the Secretariat ofthe Committee establishedunder section 7:

"software"meansa collectionof oneor more

programs or micro programs recorded,stored or embodied in any device:

"strategic goods"means military goods, dual usegoods,weapons of mass destruction and their means of delivery and nationally controlled goods and includes any component used in their production,means of delivery and

their related service;

"strategic trademeans the production,sale,export, import,re-expon, in-countrytransfer.transitand transhipment of strategic goods and the provision of related

services;

"technical services' means technical support, including repairs,development,manufacture,assembly. testing.maintenance,overhaul or any other service,which may take such forms as instruction,training.transmission ofworking knowledge or skills or consulting services provided in relation to a strategicgood;

"technical service providermeans a person providing technical services in connection with weapons of mass destruction or their means of delivery,or to military enduse in an embargoed destination,or to prohibited restricted

"transmission" means making software and technology available in an electronic form to persons within and outside Kenya as well as the oral and written transmission of technology including when technology is described over a voice transmission medium;

"transit"means the movement of strategic goods

through the territory ofKenya from a foreign country to another foreign country:

transhipmentmeans the transfer,cither directly or indirectly.ofa strategic good from an aircraft,vehicle or vessel arriving in Kenya from a foreign country to an aircraff,vehicle or vessel departing to a foreign country:

transportationmeans the act of transferring or undertaking to transfer,a strategic good,a supporting service being provided to a transport provider or any act calculated to promote the delivery ofa strategic good:

"transporter" meansapersonwhoprovides transportation services in accordance with this Act and includes transportation between foreign countries:

"visiting forcesmeans the armed forces or a member ofthe armed forces ofa designated country which for the time being is lawfullypresent inKenya

• (a)under a treaty or agreement to which the
• Govemment is party:or
• (b) during govemment
• peacekeeping or humanitarian mission:and

"weaponofmass destruction"means aweapon designed to kill,harm or infect people,animals or plants, throughmuclearexplosion.dispersion ofthe toxic properties of a chemical weapon,or dispersion of the infectious or toxic properties ofa biological weapon,and includes a means of delivery designed,adapted or intended for the deployment of such a weapon.

• 3.(1)This Act shall apply to-
• (a)any person operating within Kenya who engages in strategic trade:
• (b)any person who handles a strategic good:or
• (c)a citizen of Kenya who engages in strategic trade outside Kenya.
• (2)This Act shall not apply to-
• (a)the importation,storage,use,exportation,transit
• and transhipment of strategic goods and related

Application services bya national security organ or its agencies or similar organisation referred toin Article 239(4)ofthe Constitution:or

• (b)the transit,transhipment and temporary exportation and importation ofconventional arms by visiting forces:

Provided that suchconventionalarmsshall be

approved for clearance by the Ministry responsible for defence.

• 4.(l).The National Control List set out in the Schedule shall
• (a) specify the strategic goods that are subject to the provisionsofthis Act;and
• (b)be in conformitywith the internationaland
• regional commitments ofKenya.
• (2) The CabinetSecretary may. onthe recommendation of the Committee,amend the National Control List by notice in the Gazetre.

PARTII-THESTRATEGICGOODSCONTROL COMMITTEE

• 5.(l)There is established the Strategic Goods Control Committee.
• (2)The Committee shall consist of
• (a)the Principal Secretary responsible for matters relating to internal security,who shall be the
• chairperson;
• (b)the Principal Secretary responsible for matters relating to Defence or hisrepresentative;
• (c)the Principal Secretary responsible for matters relating to finance or his representative;
• (d) the Principal Secretary responsible for matters
• relatingto Information,Communication and Technology or his representative;
• (e)the Principal Secretaryresponsible for matters relating to health or hisrepresentative;
• (f)the Principal Secretary responsible for matters
• relating to trade or his representative;

Natoml Conel Lir

EoMishmen ofihe Srlege Goeds Conted Commnee

• (g)the Solicitor-General orhis representative:
• (h) the Chief of the Kenya Defence Forces or his representative:
• (i)the Director-General of the National Intelligence Service or his representative;
• (G)the Inspector-General of the NationalPolice
• Service or his representative;
• (k)the Commissioner-General of the Kenya Revenue Authority or hisrepresentative;
• (l)one person nominated by the Kenya Private Sector
• Alliance:
• (m)one person nominated by the Kenya National Chamber of Commerce:and
• (n)the Director,who shall be an ex officio member and Secretary to the Committee.
• (3)The members appointed under subsection (2)(l) competencies that may be required for the achievement of
• and(m)shallbe persons possessingskills and the functions of the Committee.
• (4)The chairperson shall preside at every meeting of the Committee at which he or she is present,but in the absence ofthe chairperson the memberspresent may electa chairperson from among their number to preside.
• (5)The quorum for a meeting of the Committee shall be two-thirds ofthe members.
• (6)Except as provided in this Act,the Committee shall regulate its ownprocedure.
• (7)The Committee may co-opt any other person to
• attend its meetings and participate in its deliberations,but that person shall not vote.
• 6.(l) The functions of the Committee shall be to
• (a)provide oversight of strategic trade;
• (b)develop standards and procedures for the effective implementation of this Act:
• (c)review the National Control List;

Functiossof the

Comeilee

• (d)approve,monitor and evaluate the budget proposalsprovided by the Secretariat;
• (e)establish and maintainthe coordination, cooperation,assistance and sharing ofinformation within Government agencies,academia.private institutions,any other person and other countries for the effective implementation ofthis Act;
• (f))report to the Cabinet Secretary on matters relating to strategic trade;
• (g)issue,suspend or revoke a licence or a certificate for purposes of this Act:
• (h)establish andoperale end-use controlsand compliance checks;and
• (i)perform such other functions necessary for the effective implementation of this Act.
• 7.(l) There shall bea secretariat ofthe Committee which shall consist of such public officers as may be seconded to the Secretariat.
• (2)The secretariat shall be hosted by the Ministry responsible for matters relating to intermal security.
• (3)The secretariat shall-
• (a)establish and maintain a comprehensive database
• on strategic goods and related services:
• (b)implementtheprovisionsof this collaboration with other agencies;
• Actin
• (c)conduct administrative investigations under this
• (d)coordinate,collaborate andsharerelevant information with other Govemment agencies in the implementation ofthis Act:
• (e)prepareandsubmit budgetproposalsfor
• consideration by the Committee;
• (f)monitor strategic trade and end-user controls;
• (g)inspect end-use activities and end-user controls for strategicgoods;
• (h) submit quarterly reports on matters relating to strategic trade:and

Secretanint

• (i)perform such other functions that are necessary for
• the effective implementation ofthis Act.
• 8.(l)The secretariat shall be headed by a Director
• who shall be a public officer appointed by the Cabinet Secretary on therecommendation of the Committee.
• (2)The Director shall-
• (a)be the head of the secretariat and be responsible for the day-to-day management of the secretariat;
• (b)keep all recordsofthe Committee:
• (c)communicate the decisions ofthe Committee:and
• (d)perform such other functions as may be assigned by the Committee.
• (3)The Director shall be appointed on such terms and
• conditions as may be determined by the Cabinet Secretary.

PARTIII-REGISTRATIONANDLICENSING

• 9.(1) A person who intends to engage or engages inReg strategic trade shall register with the Committee.
• (2)An application for registration under subsection (I) shall be in the prescribed form and shall be accompanied by payment ofthe prescribed fee.
• (3)The Committee may approve or refuse to grant the application under subsection(2).
• (4)Where the Committee approves an application,the
• Committee shall issue a certificate of registration to the applicant and enter the details of the applicant in the Register.
• (5)TheCommittee may refuse toapprove an
• application made under subsection (2) if
• (a) the applicant falsely represents or conceals any material fact or submits misleading information,
• (b)the applicant is found liable for violating an international embargo or sanction that binds Kenya;
• including submittinga forged document;
• (c)the applicant is the subject of ongoing civil or criminal proceedings related to national security:
• or

Diector:

• (d)there are prevailingnational security concerns
• against the applicant.
• (6)A registration under this section shall remain valid unless cancelled or suspended by the Committee.
• 10.(l) The Committee may suspend the registration of grounds to believe that there is a contravention of the
• aperson engaged in strategic trade where it hasreasonable provisions of this Act by that person.
• (2)The Committeemay restore asuspended registration if the contravention of the provisions of this Act is not established.
• (3)The Committee may cancel the registration of a person engaged in strategic trade if-
• (a)the registered person
• (i)so requests in writing:
• (i) contravenes the provisions of this Act or any other lawrelating to national security:
• (i) violates an international sanction or embargo
• that binds Kenya;
• (iv) dies;
• (v)is adjudged bankrupt;
• (vi)is a body corporate that has been dissolved or
• wound up:
• (vi) fails to engage in strategic trade for a period of three years;
• (b)new facts emerge which if they would have been known at the time of registration would have resuledinadenialoftheapplicationfor registration at the time when the application was made:
• (c)an entry with regards to the registration has been incorrectly or fraudulently made;
• (d)there isa change of shareholders,directors or signatories of the body corporate without written
• notification to the Committee:or

Cancellanon. spengonor revocahonof rgiunion

• (e)any other national security concems arise.
• (4)The Committee shallremove from the Register the name of a person whose registration has been cancelled under subsection (3).
• (5)A person whose name has been removed from the Register shall cease,from the date of such removal,to engage in strategic trade,and any licence or certificate issued to that person under this Act shall be revoked.
• 11.(l) The Director shall maintain a Register of Reps persons engaged in strategic trade.
• (2)The Register maintained under subsection(l) shall contain,in respect of each application for registration under section9(2).acopyof
• (a)the application;
• (b)the certificate or licence issued under this Act: and
• (c)any other information the Committee may
• consider necessary.
• 12.(l) The Committee shall impose end-use controls on a strategic good specified in the National Control List.
• (2)The Committee may impose end-use controls on a
• strategic good that is not specified in the National Control List.
• (3)Where the Committee imposes an end use control ona strategic good,the end user of the strategic good shall
• sign an end user certificate.
• (4)The end user certificate signed under subsection (3) shall specify the end user,the quantity,value and purpose ofthe strategic good.
• (5)The Committee shallcertifythe end-user
• certificate.
• (6)A person who intends to change the end user shall, within forty-eight hours,notify the Committee in writing of any change concerning the end-user or another party to an exportimport,transit,use,storage,transhipment of strategicgoods or provision of related services.
• (7)TheCommittee shall,upon receipt of the notification under subsection (6),approve a change of end-

End-ue coni user in accordance with the class of licence held by the applicant within ninety days from the date of receipt of the notification.

• (8)A person who engages in strategic trade shall comply with the end-user undertakings.
• 13.(l)The Committee may prohibit the export,reexport,transit,transfer,transmission and transhipment ofa good not specified in the National Control List or the provision ofa related service if the goods or services in question are or may be intended,in their entirety or in part, for use in connection with weapons of mass destruction, their means of delivery or for military applications to a destination which is subject to a United Nations Security Council sanction or embargo,prohibited or restricted enduses and end-users.
• (2)The Committee may stop the shipment of strategic goods specified in the National Control List or the provision of related services at any stage in order to verify that the shipment of the strategic goods or the provision of the related services has been approved under this Act.
• (3)Where a shipment is already in transit, the Committee may direct that the shipment be returned or unloaded at anyport ofcall.
• 14.(l) A person shall not engage in strategic trade of any strategicgood specified in the National Control List or provide arelated service unless the person is the holder ofa
• licence issued under this Act.
• (2)A person who intends to engage in strategic trade shallapply for a licence in the prescribed form,upon payment of the prescribed fee.
• (3)The Cabinet Secretary may. onthe recommendation of the Committee,exempt an applicant from the requirements of this section.
• (4)No person,other than a national security organ,
• shall engage in strategic trade for military applications.
• 15.(l)The Committee may issue alicence to an applicant subject to such conditions as setout under this Acl.

Jedus goodipecified in the Natonl Coned Lie

LREN

Condions fer he hsance ofa lieence.

• (2)In deciding whether to issue a licence under subsection(I).the Committee shall consider the following
• (a)the national security of Kenya;
• (b) international obligations and commitments under any international treaty or agreement including-
• (i)United Nations Security Council Resolutions:
• and
• (i) the African Union Peace and Security Council
• Resolutions;
• (c)the preservation of regional peace.security and stability:
• (d)the internal tensions or armed conflict in the
• destination country:
• (e)human rights and international humanitarian law;
• ()terrorism or organized criminal activities;
• (g)the security interests of a country which is an ally
• to Kenya:
• (h) the risk of diversion to an unauthorised end-user or pue:asn-pua
• (i)any other relevant national security consideration.
• (3)The Committee shall refuse to issue a licence if
• (a)the applicant does not fulfil the conditions and
• requirements ofthis Act:
• (b)the applicant submitted false documents,made misleading representations or concealed material facts in the application:
• (c)the applicant has contravened any written law
• relating to national security:
• (d)the applicant has violated an international embargo or sanction that binds Kenya;
• (e) the applicant is subject to ongoing criminal or civil proceedings related to national security;
• (f)the goods for which the licence is being sought are the subject of a policeinvestigation or court proceedings:

• (g)the proposed strategic trade is in breach ofa United Nations Security Council sanctionor embargo:
• (h) the proposed strategic trade will impede the fulfilment ofintemationalcommitmentsor obligations of Kenya;
• (i)there is credible information that the proposed stability,or
• strategic trade mayendangernational or international security.regional contribute to terrorist acts;
• G) there is credible information that the proposed strategic trade may resuk in the diversion of the strategicgood or service to an unauthorized enduse or end-user;or
• (k) there are any other national security concerms.
• 16.(1) The validity period ofa licence issued under this Act shall beas follows-
• (a)an individual licence shall be valid for a period of
• three years from the date ofissue;
• (b)a global licence shall be valid for a period of five years from the date ofissue;and
• (c)a general licence shall be valid for a period of five
• years from the date of issue or until it is revoked.
• (2)The Cabinet Secretary shall,by notice in the Gazerte,notifythe public of the issuance ofa general
• licence under this AcL
• 17.Where a licence is lost or destroyed,the holder of the licence shall notify the Committee of the loss or destruction within seven days ofthe occurrence.
• 18.In determining whether to revoke or suspenda licence,the Committee shall,where applicable,comply withArticle47 oftheConstitution andthe Fair Administrative Action Act.
• 19.(1) Where the Commitee suspects that the strategic trade is being conducted in contravention of existing conditions ofa licence,the Committee may suspend the licence.

Vadityof

Nonficaion of

lo or-destroyed licenoe.

Feir heanng

Cap.7L

Sapmson of licence

• (2)The Committee shall.in writing.inform the holder ofthe licence of the failure to comply with the conditions of the licence and shall specify the corrective action to be taken by the holder of the licence.
• (3)Where the holder of the licence does not take the corrective action specifiedbytheCommitleeunder subsection (2).the Committee may suspend the licence until the holder of the licence complies with the corrective action recommended by the Committee.
• (4)The Committee may suspend a licence for a
• shipment ofa strategic good specified in the National Control List or the provision ofrelated services to any country experiencing a deterioration in security.
• (5)The Commitee shall in writing.notify the holder ofa licence of the suspension of the licence and the period ofthe suspension.
• (6)Where at the endofthe period specified in subsection (5).the grounds for suspension are still valid, the period of suspension may be extended,and the holder
• ofthe licence shall be notified of such extension in writing.
• (7)The suspension of the licence may be lifted where
• the Committee considers it appropriate to do so.
• (8)The period for the performance of any action under this section shall be determined on a case by case basis and subject to relevant regulations.
• 20.(l)The Committee may revoke a licence if
• (a)the holder of the licence so requests,in writing:
• (b)new facts emerge which,had they been known or existed at the time of the application,would have resulted in the Committee refusing to issue the
• licence,
• (c)a material change in the information specified in
• the licence occurs;
• (d) the holder ofthe licence fails to comply with the obligations,terms or conditions of the licence;
• (e)the holder of the licence contravenes this Act or any other law relating to national security;

Revocatioef

lcence.

• (f)the holder of the licence fails to furnish the Committee with additional information relating to
• the activities conducted under the licence:
• (g)the holder of the licence dies;
• (h)the registered person is a body corporate that is
• dissolvedor woundup:
• (i)there is a change of shareholders,directors or signatories of the body corporate;
• 1)the Committee becomes aware of any other
• reasons related to national security:or
• (k) the Committee,for any other reason,deems it fit to revoke the licence.
• (2)The Committee shall revokethelicence ofa person whose registration has been cancelled.
• 21.The Commitee shall,by notice in the Gazette. notify the public of the revocation ofa general licence under this Act.
• 22.TheCommittee shall notifytherelevant Govermment agencies or State departments immediately it revokes or suspends a licence issued under this Act.
• 23.(l) A person aggrieved by a decision of the Committee may appeal to the Cabinet Secretary within thirty days of being notified of the decision.
• (2)An appeal under subscction (l) shall be heard and determined within sixty days after it is lodged.
• (3)Where al the end ofthe period specified in subsection (2), the grounds for appcal are still valid,the Committee mayextendtheperiod ofsuspensionor revocation of the licence and notify the holder of the
• licence of such extension,in writing.
• (4)The right to appeal to the Cabinet Secretary shall be in addition to any other remedy available in law to the aggrievedperson.

PARTIV-ENFORCEMENT,OFFENCESAND

PENALTIES

24.(1) A person who engages in strategic trade shall Pathciooof fevocalionof peneal licence Nstifieaton to Geveteent agencies Admiaiurative apeals Complance cequiremens

• (a)comply with the-conditions upon which the licence
• was-issued:
• (b) inform the Committee immediately ofany change that occurs inan export,importtransitor transhipment ofa strategic good or the provision
• ofa related service;
• (c)inform the Committee of the finalisation of the activity for which the licence was issued and
• submit therelevant documents to the Committee;
• (d)notify the Committee of the grounds for suspecting
• that strategic goods are or may be used,partly or entirely.for any of the uses related to weapons of mass destruction,theirmeans of delivery for military end-use in an embargoed destination by restricted persons or for suspecting that the related service whichhe intends toprovidewould facilitatethat use:
• (e) confirm the delivery and receipt of the strategic
• goods:
• (f)indicate clearly in relevant commercial documents including any sales contract,order confirmation, invoiceor dispatch note relating todomestic transfers of goods in the National Control List produced in Kenya,that those strategic goods are
• subject to controls,if exported from Kenya;
• (g)notify the Committee within twenty-four hours of any loss or theft of strategic goods or goods in the
• National Control list in their possession;
• (h) put in place intemal compliance measures for effective compliance with the provisions of this
• Act;and
• complywith other obligations,terms and conditions ofa licence or certificate issued under this Act.
• 25.(l) The Secretariat shall,in consultation and cooperation withotherregulatoryauthoritiesand enforcement agencies,be responsible for verifying
• compliance by all persons engaged in strategic trade.

Veificatonof complunce

• (2)The verification of compliance shall be conducted
• before,during and after the issuance ofa licence.
• (3)During verification of compliance,the Committee
• may,in collaboration with other regulatory authorities-
• (a)request necessary information from the applicant orholder ofa licence for purposes ofcompliance control;
• (b) inspect the documents ofan applicant or holder of
• alicence and the business premises, including offices.production facilities,warehouses,and distribution centres,related to strategic goods and nationally controlled goods as well as the goods themselves:
• (c)audit the internal compliance measures of the holder of a licence;
• (d)request information from any other institution or organisation necessary for the purposes of this
• section:
• (e)request for assistance from competent authorities ofother countries in order to collect additional information necessary for the purposes of this
• section;
• (f)monitor compliance ofthe holder of the licence with the obligations, terms,and conditions of the licence:
• (g)monitor the end-users ofthe strategic good;and
• (h)undertakeenforcementactivitieswithin the Committeesorthe regulatory authority's respective mandate.
• 26.(1)The Cabinet Secretarymay,on the recommendation of the Committee.bynotice in the Gazerte,appoint a suitably qualified person to be a strategic goods inspector.
• (2)An inspector may-
• (a)investigate an administrative violation committed
• under this Act:
• (b)undertake the enforcement of thisActin
• cooperation with other agencies:and

Inupedar

• (c)perform such other functions as may be assigned bythe Director.
• (3)No person appointed under subsection (l) shall, while being so appointed,engage in strategic trade.
• (4)The Cabinet Secretary shall issue an inspector appointedunder subsection (l)with a certificate of
• appointment.
• (5)An inspector shallupon entering any place or premises for purposes of subsection (2).be required to produce the certificate of appointment issued under subsection (4) to the person in charge of the premises.
• 27.(l)An inspector shall, with a warrant,have full and free access to any building.place,property,documents, network or data storage devicefor the purposes of administering this Act.
• (2)Where an inspector enters any place or premises for purposes of this Act,the inspector may
• (a)require any person therein to produce any books, accountsorother documenis, including computerized data or other record,whether in print orelectronic formal,or items which such person is required to keep under the provisions of this Act;
• (b)examine any books,accounts or other documents, including computerizeddata or other record, whether in print or electronic format,facility. apparatus,equipment,device or item and make copies of,or take extracts from,any such books, accounts,documents or records;
• (c)seize or detain any books,accounts or other documents,including computerized data or other record.whether in print or electronic format, facility,apparatus,equipment,device or item which contains or is reasonably suspectedto contain information relatingto anyoffence suspected to have been committed under this Act;
• (d)require any person therein to answer questions relatingto-
• (i)any book,data,document or other record or item:

Accclo pces orpremlics

• (i)any entry in any book,data, document or other record:or
• (ii)any other item that the inspector may deem necessary.
• (e)require,at the expense ofany person therein,to
• open and examine any container,envelope, package or other items and materials in any such place or premises:or
• (f) take a sample of any item,good or thing for analysis and testing.
• (3) If.by reason ofitsnature,size or amount,i is not
• practicable to remove any itembooks,accounts or other documents,including computerized data or other record whether in print or electronic format,seized or detained under this section,the inspector shall,by any means,seal such item,book,accounts or other documents,including computerized data,or other record in the place or premises or container in which it is found.
• (4)Where the inspector is unable to obtain free access
• premises,the inspector may.at any time,enter such place or premises and open such container in such manner.if necessary by force,as the inspector may deem necessary.
• (5) Where,on the entry upon any place or premises under the provisions of this Act,any strategic goods are found in relation to which an offence has been committed, such strategic goods shall be liable for forfeiture.
• 28.(l) An inspector may.with a warrant-
• (a)board any conveyance;
• (b)require the master of a vessel,pilot of an aireraft or person in control of any other conveyance to give such inforimation relating to the conveyance, cargo,stores,crew,passengers or voyage as the inspector may consider necessary.
• (c)search all parts of such conveyance for strategic
• goods:
• (d)examine all items on board and all items being loadedorunloaded;

Power to pearch

ceaveyancei

• (e) demand all documents ofitems which ought to be
• on board;or
• (frequire all or any such document to be submitted tohim for inspection.
• (2)A master ofa vesselpilot of an aircraft or person in control of any conveyance who refuses to allow an authorised officer to board or search such conveyance or refuses to give such information or to produce such documents on demand commits an offence and shall,on conviction be liable to a fine not exceeding one million shillings or to imprisonment for a term not exceeding three years,ortoboth.
• (3)If any place,box or chest on board in such conveyance is locked and the key withheld,the inspector may break open any such place,box or chest at the expense
• ofthe owner.
• 29.An inspector may.without a warranl,exercise any
• obtaining the warrant would defeat the objcct of the warrant.
• 30.Where any strategic good and any container,
• package,conveyance or other article in which the strategic good is stored,kept or found,record,bookaccount document or electronic data are seized,the inspector seizing the items shall prepare a list of the items seized and shall thereafter deliver a copy signed by the inspector to the owner or person in charge of the place,premises or conveyance which has been searched,or lo such owmer'sor persons agent orservant,at that place,premises or conveyance.
• 31.(1) The Committee may at any time it considers conveyance or other article in which the strategic goods are
• appropriate,obtain a court order for the disposal of the strategic goods together with any container,package. stored,kept or found,record,book,account,documenl or clectronic data seized subject to the following procedures beingcompliedwith-
• (a) an inventory specifying the description,markings and other particulars which clearly identify the items seized prepared by an inspector;

Eanry and search ofpremises wthoui wamant

Liarofuea seieod or deained

Dipo of sid sratepic goods

• (b)photographs of the items seized taken in the presence of the inspector.and the said inspector has certified that the photographs are true;and
• (c)copies ofany record,book,account,document or electronic data seized are duly certified by an inspector.
• (2)The disposal of goods under subsection (l) shall be carried out at the expense ofthe ownerof the goods.
• (3)The Cabinet Secretary shall by notice in the Gazerre,appoint a technical ad-hoc committee to handle the disposal of the strategic goods under this section.
• (4) The Cabinet Secretary shall, in appointing the adhoc committee undersub-section(3).takeinto consideration the category of the strategic good to-be destroyed and the lechnical expertise of the members in
• dealingwith the strategicgood.
• 32.(l)Where there is no prosecution or conviction in
• respect of any strategic goods or electronic data seized in the exercise of any power conferred under this Act,the strategic goods or electronic data shall be held for a period ofninety days from the date of seizure and at the end of that period shall be deemed forfeited,unless a written claim thereto is received within such period.
• (2)Any person claiming ownership of any strategic goods,container,package,conveyance,article,records, books,accounts,documents,or computerized data seized under this Act and that the strategic goods,container. package,conveyance,article,records,books,accounts, documents,or electronic data are not liable to forfeiture may personally or by his agent authorised in writing.give written notice to the inspector who made the seizure of his
• claim.
• (3) On receipt of the written notice under subsection
• (2),the inspector shall refer the matter to the Director.
• (4) The Committee shall conduct an inquiry on such claims and the person making the claim shall be entitled to appear and to be heard in person or to be represented by an advocate.
• under this Act,the Committee shall have power to

Forfeitre of sralepiegooda shonhcicamo prossuion

• (a)administer oaths;
• (b) summon persons to attend and give evidence:and
• (c)order the production of documents.
• (6)Any summons and orders issued under the hand of theDirector shall be deemed to be issued bythc
• Committee.
• (7)The Director shall record or cause to be recorded a
• the Committee.
• (8)The Committee shall regulate its own procedure al an inquiry held under this Act.
• (9)Where there is proof that an offence has been committed under this Aet and that the strategic goods, container.package,conveyance,article,records,books, accounts,documents,or computerized data that were the subject matter of or were used in the commission of the offence,the Committee shall order that the strategic goods, container,package,conveyance,article,records,books accounts,documents or computerized data be forfeited or may.in the absence of such proof,order the release of such strategic goods,container,package,conveyance,article, records,books,accounts,documents or computerized data to the person entitled to them.
• 33.Whereany strategic good,or any container, package,conveyance or other article in which the strategic goods are stored,kept or found,record,book,account document or electronic data seized under this Act,is held in the custody of the Government pending completion of any proccedings in respect ofan offence under this Act,the cost ofholding such strategic goods,container.package, conveyance,article,record,book,account,document or electronic data in custody shall,in the event of any person being convicted of an offence,be a civil debt due to the Government by such person and shall be recoverable
• accordingly.
• 34.A person shall not,in any proceedings before any court in respect of any strategic goods,or any container, package,conveyance or other article in which the strategic goods are stored,kept or found,record,book,account,

Cos ofholding seied strtegic poods

No costsor dmugeswisng fom scinire to be recoverble document or electronic data seized in the exercise of any power conferred under this Act,be entitled to the costs of such proceedings or to any damages or other relief unless such seizure was made without reasonable cause.

• 35.(1) A person shall not obstruct,impede or interfere with an inspector in the performance of the inspector's
• functions under this Act.
• (2) A person shall not impersonate an inspector.
• (3)A person who contravenes subsections (l) or (2) commits an offence and shall,on conviction,be liable to a fine not exceeding five million shillings or to imprisonment for a term not exceeding five years,or to both.
• 36.(l)Aperson who-
• (a)makes false ormisleadingrepresentationsor conceals any material fact in any submission to the Committee;
• (b)fails to act in accordance with any order or instructions issued by the Committee;
• (c)fails to report to or notify the Committee as
• required by this Act;
• (d)failstocomplywith therecordkeeping
• requirements under this Act;
• (e) causes,aids or abets a contravention of this Act or any order or conditions ofa licence issued under this Act;
• (f))attempts to contravene a provision of this Act or any order or licence issued under this Act;
• (g)conspires or acts in concert with one or more
• persons to contravene the provisions of this Act:
• (h)obstructsorhinders the Committee.its inspector in the execution of its powers conferred
• under this Act;or
• (i)forges or alters any registration,licence,end-use certificate,or any other document issued under the provisions ofthis Act,

commits an offence.

Olsiruction ofan

impedlo

Oliencen

• (2)Aperson who commitsan offence under exceeding fifty million shillings or to imprisonment for a
• subsection (l) shall,on conviction,be liable to a fine not term not exceeding ten years,or to both.
• (3)Aperson who
• (a)engages in strategic trade or provides related services without being registered and licenced under this Act;
• (b) fails to furnish any information as required under
• this Act:
• (c)uses any confidential information for any purpose not authorised under this Act:
• (d)uses strategic goods in a manner inconsistent with
• registration certificate and licence issued under thisAct;or
• (e)obstructs or fails to assist the Committee or an inspector in the performance oftheir duties under this Act,

commis an offence and shall,on conviction,be liable imprisonment for a term not exceeding ten years,or to

to a fine not exceeding twenty million shillings or to both.

• (4)Aperson who knowingly facilitates or finances the handling of strategic goods,if this endangers public safety and security commits an offence and shall,on conviction, be liable to a fine not exceeding five million shillings or to imprisonment for a term not exceeding three years,or to
• both.
• (5)A person who is in possession of conventional weapons prescribed in the NationalControlListor components thereof without a licence or certificate issued under this Act commits an offence and shall,on conviction, be liable to a fine not exceeding five million shillings or to imprisonment for a term not exceeding three years,or to both.
• (6)A person who knowingly offers to provide or provides strategic goods to be used for terrorism purposes commits an offence as pursuant to section 1l of the Cap s9B

Prevention of Terrorism Act and shall,on conviction,be liable to the penalty stipulated thereunder.

37.The Committee may refer any matter that falls within its jurisdiction to the relevant law enforcement agencies or the Director of Public Prosecutions.

Refecnceo aforcemem gennei

PARTV-MISCELLANEOUSPROVISIONS

Aapedjeauan

• 38.A person who contravenes any of the provisions of this Act for which no penalty is provided shall.on conviction, be liable to a fine not exceeding five million shillings,or imprisonment for a term not exceeding five years,or to both.
• 39.(1) Any confidential information obtained under this Act shall not be disclosed to any other party except in the furtherance ofjustice and law enforcement or national security.as may be determined by the Committee,or unless the party providing such information has consented to its disclosure.

Conldenly

• (2) The Committee shall keep confidential, trade and

2. production secrets. 3. (3)The information obtained and maintained under this Act shall be handled,retained and disposed of in accordancewith theprovisionsoftheAccessto Information Act,the Data Protection Act and any other related legislation. 4. 40.A person who contravenes any provisions of this Act and voluntarily discloses to the Committee such contravention shall have the benefit of such disclosure when theCommittee determinesthe administrative sanction,if any.applicable to that person. 5. 41.(l) No action or thing done by a member of the Committee or by an inspector,employee or agent ofa government authority shall, if the action or thing is done in good faith for executing the functions,powers or duties under this Act render the member,officer,employee or agent or any person acting on their direction pcrsonally liable to any action,claim or demand whatsoever. 6. (2)Where the Committee suspends or revokesa licence or registration issued under this Act,the Committee shall not be liable for any damages that may be caused by such acts.

Cp7M

Vdluntry dudosure.

Protectionfrom peonl labiliy

• 42.No civil action or proceedings based on or arising out of this Act or in general shall lie or be instituted unless iis commenced within three years next afler the act neglect or default complained or in the case of continuing injury or damage within twelve months next after the cessation thereof.
• 43.(1) The Cabinet Secretary shall,in consultation with the Committee,make regulations for the better carrying out of the objects and purposes of this Act.
• (2)Without prejudice to the generality of subsection (1).the Cabinet Secretary shall make regulations prescribing-
• (a) the safety,storage,transportation,disposal and security ofstrategic goods;
• (b)any fees payable under this Act;
• (c)procedures for voluntary disclosure;
• (d) any forms to be used for the purposes this Act:
• (e)the manner ofrecord keeping bypersons
• registered under the Act;and
• (f)any other matter necessary for the implementation
• of this Act.

PARTVI-CONSEQUENTIALAMENDMENTSAND

SAVINGS

• 44.The Firearms Act is amended-
• (a)in section 2 by inserting the following definition in proper alphabetical sequence

"armoured vehicle"means a vehicle which is armour-plated for protection against bullets or any other munition andincludes components for

armour plating:

• (b)in section 3-
• (i)by inserting the words"certificate of approval" immediatelyafterthe word "licence" appearing in subsection(5)b):
• (c)byinsertingthefollowingnew subsection immediately after subsection(5)

Limitationof acuonE

Regulanon

Amendment of Cap114

• (6)Notwithstanding the provisionsof subsection (5yb).where a licence,certificate of approval orpermit relates to a strategic good listed in the National Control List under the Strategic Goods Control Act.the Board shall issue the licence,certificate of approval or permit under subsection(S)(b)with the approvalof the Strategic Goods Control Committee
• 45.The Explosives Act is amended by inserting the
• following new section immediately after section 9

Licens and pemts ande he Act

• 9A.The provisions ofthis Act relating 1o permits,licensesandregulatory compliance shall be subject to further regulatorycontrolunderthe Strategic Goods Control Act.
• 46.The Nuclear Regulatory Act is amended in section 4by inserting the following new subsection immediately
• after subsection(2)
• (3)Despite the provisions of this Act,any persondealingwithnuclearorradioactive material,activitiesorfacilitiesshallfurther comply with the provisions ofthe Strategic Goods Control Act."
• 47.The Pharmacy and Poisons Act is amended by inserting the following new section immediately after section3B-

medcial sbstanee

theNatlCotdlicensed under section 3B(2)(e)relates toa Goods Control Committee.

Approwal for LiR

• 3C.Despite the provisions of section medicinal substance listed on the National Control Listunder the StrategicGoods Control Act, the Board shall only issue the licence with the approval of the Strategic
• 48.The Mining Act is amended in section 20(1Xe) by inserting the words and the Strategic Goods Control Act immediately after the words "this Act".
• 49.The Fertilizers and Animal Foodstuffs Act is amended in section2B-

Amndnent ef seton ofCap 115

Amesdmest of sectin4ofCap

Amendnen of

Cp24

Amendmenof

dJogguoos J06

Amendment of chos 2BofCap. H45

• (a)by re-numbering the existing provision as (I):
• (b) in subsection (1)—
• (i)in paragraph (a).by inserting the words "exportation,transhipmentimmediately after the word"importation":
• (i)in paragraph (D.by inserting the words "exporters,importers"immediately after the word"manufacturers";
• (i) by inserting the following new paragraph
• immediately after paragraph(h)
• "(i) implement administrative strategies and
• measures to ensure that persons do not use fertilizers in a manner prejudicial to national security."
• (c)by insertingthe followingnew subsection
• immediately after sub section (l)-
• "(2)Despite the provisions of subsection (1) fertilizers and animal foodstuffs that are listed in the National Control List shall be regulated in accordance with the provisions of the Strategic Goods Control Act."
• 50.Section 2CoftheFertilizersandAnimal Foodstuffs Act is amended in subsection (l) by inserting the following new paragraph immediately after paragraph
• (h

"(ha) one person representing the National Intelligence Service;and"

• 51.Section.2EoftheFertilizersandAnimal Foodstuffs Act is amended in subsection (2) by inserting the following new paragraph immediately after paragraph (b)-

"(ba)prescribe the concentrationof the

ingredients in a fertilizer in consultation with the Kenya Bureau of Standards."

• 52.Section 9 of the Fertilizers and Animal Foodstuffs
• Act is amended in subsection (l)
• (a)inparagraph (a)by inserting the pOM "exportation" immediatelyafterthe word

Amedmf wc2CofC

3H5.

Amendmen of

345

Amodmatof tn9f Cap 345

• (b)inparagraph (b)by insertingthe poM "exportation" immediatelyafter the word "importation.
• 53.The Pest Control Products Act is amended in section6by-
• (a)renumbering the existing provision as(1);
• (b)inserting thefollowing new subsection immediately after sub section(1)-
• "(2)Despite the provisions ofsubsection (l),a
• pest control product that is listed in the National Control List under the Strategic Goods Control Act shall not be registered by the Board except with the approval of the Strategic Goods Control Committee."
• 54.Any registration,licence, certificate or written authority to engage in strategic trade issued under any written law immediately before the commencement of this Act shall be deemed to have been issued under this Act:

Provided that the person who is registered or is the hokder ofa licence,certificate or written authority shall

apply to the Committee for registration within a periodof twelve months after the commencement of this Act.

Amedme af ctn 6efCap 346

Saningi

4(1)

SCHEDULE

THENATIONALCONTROLLIST

PART A:MilitaryList

PART B:Listof Dual Use Goods

PARTA:MILITARYLIST

Definition of terms used in the List

The following are the definition of the terms used in this List,in alphabetical order.

| Category | Term | Definition | |-------------|---------------------|----------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------| | | ML8,10“aircraf" | A fixed wing.swivel wing.rotary wing (helicopter),tilt rotor or til-wing airbome vehicle. | | | ML7,22biocatalysts” | Enzymes'for specific chemicalor biochemical reactions or other biological compounds which bind to and accelerate the degradation of CWagents. | | ML7 | "biological agents" | Pathogens or toxins,selected or modified (such as altering purity.shelf life virulence,dissemination characteristics,on resistance to UVradiation) to produce casualties in humans or animals,degrade cquipmentor damagecropsor the environment. | | ML17, 21,22 | "development" | Isrelated to allstages prior to serial productionsuchas:design.design research,design analyses,design concepts, assembly and testing of prototypes,pilot production schemes,design data,process of transforming design data into a product configuration design,integration design. layouts. | | ML17 | "end-effectors" | Grippers,active tooling units'and any other tooling that is attachedto the baseplateontheendofa“robot |

| Category | Term | Definition | |---------------|-----------------------------|------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------| | | | manipulator arm. | | ML8 | "energetic materials" | Substances mixtures that reacl chemically to release energy required for their intended application“Explosives" 'pyrotechnics" andpropellants”are subclassesofenergetic materials. | | ML8 | "explosives" | Solid,liquid or gaseous substancesor mixtures of substances which,in their application as primary.booster,or main charges in warheads,demolition and other applications.are required to detonate. | | MLI5 | "first image tubes" | Electrostatically focused tubes,empioying generationinput and output fibre optic or glass face intensifierplates,multi-alkali photocathodes (S-20 or S-25)butnot microchannelplate amplifiers. | | ML17 | "fuel cell" | An electrochemical device that converts chemicalenergydirectlyintoDirect Curent (DC)electricityby consuming fuel from an external source. | | ML17,19laser" | | An item that produces spatially and temporally lightthrough amplification by stimulated emission off radiation. | | ML10 | "lighter-than-air vehicles" | Balloons and“airshipsthat rely on hot air or onlighter-than-air gases such ashelium orhydrogen for their liff. | | ML17 | "nuclear reactor" | Includes the items within or attached directlytothereactorvesselthe equipment which controls the levelof power in the core,and the components which normally contain or come into direct contact with or control the primary |

| Category | Term | Definition | |---------------------|-----------------------|-----------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------| | ML8 | "precursors" | Specialtychemicals used inthe manufacture of explosives. | | ML7. 8,18.21. 22,23 | "production" | Means all production stages,such as: product engineering. manufacture. integration, assembly (mounting) inspection,testing.quality assurance. | | ML8 | "propellants" | Substancesormixturesthat reacl chemically to produce large volumes of hot gases at controlledrates to perform mechanicalwork. | | | ML2,8pyrotechnic(s) | Mixtures of solid or liquid fuels and oxidizers which,when ignited,undergo an energeticchemical reaction at a controlled rate intended to producespecific time delays,or quantities ofheat,noise,smoke. visiblelight infraredradiation. Pyrophories are subclass ot pyrotechnics,which contain no oxidizers but ignite spontaneously on contact with air. | | ML23 | "required" | As applied totechnology,refers to only that portionoftechnologywhich is peculiarly responsible for achieving or exceedingthecontrolledperformance levels,characteristics or functions.Such "required”“technology”may be shared by |

CLASSIFICATIONSINTHEMILITARYLIST

| Category | Term | Definition | |------------|----------------------------|--------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------| | | | trajectories:and (c)land back on earth with the people orcargo intact | | ML20 | "superconductive" | Refers to materials.(ie.metals,alloys or compounds)which can lose all electrical resistance (ie.which can attain infinite electrical conductivity and carry very large electrical currents without Joule heating. | | ML23 | "technology" | Specific information necessary for the "development”,“production”or“use”ofa product.The information takes the form ot technical data'or 'technical assistance' | | ML10 | "unmanned vehicle" ("UAV") | and sustainingcontrolledflightand navigation without any human presence on board. |

| Category | Contents | |------------|----------------------------------------------------------------------------------------------------------------------------------------------------| | ML1 | Smooth-bore weapons with a calibre ofless than 20 mm.other arms and automatic weapons. | | ML2 | Smooth-bore weapons with a calibre of20 mm or more,other weapons or armament,projectors and accessories. | | ML3 | Ammunition and fuze setting devices. | | ML4 | Bombs,torpedoes,rockets,missiles,other explosive devices andcharges. | | MLS | Fire control surveillance and waming equipment,and related systems,test and alignment and countermeasure equipment. | | ML6 | Ground vehiclesand components. | | ML7 | Chemical agents,“biological agents”,“riot control agents” radioactive materials,related equipment,components and materials. | | ML8 | Energetic materials"and related substances. | | ML9 | Vesselsofwar,special naval equipment,accessories components and other surface vessels. | | ML10 | Aircraf,“lighter-than-air vehicles",“Unmanned Aerial Vehicles"("UAVs").aero-engines,“sub-orbital craft”and "aircraft"equipment,related equipment. | | MLII | Electronic equipment,“spacecraf"and components. | | ML12 | cquipment. | | ML13 | Armoured or protective equipment,constructions,components andaccessories. | | ML14 | Specialised equipment formilitary trainingor for simulating military scenarios and simulators fortraining. | | MLI5 | Ilmaging orcountermeasure equipment. | | ML.16 | Forgings,castings and other unfinished products. | | ML17 | Miscellaneous equipment,materials and“libraries | | ML18 | Production'equipment,environmental test facilities and components. | | ML19 | Directed Energy Weapon (DEW) systems,related or |

| | countermeasure equipment and test models | |-------|----------------------------------------------------| | ML20 | Cryogenic and"superconductive”equipment. | | ML21 | Software. | | ML.22 | Other security and para-military police equipment. | | ML23 | Technology. |

MILITARYLIST

ML1

Smooth-bore weapons with a calibre of less than 20 mm,other

arms and automatic weapons with a calibre of12.7 mm (calibre 0.50 inches) or less and aecessories,as follows,and specially designed components therefor.

• a.Rifles and combination guns,handguns,machine,sub-machine and volleyguns:
• b.Smooth-bore weapons as follows:
• c.Weapons using caseless ammunition;
• d.Accessories designed for arms specified byMLlaMLI.b.orMLl.c,as follows:
• 1.Detachable cartridge magazines,
• 2.Sound suppressors ormoderators;
• 3.'Gun-mountings';
• 4.Flash suppressors;
• 5.Optical weapon-sights with electronic image processing:
• 6.Optical weapon-sights specially designed for military use,

ML2

Smooth-bore weapons with a calibre of 20 mm or more,other

weapons or armament with a calibre greater than 12.7 mm (calibre 0,50 inches),projectors specially designed or modified for military use and acccssories,as follows,and speciallydesigned components therefor:

• aGuns,howitzers,cannon,mortars,anti-tank weapons,projectile
• launchers,military flame throwers,rifles,recoilless rifles and smooth-bore weapons;
• b.Projectors,specially designed or modified for military use,as follows:
• 1.Smoke canister projectors;
• 2.Gas canister projectors;
• 3.Pyrotechnics projectors;

ML5

Fire control,surveillance and warning equipment,and related systems,test and alignment and countermeasure equipment,as

• c.Accessories specially designed for the weapons specified in ML2.a.,as follows:
• 1.Weapon sights and weapon sight mounts,specially designed for military use;
• 2.Signature reduction devices;
• 3.Mountings;
• 4.Detachable cartridge magazines:
• d.Not used since 2019.

ML3

Ammunition and fuze setting devices,as follows,and specially designed components therefor:

• a.Ammunition for weapons specified by MLl,ML2or ML12:
• b.Fuze setting devices specially designed for ammunition specified by
• ML3.a.

ML4

Bombs,torpedoes,rockets,missiles,other explosive devices and charges and related equipment and accessories,as follows,and specially designed components therefor:

• aBombs,torpedoes,grenades,smoke canisters,rockets,mines, missiles,depth charges,demolition-charges,demolition-devices, demolition-kits,"pyrotechniedevices,cartridges,submunitions therefor and simulators (ie.equipment simulating the characteristics ofany of these items), specially designed for military use;
• b.Equipment having all of the following:
• 1.Specially designed for military use;and

2. Specially designed for'activities'relating to any of the following:

• a.Items specified by ML4.a.:or
• b. Improvised Explosive Devices (IEDs):
• c.Aircraft Missile Protection Systems(AMPS)

follows,specially designed for military use,and specially designed

components and accessories therefor:

• a.Weapon sights,bombing computers,gun laying equipmenl and weapon control systems;
• b.Other fire control,surveillance and waming equipment,and related systems,as follows:
• 1.Target acquisition,designation,range-finding.surveillance ortracking systems;
• 2.Detection,recognition or identification equipment;
• 3.Data fusion or sensor integration equipment;
• c.Countermeasureequipment for items specified by ML5.a.or
• ML5.b.:
• d.Field test or alignment equipment,specially designed for items specified by ML5.a.,ML5.b.orML.5.c.

ML6

Ground vehicles and components,as follows:

• aGround vehicles and components therefor.specially designed or modified for military use;This includes.
• 1.Tanks and other military armed vehicles and military vehicles fitted with mountings for arms or equipment for mine laying orthe launchingofmunitions specified by ML4;
• 2.Armoured vehicles;
• 3.Amphibious and deep-water fording vehicles;
• 4.Recovery vehicles and vehicles for towing or trarsporting
• ammunition or weapon systems and associated load handling equipment;
• 5.Trailers.

Modification of a ground vehicle for military use specified by ML6.a.entails a structuralelectrical or mechanical change involving one ormore components that are specially designed for military use.Such components include:

• 1.Pneumatic tyre casings ofa kind specially designed to be bullet-proof,
• 2.Armoured protection of vital parts (e.g.fuel tanks or vehicle
• cabs):

ML7

Chemieal radioactive materials,related equipment,components and materials, as follows:

• "Biological agents"or radioactive materials selected or modified to increase their effectiveness in producing casualties in humans or animals,degrading equipment or damaging crops or the environment:
• b.Chemical warfare (CW)agents,including:
• 1.
• CWnerve agents:
• O-Alkyl (equaltoor less than Cl0,including 配 cycloalkyl) alkyl (Methyl,Ethyl,n-Propyl or Isopropyl) phosphonofluoridates,such as:
• 3.Special reinforcements or mountings for weapons;
• 4.Black-outlighting.

b.Other ground vehicles and components,as follows:

• 1.Vehicles having all of the following:
• aManufacturedorfitedwithmaterialsor components to provide ballistic protection equal to or
• better than level Ill (NIJ 0108.01,September 1985).or "equivaleni standards";
• b.A transmission to provide drive to both front and rear wheels simultaneously.including those for vehicles having additional wheels for load bearing purposes
• whether driven ornot:
• C.Gross Vehicle Weigh Rating (GVWR)greater than
• 4500kg:and
• d.Designed or modified for off-roaduse:
• 2.Components having allof the following:
• aSpecially designed for vehicles specified in ML6.b.1.: and
• b.Providing ballistic protection equal to or better than level ll (NU 0108.01,September 1985).or"equivalent
• standards".

Sarin (GB):O-Isopropyl methylphosphonofluoridate (CAS107-44-8):and

Soman (GD):O-Pinacolylmethylphosphonofluoridate (CAS96-64-0):

• b. O-Alkyl (equal to or less than Clo,including cycloalkyl) N,N-dialkyl (Methyl,Ethyl,n-Propyl or Isopropyl) phosphoramidocyanidates,such as:

Tabun (GA):O-Ethyl N.Ndimethylphosphoramidocyanidate(CAS 77-81-6);

• O-Alkyl (H or equal to or less than Ci0,including cycloalkyl) S-2-dialkyl (Methyl,Ethyl,n-Propylor Isopropyl)-aminoethylalkyl (Methyl,Ethyl,n-Propyl or Isopropyl)phosphonothiolatesandcorresponding alkylated and protonated salts,such as:VX:O-Ethyl S2-diisopropylaminoethylmethylphosphonothiolate (CAS50782-69-9):

2. CWvesicant agents:

• a Sulphur mustards,such as:
• 1.2-Chloroethylchloromethylsulphide (CAS 2625-765)
• 2.Bis(2-chloroethyl) sulphide(CAS 505-60-2);
• 3.Bis(2-chloroethylthio)methane(CAS 63869-13-6):
• 4.1,2-bis(2-chloroethylthio)ethane (CAS3563-36-8);
• 5.1.3-bis(2-chloroethylthio)-n-propane(CAS 6390510-2
• 6.1,4-bis (2-chloroethylthio)-n-butane(CAS 14286893-7
• 7.1.5-bis (2-chloroethylthio) -n-pentane 142868-94-8):
• (CAS
• 8.Bis (2-chloroethylthiomethyl)ether (CAS 63918-
• 90-1):
• 9.Bis(2-chloroethylthioethyl)ether (CAS 63918-898):
• b.Lewisites,such as:
• 1.2-chlorovinyldichloroarsine(CAS 541-25-3):

• 2.Tris(2-chlorovinyl) arsine(CAS40334-70-1):
• 3.Bis(2-chlorovinyl) chloroarsine (CAS 40334-69-8);
• Nitrogen mustards,such as:

1. HN1:bis (2-chloroethyl)ethylamine (CAS

• 538-07-8):

2. HN2:bis(2-chloroethyl)methylamine (CAS

• 51-75-2):

3. HN3:tris (2-chloroethyl)amine(CAS55577-1) 3. CW incapacitating agents,such as:3-Quinuclidinyl benzilate (BZ)(CAS6581-06-2): 4. CWdefoliants,such as:

• a.Butyl 2-chloro-4-fluorophenoxyacetate(LNF);
• b.
• 2,4.5-trichlorophenoxyacetic acid (CAS 93-76-5)mixed with 2,4-dichlorophenoxyacetic acid(CAS94-75-7) (Agent Orange(CAS39277-47-9)):
• c.CW binary precursors and key precursors,as follows:
• 1.Alkyl (Methyl.Ethyl,n-Propyl or Isopropyl) Phosphonyl Difluorides,such as:DF:Methyl Phosphonyldifluoride(CAS 676-99-3):
• 2.O-Alkyl (H orequalto or less than C10, including eycloalkyl) O-2-dialkyl(Methyl,Ethyl n-Propyl or Isopropyl)-aminoethyl alkyl (Methyl, Ethyl,n-Propyl or Isopropyl) phosphonites and corresponding alkylated and protonated salts, such as: QL: O-Ethyl O-2-diisopropylaminoethylmethylphosphonite (CAS
• O-lsopropyl
• 57856-11-8);
• 3.Chlorosarin: methylphosphonochloridate (CAS1445-76-7):
• 4.Chlorosoman: O-Pinacolyl methylphosphonochloridate (CAS7040-57-5):
• 5."Riotcontrolagents", active constituent
• chemicals and combinations thereof,including:
• 6.a-Bromobenzeneacetonitrile,(Bromobenzyl cyanide)(CA)(CAS5798-79-8):

• 7.[(2-chlorophenyl) methylene) propanedinitrile, (oChlorobenzylidenemalononitrile) (CS) (CAS 2698-41-1);
• 8.2-Chloro-I-phenylethanone,Phenylacyl chloride (-chloroacetophenone)(CN)(CAS532-27-4):
• 9.Dibenz-(b,f-1,4-oxazephine,(CR)(CAS 257-
• 07-8).
• 10.10-Chloro-5,10-dihydrophenarsazine,
• (Phenarsazine chloride),(Adamsite),(DM) (CAS578-94-9):
• 11.N-Nonanoylmorpholine,(MPA)(CAS 5299-
• 64-9):
• d. Equipment,specially designed ormodified for militaryuse,designed or modified for the dissemination of any of the following.and specially designed components therefor.

1. Materials oragents specified by

• ML7.a.ML7.b.orML7.d.:or

2. CWagents madc up ofprecursors specified by ML7.e.;

Protective and decontamination equipment,specially

designed or modified for military use,components and chemical mixtures,as follows:

• 1.Equipment designed or modified for defence against materials specified by ML7.a.,ML7.b.or ML7.d.and speciallydesigned components
• therefor:
• 2.Equipment designed OT modified for decontamination of objects contaminated with materials specified by ML7.a.or ML7.b.,and specially designed components therefor:
• 3.Chemicalmixturesspeciallydevelopedor formulated for the decontamination ofobjects contaminated with materials specified by ML7.a. orML7.b.:Equipmentspecially designedor modified for military use designed or modified
• for the detection or identification of materials

ML8

Energetie materials"and related substances,as follows:

• a"Explosives"as follows,andmixtures'thereof
• L.ADNBF (aminodinitrobenzofuroxan or 7-amino-4.6-
• dinitrobenzofurazane-1-oxide)(CAS 97096-78-1):
• 2.BNCP(cis-bis (5-nitrotetrazolato)tetraamine-cobalt (III)
• perchlorate)(CAS 117412-28-9):
• 3.CL-14(diamino dinitrobenzofuroxan or 5,7-diamino4,6-dinitrobenzofurazane-I-oxide) (CAS117907-74-1):
• 4.CL-20 (HNIWor Hexanitrohexaazaisowurtzitane)(CAS 13528590-4):chlathrates ofCL-20 (see also ML8.g.3.and ML.8.g.4. for its"precursors");
• 5.CP(2-(5-cyanotetrazolato)penta amine-cobalt (Ill)perchlorate) (CAS70247-32-4);
• 6.DADE (1.1-diamino-2,2-dinitroethylene,FOX-7)(CAS145250-
• (E-18

specified by ML7.a.ML7.b.or ML7.d,and specially designed components therefor;

• fBiopolymers'specially designed or processed for the detection or identification of CWagents specified by ML7.b.,and the culures of specific cells used to produce
• them:
• g."Biocatalysts"for the decontamination or degradation of
• CWagents,and biological systems therefor,as follows:
• a"Biocatalysts" specially designedforthe decontamination or degradation of CW agents specified by ML7:and

b.resulting from directedlaboratoryselection or genetic manipulation of biological systems;

• h.Biological systems containing the genetic information specific to the production ofbiocatalystsspecified by
• ML7.i.l.,asfollows:
• a.'Expression vectors';
• b.Viruses;
• c.Cultures of cells.

• 7.DATB(diaminotrinitrobenzene)(CAS 1630-08-6):
• 8.DDFP(1,4-dinitrodifurazanopiperazine);
• 9.DDPO(2,6-diamino-3.5-dinitropyrazine-1-oxide,PZO)(CAS 194486-77-6):
• DIPAM(3.3-diamino-2,2,4.4'6.6-hexanitrobiphenyl Or

10. dipicramide)(CAS 17215-44-0): 11. DNGU (DINGUor dinitroglycoluril)(CAS555I0-04-8): 12. Furazans as follows:

• a.DAAOF(DAAF,DAAFox,or diaminoazoxyfurazan):
• b.DAAzF(diaminoazofurazan)(CAS78644-90-3):
• HMX and derivatives(see also ML8.g.5. for itsprecursors"). asfollows:
• a.HMX(Cyelotetramethylenetetranitramine,
• octahydro1.3,5,7-tetranitro-1,3,5,7-tetrazine, 1,3,5.7-tetranitro1,3,5,7-tetraza-cyclooctane,octogen or octogene)(CAS 2691-41-0):
• b.difluoroaminated analogs of HMX;
• c.K-55(2,4,6,8-tetranitro-2,4,6,8-tetraazabicyclo[3,3,0]octanone-3,tetranitrosemiglycourilorketo-bicyclic
• HMX)(CAS130256-72-3):
• 14.HNAD(hexanitroadamantane)(CAS143850-71-9);
• 15.HNS(hexanitrostilbene)(CAS 20062-22-0):
• 16.Imidazoles as follows:
• (Octahydro-2,5-bis(nitroimino)imidazo
• aBNNII [4,5-djimidazole);
• b.DNI (2.4-dinitroimidazole)(CAS5213-49-0):
• c.FDlA(1-fluoro-2,4-dinitroimidazole);
• d.NTDNIA
• (N-(2-nitrotriazolo)-2,4-
• dinitroimidazole):
• e.PT1A(1-picryl-2,4,5-trinitroimidazole):
• 17.NTNMH (1-(2-nitrotriazolo)-2-dinitromethylene hydrazine):
• 18.NTO(ONTA or3-nitro-1,2,4-triazol-5-one)(CAS932-64-
• 9);
• 13.

• 19.Polynitrocubanes with more than four nitro groups:
• 20.PYX (2,6-Bis(picrylamino)-3,5-dinitropyridine) (CAS

21.RDXand derivatives,as follows:

• a.RDX(cyclotrimethylenetrinitramine,cyclonite,T4. hexahydro-1.3,5-trinitro-1,3,5-triazine, 1,3,5trinitro-1.3,5-triaza-cyclohexane, hexogen or hexogene)(CAS 121-82-4);
• b.Keto-RDX (K-6 or 2.4,6-trinitro-2.4,6triazacyclohexanone)(CAS115029-35-1):
• 22.TAGN(triaminoguanidinenitrate)(CAS4000-16-2):
• 23.TATB (triaminotrinitrobenzene)(CAS 3058-38-6)(see also ML8.g.7 for its"precursors");
• 24.TEDDZ(3.3.7,7-tetrabis(difluoroamine)octahydro-1,5-dinitro1,5-diazocine):
• 25.Tetrazoles as follows:
• a.NTAT (nitrotriazol aminotetrazole);
• b.NTNT(1-N-(2-nitrotriazolo)-4-nitrotetrazole):
• 26.Tetryl (trinitrophenylmethylnitramine)(CAS479-45-8):
• 27.TNAD (1,4,5.8-tetranitro-1,4,5.8-tetraazadecalin) 135877-16-6)(see also ML8.g.6.for itsprecursors"):
• (CAS
• 28.TNAZ(1,3,3-trinitroazetidine)(CAS 97645-24-4)(see also ML8.g-2.for its"precursors);
• 29.TNGU(SORGUYLor tetranitroglycoluril)(CAS55510-03-7):
• 30.TNP(1,4,5.8-tetranitro-pyridazino[4,5-d]pyridazine)(CAS 229176-04-9):
• 31.Triazinesas follows:
• a.DNAM (2-oxy-4,6-dinitroamino-s-triazine)
• (CAS19899-80-0):
• b.NNHT (2-nitroimino-5-nitro-hexahydro-1.3,5-
• triazine)(CAS130400-13-4);
• 32.Triazolesas follows:
• a.5-azido-2-nitrotriazole;

• b.ADHTDN (4-amino-3,5-dihydrazino-1.2,4triazole dinitramide)(CAS1614-08-0):
• c.ADNT(1-amino-3,5-dinitro-1.2,4-triazole)
• d.BDNTA ((bis-dinitrotriazole)amine):
• (3.3'-dinitro-5,5-bi-1,2,4-triazole) (CAS
• e.DBT 30003-46-4):
• fDNBT(dinitrobistriazole)(CAS70890-46-9):
• g.Not used since 2010
• h.NTDNT (1-N-(2-nitrotriazolo)3.5-dinitrotriazole):
• LPDNT(I-picryl-3.5-dinitrotriazole):
• TACOT
• (tetranitrobenzotriazolobenzotriazole) (CAS25243-36-1):
• 33."Explosives"not listed elsewhere in ML8.a. and having anyofthe following:
• a.Detonation.velocityexceeding 8700m/s,at
• maximum density.or
• b.Detonation pressure exceeding 34 GPa(340 kbar);
• 34.Not used since 2013
• 35.DNAN(2.4-dinitroanisole)(CAS119-27-7);
• 36.TEX(4,10-Dinitro-2,6,8,12-tetraoxa-4,10-diazaisowurtzitane);
• 37.GUDN(Guanylurea dinitramide)FOX-12(CAS 217464-385):
• 38.Tetrazines as follows:
• a.BTAT (Bis(2.2,2-trinitroethyl)-3,6-
• diaminotetrazine):
• b.LAX-112 (3,6-diamino-1.2,4,5-tetrazine-1,4dioxide);
• 39.Energetic ionic materials melting between 343 K(70 C)and 373K(100C)and with detonation velocity exceeding 6800
• m/s or detonation pressure exceeding 18 GPa (180 kbar);
• 40.BTNEN(Bis(2.2.2-trinitroethyl)-nitramine)(CAS 19836-28 3):
• 41.FTDO (5,6-(3,4-furazano)-1,2,3,4-tetrazine-1,3-dioxide);

42.EDNA(Ethylenedinitramine)(CAS 505-71-5):

• 43.TKX-50(Dihydroxylammonium5,5'-bistetrazole-1,1-diolate);
• b. "Propellants"as follows:
• 1.Any solid"propellantwith a theoretical specific impuise (under standard conditions)ofmore than:
• a. 240seconds for non-metallized, non-halogenized "propellant";
• b.250 seconds for non-metallized,halogenized "propellant"; or
• C. 260 seconds for metallized"propellant":
• 2.Not used since 2013
• 3."Propellants" having a force constant of more than 1 200 kJ/kg;
• 4."Propellantsthat can sustain a steady-state linear buming rate ofmore than 38 mm/s under standard conditions (as measured in the form of an inhibited single strand)of6.89 MPa (68,9 bar) pressure and294K(21 °C):
• 5.Elastomer Modified Cast Double Base(EMCDB)"propellants with extensibility atmaximum stress of more than 5% at 233K
• (-40°°C)
• 6.Any "propellant"containing substances specified by ML8.a.:
• 7.Propellants,not specified elsewhere in this Military List, specially designed for military use:
• Pyrotechnics,fuels and related substances,as follows,and mixtures'thereof:

1. "Aircraf" fuels specially formulated for military purposes; 2. Alane(aluminium hydride)(CAS 7784-21-6); 3. Boranes,as follows,and their derivatives:

• a.Carboranes;
• b.Borane homologues,as follows:
• 1.Decaborane(14)(CAS 17702-41-9):
• 2.Pentaborane(9)(CAS 19624-22-7);
• 3.Pentaborane(11)(CAS 18433-84-6):

• 4.Hydrazine and derivatives,as follows (see alsoML8.d.8.andML.8.d.9.for oxidising
• hydrazine derivatives):
• a.Hydrazine (CAS 302-01-2) in concentrations of 70 % or more;
• b.Monomethyl hydrazine(CAS 60-34-4):
• c.Symmetrical dimethyl hydrazine (CAS 540-73-8);
• d.Unsymmetrical dimethyl hydrazine (CAS57-14-7);
• 5.Metal fuels,fuel 'mixtures'or "pyrotechnic" 'mixtures,in particle form whether spherical. atomized spheroidal,flakedorground manufactured from material consisting of99 % or more of any of the following:
• a.Metals as follows andmixtures'thereof:
• 1.Beryllium(CAS7440-41-7)in
• particle sizesof less than 60 μm;
• 2.Iron powder (CAS7439-89-6) with particle size of3μm orless produced byreduction of iron
• oxide with hydrogen;
• b.'Mixtures' containing any ofthe following:
• 1.Zirconium (CAS7440-67-7), magnesium (CAS 7439-95-4)or alloys of these inparticle sizes of
• lessthan 60μm,or
• 2.Boron(CAS7440-42-8)orboron carbide (CAS 12069-32-8) fuels of85%purityor higher and
• particle sizes ofless than 60 um:
• 6.Militarymaterials,containing thickeners for hydrocarbon fuels,specially formulated for use in flame throwers or incendiary munitions,such asmetal stearates (e.g.0ctal (CAS 637-12-7)) or palmitates;

• 7.Perchlorates, chlorates and chromates, composited with powdered metal or other high energy fuel components,
• 8.Spherical or spheroidal aluminium powder (CAS 7429-90-5)with a particle size of60 μm orless
• andmanufacturedfrommaterialwithan aluminium content of99 %or more;
• 9.Titanium subhydride (TiHn)of stoichiometry cquivalent to n=0,65-1.68;
• 10.Liquid high energy density fuels not specified
• inML8.c.L.,asfollows:
• a.Mixed fuels,that incorporate both solid and liquid fuels(e.g.boron slurry).having a mass-based energy density of 40 MJ/kg orgreater;
• b.Other high energy density fuels and fuel additives (e.g.cubane,ionic solutions,JP7.JP-10).having a volume-based energy density of37,5GJper cubicmeteror greater,measured at 293 K(20 °C)and one atmosphere (101,325kPa)pressure;
• 1.Pyrotechnicandpyrophoricmaterials as
• follows:
• a."Pyrotechnic" or pyrophoric materials specifically formulated toenhanceor-controlthe production ofradiated energy in any part of the IR spectrum;
• b.Mixtures of magnesium, polytetrafluoroethylene(PTFE) andavinylidenedifluoridehexafluoropropylene copolymer (e.g.MTV);
• Fuel mixtures,"pyrotechnicmixtures or "energetic materials", not.. specified elsewhere in ML8,having all of the

12. following:

• a.Containing greater than 0.5 %ofpaniclesofanyofthe following:
• 1.Aluminium:
• 2.Beryllium:
• 3.Boron,
• 4.Zirconium;
• 5.Magnesium:or
• 6.Titanium;
• b.Particles specified by ML8.c.12.a.withasize less than 20o nm in any direction:
• and
• c.Particles specified by ML8.c.12.a. witha metal contenl of60 %or greater;
• d.Oxidisers asfollows, and mixtures'thereof.
• ADN (ammonium dinitramide orSR12)(CAS140456-78-6):

2. AP (ammonium perchlorate)

• (CAS7790-98-9);
• 3.Compounds of
• composed fluorineand any of the following:
• a.
• Other halogens;
• b. Oxygen,or
• c.
• Nitrogen;
• DNAD (1,3-dinitro-1,3diazetidine)(CAS78246-
• 06-7);

5. HAN (hydroxylammonium

• nitrate)(CAS13465-08-2):

• (hydroxylammonium perchlorate)(CAS1S588-
• 6.HAP 62-2),

7. HNF (hydrazinium nitroformate)(CAS 2077328-8): 8. Hydrazine

• nitrate (CAS 37836-27-4);

9. Hydrazine perchlorate (CAS

• 27978-54-7):
• '01 Liquid oxidisers comprised ofor containing inhibited redfumingniricacid (IRFNA)(CAS8007-58-7):
• Binders, plasticizers, monomers and polymers,as follows:

(azidomethylmethyloxetane anditspolymers) (CAS 90683-29-7) (see also ML8.g.1. for its

• AMMO "precursors");

2. BAMO (3.3bis(azidomethyljoxetane and

its"precursors"):

its polymers)(CAS 1760720-4)(see also ML8.g.1.for

3. BDNPA (bis dinitropropyljacetal) (CAS 2. (2.25108-69-0): 4. BDNPF (bis 4. (2.2dinitropropyl)formal)(CAS 5917-61-3): 5. BTTN(butanetrioltrinitrate) (CAS 6659-60-5)(seealso

• ML8.g.8. for its 6. Energetic monomers, plasticizers orpolymers, speciallyformulatedfor military use and containing any ofthe following:
• a.Nitro groups;
• b. Azido groups;
• c. Nitrate groups,
• d. Nitraza groups;or
• e Difluoroamino groups,
• FAMAO (3difluoroaminomethyl-3azidomethyl oxetane) and its polymers:

8. FEFO (bis-(2-fluoro-2.2-

• dinitroethyl)formal)(CAS 17003-79-1):
• FPF-1 (poly-2.2,3,3,4,4hexafluoropentane-1,5-diol formal)(CAS376-90-9):

10. FPF-3 (poly-2,4,4,5,5.6,6heptafluoro-2-trifluoromethyl-3-oxaheptane1.7-diol formal);

• GAP(glycidylazidepolymer) (CAS143178-24-9)and its derivatives;

12. HTPB (hydroxyl terminated polybutadiene) with hydroxyl functionality equal toor greater than 2.2and less than or equal to 2,4,a hydroxyl value of less than 0.77 meq/g.and a viscosity at30oCoflessthan 47 poise(CAS 69102-90-5);

• 13.Alcohol functionalised poly(epichlorohydrin)with a molecular weight less than 10000.asfollows:a Poly(epichlorohydrindiol):
• 14.b.Poly(epichlorohydrintriol):

15.NENAs

(nitratoethylnitramine compounds)(CAS17096-478.85068-73-1,82486-83-7. 82486-82-6 and85954-06-9):

• 16.PGN (poly-GL.YN, polyglycidylnitrate or poly(nitratomethyl oxirane) (CAS 27814-48-8):

17. Poly-NIMMO (poly (nitratomethylmethyloxetane) poly-NMMOorpoly(3Nitratomethyl-3methyloxetane)) (CAS 84051-81-0): 18. Polynitroorthocarbonates; 19. TVOPA (1.2,3-tris1,2bis(difluoroamino)ethoxy] propane or.tris vinoxy propane adduct) (CAS 53159-39-0): 20. 4.5diazidomethyl-2-methyl1.2.3-triazole(iso-DAMTR): 21. PNO (Poly(3-nitrato

• oxetane));
• 22 TMETN (Trimethylolethane trinitrate)(CAS 3032-55-1):
• f Additives'as follows:
• 1.Basic copper salicylate(CAS 62320-94-9):
• 2.BHEGA (bis-(2hydroxyethyl)glycolamide)
• (CAS17409-41-5);

• 3.BNO(butadienenitrileoxide):
• 4.Ferrocene derivativesas follows:
• a.Butacene(CAS125856-62-4):
• b.Catocene (2.2-bis-ethylferrocenyl propane) (CAS37206-42-1):
• c.Ferrocene carboxylic acids and ferrocene carboxylic acid esters;
• d.n-butyl-ferrocene(CAS 31904-29-7);
• e.Other adducted polymer ferrocene derivativesnot specifiedelsewhere in ML8.f.4.:
• f.Ethyl ferrocene(CAS 1273-89-8):
• g.Propyl ferrocene;
• h.Pentyl ferrocene(CAS 1274-00-6)
• LDicyclopentyl ferrocene;
• jDicyclohexyl ferrocene:
• k.Diethyl ferrocene (CAS 1273-97-8):
• LDipropyl ferrocene;
• m.Dibutyl ferrocene (CAS 1274-08-4):
• n.Dihexyl ferrocene(CAS 93894-59-8):
• o.Acetylferrocene(CAS127l-55-2y1.1'diacetyl ferrocene(CAS 1273-94-5);

5. Lead beta-resorcylate(CAS 20936-32-7)or copper beta-resorcylate(CAS 70983-44-7):

• 6.Lead citrate (CAS 14450-60-3):

7. Lead-copperchelatesofbeta-resorcylateor salicylates (CAS 68411-07-4):

• 8.Lead maleate (CAS 19136-34-6):
• 9.Lead salicylate(CAS15748-73-9):
• 10.Lead stannate(CAS12036-31-6):

11. MAPO (tris-1-(2-methyl)aziridinyl phosphine oxide)(CAS 57-39-6);BOBBA 8(bis(2-methyl aziridinyl)

12. 2-(2-hydroxypropanoxy) propylamino phosphine oxide):and other MAPO derivatives; 13. Methyl BAPO (bis(2-methyl aziridinyl) methylamino phosphine oxide) (CAS85068-72-0): 3. 14.N-methyl-p-nitroaniline(CAS100-15-2): 15. 3-Nitraza-1,5-pentane disocyanate (CAS7406-61-9): 5. 16.Organo-metallic coupling agents as follows: 6. a.Neopentyl|diallylloxy. trildioctylphosphato-titanate(CAS 103850-22-2) also knownas titanium IV,2,2 [bis 2-propenolatomethyl.butanolato,tris(dioctyl) phosphato](CAS1I0438-25-0):or LICA12(CAS103850-22-2): 7. b.Titanium IV,[(2-propenolato-1) tris[dioctyl] 8. methyl n-propanolatomethyl] butanolato-l. pyrophosphate or KR3538: 9. c.Titanium IV, [(2-propenolatoI)methyl, n-propanolatomethyl] butanolato-l,tris(dioctylphosphate; 16.

Polycyanodifluoroaminoethyleneoxi

de:

17.Bonding agents as follows:

• a.1,1R,IS-trimesoyl-tris(2ethylaziridine)(HX-868.BITA) (CAS7722-73-8);
• b.Polyfunctionalaziridine amides with isophthalic, trimesic, isocyanuric trimethyladipic backbone also having a 2-methylor 2-ethyl aziridine group:
• 18.Propyleneimine (2-methylaziridine)
• (CAS75-55-8):

• 19.Superfine iron oxide (Fe2O3)
• (CAS1317-60-8)with a specific surface areamore than 250 m2/g and an average particle size of 3.0 nmorless,
• 20.TEPAN (tetraethylenepentaamineacrylonitri le) (CAS 68412-45-3): cyanoethylated polyamines and their salts;
• 21.TEPANOL (tetraethylenepentaamineacrylonitri leglycidol)(CAS 68412-46-4): cyanoethylated polyamines adducted with glycidol and their salts:
• 22.
• TPB (triphenyl bismuth)(CAS 60333-8):

23. TEPB (Tris (ethoxyphenyl) bismuth)(CAS90591-48-3):

• B-
• "Precursors"as follows:
• L. BCMO (3,3bis(chloromethyljoxetane) (CAS78-71-7)(see also

ML8.e.1.andML8.e.2.);

• Dinitroazetidine-t-butyl salt (CAS 125735-38-8)(see also
• ML8.a.28.)

3. Hexaazaisowurtzitane derivatesincluding HBIW (hexabenzylhexaazaisowurtzit ane)(CAS 124782-15-6)(see alsoML8.a4.)andTAIW (tetraacetyldibenzylhexaazaiso wurtzitane)(CAS 182763-606)(see also ML8.a.4.):

• 4.Not used since 2013

• 5.TAT(1.3,5.7tetraacetyl1.3.5.7.-tetraazacyclo-octane) (CAS 41378-98-7)(sce also
• ML8.a.13.):
• 6.1,4.5.8-tetraazadecalin (CAS 5409-42-7) (see also ML8.a.27.):

7. 1.3.5-trichlorobenzene 108-70-3) (see ML8.a.23.):

• (CAS also
• 8.1.2.4-trihydroxybutane(l.2.4butanetriol)(CAS 3068-00-6) (see also ML8.e.5.):
• 9 DADN (1,5-diacetyl-3.7dinitro-1.3.5.7-tetraazacyclooctane) (see aiso ML8.a.13);
• h. Reactive materialpowders and shapes,as follows:
• Powdersofanyofthe followingmaterials,with a inanydirectionandnot
• particle size less than 250 μm specified elsewhere by ML8:
• a.Aluminium;
• b. Niobium,
• c. Boron;
• d. Zirconium;
• Magnesium;
• f
• g. Tantalum;
• h. Tungsten;
• i. Molybdenum:or
• j
• Hafnium;

ML9

Vessels ofwar(surface orunderwater),specialnaval equipment, accessories,components and other surface vessels,as follows:

• a. Vessels and components,as follows:

2. Vessels (surface or underwater) specially designed ormodified for military use,regardless of current state of repair or operating condition,and whether or not they contain weapon delivery systemsor armour. and hulls or parts ofhulls for such vessels,and components therefor specially designed for military use: 3. Surface vessels,not specified in ML9.a.1.,having 4. any of the following.fixed or integrated into the vessel:

• a. Automaticweapons specified in MLl,or weapons specified in ML2,ML4.ML12or MLi9,ormountings'orhard points for weapons havinga calibre of12.7mm or greater;
• b. Fire control systems specified in ML5;

7. c. 8. d. 9. Having all of the following: 1. Chemical,Biological,Radiological and Nuclear (CBRN)protection':and 11. Pre-wet or wash down system'designed 12. for decontamination purposes;or 13. Activeweaponcountermeasure systems specified in ML4.b.,ML5.c.or ML1l.a. and having any of the following: 1. 'CBRNprotection'; 2. Hull and superstnucture, specially designedtoreduce the radar cross 16. section; 17. 2.Shapes,not specified by ML3.ML4.ML12orML16. fabricated frompowders specified by ML8.h.1.Zechmieal

• b.
• 3.Thermal signature reduction devices,
• (e-g.an exhaust gas cooling system), excluding those specially designed to increase overall power plant efficiency or to reduce the environmental impact; or
• A degaussing system designed to reduce the magnetic signature of the whol
• vessel;
• Engines and propulsion systems,as follows,specially designed for military use and components therefor specially designed for military use:
• Diesel engines specially designed for submarines;
• 2.Electric motors specially designed for submarines
• and having all ofthefollowing:
• a.
• b.
• C.
• Power output ofmore than 0,75 MW(1 000 hp);
• Quickreversing:
• Liquid cooled:and
• d. Totally enclosed;
• 3.Diesel engines having all of the following:
• a.Power output of37,3 kW(50 hp)ormore:and
• b.Non-magnetic'content in excess of 75 %of total mass;
• 4.4.'Air Independent Propulsion'('AIP')systems specially designed for submarines;
• C. Underwater detection devices,specially designed for military use,controls therefor and components therefor
• specially designed for military use;
• Anti-submarine nets and anti-torpedo nets, specially
• d designed for military use;
• c. Not used since 2003:
• f Hull penetrators and connectors,specially designed for military use,that enable interaction with equipment cxtemal to a vessel,and components therefor specially
• designed for military use;

• Silent bearings having any of the following.components
• therefor and equipment containing those bearings,specially designed formilitary use:
• Gas or magnetic suspension:

2. Active signature controls;or 3. Vibration suppression controls;

• h. Nuclear powergeneratingequipment orpropulsion cquipment,specially designed for vessels specifiedin ML9.a.and components therefor specially designed or 'modified'for military use.

ML10

• "Aireraft", "lighter-than-air vehicles","Unmanned Aerial Vehicles"("UAVs"),aero-engines,"sub-orbital craft"and "aireraft"equipment,related equipment,and components,as follows,specially designed or modified formilitary use:
• a.Manned "aircrafl"and "lighter-than-air vehicles"and specially designed components therefor,
• b.Not used since 2011
• c.Unmanned "aircraf"and "lighter-than-air vehicles",and related equipment,asfollows,and specially designed components
• therefor:
• 1."UAVs",Remotely Piloted Air Vehicles (RPVs).
• autonomous programmable vehicles and unmanned "lighter-than-air vehicles";
• 2.Launchers,recovery equipment and ground support
• equipment;
• 3.Equipment designed for command or control;
• d. Propulsion aero-engines and specially designed components therefor:
• Airborne refuelling equipment specially designed or modified for any of the following.and specially designed components therefor:
• 1.
• "Aircraf" specified by ML10.a.or
• Unmanned"aireraft" specified by ML10.c.;

ML11

Electronic equipment,"spaceeraft"and components,not specified clsewhere on this Military List,as follows:

• Electronic cquipment specially designed for military use and specially designed components therefor;
• b. Jamming cquipment designed ormodified to hinder the reception,operation or effectiveness of positioning. navigation systems", and specially designed components therefor;
• "Spacecraft"specially designed or modified for military use,and "spacecraft"components specially designed for military use.
• f Ground equipment specially designed for"aircraf" specified by ML10.a.or aero-engines specified by ML10.d:
• Aircrew life support equipment,aircrew safety equipment and other devices for emergency escape,not specified in MLI0.a.designed foraircraflspecified by MLl0.a.or "sub-orbital craft"specified in ML10.j.:
• h. Parachutes,paragliders and related equipment,as follows, and specially designed components theretor:
• 1.Parachutes not specified elsewhere in this Military List:
• 2.Paragliders;

3. Equipment specially designed for high altitude parachutists (e.g.suits,special helmets, breathing systems,navigation equipment);

• Controlled opening equipmen or automatic piloting systems, designed for parachuted loads.
• "Sub-orbital craffand related equipment,as follows,and specially designed or modified components therefor:

1. "Sub-orbitalcraf": 2. Launch equipment,recovery equipment and ground support equipment; 3. Equipment designed for command or control.

ML12

as follows,and specially designed components therefor:

• a Kinetic energy weapon systems specially designed for destruction or effecting mission-abort ofa target;
• b.Specially designed test and evaluation facilities and test models,including diagnostic instrumentation and targets,for dynamic testing of kinetic energy projeetiles and systems.

ML13

Armoured or protective equipment,constructions,components,and

accessories,as follows:

• a.Metallic or non-metallic armoured plate,having any ofthe following:
• Manufactured to complywith a military standardor
• specification;or
• 2.Suitable for military use;
• b.Constructions of metallic or non-metallic materials or combinations thereofspecially designed to provide ballistic protection for military systems,and specially designed components therefor:
• c.Helmets and specially designed components and
• accessories therefor,as follows:

1. Helmets manufactured according to military standardsorspecifications,orcomparable

• national standards:

2. Shells.liners,or comfort pads,specially designed forhelmets specified in ML13.c.1.: 3. Add-on ballistic protection elements,specially designed for helmets specified in ML13.c.1.:

• d.Bodyarmourorprotective garments,and components therefor,as follows:

1. Sof body armour or protective garments, manufactured to military standards or specifications,or to their equivalents,and specially designed components therefor:

ML14

Specialised equipment for militarytraining'or for simulating military scenarios,simulators specially designed for training in the use of any firearm or weapon specified by MLI or ML2,and specially designed components and accessories therefor.

ML15

Imaging or countermeasure equipment,as follows,specially designed for military use,and specially designed components and accessories therefor:

• a.Recorders and image processing equipment;
• b.Cameras.photographic equipment and film processing equipment:
• c.Image intensifier equipment:
• d.Infrared or thermal imaging equipment;
• e.Imaging radar sensor equipment:
• f.Countermeasure or counter-countermcasure equipment.
• for the equipment specified by ML15.a. to ML15.e.

ML16

Forgings,castings and otherunfinished products,specially designed foritems specifiedbyML1 toML4,ML6,ML9,ML10,ML12or

ML19.

ML.17

Miscellaneous equipment,materials and "libraries,as follows,and specially designed components therefor:

• aDiving and underwater swimming apparatus,specially
• designed or modified for military use,as follows:
• 1.Self-contained diving rebreathers,closed or semi-closed
• circuit;
• 2.Underwater swimming apparatus specially designed for use with the diving apparatus specified in ML17.a.1.:
• b.Construction equipment specially designed for military use:

2. Hard body armour plates providing ballistic protection cqual to or greater than level IIl (NIJ 0101.06,July 2008).or"equivalent standards"

• c.Fittings,coatings and treatments,for signature suppression,specially designed formilitaryuse;
• d.Field engineer equipment specially designed foruse in a combat zone;
• "Robots", "robot"controllersand"robot""endeffectorshaving any ofthe following characteristics:
• Specially designed for military use;
• 2.Incorporating means of protecting hydraulic lines
• against extemally induced punctures caused by ballistic fragments (e.g. incorporating self-sealing lines) and designed to use hydraulic fluids with flash points higher than839K(566°C):or
• 3.Speciallydesignedorratedforoperatingin an Electromagnetic Puise'(EMP')environment;
• fLibrariesspecially designed or modified for military use with systems,equipment or components,specified by this MilitaryList;
• g.Nuclear power generating equipment or propulsion equipment,not specified elsewhere,specially designed formilitary use and components therefor specially designed or'modified for military use;
• hEquipment and material,coated or treated for signature suppression, specially designed for military use,not
• specified elsewhere in this Military List;
• reactors";
• Mobile repair shops specially designed or modified to
• service military equipment;
• k.Field generators specially designed or modified' for military use;
• ISOintermodal containersor demountablevehicle
• 'modified'for military use;
• m.Ferries,not specified elsewhere in this Military List, bridges and pontoons,specially designed for military use,

ML18

• Production'equipment,environmental test facilities and components,as follows:
• a.Equipment specially designed or modified for the production'ofitems specified by this Military List,and specially designed components therefor:
• b.Environmental test facilities specially designed for the certification,qualification or testing ofitems specified by this Military List,and specially designed equipment therefor,not specified elsewhere.

ML19

Direeted Energy Weapon (DEW) systems,related or countermeasure equipment and test models,as follows,and specially designed components therefor:

• a."Laser" weapon systemsnot specifiedby
• ML19.f:
• b.Particle beam weapon systems:
• c.High power Radio-Frequency(RF)weapon systems':
• d.Equipment specially designed for the detection or
• identification of,or defence against,systems specified by ML19.a.to ML19.c.:
• e.Physical test models for the systems,equipment and
• components,specified by ML19;
• f"Lasersystems speciallydesigned tocause permanent blindness to unenhanced vision,ie.to the naked eye or to the eye with corrective eyesight devices.
• nTest models specially designed for the"development ofitems specifiedby ML4,ML6,ML9orML10:
• 0.Laserprotectionequipmenl(eg.eyeor sensor protection) specially designed for military use:
• p."Fuel cells,not specified elsewhere in this Military List, specially designed ormodified formilitary use.

ML20

Cryogenie and "supereonduetive"equipment,as follows,and specially

designed components and accessories therefor:

• a.Equipment spccially designed or configured to be installed in a vehicke for military ground,marin airborne or space applications,capable of operating while in motion and of producing or maintaining temperatures below I03 K(-170 °C);
• b."Superconductive"electrical equipment (rotating
• machineryor transformers)specially designedor configured to be installed in avehicle for military ground,marine,airbome or space applications and capable ofoperating while in motion.

ML21

"Software"as follows:

• a."Software" specially designed or modified for any of the
• following:
• 1."Development", "production',operationor maintenance of equipment specified by this MilitaryList;
• 2."Development"or"production"ofmaterials
• specified by thisMilitary List;or
• 3.Development""production"operationor maintenance of"sofiware specified by the this
• Military List;
• b.Specific"software".other than that specified by ML21.a,
• as follows:

1. "Software"specially designed for military use and specially designed for modelling. simulating or evaluating military weapon systems; 2. "Soflware"specially designed for military use andspecially designedformodelling oF simulating military operational scenarios; 3. "Software"for determiningthe effectsof conventional,nuclear,chemical or biological weapons;

ML22

Other security and para-military police equipment as follows-

• Acoustic devicesrepresented by the manufacturers or suppliers thereof as suitable for riot control purposes,and specially designed components therefor;
• Anti-riot andballistic shields and specially designed
• b. components therefor:
• Shackles designed for restraining human beings having an overall dimension including chain,when measured from the outer edge ofone cuff to the outer edge ofthe other cuff,of
• between240mmand280mmwhen locked;
• Water cannon and specially designed components therefor;
• e. Riot control vehicles which have been specially designed or modified to be electrified to repel boarders and components
• therefor specially designed or modified for that purpose;
• f. Components specially designed or modified for portable devices designed ormodified for the purposes ofriot control or self-protection by the administration of an electric shock (e.g. Electric-shock batons,electric-shock shields,stun-guns and

ML23

"Technology"as follows:

• a.Technology",other than specified inML22.b,which is installation,maintenance(checking).repair,overhaulor
• refurbishing ofitems specified by thisMilitary List;
• clectric-shock dart-guns).
• 4."Software" specially designed for military use
• and specially designedforCommand, Communications.Conrol and Intelligence (C31) or Command, Communications, Control, Computer and Intelligence(C4l) applications:
• "Software" specially designed or modified for the
• conduct of military offensive cyber operations;
• "Software",not specified by ML21.a.or ML21.b.specially
• C. designed or modified to enable equipment not specified this Military List to perform the military functions ofequipment specified by the this Military List.

b."Technologyas follows:

• 1."Technology""required"for the design of.the assembly of components into,and the operation, maintenance andrepair ofcomplete production installations for items specified by this Military List, evenifthecomponentsof installations are not specified;
• 2."Technology""required"for the"development and productionof small arms,even if used to producereproductions ofantique small arms:
• 3.Not used since 2013
• 4."Technology""required"exclusivelyforthe
• incorporation of"biocatalysts,specified by ML7.i1., into military carrier substances ormilitary material.

PARTB:LIST OFDUALUSEGOODS ACRONYMSANDABBREVIATIONS

ABEC

Annular BearingEngineers Committee

ADC

Analogue-to-Digital Converter

AGMA

American Gear Manufacturers'Association

AHRS

Altitude and Heading Reference Systems

AISI

American Iron and Steel Institute

ALE

Atomic Layer Epitaxy

ALU

Arithmetic Logic Unit

ANSI

American National StandardsInstitute

APP

Adjusted Peak Performance

APU

Auxiliary Power Unit

ASTM

American Society for Testing and Materials

ATC

AirTraffic Conrol

BIT

Bipolar Junction Transistors

BPP

Beam Parameter Product

BSC

Base Station Controller

CAD

Computer-Aided-Design

CAS

Chemieal Abstracts Service

CEP

Circular Error Probable

CCD

Charge Coupled Device

CDU

Control and Display Unit

CEP

Circular ErrorProbable

CMM

Coordinate Measuring Machine

CMOS

Complementary Metal Oxide

Semiconductor

CNTD

Controlled Nucleation Thermal Deposition

CPLD

Complex Programmable Logic Device

CPU

Central Processing Unit

CVD

Chemical Vapour Deposition

CW

Chemical Warfare

CW(for lasers)

Continuous Wave

DAC

Digital-to-Analogue Converter

DANL

Displayed Average Noise Level

DBRN

Data-Base Referenced Navigation

DDS

Direct Digital Synthesizer

DMA

Dynamic Mechanical Analysis

DME

Distance Measuring Equipment

DMOSFET

Diffused Metal Oxide Semiconductor Field

Effect Transistor

DRM

Digital Rights Management

DS Directionally Solidified

EB

Exploding Bridge

EB-PVD Electron Beam Physical VapourDeposition

EBW Exploding Bridge Wire

ECM

Electro-Chemical Machining

EDM

Electrical Discharge Machines

EEPROMS Electrically Erasable Programmable Read Only Memory

EFI

ExplodingFoil Initiators

EIRD

Effective Isotropic Radiated Power

ENOB

Effective Number of Bits

ERF

Electrorheological Finishing

ERP

Effective Radiated Power

ETO

EmitterTum-Off Thyristor

ETT

Electrical Triggering Thyristor

Extreme UltraViolet

FADEC

Full AuthorityDigital Engine Conrol

FFT

Fast FourierTransform

FPGA

Field Programmable Gate Array

FPIC

Field Programmable Interconnect

FPLA

Field Programmable Logic Array

FPO

Floating Point Operation

FWHM

Full-Width Half-Maximum

GSM

Global System forMobile Communications

GLONASS

Global Navigation Satellite System

GPS

Global Positioning System

GNSS

Global Navigation Satellite System

GTO

GateTum-offThyristor

HBT

Hetero-BipolarTransistors

| HEMT | High Electron Mobility Transistor | |-----------------|--------------------------------------------------| | ICAO | Intermational Civil Aviation Organisation | | IEC | Intermational Electro-technical Commission | | IED | Improvised ExplosiveDevice | | IEEE | Institute of Electricaland Electronic | | Engineers | | | IFOV | Instantaneous-Field-Of-View | | IGBT | Insulated Gate Bipolar Transistor | | IGCT | Integrated Gate Commutated Thyristor | | IHO | Interational Hydrographic Organization | | ILS | Instrument Landing System | | IMU | Inertial Measurement Unit | | INS | Inertial Navigation System | | IP | Intemet Protocol | | IRS | Inertial Reference System | | IRU | Inertial Reference Unit | | ISA | Intemational Standard Atmosphere | | ISAR | Inverse Synthetic Aperture Radar | | ISO | Intermational Organization for | | Standardization | | | n.LI | Intemational Telecommunication Union | | JT | Joule-Thomson | | LDAR | Light Detection and Ranging | | LIDT | Laser Induced Damage Threshold | | LOA | Length Overall | | LRU | Line Replaceable Unit | | MLS | Microwave Landing Systems | | MMIC | Monolithic Microwave Integrated Circuit | | MOCVD | Metal Organic Chemical VapourDeposition | | MOSFET | Metal-Oxide-SemiconductorField Effect Transistor | | MPM | MicrowavePower Module | | MRAM | Magnetic Random Access Memory | | MRF | MagnetorheologicalFinishing | | MRF | Minimum Resolvable Feature size | | MRI | Magnetic Resonance Imaging |

| MTBF MTTF | Mean-Time-Between-Failures Mean-Time-To-Failure | |--------------|---------------------------------------------------| | NA | Numerical Aperture | | NDT | Non-Destructive Test | | NEQ | Net Explosive Quantity | | OAM | Operations,Administration or Maintenance | | OSI | Open Systems Interconnection | | PAI | Polyamide-imides | | PAR | Precision Approach Radar | | PCL | Passive Coherent Location | | PDK | Process Design Kit | | PIN | Personal Identification Number | | PMR | Private Mobile Radio | | PVD | Physical VapourDeposition | | PPM | Parts Per Million | | QAM | Quadrature-Amplitude-Modulation | | QE | Quantum Efficiency | | RAP | Reactive Atom Plasmas | | RF | Radio Frequency | | RMS | Root Mean Square | | RNC | Radio Network Controller | | RNSS | Regional Navigation Satellite System | | ROIC | Read-out Integrated Circuit | | S-FIL | Step and Flash Imprint Lithography | | SAR | Synthetic Aperture Radar | | SAS | Synthetic Aperture Sonar | | SC | Single Crystal | | SCR | Silicon Controlled Rectifier | | SFDR | Spurious Free Dynamic Range | | SHPL | Super High Powered Laser | | SLAR IOS | Sidelooking Airbome Radar Silicon-on-lnsulator | | SQUID Device | Superconducting Quantum Interference | | SRA | Shop Replaccable Assembly |

| SRAM | Static Random Access Memory | |--------|------------------------------------------| | SSB | Single Sideband | | SSR | Secondary Surveillance Radar | | SSS | Side Scan Sonar | | SRE | Software Reverse Engineering | | TIR | Total Indicated Reading | | TVR | Transmitting Vokage Response | | AMU | Atomic Mass Unit | | UPR | Unidirectional Positioning Repeatability | | UV | UltraViolet | | UTS | Ultimate Tensile Strength | | VJFET | Vertical JunctionField Effect Trarsistor | | VOR | Very HighFrequency Omni-directional | | Range | | | WLAN | Wireless Local Area Network |

DEFINITION OFTERMS

N.B Category references are given in brackets afier the defined ferm.

"Accuracy"(23 678).usually measured in terms of inaccuracy. mcans the maximum deviation,positive or negative,of an indicated value from an accepted standard or true value.

"Active flight control systems(7) are systems that function to prevent undesirable"aircrafland missile motions or structural loads by autonomously processing outputs from multiple sensors and then providing necessary preventive commands to effect automatic control.

"Active pixel(6)is a minimum (single)element of the solid-state array which has a photoelectric transfer function when exposed to light (electromagnetic)radiation.

"Adjusted Peak Performance"(4) is an adjusted peak rate at which "digital computersperform 64-bit or larger floating-point additions and multiplications,and is expressed in Weighted TeraFLOPS(WT) withunits of10'adjusted floatingpoint operations per second.

"Aircraf" (1 6 7 9)means a fixed wing,swivel wing.rotary wing (helicopter),tilt rotor ortilt-wing airbome vehicle

"Airship"(9)means a power-driven airborne vehicle that is kept buoyant by a body of gas (usually helium.formerly hydrogen) which is ligher than air.

"All compensations available"(2) means after all feasible measures

available to the manufacturer to minimise all systematic positioning errors for the particularmachine-tool model or measuring errors for the particular coordinate measuring machine are considered.

"Allocated by the ITU"(3 5)means the allocation of frequency bands according to the current edition of the ITU Radio Regulations for primary. permitted and secondary services.

"Angular position deviation"(2)means the maximum difference

between angular position and the actual,very accurately measured angular position after the workpiece mount of the table has been tumed out of its initialposition.

"Angle random walk"(7) means the angular error build up with time

that is due to white noise in angular rate(IEEE STD 528-2001)

"APP"(4) is equivalent to"Adjusted Peak Performance"

"Asymmetric algorithm"(5) means a cryptographic algorithm using

different,mathematically-relatedkeys for encryption and decryption.

"Authentication"(5)means verifying the identity of a user, process or device,often as a prerequisite to allowing access to resources in an information system.This includes verifying the origin or content of a message or other information,and all aspects of access control where there isno encryption of files or text except as directly related to the protection ofpasswords,Personal Identification Numbers (PiNs)or similar data to prevent unauthorised access.

joules,divided by the period over which a series of consecutive pulses is emitted,in seconds.For a series ofuniformly spaced pulses it is equal to the total "laseroutput energy in a single pulse,in joules,multiplied by

the pulse frequency ofthe"laser",in Hertz10/237

Basic gate propagation delay time"(3) mcans the propagation delay

time value corresponding to the basic gate used in amonolithic integrated circuit.For a 'family'of "monolithic integrated circuits,this may be specified cither as the propagation delay time per typical gate within the given'family'or as the typical propagation delay time per gate within the given'family.

"Basic scientific research"(GTN NTN) means experimental or

theoretical work undertaken principally to acquire new knowledge of the fundamental principles of phenomena or observable facts,not primarily directed towards a specific practical aim orobjective.

""Bias"(accelerometer)(7) means the average over a specified time of accelerometer output,mcasured at specified operating conditions,that has no correlation with input acceleration or rotation"Bias"is expressed in g orin metres per second squared(gor m/s2).(IEEEStd 528-2001)(Microg equals1x10-g).

"Bias"(gyro)(7)means the average over a specified time of gyro output measured at specified operating conditions that has no correlation perhour(deg/hr).(IEEE Std528-2001).

"Biological agents"(1)are pathogens or toxins, selected or modified (such as altering purity,shelf life,virulence,dissemination characteristics orresistance to UVradiation) to produce casualties in humans or animals, degrade equipment or damage crops or the environment.

"Camming(2)means axial displacement in one revolution of the apoint next to the circumference of the spindle faceplate(Reference:ISO 230-1:1986.paragraph 5.63).

"Charge multiplication"(6)means a form ofelectronic image amplification defined asthe generation of charge carriers as a result ofan impact ionisation gain process."Charge multiplicationsensors may take the form of an image intensifier tube,solid state detector or"focal plane

AELE

"CEP"(7)means"Circular Error Probable"-In a circular normal distribution,the radius of the circle containing 50 % of the individual

measurements being made,or the radius of the circle within which there is a50 %probabilityofbeinglocated.

"Chemical laser"(6) means a"laser"in which the excited species is produced by the output energy from a chemical reaction.

Chemical mixture(l) means a solid,liquid or gaseous product made up of two or more components which do not react together under the conditions under which the mixture is stored.

"Circulation-controlled anti-torque or circulation-controlled direction control systems(7)are systems that use air blown over aerodynamic surfaces to increase or control the forces generated by the surfaces.

"Civil aircraf"(1 3 4 7)means those"aircraf"listed by designation inpublished airworthinesscertificationlistsbythe civil aviation authoritiesofone or more EU Member States or Wassenaar Arrangement Participating States to fly commercial civil internal and external routes or for legitimate civil,private or business use.

Communications channel controller(4)means the physical interface which controls the flowof synchronous or asynchronous digital information.It is an assembly that can be integrated into computer or telecommunications equipment to provide communications access.

"Compensation systems"(6)consist ofthe primary scalar sensor,one

software that permit reduction of the rigid body rotation noise of the platform.

"Composite"(1 2 689)means a"matrixand an additional phase or additional phases consisting of particles,whiskers.fibres or any combination thereofpresent for a specificpurpose or purposes.

I/Vcompounds"(3 6)means polycrystalline or binary or complex monocrystalline products consisting ofelements ofgroupsIllA andVA of Mendeleyev's periodie classification table (e.g.,gallium arsenide,galliumaluminium arsenide,indium phosphide).

"Contouringcontrol"(2)means two or more"numerically

controlledmotions operating in accordance with instructions that specify the next required position and the required feed rates to that position. These feed rates are varied in relation to each other so that a desired contour is generated.(refISO/DIS2806-1980).

"Critical temperature"(1 3 5)(sometimes referred to as the transition temperature)ofaspecific"superconductive"materialmeansthe temperature at which the material loses all resistance to the flow of direct electricalcurrent.

"Cryptographic activation"(5) means any technique that specifically activates or enables cryptographic capability of an item,by means ofa mechanism implemenled by the manufacturer of the item,where this mechanism isuniquely bound to any of the following:

• (a)A single instance of the item:gr
• (b) One customer,for multiple instances ofthe item.

"Cryptography"(5) means the discipline which embodies principles, means and methods for the transformation of data in order to hide its information content,prevent its undetected modification or prevent its unauthorised use.Cryptography"is limited to the transformation of information using one or more'secret parameters'(e.g.crypto variables) or associated key management.

"CWlaser(6)means a"laser"that produces a nominally constant output energy forgreater than 0,25seconds.

"Cyber incident response"(4) means the process of exchanging necessary information on a cybersecurity incident with individuals or organisations responsible for conducting or coordinating remediation to address the cybersecurity incident

Data-Based Referenced Navigation"("DBRN")(7) Systems means

systems which use various sources of previously measured geo-mapping data integrated to provide accurate navigation information under dynamic conditions.Data sources include bathymetric maps,stellar maps,gravity maps,magneticmaps or3-D digital terrain maps

"Depleted uranium"(O)means uranium depleted in the isotope 235 below that occurring in nature.

Development"(GTN NTN All) is related to all phases prior to serial production,such as:design,design research,design analyses,design concepts,assembly and testing of prototypes,pilot production schemes, design dataprocess of transforming design data into a product, configuration design,integration design,layouts.

"Diffusion bonding"(1 2) means a solid state joining ofat least two separate pieces ofmetals into a single piece with a joint strength equivalent to that of the weakest material,wherein the principal mechanism is interdiffusion of atoms across the interface

"Digital computer"(4 5) means equipment which can,in the form of

one or more discrete variables,perform all of the following:

• (a) Accept data;
• (b) Store data or instructions in fixed or alterable (writable)
• (c)Process data by means ofa stored sequence of instructions
• whichis modifiable:and
• (d)Provide output ofdata.

"Digital transfer rate"(def) means the total bit rate of the information that is directly transferred on any type ofmedium.

"Drift rate"(gyro)(7)means the componen of gyro output that is functionally independent of input rotation.It is expressed as an angular rate.(IEEESTD 528-2001).

"Effective gramme"(0 1)of"special fissile material"means:

• (a)For plutonium isotopes and uranium-233,the isotope weight ingrammes;
• (b)For uranium enriched 1 per cent or greater in the isotope uranium-235,the element weight in grammes multiplied by the square of its enrichment cxpressed as a decimal weight fraction;
• (c)For uranium enriched below l per cent in the isotope uranium-235,the element weight in grammes multiplied 10000q

"Electronicassembly"(2 34)means anumber ofelectronic components(ie.,'circuit elements','discretecomponents'integrated circuits,etc.)connected together to perform (a) specific function(s) replaceable as an entity and normally capable of being disassembled.

"Energetic materials"(l) mcans substances or mixtures that react chemically to release energy required for their intended application. "Explosives","pyrotechnics"and"propellants"are subclasses of energetic materials.

"End-effectors"(2) means grippers,active tooling unitsand any other tooling that is attached to the baseplate on the end ofarobot manipulator arm.

Equivalent density"(6) means the mass of an optic per unit optical area projected onto the optical surface.

(1) meanscomparablenationalor international standardsrecognised by one or more EU Member States or Wassenaar Arrangement Participating States and applicable to the relevant

"Equivalentstandards" entry.

"Explosives"(l)means solid,liquid or gaseous substances or mixtures of substances which,in their application as primary,booster,or main charges in warheads,demolition and other applications,are required to detonate.

"FADEC Systems"(9)means Full Authority Digital Engine-Control Systems-A digital electronic control system for a gas turbine engine that is able to autonomously control the engine throughout itswhole operating range from demanded engine stan until demanded engine shut-down,in both normal and fault conditions.

"Fibrous or filamentary materials"(0 I 8 9)include:

• (a) Continuous"monofilaments";
• (b) Continuous"yarns"and"rovings":
• (2) "Tapes",fabrics,random mats and braids:
• (d)
• Chopped fibres,staple fibres and coherent fibre blankets;
• Whiskers,either monocrystalline or polycrystalline,ofany
• (e) length;
• f)
• Aromaticpolyamide pulp.

"Film type integrated circuit"(3) means an array of'circuit elements and metallic interconnections formed by deposition ofa thick or thin film onan insulating"substrate".

Fly-by-light system(7) means a primary digital flight control

system employing feedback to control the"aircraft during flight,where the commands to the effectors/actuators are optical signals.

"Fly-by-wire system(7) means a primary digital flight control system employing feedback to control the"aircraff" during flight,where the commands to the effectors/actuators are electrical signals.

"Focal plane array"(6 8)means a linear or two-dimensional

planar layer,or combination of planar layers,of individual detector elements,with or without readout electronics,which work in the focal plane.

"Fractional bandwidth"(3 S)means the "instantaneous bandwidth" divided by the centre frequency,expressed as a percentage.

"Frequency hopping"(5 6)means a form of"spread spectrum"in which the transmission frequency ofa single communication channel is made to change by a random or pseudo-random sequence of discrete steps.

"Frequency switehing time"(3) means the time (ie.,delay) taken by arrive at orwithin any of the following:

• (a)
• ±100 Hz ofa final specified output frequency of less than 1GHz.gr
• (b)
• ±0.lpart per million of a final specifiedoutput frequency equal toorgreaterthan I GHz.

"Fuel cell"(8)is an electrochemical device that converts chemical energy directly into Direct Current (DC) electricity by consuming fuel from an exlernal source.

"Fusible"(l)means capable ofbeing cross-linked or polymerized

further (cured) by the use of heat,radiation,catalysts,etc.,or that can be melted without pyrolysis (charring).

"Gate-All-Around Field-Effect Transistor ("GAAFET)(3)means a device having a single or multiple semiconductor conduction channel clement(s) with a common gate structure that surrounds and controls current in all of the semiconductor conduction channelelements.

"Hard selectors"(5)means data or set of data,related to an individual

(e.g,family name,given name,e-mail street address.phone number or group affiliations)

High output diesel engines"(9)means diesel engines with a specified brake mean effective pressure of 1,8MPa or more at a speed of2 300r.p.m.provided the rated speed is2300r.p.m.ormore.

"Guidance set"(7) means systems that integrate the process of measuring and computingavehicles position and velocity(ie navigation) with that ofcomputing and sending commands to the vehicles flight control systems to correct the trajectory.

"Hybrid integrated circuit"(3) means any combination of integrated

circuit(s)orintegrated circuit with 'circuit elements'or'discrete componentsconnected together to perform (a) specific function(s),and having all ofthe following characteristics:

• (a) Containing at least one unencapsulated device;
• (b) Connected together using typical IC production methods;
• (c)Replaceable as an entity,and
• (d)Notnormally capable ofbeing disassembled.

"Image enhancement(4)means the processing ofexternally derived information-bearing images by algorithms such as time compression, filtering.extraction,selection,correlation,convolution or transformations between domains (e.g,fast Fourier transform or Walsh transform). This does not include algorithms using only linear orrotational transformation ofa single image,such as translation,feature extraction,registration or

false coloration.

"Immunotoxin(l) is a conjugate of one cell specificmonoclonal

antibody and a"toxin"or"sub-unit of toxin",that selectively affects diseasedcells.

"In the public domain(GTN NTN GSN) as it applies herein,means "technology"or "software"which has been made available without restrictions upon its further dissemination (copyright restrictions do not remove"technology"or"software"from being"in the public domain").

"Information security"(GSN GISN 5) is all the means and functions activation",'cryptanalysis',protection against compromising emanations

ensuring the accessibility.confidentiality or integrity of information or communications,excluding the means and functions intended to safeguard against malfunctions.This includes"cryptography""cryptographic and computer security.

"Instantaneous bandwidth"(3 5 7) means the bandwidth over which output power remains constant within 3 dB without adjustment ofother operatingparameters.

"Interior lining(9) is suited for the bond interface between the solid propellant and the case or insulating liner.Usually a liquid polymer based dispersion of refractory or insulating materials,e.g.carbon filled hydroxyl terminated polybutadiene (HTPB)or other polymer with added curing agents sprayed or screeded over a case interior.

Interleaved Analogue-to-Digital Converter (ADC)"(3)means

devices that have multiple ADCunits that sample the same analogue input input has been effectively sampled and converted at a higher sampling rate.

"Intrinsic Magnetic Gradiometer(6)is a single magnetic field

gradient sensing element and associated electronics the output ofwhich is a measure of magneticfield gradient.

"Intrusion software"(4 5)means"softwarespecally designed or modified to avoid detection bymonitoring tools',or to defeatprotective countermcasuresofacomputerornetwork-capabledevice,and performinganyofthe following:

• (a)The extraction of data or information,from a computer or network-capable device,or the modification of system or user
• data:or
• (b) The modification of the standard execution path ofa program or process in order to allow the execution ofexternally provided instructions.

"Isolated live cultures(I) includes live cultures in dormant form and

in dried preparations.

"Isostatic presses"(2)mean equipment capable of pressurisinga closed cavity through various media (gas,liquid,solid particles,etc.)to create equalpressure in all directions within the cavity upon a workpiece

or material.

"Laser"(012356789)is an item thatproduces spatiallyand temporally coherent light through amplification by stimulated emission of

radiation.

Library"(1)(parametric technical database)means a collection of

technical information,reference to which may enhance the performance of relevant systems,equipment or components.

rely on hot air or other lighter-than-air gases such as helium or hydrogen

for their lift.

"Linearity"(2) (Usually measured in terms ofnon-linearity)means

the maximum deviation of the actual characteristic (average of upscale and downscale readings)positive or negative,from astraight line so positioned as to equalise and minimise the maximum deviations.

"Local area network"(4 5) is a data communication system having allofthe following characteristics:

• (a)Allows an arbitrary number of independent 'data devices'to
• communicate directly with each other;and

(b) Is confined to a geographical area of moderate size (e-g

office building.plant,campus,warehouse).

"Magnetic Gradiometers"(6) are instruments designed to detect the

spatial variation of magnetic fieldsfrom sourcesextemalto the instrument.They consist of muitiple magnetometersand associated electronics the output ofwhich isa measure of magnetic field gradient.

"Magnetometers"(6)are instruments designed to detect magnetic fields from sources external to the instrument. They consist of a single magnetic field sensing clement and associated electronics the output of which isa measure ofthe magnetic field.

"Materials resistant to corrosion by UFe(O) include copper,copper

alloys,stainless steel,aluminium,aluminium oxide,aluminium alloys. nickel oralloys containing 60 %or morenickel by weight and fluorinated hydrocarbon polymers.

"Matrix"(1 289)means a substanially continuous phase that fills the space between particles,whiskers or fibres.

specifies in what range around the output value the correct value of the measurable variable lies with a confidence level of 95 %.lt includes the uncorrected systematic deviations,the uncorrected backlash and the random deviations(ref.1SO 10360-2).

"Microcomputer microcircuit"(3)means a"monolithie integrated circuit"or"multichip integrated circuit"containing an arithmetic logic unit (ALU) capable ofexecuting general purpose instructions from an internal storage,on data contained in the internal storage.

"Microprocessor microcircuit"(3)means a"monolithic integrated circuitor"multichip integrated circuitcontaining an arithmetic logic unit (ALU) capable of executing a series of general purpose instructions from an extemal storage.

"Microorganisms"(12)means bacteria,viruses,mycoplasms, rickettsiae,chlamydiae or fungi,whether natural,enhanced or modified either in the form of"isolated live cultures"or as material including living material which hasbeen deliberately inoculated or contaminated with such cultures.

"Missiles"(123679)means complete rockel systems and unmanned aerial vehicle systems,capable of delivering at least 500 kg payload to a range of at least 300 km.

"Monofilament"(I) or filament is the smallest increment of fibre usually several micrometres in diameter.

Monolithic integrated circuit"(3)mcans a combination ofpassive or

active'circuit elements'orboth which:

• (a) Are formed by means of diffusion processes, implantation semiconducting piece ofmaterial,a so-called'chip:
• (b) Can be considered as indivisibly associated:and
• (c)Perform the function(s)ofa circuit.

"Monolithic Microwave Integrated Circuit"("MMlC)(3 5)means a

"monolithic integrated circuitthal operates at microwave or millimetre wave frequencies.

"Monospectral imaging sensors"(6)are capable of acquisition of imaging data from one discrete spectral band.

"Multichip integrated circuit"(3)means two or more "monolithic integrated circuits"bonded to a common"substrate"

"Multiple channel Analogue-to-Digital Converter(ADC)"(3)means devices that integrate more than one ADC,designed so that each ADC has

a separate analogue input.

"Multispectral imaging sensors"(6)are capable of simultaneous or serial acquisition ofimaging data from two or more discrete spectral bands.Sensors having more than twenty discrete spectral bands are

"Natural uranium"(O) means uranium containing the mixtures of

sometimesreferred to as hyperspectral imaging sensors.

isotopes occurring in nature.

"Network access controller(4)means a physical interface to a distributed switching network.lt usesa common medium which operates throughout at the same "digital transfer rate"using arbitration (e.g,token or carrier sense) for transmission. Independently from any other.it selects data packets or data groups (e.g,IEEE 802)addressed to it.lt is an assembly that can be integrated into computer or telecommunications equipment to provide communications access.

"Nuclear reactor"(O)means a complete reactor capable ofoperation soas to maintain a controlled self-sustaining fission chain reaction. A "nuclear reactorincludes all the items within or attached directly to the reactor vessel,the equipment which controls the level of power in the core,and the components which normally contain,come into direct contact with or control the primary coolant of the reactor core.

"Numerical control(2) means the automatic control of a process performed by a device that makes use of numeric data usually introduced as the operation is in progress(ref.ISO 2382:2015).

"Object code"(GSN)means an equipment executable form ofa convenienl expression ofone or more processes ("source code"(source language)) which hasbeen compiled by programming system.

"Operations,Administration or Maintenance"("OAM')(5)means

performing one ormore of the followingtasks:

• (a) Establishing or managing any ofthe following:
• (i)Accounts or privileges of users or administrators:
• (ii) Settings of an item:or
• (iljAuthentication data in support of the tasks described in paragraphs (a)(i) or(a)ii)):
• (b)Monitoring or managing the operating condition or performance ofan item;or
• (c)Managing logs or audit data in support of any of the tasks described in paragraphs (a)or(b)

"Optical integrated circuit"(3)means a"monolithic integrated circuit"or a"hybrid integrated circuit",containing one or more parts designed to function as a photosensor or photoemitter or to perform (an) optical or (an) electro-optical function(s).

"Optical switching"(5)means the routing ofor switching of signals in optical form without conversion to electrical signals.

"Overall current density"(3) means the total number of ampere-turns in the coil (ie.,the sum of the number of tums multiplied by the maximum current carried by each turn) divided by the total cross-section of the coil (comprising the superconducting filaments,the metallic matrix in which the superconducting filaments are embedded,the encapsulating material,any cooling channels,etc.).

Participating state"(7 9) is a state participating in the Wassenaar

Arrangement.

duration"

"Personal area network"(5)means a data communication system having all ofthe following characteristics:

• (a)Allows an arbitrary number ofindependent or interconnected'data devices'to communicate directly with each other.and
• (b)ls confined to the communication between devices within the immediate physical vicinity ofan individual person or device controller (e.g,single room,office,or
• automobile).

Previously separated"(1) is the application of any process intended to increase the concentration of the controlled isotope.

"Principal element"(4).asit applies in Category 4,is a "principal elementwhen itsreplacement value ismore than 35%of the total value ofthe system of which it is an element.Element value is the price paid for the clement by the manufacturer ofthe system,or by the system integrator. Total value is the normal international selling price to unrelated parties at the point of manufacture or consolidation of shipmenl.

"Production"(GTN NTN All) means all production phases,such as: construction,production engineering.manufacture,integration,assembly (mounting).inspection,testing.quality assurance.

"Production equipment(179)means tooling.templates,jigs,

mandrels,moulds,dies,fixtures,alignment mechanisms,test equipment other machinery and components therefor,limited to those specially designed or modified for "developmentor for one or more phases of "production".

"Production facilities"(7 9)means"production equipment"and specially designed software therefor integrated into installations for developmentor forone or more phases of"production"

"Program(7) means a sequence of instructions to carry out a process in,or convertible into,a form executable by an electronic computer.

Pulse compression(6) means the coding and processing ofa radar signal pulse of long time duration to one of short time duration,while maintaining the benefits ofhigh pulse energy.

"Pulse duration"(6)is the duration ofa "laser"pulse and means the time between the half-power points on the leading edge and trailing edge ofan individual pulse.

lessthan orcqualto 0,25 seconds:

"Quantum cryptography"(5)means a family of techniques for the o o theory or quantum electrodynamies).

"Radar frequency agility"(6) means any technique which changes,in transmitter between pulses or between groups ofpulses by an amount

apseudo-random sequence,the carrier frequency ofa pulsed radar equal toor larger than the pulse bandwidth.

"Radar spread spectrum"(6)means any modulation technique for spreading energy originating from a signal with a relatively narrow frequency band,over a much wider band of frequencies,by using random

orpseudo-random coding.

(wavelength in nm)×Quantum Efficiency (QE).

"Real-time processing"(6)means the processing of data bya

computer system providing a required level of service.as a function of available resources,within a guaranteed response time,regardless of the load of the system,when stimulated by an external event.

"Repeatability(7)means the closeness ofagreement among repeated measurements of the same variable under the same operating conditions when changes in conditions or non-operating periods occur between measurements.(Reference:IEEE STD 528-200l (one sigma standard deviation))

"Required(GTN 3567 9).as applied to"technology",refers to

only that portion oftechnologywhich is peculiarly responsible for achieving or extending the controlled performance levels,characteristics goods.

"Riot control agent(1) means substances which,under the expected conditions of use for riot control purposes, produce rapidly in humans sensory irritation or disabling physicaleffects which disappear within a short time followingtermination ofexposure.

"Robot"(2 8)means a manipulation mechanism,which may be of the continuous path or of the point-to-point variety,may use sensors,and has all the followingcharacteristics:

• (a) Is multifunctional;
• (b)Is capable of positioning or orienting material,parts,tools or special devices through variable movementsin three dimensional space;

• (c)Incorporates three or more closed or open loop servo-
• devices which may include stepping motors:and
• teachplaybackmethodor bymeansof an electronk computer which may be a programmable logic controller, i.e.,without mechanical intervention.

"Roving(1) is a bundle (typically 12-120)of approximately parallel 'strands'.

"Run-out(2)(out-of-true running) means radial displacememt in one

revolution of the main spindle measured in a plane perpendicular to the spindle axis at a point on the external or intermalrevolving surface to be tested(Reference:ISO 230-1:1986.paragraph 5.61).

Sample rate(3) for an Analogue-to-Digital Converter (ADC) means the maximum number of samples that are measured at the analogue input overa period ofone second,except for oversampling ADCs.For oversampling ADCs the sample rate"is taken to be its output word rate. "Sample ratemay also be referred to as sampling rate,usually specified in Mega Samples Per Second (MSPS)or Giga Samples Per Second (GSPS).or conversion rate,usually specified in Hertz(Hz).

"Satellite navigation system"(5 7)means a system consisting of ground stations,a constellation of satellites,and receivers,that enables receiver locations to be caleulated on thc basisof signals received from the satellites.It includes Global Navigation Satellite Systems (GNSS)and Regional Navigation Satellite Systems (RNSS).

"Scale factor"(gyro or accelerometer) (7)means the ratio of change

in output to a change in the input intended to be measured.Scale factor is generally evaluated as the slope of the straight line that can be fitted by the method of least squares to input-output data obtained by varyingthe input cyclically over the input range.

o se displaying basic properties of the single-frequency components of multifrequency signals.

"Signal processing(3 45 6)means the processing ofexternally compression,filtering.extraction,selection,correlation,convolution or transformations between domains (e.g..fast Fourier transform or Walsh transform).

"Software"(GSN All) means a collection of one or more "programs or'microprograms'fixed in any tangible medium ofexpression.

Source code(or source language)(679)isaconvenient expression ofone or more processes which may be turned bya programming system into equipment executable form ("object code"(or object language)).

"Spacecraf"(9) means active and passive satellites and space probes.

"Spacecraff bus"(9) means equipment that provides the suppon infrastructure of the"spacecraf"and location for the "spacecraf

payload".

Spacecrafpayload(9)means equipment,altached to the spacecraff bus,designed to perform a mission in space (e.g communications,observation,science).

Space-qualified"(3 67)means designed,manufactured or qualified through successful testing.for operation at altitudes greater than lo0 km

above the surface ofthe Earth.

Special fissile material(0) means plutonium-239,uranium-233. uranium enrichedin the isotopes 235or 233,andany material

containing the foregoing.

"Specific modulus"(0 1 9) is Young's modulus in pascals.equivalent to N/m divided by specific weight in N/m,measured at a temperature of

"Specific tensile strength"(01 9)is ultimate tensile strength in pascals,equivalent to N/m2divided by specific weigh in N/m2,measured (50±5)%.

"Spinning mass gyros"(7) means gyros which use a continually rotating mnss to sense angular motion.

Spread spectrum"(5)means the technique whereby energy in a relatively narrow-band communication channel is spread over a much

wider energy spectrum.

"Spread spectrum"radar (6)- see"Radar spread spectrum".

"Stability"(7)means the standard deviation (1 sigma) of the variation ofa particular parameter from its calibrated value measured under stable temperature conditions.This can be expressed as a function of time.

"States (not) Party to the Chemical Weapon Convention"(l) are those states for which the Convention on the Prohibition of the Development,Production,Stockpiling and Use of Chemical Weapons has (not)entered into force.(Seewww.opcw.org)

Steady State Mode"(9) defines engine operation conditions, where the engine parameters,such as thrust/power,rpm and others,have noappreciable fluctuations,when the ambient air temperature and pressure at the engine inlet are constant.

"Sub-orbital craf"(9) means a craft having an enclosure designed for the transport ofpeople or cargo which is designed to:

• (a) Operate above the stratosphere:
• (b)Perform a non-orbital trajectory:and
• (c)Land back on Earth with the people or cargo intact.

"Substrate"(3) means a sheet of base material with or without an interconnection pattemandonwhichorwithinwhich'discrete components'or integrated circuits or both can be located.

Substrateblanks(36)means monolithiccompoundswith dimensions suitable for the production ofopticalelements such as mirrors oropticalwindows.

"Sub-unit of toxin"(l) is a structurally and functionally discrete component ofa whole"toxin

"Superalloys(2 9) means nickel-,cobalt-or iron-base alloys having a stress rupture life greater than I 000 hours at 400 MPa and an ultimate tensile strength greater than 850 MPa.at 922K(649 C)or higher.

"Superconductive(1 3 5 6 8)means materials,ie.,metals,alloys or compounds,which can lose all electrical resistance,Le.which can attain

without Joule heating.

delivering (the total or any portion of) the output energy exceeding 1kJ within 50 ms or having an average or CWpower exceeding20 kW.

"Superplastic forming"(1 2)means a deformation process using heat for metaks that are normally characterised by low values of elongation (less than 20 %)at the breaking point as determined at room temperature by conventional tensile strength testing.in order to achieve elongations during processing which are at least 2 times those values.

"Symmetric algorithm(5)means a cryptographic algorithm using an

identical key for both encryption and decryption.

"Tape"(I) is a material constructed of interlaced or unidirectional "monofilaments",'strands',"rovings""tows",or"yarns",ete.,usually pre-impregnated with resin.

"Technology(GTN NTN All)means specific information necessary for the "development","productionor"use"ofgoods.This information takesthe form of'technical data'ortechnical assistance'.

"Three dimensional integrated circuit"(3)means a collection of semiconductor dies or active device layers,integrated together,and having through semiconductor via connections passing completely through an interposer,substrate,die or layer to establish interconnections between the device layers.An interposer is an interface that enables electrical

connections.

Tilting spindle"(2) means a tool-holding spindle which alters,

during the machining process,the angular position of its centre line with respect to any other axis.

"Time constant(6) is the time taken from the application of a light

stimulus for the current increment to reach a value of I-l/e times the final value (ie.,63 % ofthe final value).

Time-to-steady-state registration(6)(also referred to as the gravimeter's response time)is the time over which the disturbing effects ofplatform induced accelerations (high frequency noise)are reduced.

Tip shroud(9)means astationaryring component (solid or segmented) attached to the inner surface of the engine turbine casing or a feature at the outer tip of the turbine blade,which primarily provides a gas seal between the stationary and rotating components.

"Total control of flight"(7) means an automated control of"aircraff"" state variables and flight path to meet mission objectives responding to real time changes in data regarding objectives,hazards or other aircraft"

"Total digital transfer rate(5) means the number of bits,including line coding.overhead and so forth per unit time passing between corresponding equipment ina digital transmission system.

"Tow"(1) is a bundle of"monofilaments",usually approximately parallel.

"Toxins"(1 2)means toxins in the form of deliberately isolated preparations or mixtures,no matter how produced,other than toxins present as contaminants of other materials such as pathological specimens, crops,foodstuffs or seed stocks of"microorganisms"

"Tunable"(6) means the ability of a"laser" to produce a continuous output at all wavelengths over a range of several "lasertransitions.A line selectable"laser"produces discrete wavelengths within one"laser" transition and isnot considered"tunable"

"Unidirectional positioning repeatability"(2)means the smaller of valuesRand R](forward and backward).asdefined by 3.2lofISO 2302:2014 ornational equivalents,of an individual machine tool axis.

"Unmanned Aerial Vehicle"("UAV")(9) means any aircraft capable

ofinitiating flight and sustaining controlled flight and navigation without any human presence on board.

"Uranium enriched in the isotopes 235or 233"(0)means uranium

containing the isotopes 235 or 233,or both,in an amount such that the abundance ratio of the sum of these isotopes to the isotope 238 is more than the ratio of the isotope 235 to the isotope 238 occurringinnature (isotopic ratio 0.71 per cent).

"Use(GTN NTN All)means operation,installation (including on-

siteinstallation).maintenance (checking),repair,overhauland refurbishing.

"User-accessible programmability"(6) means the facility allowing a

user to insert,modify or replaceprograms"by means other than:

• (a)Aphysical change in wiring or interconnections:or
• (b)The setting of function controls including entry of parameters.

"Vaccine(1) is amedicinal product in a pharmaceutical formulation licensed by.or having marketing or clinical trial authorisation from,the regulatory authorities ofeither the country of manufacture or ofuse,which is intended to stimulate aprotective immunological response in humansor animals in order to prevent disease in those to whom or to which it is administered.

"Vacuum electronic devices"(3) means electronic devices based on the interaction of an electron beam with an electromagneticwave propagating in a vacuum circuit or interacting with radio-frequency vacuum cavity resonators."Vacuum electronic devices" include klystrons, travelling-wave tubes,and their derivatives.

"Vulnerability disclosure"(4)means the process of identifying.

reporting or communicating a vulnerability to,oranalysing a vulnerability with,individualsororganisationsresponsible forconductingor

"Yarn"(l) is a bundle oftwisted'strands'

CLASSIFICATIONOFDUALUSE GOODS

| CATEGORY | CONTENTS | |------------|---------------------------------------------| | Category0 | Nuelear materials,facilities and equipment | | Category1 | Special materialsand related equipment | | Category2 | Materials processing | | Category3 | Electronics | | Category4 | Computers | | Category5 | Telecommunications and"Information Security | | Category6 | Sensors andLasers | | Category7 | Navigationand avionics | | Calegory8 | Marine | | Category9 | Aerospace and Propulsion |

CATEGORY O:NUCLEAR MATERLALS,FACILITIES,AND EQUIPMENT

OA Systems.Equipmen and Components

0A001

Nuclear reactors and specially designed or prepared equipment and components therefor,as follows:

• aNuclearreactors;
• b.Metal vessels,or major shop-fabricated parts therefor.including the reactor vessel head for a reactor pressure vessel, specially designed or prepared to contain the core ofanuclearreactor:
• Manipulative equipment speciallydesigned or prepared for inserting or removing fuel in a muclearreactor.
• d.Control rods specially designed or prepared for the control of the fission process in a nuclear reactor, support or suspension structures therefor,rod drive mechanisms and rod guide tubes;
• e.Pressure tubes specially designed or prepared to contain both fuel elements and the primary coolant in a nuclear reactor,
• Zirconium metal tubes or zirconium alloy tubes (or assembles of tubes) specially designed or prepared for use as fuel cladding in a nuclear reactor and in quantities exceeding lo kg:For zirconium pressure tubes see 0A001.e.and for calandria tubes see 0A001.h
• Coolant pumps or circulators specially designed or prepared for circulating the primary coolant of nuclear reactors;
• h. Nuclear reactor internals' specially designed or prepared for use in anuclear reactor,including support columns for the core,fuel channels,calandria tubes,thermal shields,baffles,core grid plates, and diffuser plates;
• iHeat exchangers as follows:
• 1.Steam generators specially designed or prepared for the primary,or intermediate,coolant circuit ofa nuclear reactor:
• 2 use in the primary coolant circuit of a nuclear reactor; OAool.l.doesnotcontrolheatexchangers for the supporting systems of the reactor,e.g.,the emergency cooling system or the decay heat cooling system.

• jNeutron detectorsspeciallydesignedorprepared for determining neutron flux levels within the core of a nuclear reactor:
• k.External thermal shields' specially designed or prepared for use in a nuclear reactor for the reduction of heat loss and also for the containmentvesselprotection.In 0A0ol.k.externalthermal shields'means major stnuctures placed over the reactor vessel which reduce heat loss from the reactor and reduce temperature within the containment vessel.

OBTest,Inspection and Production Equipment

Plant for the separation of isotopes of "natural uranium","depleted uranium"or "special fissile materials",and specially designed or

prepared equipment and components therefor,as follows:

• a.Plant specially designed for separating isotopes ofnatural uranium. depleteduranium,or special fissile materials,as follows:
• L.Gas centrifuge separation plant;
• 2.Gaseous diffusion separation plant;
• 3.Aerodynamic separation plant;
• 4.Chemical exchange separation plant;
• 5.lon-exchange separation plant;
• 6.Atomic vapour-laserl isotope separation plant;
• 7.Molecular "laser" isotope separation plant;
• 8.Plasma separation plant;
• 9.Electro-magnetic separation plant;
• b.Gas centrifuges and assemblies and components,specially designed or prepared for gas centrifuge separation process,as follows:In 0B0o1.b.'high strength-to-density ratio material means any of the following:
• 1.Maraging steel capable of an ultimate tensile strength of 1,95 GPa or more;
• 2.Aluminium alloys capable of an ultimate tensile strength of 0.46GPa ormore;or

• 3."Fibrous or filamentary materials"with a"specific modulus"ofmore than 3,18×106m and a"specific tensile strengthgreater than 7.62×104m:
• I.Gas centrifuges;
• 2.Complete rotor assemblies;
• 3.Rotor tube cylinders with a wall thickness of I2 mm
• or less,a diameter ofbetween 75 mm and 650 mm made from high strength-to-density ratio materials':
• 4.Rings or bellows with a wall thicknessof 3 mm or lessanda diameterofbetween75mmand650mm and designed to give local support to a rotor tube or to join a number together,made from'high strengthto-density ratio materials';
• 5.Bafflesofbetween 75 mm and 650 mm diameter
• for mounting inside a rotor tube,made from high strength-to-density ratio materials'.
• 6.Top or bottom caps of between 75mm and 650 mm diameter to fit the ends of a rotor tube,made from high strength-to-densityratio materials';
• 7.Magnetic suspension bearings as follows:
• a:Bearing assemblies consisting of an annular magnet suspended within a housing made of orprotectedbymaterialsresistantto corrosion by UF6"containing a damping medium and having the magnet coupling with apole piece or second magnet fitted to the top cap ofthe rotor;
• b.Active magnetic bearings specially designed or prepared for use with gas centrifuges.
• 8.Speciallyprepared bearings comprising a pivot-cup assembly mounted on a damper;
• 9.Molecular pumps comprised of cylinders having internally machined or extruded helical grooves and internally machined bores;
• 10.Ring-shaped motor stators for multiphase AC hysteresis (or reluctance)motors for synchronous operation within a vacuum at a frequency of 600 Hz or more anda power of40 VA or more;

• 11.Centrifuge housing/recipients to contain the rotor tube assembly of a gas centrifuge,consisting ofa rigid cylinderofwall thickness up to 30 mm with precision machined ends that are parallel to each other andperpendicular tothe cylinder's longitudinal axis to within 0.o5°or less;
• 12.Scoops consisting of specially designedor prepared tubes for the extraction ofUF6 gas from within the rotor tube by a Pitot tube action and capable of being fixed to the central gas extraction system;
• 13.Frequencychangers (converters or inverters) specially designed or prepared to supply motor stators for gas centrifuge enrichmen,having all of the following characteristics,and specially designed components therefor:
• a.A multiphase frequency output of 600 Hz or
• greater,and
• b.High stability (with frequency control better
• than 0.2%):
• 14.Shut-off and control valves as follows:
• Shut-offvalves specially designedor prepared to act on the feed,product or tails UF6gaseous streams of an individual gas centrifuge;
• b Bellows-sealed valves,shut-off or control, made ofor protected bymaterials resistant tocorrosionbyUF6,with an inside diameter ofI0 mm to I60 mm,specially designed or prepared for use in main or
• auxiliarysystemsofgascentrifuge enrichment plants;
• c.Equipment and components,specially designed or prepared for gaseous diffiusion separation process,as follows:
• 1:Gaseous diffusion barriers made of porous metallic. polymer or ceramic "materials resistant to corrosion by UF6with a pore size of 10 to l00 nm,a thickness of5mm orless,and,for tubular forms,a diameter of25mm or less;

• 2 Gascous diffuser housingsmade of or protected by "materialsresistant to corrosion by UF6":
• 3.Compressors or gas blowers with a suction volume capacity of1m3/min or more ofUF6,with a discharge pressure up to 500 kPa,and having a pressure ratio of I0:l or less,and made ofor protected bymaterials resistant to corrosion by UF6":
• 4 Rotary shaft seals for compressors or blowers specified in 0B00l.c.3.and designed for a buffer gas in-leakage rate of lessthan L000 cm3/min;
• 5.Hheat exchangers made of or protected by-materials resistant to corrosion by UF6,and designed for a leakage pressure rate of less than l0 Pa per hour under a pressure differentialof100kPa;
• Bellows-sealed valves,manual or automated,shut-off or control,made of or protected by materials resistant to corrosionbyUF6":
• d.Equipmen and components,specially designed or prepared for aerodynamie separation process,as follows:
• Separationnozzlesconsistingofslit-shaped,curved channels having a radius of curvature less than I mm resistant to corrosion by UF6,and having a knife-edge contained within the nozzle which separates the gas flowingthrough thenozzle into two streams;

2. Cylindrical or conical tubes,(vortex tubes),made ofor with one ormore tangential inlets;

• 3.Compressors or gas blowers made of or protected by "materials resistant to corrosion by UF6",and rotary shaff seals therefor,
• Heat exchangers made ofor protected by"materials resistant to corrosion by UF6":

5. Separation element housings,made of or protected by "materials resistant to corrosion by UF6"to conain vortex tubes or separationnozzles;

• b. Bellows-sealed valves,manual or automated,shut-off or controlmade of or protected by materials resistant to corrosion by UF6",with a diameter of40 mm or more;

• 7.Process systems for separating UF6 from carrier gas (hydrogen or helium)to1ppm UF6 content or less, including-
• a.Cryogenic heatexchangers and cryoseparators capableoftemperaturesof153K(-I20°C)or less;
• refrigeration units capable of
• b.Cryogenic temperaturesofI53K(-120°C)or less;
• c.Separation nozzle or vortex tube units for the
• separationofUF6from carriergas;
• d.UF6 cold traps capable of freezing out UF6:
• e.Equipment and components,specially designed or prepared for chemical exchange separation process,as follows:
• 1.Fast-exchange liquid-liquid pulse columns with stage concentrated hydrochloric acid (e.g.made of or protected
• residence time of 30 seconds or less and resistant to bysuitableplasticmaterialssuch asfluorinated hydrocarbon polymers orglass):
• Fast-exchange liquid-liquid cenrifugalcontactors with stage residence time of 30 seconds or less and resistant to concentrated hydrochloric acid (e.g.made ofor protected bysuitableplasticmaterials such asfluorinated hydrocarbon polymers orglass);
• 3.Electrochemical reduction cells resistant to concentrated hydrochloric acid solutiors,for reduction ofuranium from
• one valence state to another:
• Electrochemical reduction cells feed equipment to take U+4 from the organic stream and,for those parts in contact with the process stream,made of or protected by suitable materials (e.g.glass,fluorocarbon polymers,polyphenyl resin-impregnated graphite);
• 5.Feedpreparation systems for producing high purity uranium chloride solution consisting of dissolution,solvent extraction and/or ion exchange equipment for purification and electrolytic cells for reducing the uranium U+6or U+4 to U+3:
• 6.Uranium oxidation systems for oxidation of U+3 to U+4;

• fEquipmenl and components,specially designed or prepared for ion-exchange separation process,as follows:
• 1.Fast reacting ion-exchange resins.pellicular or porous macro-reticulated resins in which the active chemical exchange groups are limited to a coating on the surface of an inactive porous suppont structure,and other composite structures in any suitable form,including particles or fibers, with diameters of 0.2 mm or less,resistant to concentrated hydrochloric acid and designed to have an exchange rate half-time ofless than I0 s and capable ofoperating at temperatures in the range of373 K(l00°C)to 473 K (200°C);
• lon exchange columns (cylindrical) with a diameter greater than 1 0o0 mm,made ofor protected by materials resistant toconcentratedhydrochloricacid(e.g.titaniumor fluorocarbonplastics)andcapableofoperatingat temperatures in the rangeof373 K(I00°C)to 473 K (200°C)andpressures above 0.7MPa;
• 3.lon exchange reflux systems(chemical or electrochemical oxidation or reduction systems) for regeneration of the chemical reducing or oxidizing agents used in ion exchange enrichment cascades.
• g.Equipment and components,specially designed or prepared for laser-based separation processes using atomic vapour laser isotope separation,as follows:
• 1.Uranium metal vaporization systems designed to achieve a delivered power ofI kW or more on the target for use in laser enrichment:
• Liquid or vapour uranium metal handling systems specially designed or prepared for handling molten uranium,molten uranium alloys or uranium metal vapour for use in laser enrichment,and specially designed components therefor,
• 3.Product and tails collector assemblies for collecting uranium metal in liquid or solid form,made ofor protected by materials resistant to the heat and corrosion ofuranium metal vapour or liquid,such as yttria-coated graphite or tantalum:

• 4.Separator module housings (cylindrical or rectangular vessels) for containing the uranium metal vapour source, the electron beam gun and theproduct and tails collectors;

5. "Lasersor"laser"systems specially designed or prepared for the separation of uranium isotopes with a spectrum frequency stabilization for operation over extended periods oftime:

• h.Equipment and components, specially designed or prepared for laser-based separation processes using molecular laser isotope separation,as follows-
• 1.Supersonic expansion nozzles for cooling mixtures of UF6 and carrier gas to 150 K(-I23oC)orlessandmade from "materiaisresistant to corrosion byUF6":
• Product or tails collector components or devices specially designed or prepared for collecting uranium material or uranium tails material following illumination with laser light,made of"materials resistant to corrosion by UF6"
• 3.Compressors made ofor protected bymaterials resistant to corrosion by UF6',and rotary shaft seals therefor:
• 4.Equipment for fluorinating UF5(solid) to UF6(gas):
• 5.Process systems for separating UF6 from carrier gas (e.g. nitrogen,argon or other gas) including:
• a.Cryogenic heatexchangersand cryoseparators capable oftemperatures of I53K(-120oC)or less;
• b.Cryogenic refrigeration units capable of temperatures of153 K(-120oC)or less;
• c.UF6 cold trapscapable of freezing out UF6
• 6.Lasers"or "laser"systems specially designed or prepared for the separation of uranium isotopes with a spectrum frequency stabilization foroperation over extended periods oftime;
• iEquipment and components,specially designed or prepared for plasma separation process,as follows:
• 1.Microwave power sources and antennae for producing or accelerating ions,with an output frequency greater than 30 GHz andmean power output greater than 50k W;

• 2.Radio frequency ion excitation coils for frequencies of more than Mo kHz and capable ofhandling more than 40 kWmean power.
• 3.
• Uranium plasma generation systems;
• Product and tails collector assemblies for uranium metal in solid form,made ofor protected by materials resistant to coated graphite or tantalum;
• Separator module housings (cylindrical) for containing the uranium plasma source,radio-frequency drive coil and the product and tails collectors and made ofa suitable nonmagnetic material (e.g.stainless steel)
• Equipment and components,specially designed or prepared for electromagnetic separation process,as follows:
• I.lon sources,single or multiple,consisting of a vapour source,ionizer,and beam accelerator made of suitable nonmagnetic materials (e.ggraphite,stainless steel,or copper) andcapableofprovidinga total ion beam current of50 mA orgreater:
• 2.Ion collector plates for collection of enriched or depleted uranium ion beams,consisting of two or more slits and pockets and made of suitable non-magnetic materials (e.g. graphite or stainless steel):

3. Vacuum housings for uranium electromagnetic separators made of non-magnetic materials (e.g.stainless steel) and designed to operate at pressures of0.1 Pa or lower;

• 4.Magnet pole pieces with a diameter greater than 2m:
• 5.High voltage power supplies for ion sources,having all of
• the following characteristics:
• a.Capable of continuous operation;
• b.Output voltage of20,000 Vor greater
• c.Output current ofIA or greater,and
• d.Voltage regulation of better than 0.o%over a period of 8 hours;
• 6.Magnet power supplies (high power,direct current) having allofthe following characteristics:

OB002

Specially designed or prepared auxiliary systems,equipment and components as follows,for isotope separation plant specified in oBool,

• a.Feed autoclaves,ovens or systems used for passing UF6 to the enrichment process;
• b. Desublimers or cold traps,used to remove UF6 from the enrichment process for subsequent transfer upon heating:
• c.Product and tails stations for transferringUF6 into containers,
• d Liquefaction or solidification stations used to remove UF6 from the enrichmenl process by compressing.cooling and converting UF6 to a liquid orsolid form:
• Piping systems and header systems specially designed or prepared forhandling UF6within gaseous diffusioncentrifuge or aerodynamic cascades;
• Vacuum systems and pumps as follows:
• 1.Vacuum manifolds,vacuum headers or vacuum pumps having a suction capacity of5m3/minute ormore;
• Vacuum pumps specially designed for use in UF6 bearing atmospheres made ofor protected by."materials resistant to corrosion byUF6":or
• 3.Vacuum systems consisting ofvacuum manifolds,vacuum headers and vacuum pumps,and designed for service in UF6-bearing atmospheres;
• g.UF6 mass spectrometers/ion sources capable of taking on-line samples from UF6 gas streams and having all of the following characteristics:
• 1.Capable of measuring ions of 320 atomic mass units or greater and having a resolution of better than l part in320;
• a.Capable of continuous operation with a current outputof500 Aorgreater ata voltageofl00Vor greater,and
• b.Current or voltage regulation better than O.01% overaperiod of 8hours.

0B003

Plant for the conversion ofuranium and equipment specially designed orprepared therefor,as follows:

• a.Systems for the conversion ofuranium ore concentrates to UO':
• b.Systems for the conversion ofUOto UF
• c.Systems for the conversionofUO'to UO2:
• d.Systems for the conversion of UO2to UF
• e.Systems for the conversion of UFto UF
• f.Systems for the conversion of UFto uranium metal:
• g.Systems for the conversion of UFto UO2:
• h Systems for the conversion of UF° to UF:
• LSystems for the conversion ofUO2to UCL

FOO8O

Plant for the production or concentration of heavy water, deuterium and deuterium compounds and specially designed or prepared equipment and components therefor,asfollows:

• a.Plant for the production of heavy water,deuterium or deuterium compounds,as follows:
• 1.Water-hydrogen sulphide exchange plants;
• 2.Ammonia-hydrogen exchange plants:
• 3.Combined Electrolysis and Catalytic Exchange (CECE) plants;

4. Combined Industrial Reforming and Catalytic Exchange (CIRCE)plants;

• 5.Bithermal Hydrogen-Water exchange(BHW)plants:
• b.Equipment and components,as follows:
• 2.lon sources constructed of or protected by nickel nickel-copper alloys with a nickel content of 60%ormore by weight,or nickel-chrome alloys:
• 3.Electron bombardment ionization sources:and
• 4.Having a collector system suitable for isotopic analysis

• 1.Water-hydrogen sulphide exchange towers with diametersofL5mormore,capableofoperatingat pressuresgreater than or equal to 2MPa;
• Single stage,low head (ie.0.2 MPa)centrifugal blowers or compressors for hydrogen sulphide gas circulation (ie.gas containing more than 7o% by weight hydrhogen suplhide, H2S) with a throughput capacity greater than or equal to 56 m3/s when operating at pressures greater than or equal to 18 MPa suction and having seals designed for wet H2S service;
• 3.Ammonia-hydrogen exchange towers greater than or equal to35m inheight with diameters of 1.5m to2.5m capable ofoperating at pressures greater than I5 MPa;
• 4.Tower internals,including stage contactors,and stage pumps,including those which are submersible,for heavy water production utilizing the ammonia-hydrogen exchange process:

5. Ammonia crackers with operating pressures greater than or cqual to 3 MPa for heavy water production utilizing the ammonia-hydrogen exchange process; 6. Infraredabsorption analyzerscapable ofon-line hydrogen/deuteriumratioanalysiswheredeuterium

• 7.Catalytic burners for the conversion of enriched deuterium gas into heavywater utilizing the ammonia-hydrogen exchange process:
• 8.Complete heavy water upgrade systems,or columns therefor,for the upgrade of heavy water to reactor-grade deuterium concentration:
• Ammonia synthesis converters or synthesis units specially designed or prepared for heavy water production utilizing the ammonia-hydrogen exchange process.
• 10.Complete columns or towers specially designed orprepared for hydrogen isotope exchange having all ofthe following:
• 1.Packed withrandom or structuredwet-proofed platinised catalysts;
• 2.Constructed of carbon steel or stainless steel;

OB005

Plant specially designed for the fabrieation of"nuclear reactor"fuel elements and specially designed orprepared equipment therefor

Specially designed or prepared equipment for the fabrication of"nuclear reactor"fuel elements includes equipment which:

• 1.Normally comes into direct contact with or directly processes or controls the production flow ofnuclear materials;
• 2.Seals the nuclear materials within the cladding:
• 3.Checks the integrity of the cladding or the seal;
• 4.Checks the finish treatment of the sealed fuel:or
• 5.Isisused for assembling reactor elements.

0B006

Plant for the reprocessing of irradiated "nuclear reactor"fuel elements,and specially designed or prepared equipment and components therefor to include:

• aPlant for the reprocessing ofirradiated "nuclear reactorfuel elements including equipment and components which normally come into direct contact with and directly control the irradiated fuel and the major muclear material and fission product processing streams;
• b.Fuel element chopping or shredding machines,ie. remotely operated equipment to cut,chop or shear irradiated"nuclear reactor"fuel assemblies,bundles orrods;
• Dissolvers,critically safe tanks (e.g. small diameter,annular or slab tanks)specially designed or prepared for the dissolution of irradiated"nuclear reactor" fuel,which are capable of withstanding hot,highly corrosive liquids.and which can be remotely loaded and maintained;
• d.Solvent extractors, such as packed or pulsed columns,mixer settlers or centrifugal contractors,resistant to the corosive effects ofnitric acid and specially designed or prepared foruse in a plant for the reprocessing of iradiated "natural uranium","depleted
• 3.Capable of operating with pressure in the range
• of0.1 to4MPa:and
• 4.Capable ofoperating at temperatures in the range of 293K(20°C)10473K(200°C).

OC001

"Natural uranium"or"depleted uranium"or thorium in the form of metal,alloy.chemicalcompound or concentrate and any other following:

• a.Four grammes or less of"natural uranium"or"depleted uranium" when contained in a sensing component in instruments;
• b.Depleted uranium specially fabricated for the following civil
• non-nuclear applications:
• 1.Shielding:
• 2.Packaging:
• 3.Ballasts having a mass not greater than 100 kg:
• 4.Counter-weights having a mass not greater than 100 kg:

uranium"or "special fissile materials":depleted uraniuml or

special fissile materialsl;

• Holding or storage vessels specially designed to be critically safe and resistant to the corrosive effects ofnitric acid with the following features;
• 1.Walls or internal structures with a boron equivalent (calculated for all constituent elements as defined in the
• note to 0C004)ofat least two per cent:
• 2.A maximum diameter of 175 mm for cylindrical vessels:or
• 3.A maximum width of 75mm for either a slab or annular vessel.
• fNeutron measurement systems specially designed or prepared for plant for the reprocessing of irradiated"naturaluranium"
• "depleted uraniumor"special fissile materials".

Plant for the conversion of plutonium and equipment specially

designed or prepared therefor,as follows:

• a.Systems for the conversion ofplutonium nitrate to oxide:
• b.Systems for plutonium metal production.

OCMaterials

• c.Alloys containing less than 5% thorium;
• d.Ceramic products containing thorium.which havebeen manufactured fornon-nuclearuse.

0C002

Special fissile materials.

0C003

Deuterium,heavy water (deuterium oxide)and other compounds of deuterium,and mixtures and solutions containing deuterium,in which the isotopie ratio of deuterium to hydrogen exceedsl:5.000.

0C004

Graphite having a purity level better than 5 parts per million boron equivalent'and with a density greater than L50 g/em2for use in a "nuclear reactor",in quantities exceeding lkg.

0C005

Specially prepared compounds or powders for the manufacture of gaseous diffusion barriers,resistant to corrosion by UF6(e.g.nickel oralloys containing 60%by weight or more nickel,aluminium oxide 99.9% by weight or more anda particle size less than 10 μm measured by American Society for Testing and Materials (ASTM)

and fully fluorinated hydrocarbon polymers),having a purity of B33O standard and a high degree ofparticle size uniformity.

ODSofhware

OETechnology

OD001

• "production"or "use"of goods specified in this category.

10030

• "Technology"according to the Nuclear Technology Note for the
• category-

CATEGORY1:SPECIALMATERIALS ANDRELATED EQUIPMENT

LA Systems.Equipment and Components

1A001

Components made from fluorinated compounds,seals,gaskets, sealants or fuel bladders,speciallydesigned for"aireraft"or aerospace use,made from more than So% by weight of any of the materials specified in 1C009.b.or1C009.c.;

1A002

Composite structures or laminates,as follows:

• a.Made from any of the following:
• L.An organic"matrix"and "fibrous or filamentary materials" specified in1C010.c.or1C010.d:or
• 2.Prepregs or preforms specified in IC010.e.:
• b.Made from a metal or carbon"matrix,and any of the following
• 1.Carbon-fibrousor filamentary materialsl having all of the
• following-
• a.A"specific modulus"exceeding 10.15x106 m;
• pue
• b.A"specific tensile strength"exceeding 17.7x104
• m;or
• 2.Materials specified in 1C010.c.

1A003

Manufactures of non-"fusible"aromatic polyimides in film, sheet, tape orribbon form having any of the following:

• a.Athickness exceeding 0.254mm;or
• b.Coated or laminated with carbon graphite,metals or magnetic
• substances.

1A004

Protective and detection equipment and components not specinlly designed for military use,as follows:

• a.Full face masks/gas masks,filter canisters and decontamination equipment therefor,designed or modified for defense against any of the following.and specially designed components therefor

• including:Powered Air Purifying Respirators (PAPR) that are designed or modified for defense against agents or materials;
• b.Protective suits,gloves and shocs,specially designed or modified for defence against any of the following:
• 1.'Biological agents;
• 2.Radioactive materials;or
• 3.Chemical warfare (CW) agents;
• Detection systems,specially designed or modified for detection or identification of any of the following.and specially designed components therefor--
• I.Biological agents;
• 2.Radioactive materialsor
• 3.Chemical warfare(CW)agents.
• d.Electronic equipment designed for automatically detecting or identifying the presence of"explosives"residues and utilizing 'trace detection'technique capable of less than I ppm vapour,or1 mg solid or liquid.Techniques.

1A005

Body armour and components therefor,as follows:

• a.Soft body armour not manufactured to military standards or specifications,or to their equivalents and specially designed components therefor:
• b.Hard body armour platesproviding ballistic protection equal to or less than level A(N U 0101.06,July 2008)or nationalequivalents to exclude body armour when accompanying itsuser for the user's own personalprotection;
• Body armour designed toprovide frontalprotection only from both fragment and blast from non-military explosive devices;
• Control body armour designed to provide protection only from knife,spike,needle or blunt trauma.

LA006

Equipment, specially designed or modified for the disposal of improvised explosive devices,as follows,and specially designed componentsandaccessories therefor.

• a.Remotely operated vehicles;

1A008

Charges,devices and components,as follows:

• Explosive charges shaped to focus the effects of the explosive blast having allofthe following:
• 1.Net Explosive Quantity (NEQ)greater than 90g and
• 2.Outer casing diameter equal to or greater than 75 mm;
• b.Linear shaped cutting charges having all of the following.and specially designed components therefor:
• 1.An explosive loadgreater than 40g/m;and
• 2.Awidth of10 mm ormore,
• c.Detonating cord with explosive core load greater than 64g/m;
• d.Cutters,other than those specified in 1A008.b.,and severing tools having a Net Explosive Quantity (NEQ)greater than 3.5 kg.

1A102

Resaturated pyrolized carbon-carbon components designed for space launch vehicles specified in 9A004 or sounding rockets specified in 9A104.

• b.Devices specially designed for the purpose of preventing the operation of an explosive device by projecting a liquid,solid or frangibleprojectile.

LA007

Equipment and devices,specially designed to initiate charges and devices containing "energetic materials",by electrical means,as follows:

• a.Explosive detonator firing sets designed to drive explosive detonators specified in IA007(b):
• b.Electrically driven explosive detonators as follows:
• 1.Exploding bridge(EB):
• 2.Exploding bridge wire (EBW):
• 3.Slapper:
• 4.Exploding foil initiators (EFI)

1A202

Composite structures,other than those specified in 1A002,in the form oftubesand havingboth ofthe following characteristies:

• a.An insidediameter ofbetween75 mm and 650 mm;
• b.Athicknessof12mmor less:and
• C. Made with any of the"fibrous or filamentary materials" specified in1C010.a.or b.or 1C210(a)or with carbon prepregmaterials specified in 1C210(c).

1A225

Wet-proofed platinized catalysts specially designed or prepared for

promoting the hydrogen isotope exchange reaction between hydrogen and water for the recovery of tritium from heavy water or for the production of heavy water

1A226

Specialized packings which may be used in separating heavy water

from ordinary water,havingboth of the following characteristics

• a.Made ofphosphor bronze mesh chemically treated to improve
• wettability:and
• b.Designed to be used in vacuum distillation towers.

1A227

High-density (lead glass or other)radiation shielding windows,having all of the following characteristies,and specially designed frames therefor:

• aAviewing area of the window exposed to the lowest level of
• radiation in the design application,which is greater than 0.09 m:
• b.Adensity greater than 3g/em':and
• c.Athicknessof 100 mm orgreater.

IB Test,Inspection andProduction Equipent

1B001

Equipment for the production orinspection of"composite"structures or laminates specified in 1A002 or"fibrous or filamentary materials" specified in ICo10,as follows,and specially designed components and accessories therefor to include:

• a.Filamentwindingmachines,ofwhich the motions for positioning.wrapping and winding fibers are coordinated and programmed in three or more primary servo positioning'axes, specially designed for the manufacture of"composite" structures or laminates,from"fibrous or filamentary materials":
• b.Tape-laying machines'which have the ability to lay one or more filament bands' limited to widths greater than 25,4 mm and less than or equal to 304.8mmand to cut andrestart individual filament band courses during the laying process,ofwhich the motions for positioning and laying tape are coordinated and programmed in five or more primary servo positioning'axes, specially designed for the manufacture of"composite"airframe or complete rocket systems and unmanned aerial vehicle systems and structures:
• Multidirectional, mulidimensional weaving machinesor interlacing andknittingmachines,includingadapters and modification kits, specially designed or modified for weaving. interlacing or braiding fibers,for"compositestructures;
• d.Equipment specially designed or adapted for the production of reinforcement fibers,as follows:
• 1.Equipment for converting polymeric fibers(such as polyacrylonitrile,rayon,pitch or polycarbosilane)into carbon fibers or silicon carbide fibers,including special equipment to strain the fiber during heating:
• 2.Equipment for the chemical vapour deposition of elements orcompounds,on heated filamentarysubstrates,to manufacture silicon carbide fibers;

3. Equipment for the wet-spinning of refractory ceramics (such as aluminium oxide):

• Equipment for converting aluminium containing precursor fibers into alumina fibers by heat treatment:
• Equipment specially designed or modified for producing prepregs specified by the hot melt method;
• f Non-destructive inspection equipment specially designed for "composite"materials,as follows:
• 1.X-ray tomography systems for three-dimensional defect inspection;

1B002

Equipment for producing metal alloys,metal alloy powder or alloyed materals,specially designed to avoid contamination and specially designed for use in one of the processes specified in 1C002.(e)2.

1B003

Tools,dies,moulds or fixtures,for "superplastic forming"or "diffusion bonding" titanium,aluminium or their alloys,specially designed forthe manufacture of anyof the following:

• a.Airframe or aerospace structures,
• b."Aircraft"or aerospace engines; or
• Speciallydesigned components for structures specifiedin
• 1B003(a)or for engines specified in 1B003(b).

1B101

Equipment,other than that specified in 1Boo1,for the "produetion" ofstrueturalcompositesas follows;andspecially designed components and accessories therefor to include moulds,mandrels, dies,fixtures and tooling for the preform pressing,curing,casting. sinteringor bondingofcomposite struetures,laminates and

manufacturesthereof:

• a.Filament winding machines or fiber placement machines,of which the motions for positioning.wrapping and winding fibers can be coordinated and programmed in three or more axes,designed to fabricate composite structures or laminates from "fibrous or filamentary materialsandcoordinatingand programming controls;
• 2.Numerically controlled ultrasonic testing machines of which the motions for positioning transmitters or receivers are simultaneously coordinated andprogrammed in four or more axes to follow the three-dimensional contours of the component under inspection;
• 3.Tow-placement machines'with the ability to place one or more filament bands having widths less than or equal to 25.4mm,and to cut and restart individual filament band courses during the placement process,of which the motions forpositioning andlaying tows are coordinated and programmed in two or more primary servo positioning axes,speciallydesignedfor the manufacture of "composite"airframe or'missile'structures.

• b.Tape-laying machines of which the motions for positioning and laying tape and sheets can be coordinated and programmed in two or more axes,designed for the manufacture of composite airframe and"missile"structures;
• Equipment designed or modified for the"production"of"fibrous orfilamentary materials"as follows:
• 1.Equipment for converting polymeric fibers (such as polyacrylonitrile.rayon orpolycarbosilane)including special provision to strain the fiber during heating;

2. Equipment for the vapour deposition of elements or compounds on heated filament substrates:

• 3.Equipment for the wet-spinning of refractory ceramics (such as aluminium oxide):
• d.Equipment designed or modified for special fiber surface treatment or forproducing prepregs and preforims specified in entry 9C110.

1B102

Metal powder "produetion equipment,other than that specified in 1B0o2,and components as metal powder "production cquipment usable for the production,in a controlled environment,of spherical spheroidal or atomized materialsspecified in 1Coll.a.1Coil.b 1C1ll.a.l.,1C1ll.a.2.or in the Military Goods Controls.Specially designed components for"produetion equipmentspecified in 1B002 or1B102(a).

IB1IS

Equipment,other than that specified in 1B002 or 1B102,for the produetion of propellant and propellant constituents,as follows,and specially designedcomponents therefor:

• a"Production equipmentfor the "production",handlingor
• acceptance testing ofliquid propellants or propellant constituents specified in IC011.a,IColl.b.,ICIll or in the Military Goods Controls:
• b. "Production equipmentfor the"production",handling.mixing. curing.casting.pressing.machining.extruding or acceptance testing of solid propellants or propellant constituents specified in 1C01l.a.,1C01l.b.,IClll or in the Military Goods Controls.

1B116

Specially designed nozzles for producing pyrolitieally derived materials formed on a mould,mandrel or other substrate from

(2,900°C) temperature range at pressures of 130 Pa to 20kPa.

1B117

Batch mixers having all of the following.and specially designed componentstherefor:

• a.Designed or modified for mixing under vacuum in the range of zero to 13,326kPa:
• b.Capable ofcontrolling the temperature of the mixing chamber,
• c.A total volumetric capacity of 1l0 liters or more;and
• d.At least one'mixing/kneading shaft'mounted off center with the exception ofdeagglomerators orknife-spindles.

1B118

Continuous mixers having all of the following.and specially designed componentstherefor:

• a.Designed or modified for mixing under vacuum in the range of zero to 13,326kPa:
• b.Capable of controlling the temperature of the mixing chamber,
• c.Any ofthe following:
• 1.Two or more mixing or kneading shafts; or
• 2.All ofthe following
• a.A single rotating and oscillating shaft with kneading teeth orpins;and
• b.Kneading teeth or pins inside the casing of the mixing chamber.

1B119

Fluid energy mills usable for grinding or milling substances specified

in 1Co1l(a),1C01l(b),1Clll or in the Military Goods Controls,and specially designed components therefor.

1B201

Filament winding machines,other than those specified in 1Boo1 or

IB10l,and related equipment,as follows:

• a.Filament winding machines having all of the following characteristics:
• 1.Having motions for positioning.wrapping.and winding fibers coordinated and programmed in two or more axcs;

2. Specially designed to fabricate composite structures or laminates from "fibrous or filamentary materials":and

• 3.Capable of winding cylindrical tubes with an internal diameterbetween 75and 650 mmand lengthsof300 mm
• b.Coordinating and programming controls for the filament winding machines specified in1 B20i(a):
• Precision mandrels for the filament winding machines specified in 1B201.a.

1B225

Electrolytic cells for fluorine produetion with an output capacity greater than 250gof fluorineper hour.

1B226

Electromagnetic isotope separators designed for, or equipped with, single or multiple ion soureescapable ofproviding a total ion beam current of50 mA orgreater to include separators:

• aCapable ofenriching stable isotopes;
• b.With the ion sources and collectors both in the magnetic field and those configurations in which they are extermal to the field.

1B228

Hydrogen-cryogenie distillation columns having all of the following characteristics-

• Designed for operation with internal temperatures of 15 K(-258 C)to35K(-238°C;
• b.Designed for operation at an intermal pressure ofO.1 MPato1
• MPa;
• c.Constructed ofeither:
• 1 Stainless steel of the Society of Automotive Engineers Intermational(SAE)300 series with low sulphur content and with an austenitic ASTM (or equivalent standard)grain sizenumber of5orgreater,or

1B231

Tritium facilities or plants,and equipment therefor,as follows:

• aFacilities or plants for the production,recovery,extraction. concentration,or handling of tritium;
• b.Equipment for tritium facilities or plants,as follows:
• 1.Hydrogen or helium refrigeration units capable of cooling to23 K(-250°C)orless,with heat removal capacity greater than 150 W:
• 2.Hydrogen isotope storage or purification systems using metal hydrides as the storage or purification medium.

1B232

Turboexpanders or turboexpander-compressor sets having both of the following characteristics:

• a.Designed for operation with an outlet temperature of 35 K(-
• 238°C)orless;and
• b.Designed for a throughput of hydrogen gas of 1000 kg/h or greater.
• 2.Equivalent materials which are both cryogenic and hydrogen (H)-compatible between15K(-258C)and 35 K(-238C):
• d.With intermal diameters of30 cm orgreater and the active height of packing material in a packed-type column,or the active height of internal contactor plates in a plate-type column of 4m or greater.

1B230

Pumps capable of cireulating solutions of concentrated or dilute potassium amide catalyst in liquid ammonia (KNH/NHs),having all ofthe following characteristics:

• a.Airtight (ie.,hermetically sealed);
• b.A capacity greater than 8.5 m/h,and
• C.Either ofthe following characteristics:
• 1.Forconcentratedpotassiumamide solutions (1%or greater).an operating pressure of1.5 MPa to 60MPa:or
• 2.For dilute potassium amide solutions (less than 1%).an operatingpressureof20 MPa to 60 MPa.

1B233

Lithium isotope separation facilities or plants,and systems and equipment therefor,asfollows:

• a.Facilities or plants for the separation of lithium isotopes;
• b.Equipment for the separation of lithium isotopes based on the lithium-mercury amalgam process,as follows:
• 1.Packed liquid-liquid exchange columns specially designed for lithium amalgams:
• 2.Mercury or lithium amalgam pumps;
• 3.Lithium amalgam electrolysis cells;
• 4.Evaporators for concentrated lithium hydroxide solution;
• lon exchange systems specially designed for lithium isotope separation,and specially designed components therefor:
• d. Chemical exchange systems (employing crown ethers,cryptands, orlariat ethers).specially designed for lithium isotope separation. and specially designed components therefor.

1B234

High explosive containment vessels,chambers,containers and other similar containment devices designed for the testing ofhigh explosives orexplosive devicesand having both of the following characteristics:

• a.Designed to fully contain an explosion cquivalent to 2kg of trinitrotoluene (TNT)orgreater;and
• b.Having design elements or features enabling real time or delayed transferof diagnostic ormeasurement information.

1B235

Target assemblies and components for the production of tritium as follows:

• a. Targct assemblies made of or containing lithium enriched in the lithium-6 isotope specially designed for the production of tritium through irradiation,including insertion in a nuclear reactor;

2. b.Components specially designed for the target assemblies specified in1B235(a).

ICMaterials

1C001

Materials specially designed for absorbing electromagnetie radiation, orintrinsically conduetive polymers,as follows:

• aMaterials for absorbing frequencies exceeding2x 108 Hzbut less than3x1012Hz
• Hair type absorbers.constructed ofnatural or synthetic fibers,with non-magnetic loading to provide absorption;
• Absorbers having no magnetic loss and whose incident surface is non-planar in shape,including pyramids,cones,wedges and convoluted surfaces;
• d.Planar absorbers.having all of the following:
• 1.Made from any ofthe following:
• a.Plasticfoam materials (flexible or non-flexible) with carbon-loading.or organic materials,including binders,providing more than 5% echo compared with metaloverabandwidth exceeding±15%ofthe center frequency of the incident energy,and not capable of withstanding temperatures exceeding 450K(177C);
• b.Ceramic materials providing more than 20% echo compared with metal over a bandwidth exceeding ±15%of the centerfrequencyof the incident energy.and notcapableofwithstanding temperatures exceeding 800K(527°C).
• c.Tensile strength less than 7x 106 N/m2;or
• d.Compressive strength less than 14x 106N/m2;
• e.Materials not transparent to visible light and specially designed for absorbing near-infrared radiation having a wavelength exceeding 810 nm but less than 2,000 nm (frequencies exceeding 150 THz but less than370 THz):
• Intrinsically conductivepolymericmaterials with abulk electrical conductivityexceeding 10 000 S/m (Siemens per meter) or ashect (surface)resistivityof less than l00 ohms/square,based on any of the followingpolymers:
• 1.Polyaniline;
• 2.Polypyrrole;

1C002

Metal alloys,metal alloy powder and alloyed materials,as follows:

• I.Those containing a higher percentage by weight of the stated metal than ofany other element.
• 2.Stress-rupture life'should be measured in accordance with ASTM standard E-139or nationalcquivalents.
• 3.Low cycle fatigue life'should be measured in accordance with ASTM Standard E-606 Recommended Practice for ConstantAmplitude Low-Cyele Fatigue Testing'or national equivalents. Testing should be axial with an average stressratio equal to I and a stress-concentration factor (Kt) equal to I.The average stress is defined as maximum stress minus minimum stress divided by maximum stress.
• 4.Aluminides,as follows:
• 1.Nickel aluminides containing a minimum of 15%by weight aluminium,a maximum of38% by weight aluminium and at least one additional alloying element;
• 2.Titanium aluminides containing1o%by weigh or more aluminium and at least one additional alloying clement;
• 5.Metal alloys,as follows,made from the powder or particulate material specified in 1C0029e)
• 6.Nickel alloys having any of the following:
• a.Astress-rupture life'of 10,000 hours or longer at 923 K
• (650°C)at a stressof676MPa:or
• b.Alow cycle fatigue life'of 10.000 cycles or more at 823 K (550°C)at a maximum stressof1,095MPa;
• 7.Niniobium alloys having any ofthe following:
• a.A'stress-rupture life'of10,000 hours or longer at1 073K
• (800C)at a stressof400 MPa;or
• b.Alow cycle fatigue life'of 10 000 cycles or more at 973 K (700°C)at a maximum stress of700 MPa;
• 3.Polythiophene,
• 4.Poly phenylene-vinylene;or
• 5.Poly thienylene-vinylene.

• 8.Titanium alloys having any ofthe following:
• aA'stress-rupture life'of10 000 hours orlonger at 723K (450C)at a stressof200 MPa:or
• b.Alow cycle fatigue life'of 10 000 cycles or more at 723 K (450°C)ata maximum stressof400 MPa;
• 9.Aluminium alloys having any of the following:
• L A tensile strength of240MPa or more at 473K(200°C);or
• Atensile strengthof415 MPa ormore at298K(25°C):
• 10.Magnesium alloys having all of the following:
• a.A tensile strength of345 MPa ormore;and
• b.Acorrosion rate of less than Imm/year in 3% sodium chloride aqueous solution measured in accordance with ASTM standard G-31 or nationalequivalents;
• 11.Metal alloy powder or particulate materialhaving all of the following:
• a.Made from any of the following composition systems:
• Nickel alloys (Ni-AlX,Ni-X-A) qualified for turbine engine parts or components,ie.with less than3 non-metallic particles (introduced during the manufacturing process) larger than 100 μm in 109 alloy particles;
• iL Niobium alloys (Nb-Al-X or Nb-X-Al,Nb-Si-Xor
• Nb-X-SiNb-Ti-XorNb-X-Ti);
• Titanium alloys(Ti-Al-XorTi-X-Al):
• iv.
• Aluminium alloys (Al-Mg-XorAl-X-Mg.Al-Zn-X orAl-X-Zn,Al-Fe-X orAl-X-Fe):or
• Magnesium alloys(Mg-Al-Xor Mg-X-Al);
• b.Made in a controlled environment by any of the following processes:
• L
• "Vacuum atomization';
• L 'Gas atomization';
• Rotary atomization':
• iv. 'Splat quenching';

1C003

Magnetic metals,of all types and ofwhatever form,having any of the following:

• a.Initial relative permeability of120.000 ormore and a thicknessof 0.05 mm or less performed on fully annealed materials;
• b.Magnetostrictive alloys having any of the following:
• 1.A saturationmagnetostriction ofmore than 5x 10-4:or
• 2.A magnetomechanical coupling factor (k) of more than 0.8;
• or
• c.Amorphous or 'nanocrystalline' alloy strips,having all of the following:
• 1.A composition having a minimum of 75%by weight of iron,cobal or nickel;
• 2.A crystal grain size of 50 nm or less,as determined by X-
• ray diffraction;
• 3.A saturation magnetic induction(Bs)of 1.6T or more;and
• 4.Any ofthe following:
• V. 'Melt spinning'and'comminution';
• vi. 'Melt extraction'and'comminution';
• vil. 'Mechanical alloying':or
• vilL. Plasma atomization':and
• c.Capable of forming materials specified in 1C002(a.)or 1C002.((b.));
• 12.Alloyed materials having all of the following:
• a.Made from any of the composition systems specified in IC002.c.1.;
• b.Nin the form of uncomminuted flakes,ribbons or thin rods; and
• c.Produced inacontrolled environment by any of the following:
• L 'Splat quenching':
• 'Melt spinning':or
• 'Melt extraction'

1C004

Uranium titanium alloys or tungsten alloys with a "matrix" based on iron,nickel or copper,having all of the following:

• a.A density exceeding 17.5g/cm2;
• b.An elasticlimit exceeding 880 MPa:
• c.An ultimate tensile strength exceeding I270 MPa:and
• d.An elongation exceeding 8%.

1C005

"Superconductive""composite"conductors in lengths exceeding 100 m orwith a mass exceeding lo0 g.as follows:

• a"Superconductive""composite"conductors containing oneor more niobium-titanium,wire,cylinder,film,tape or ribbon form filaments,having all ofthe following-
• Embedded in a"matrix"other than a copper or copper-
• based mixed"matrix;and
• 2.Having a cross-section area less than 0.28x 10-4 mm2(6
• μm in diameter for circularfilaments);
• b."Superconductive""compositeconductors consisting ofone or
• having all ofthe following:
• 1.A"criticaltemperatureat zero magnetic induction
• exceeding 9.85K(-263.31°C):and
• Remaining in the "superconductive state at a temperature of4.2K(-268.96°C)when exposed toamagneticfield oriented in any direction perpendicular to the longitudinal axisofconductor andcorrespondingtoamagnetic induction of 12T with critical current density exceeding
• 1.750A/mm2onoverall cross-section ofthe conductor;
• Superconductive"composite"conductors consisting ofone or more "superconductive" 'filaments' which remain "superconductive"above 115K(-158.16°C).
• Astrip thickness of0.02mm or less,or
• b. An electricalresistivity of2x10-4ohm cmor
• more.

1C006

Fluids and lubricating materials,as follows:

• a.Lubricating materials containing.as their principal ingredients, phenyleneor alkylphenylenecthersor thio-ethers,or their mixtures,containing more than two ether or thio-ether functions or mixtures thereof;
• b.Damping or flotation fluids having all of the following:
• 1.Purity exceeding99.8%:
• 2.Containing less than 25 particles of200 μm or larger in size per 100ml:and
• 3.Made from at least 85%of any ofthe following:
• a Dibromotetrafluoroethane (CAS 25497-30-7.12473-2.27336-23-8);
• b. Polychlorotrifluoroethylene (oily and AXEM modifications only):or
• C. Polybromotrifluoroethylene:
• c.Fluorocarbon electronic cooling fluids having all of the following:
• 1.Containing 85% by weight or more of any of the following. ormixtures thereof:
• a.Amonomericformofperfluoropolyalkylethertriazines or perfluoroaliphaticethers; perfluoroaliphatic-ethers;
• b.Perfluoroalkylamines;
• c.Perfluorocycloalkanes;or
• d.Perfluoroalkanes;
• 2.Density at 298K(25°C)of 1.5g/mlormore;
• 3.Ina liquid state at 273K(0°C):and
• 4.Containing 60% or more by weight of fluorine.

1C007

Ceramie powders,special purpose polymerie or metallo-organic materials used for the "production"of silicon carbide,silicon nitride, or ceramics with silicon,carbon and nitrogen.And special purpose polymeric or metallo-organie materials used for the"production"of

silicon carbide,silicon nitride,or ceramies with silicon,carbon and nitrogen.,as follows:

• a.Ceramic powdersof titanium diboride (TiB2)(CAS12045-63-5) having total metallic impurities,excluding intentional additions,of less than50o0 ppm,an averageparticle size equal to or lessthan 5 μm and nomore than 10%ofthe particles larger than10 μm:
• b.Ceramic-"matrix"compositematerialsas follows:
• l.Ceramie-ceramic "composite"materials with a glass or oxide-matrix"and reinforced with any ofthe following:
• a. Continuous fibers made from any of the following materials:
• aAI2O3(CAS1344-28-1);0r
• b.Si-C-N;or
• b.Fibersmade from any of the followingmaterials:
• a.Si-N:
• b.Si-C;
• c.Si-AI-O-N;or
• PUe:N-O-SP
• C. Having a"specific tensile strength"exceeding 12.7 x103m;
• 2.Ceramic"matrix"composite"materials,with a"matrix" formed of carbides ornitrides of silicon,zirconium or boron;
• Precursor materials' specially designed for the "production"of materials specified in IC007.c.,as follows:
• 1.Polydiorganosilanes;
• 2.Polysilazanes;
• 3.Polycarbosilazanes.

1C008

Non-fluorinated polymeric substances as follows:

• aImides as follows:
• 1.Bismaleimides;

• 2.Aromaticpolyamide-imides(PAl)having aglass
• transition temperature(Tg)exceeding 563 K(290°C);
• 3.Aromatic polvimides havinga'glass transition temperature (Tg)'exceeding505K(232°C):
• 4.Aromaticpolyetherimideshavingaglasstransition temperature(Tg)exceeding 563K(290°C):
• b.Polyarylene ketones;
• Polyarylene sulphides,where the arylene group is biphenylene, C. triphenylene or combinations thereof.
• d.Polybiphenylenethersulphone havinga transition
• temperature (Tg)exceeding 563K(290°C).

1C009

Unprocessed fuorinated compounds as follows:

• aFluorinated polyimides containing10% by weight or more of
• combined fluorine:
• b.Fluorinated phosphazene elastomers containing 30% by weight or
• more ofcombined fluorine.

1C010

"Fibrous or filamentary materials",as follows:

• aOrganic "fibrous or filamentary materials",having all of the
• following:
• 1."Specific modulusexceeding 12.7x 106m;and
• 2."Specific tensile strength"exceeding 23.5x104m;
• b.Carbon "fibrous or filamentary materials":having all of the
• following:
• 1."Specific modulusexceeding 14.65x106 m;and
• 2."Specific tensile strength"exceeding 26.82x104 m;
• C. Inorganic "fbrous or filamentary materials",having all of the
• following:
• 1."Specific modulus"exceeding 2.54x 106 m:and
• 2.Melting.softening.decomposition or sublimation point exceeding1,922K(1,649°C)in an inert environment;

1C011

Metals and compounds,as follows:

• a.Metals in particle sizes of less than 60 μm whether spherical, atomised,spheroidal,flakedorground,manufacturedfrom material consisting of 99%or more ofzirconium,magnesium and alloys thereof;
• 1.Composed ofany of the following:
• a.Polyetherimides specified in lC008(a);
• b.Materials specified in 1C008(d)to 1C008(f):or

2. Composedofmaterials specifiedin1C01o(d)l.aor 1C010.d.1.b.and'commingled'with other fibers specified in1C010.a.1C010.b.or1C010.c:

• e.Fully or partially resin-impregnated or pitch-impregnated "fibrous or filamentarymaterials"(prepregs).metalorcarbon-coated "fibrous or filamentary materials"(preforms)orcarbon fiber
• preforms'having all of the following:
• 1.Having any of the following:
• a.Inorganic"fibrousor filamentary materials" specifiedin 1C010(c);or
• b.Organicorcarbon fibrousor filamentary
• materials",having all of the following:
• 1."Specificmodulus"exceeding10.15x106 m,

2. "Specific tensile strength"exceeding 17.7x

• 104m:and
• 2.Having any ofthe following:
• aResin or pitch,specified in 1C008 or 1C009(b);
• b.Dynamic Mechanical Analysis glass transition temperature (DMA Tg)equal to or exceeding 453
• K(180C)and havinga phenolic resin;or
• Dynamic MechanicalAnalysis glass transition temperature (DMA Tg)equal to or exceeding505 K(232°C)and having a resin or pitch,not specified in 1C008 or 1C009.b.,and not being a phenolic
• resin:

• b.Boron or boron alloys whether or not the metals or alloys are encapsulated in aluminium, magnesium,zirconium or beryllium. with a particle size of60um or less,as follows:
• 1.Boron with a purity of 85%by weight ormore;
• 2.Boron alloys with a boron content of 85% by weight or
• more,
• c.Guanidine nitrate (CAS 506-93-4);
• d.Nitroguanidine(NQ)(CAS556-88-7)
• e.lodine pentafluoride(CAS7783-66-6).

1C012

Materials as follows:

• a.Plutonium in any form with a plutonium isotopic assay of
• plutonium-238ofmore than50%by weight;
• b.Previously separatedneptunium-237 in any form

1C101

Materials and devices for reduced observables such asradar reflectivity. ultravioletinfrared signatures and acoustie signatures, other than those specified in 1Cool,usable in'missiles,"missile" subsystems or unmanned aerial vehicles specifiedin 9Ao12 or

9A112(a) including:

• a.Structural materials and coatings specially designed for reduced
• radar reflectivity;
• b. Coatings,including paints,specially designed for reduced or tailored reflectivity or emissivity in the microwave,infrared or ultravioletregions ofthe electromagnetic spectrum.

1C102

Resaturated pyrolized carbon-carbon materials designed for space 9A104.

1C107

Graphite and ceramie materials,other than those specified in IC007,

as follows:-

• a.Fine grain graphites with a bulk density of1.72g/cm2or greater.
• measured at 288K(15C).and havinga grain size of100 μm or

1C111

Propellants and constituent chemicals for propellants,other than those specified in 1C01l,as follows:

• a.Propulsive substances:
• 1.Spherical or spheroidal aluminium powder other than that specified in the Military Goods Controls,in particle size of less than 200 um and an aluminium conten of97% by

less,usable for rocket nozzles and re-entry vehicle nose tips, which can be machined to any of the followingproducts:-

1. Cylinders having a diameter of 120 mm or greater anda length of50mm orgreater. 2. Tubes having an inner diameter of 65 mm or greater and a wall thicknessof25mm or greater andalength of50 mm 3. 3.Blocks havinga size of120 mm x120 mm x50mm or greater; 4. b.Pyrolytic or fibrous reinforced graphites,usable for rocket nozzles and reentry vehicle nose tips usable in "missiles".space launch vehicles specified in 9A004 or sounding rockets specifiedin 9A104: 5. Ceramic composite materials (dielectric constant less than 6 at any frequency from 100 MHz to 100 GHz) foruse in radomesusable in "missiles,space launch vehicles specified in 9A004 or sounding rockets specified in 9A104; 6. d.Bulk machinable silicon-carbide reinforced unfired ceramic,usable for nose tips usable in "missiles,space launch vehicles specified in9A004 or soundingrocketsspecifiedin9A104; 7. Reinforced silieon-carbide ceramic composites,usable for nose tips,reentry vehicles and nozzle flaps usable in "missiles", space launch vehicles specified in9A004 or sounding rockets specified in9A104. 8. Bulk machinable ceramic composite materials consisting of an 'Ultra High Temperature Ceramic (UHTCy matrix with a melting point equal to or greater than3,0ooCand reinforced with fibers or filaments,usable for missiie components (such as nose-tips,reentry vehicles,leading edges,jet vanes,control surfaces or rocket motor throat inserts)in"missiles",space launch vehicles specified in9A004,soundingrockets specified in9A104or'missiles'

weight or more,if at least 10% of the total weight is made up of particlesof less than 63 μm.according to SO 2591-1:1988ornationalequivalents;

• 2.Metal powders,other than that specified in the Military
• Goods Controls,as follows:
• a Metalpowdersofzirconium,berylliumor magnesium,or alloys of these metals,if at least 90% of the total particles by particle volume or weight aremade up ofparticlesof less than 60 um (determined by measurement techniques such as using a sieve,laser diffraction or optical scanning) whether spherical,atomized,spheroidal,flaked or ground,consisting 97%by weight ormore of any of the following:
• 1.Zirconium;
• 2.Beryllium;or
• 3.Magnesium;
• b. Metalpowders ofeither boron or boron alloys with a boron content of 85% or more by weight,if at least 90%ofthe totalparticlesby particle volume or weight aremade up ofparticlesof less than 60 μm (determined bymeasurement techniques such as using a sieve, laser diffraction or optical scanning) whether spherical,atomized,spheroidal,flaked or ground;
• 3.Oxidizer substances usable in liquid propellant rocket enginesas follows:-
• a.Dinitrogen trioxide(CAS 10544-73-7):
• b.Nitrogen dioxide (CAS10102-44-0ydinitrogen tetroxide (CAS 0544-72-6):
• c.Dinitrogen pentoxide(CAS 10102-03-1):
• d.Mixed Oxides of Nitrogen (MON);
• 4.Hydrazine derivatives as follows:
• a.Trimethylhydrazine (CAS1741-01-1);
• b.Tetramethylhydrazine (CAS 6415-12-9):
• c.N,N-Diallylhydrazine (CAS5164-11-4):

• d.Allylhydrazine(CAS 7422-78-8):
• e.Ethylene dihydrazine (CAS 6068-98-0):
• f.Monomethylhydrazine dinitrate:
• g.Unsymmetrical dimethyIhydrazine nitrate:
• h.Hydrazinium azide (CAS 14546-44-2):
• i.1.1-Dimethylhydrazinium azide (CAS 227955-524)/1.2-7Dimethylhydraziniumazide(CAS 299177-50-7):
• j.Hydrazinium dinitrate (CAS13464-98-7):
• k.Diimido oxalic acid dihydrazine (CAS3457-37-2):
• L2-hydroxyethylhydrazine nitrate (HEHN);
• m.See Military Goods Controls for Hydrazinium
• perchlorate:
• n.Hydrazinium diperchlorate (CAS13812-39-0):
• 0.Methylhydrazine nitrate(MHN)(CAS29674-96-2);
• p.1,1-Diethylhydrazine nitrate(DEHN)/1,2Diethylhydrazine nitrate(DEHN)(CAS363453-172)
• q.3,6-Dihydrazino tetrazine nitrate (l,4-dihydrazine
• nitrate)(DHTN);
• 5.High energy density materials,other than that specified in the MilitaryGoods Controls,usable inmissilesor unmanned aerialvehicles specified in 9A012or9Al12(a)
• a.Mixed fuel that incorporate both solid and liquid
• fuels,such as boron slurry,having a mass-based energydensityof40x 106U/kgorgreater;
• b.Other high energy density fuels and fuel additives (c.g,cubane,ionic solutions,UP-1o) having a volume-basedenergy density of37.5x109U/m3or greater,measured at 20°Cand one atmosphere (101,325kPa)pressure;
• 6.Hydrazine replacement fuels as follows
• a.2-Dimethylaminoethylazide(DMAZ)(CAS86147-04-
• 8)

b.Polymeric substances:

• 1.Carboxy-terminated polybutadiene (including carboxylterminated polybutadiene)(CTPB):
• Hydroxy-terminated polybutadiene (including hydroxylterminated polybutadiene)(HTPB)(CAS69102-90-5).
• other than that specified in the Military Goods Controls;
• 3.Polybutadiene-acrylic acid (PBAA);

4. Polybutadiene-acrylicacid-acrylonitrile(PBAN)(CAS 25265-19-4/CAS68891-50-9):

• 5.Polytetrahydrofuran polyethylene glycol (TPEG):
• 6.Polyglycidyl nitrate (PGN or poly-GLYN)(CAS27814-48-
• 8:

c.Other propellant additives and agents:

• 1.SEE MILITARY GOODS CONTROLS FOR Carboranes, decaboranes,pentaboranes and derivatives thereof

2. Glyeol dinitrate(TEGDN)(CAS111-22-8):

• 3.2-Nitrodiphenylamine(CAS 119-75-5):

4. Trimethylolethane trinitrate(TMETN)(CAS3032-55-1);

• 5.Diethylene glycol dinitrate(DEGDN)(CAS 693-21-0):
• 6.Ferrocene derivatives as follows:
• SEE MILITARYGOODS CONTROLSFOR
• a calocene(CAS37206-42-1):
• b. SEEMILITARY GOODS CONTROLSFOR Ethy! ferrocene(CAS 1273-89-8):
• SEE MILITARY GOODS CONTROLSFORn C. Propylferrocene(CAS1273-92-3)iso-propyl
• ferrocene(CAS 12126-81-7);
• d. SEE MILITARY GOODS CONTROLS FORn butyl ferr0cene(CAS31904-29-7):
• SEEMILITARYGOODSCONTROLSFORPentyl
• ferrocene(CAS1274-00-6);
• SEEMILITARY GOODS CONTROLSFOR Dicyclopentyl ferrocene(CAS 125861-17-8);

• SEE MILITARY GOODSCONTROLSFOR Dicyclohexyl ferrocene;
• h. SEE MILITARYGOODS CONTROLS FOR Diethylferrocene (CAS 1273-97-8):
• SEE MILITARYGOODSCONTROLSFOR Dipropyl ferrocene;
• SEE MILITARYGOODSCONTROLS FOR Dibutyl ferrocene(CAS1274-08-4);
• k. SEE MILITARYGOODSCONTROLSFOR Dihexyl ferrocene (CAS 93894-59-8):
• SEEMILITARYGOODSCONTROLSFOR Acetyl ferrocene(CAS1271-55-2)/1.l-diacetyl ferrocene(CAS 1273-94-5);
• m. SEE MILITARY GOODSCONTROLS FOR Ferrocene carboxylic acid (CAS1271-42-7)/1.1Ferrocenedicarboxvlic acid(CAS 1293-87-4):
• n, SEEMILITARYGOODSCONTROLSFOR butacene (CAS 125856-62-4);

0. Other ferrocene derivatives usableas rocket propellant burning rate modifiers,other than those specified in the Military Goods Controls.

• 7.Diazidomethyl-2-methyl-1.2,3-triazole (isoDAMTR):other than that specified in the Military Goods
• Controls.
• d'Gel propellants,other than that specified in the Military Goods Controls,specifically formulated for use inmissiles'.

1C116

Maraging steels,useable in'missiles',having all of the following:

• aHaving an ultimate tensile strength,measured at 293 K(20°C).
• equal to orgreater than:
• 1.0.9 GPa in the solution annealed stage;or
• 2.1.5 GPa in the precipitation hardened stage:and

b.Any ofthe following forms:

• 1.Sheet,plate or tubing with a wall or plate thickness equal to
• orless than 5.0 mm;

1C117

Materials for the fabrieation of'missiles'components as follows:

8. Tungsten and alloys in particulate form with a tungsten content of 97%by weight ormore anda particle size of50x10-6m(50μm) orless, 2. b.Molybdenum and alloys in particulate form with a molybdenum contentof97%by weight or more and a particle sizeof50x 10-6 m(50μm)orless: 3. c.Tungsten materials in solid form having all of the following: 4. I.Any ofthe following material compositions: 5. a.Tungsten and alloys containing 97% by weight or more of tungsten; 6. b.Copper infiltrated tungsten containing 80% by weightor more of tungsten:or 7. c.Silver infiltrated tungsten containing 8o%by weight or more of tungsten:and 8. 2.Able to be machined to any of the following products: 9. aCylinders having a diameter of 120 mm or greater anda lengthof 50 mm orgreater; 10. b.Tubes having an inner diameter of 65mm or greater anda wall thickness of 25mm or greater and a length of 50 mm orgreater,or 11. c.Blocks having a size of120 mm by 120mm by50 12. mm or greater.

1C118

Titanium-stabilized duplex stainless steel (Ti-DSS) having all of the following:

• a.Having all ofthe following characteristics:
• 1.Containing 17.0-23.0% by weight of chromium and 4.57.0%by weight ofnickel;
• 2.Having a titanium content of greater than 0,l0% by weight; and
• 2.Tubular forms with a wall thickness equal to orless than 50mm and having an inner diameter equal to or greater than270mm.

1C202

Alloys,other than those specified in IC002(b)3.or(b)4.,as follows:

• a.Aluminium alloys before or after heat treatment,having both ofthe following characteristics:
• 1.Capable ofan ultimate tensile strength of 460 MPa or moreat293K(20C):and
• 2 In the form oftubes or cylindrical solid forms (including forgings)with an outside diameter ofmore than 75mm;
• b.Titanium alloys before or after heat treatment.having both of the following characteristics:
• 1.'Capable ofan ultimate tensile strength of 900 MPa or more at 293K(20°C):and
• 2.In the form of tubes or cylindrical solid forms (including forgings) with an outside diameter of more than 75 mm.

1C210

Fibrous or filamentary materials'or prepregs.other than those specified in 1C010(a),(b)or (e).as follows:

• a.Carbon or aramidfibrous or filamentary materials'having either of
• the following characteristics:
• 1.A"specific modulusof12.7x 106 m or greater;or
• 2.A"specific tensile strength"of23.5 x 104m or greater;
• b.Glass 'fibrous or filamentary materials'having both of the following characteristics-
• 3.A ferritic-austenitic microstructure (also referred to as a two-phase microstructure)of which at least 10%by volume (according to ASTM E-1181-87 or nationalequivalents)is austenite:and
• b.Having any ofthe following forms:
• I.Ingots or bars having a size of 1o0 mm or more in each dimension;
• 2.Sheets having a width of 600 mm or more and a thickness of3mm orless;or
• 3.Tubes having an outer diameter of 600 mm or more and a wall thicknessof3mm or less.

• 1.A"specific modulusof3.18x106m or greater:and
• 2.A"specific tensile strength"of 7.62x 104 m orgreater;
• Thermosetresinimpregnated continuous"yarns""rovings" tows"or"tapes"with a width of 15mm or less(prepregs),made from carbon or glassfibrous or filamentary materials' specified in IC210.a.orb.

1C216

Maraging steel,other than that specified in 1Cll6,'capable of an ultimate tensile strength of1,950 MPa ormore,at293K(20°C).

1C225

Boron enriched in the Bboron-lo (loB) isotope to greater than its natural isotopic abundance,such as clemental boron,compounds, mixtures containing boron,manufactures thereof,waste or scrap of any of the foregoing.

1C226

Tungsten,tungsten carbide,and alloys containing more than 90% tungsten by weight,other than that specified in 1Cl17,having both of the followingcharacteristies:

• a.In forms with a hollow cylindrical symmetry (including cylinder segments) with an inside diameter between 100 mm and 300 mm; and
• b.A mass greater than 20 kg.

1C227

Caleium having both of the followingcharacteristies:

• Containing less than 1 0oo ppm by weight ofmetallie impurities
• other than magnesium:and
• b.Containing less than 10 ppm by weight of boron.

1C228

Magnesium having both of the following characteristics:

• aContaining less than 200 ppm by weight of metallic impurities other than calcium;and
• b.Containing less than 10 ppm by weight of boron.

1C229

Bismuth havingboth of the following characteristies:

• aApurityof99.99% or greater by weight:and
• b.Containing less than 10 ppm by weight of silver.

1C230

Beryllium metal,alloys containing more than So% beryllium by weight,beryllium compounds,manufactures thereof,and waste or

serap of any of the foregoing.

1C231

Hafnium metal,alloys containing more than 60%hafnium by weight, hafnium compounds containing more than 60% hafnium by weight.

manufactures thereof,and waste or scrap ofany of the foregoing.

1C232

Helium-3 (He).mixtures containing helium-3,and products or

devices containing any of the foregoing.

1C233

Lithium enriched in the lithium-6 (*Li) isotope to greater than its natural isotopic abundance,and products or devices containing enriched lithium,as follows:elemental lithium,alloys,compounds. mixtures containing lithium,manufactures thereof.waste or scrap of

any of the foregoing.

1C234

Zirconium with a hafnium content ofless than 1part hafnium to 500 parts zirconium by weight,as follows: metal,alloys containing more than So% zirconium by weight,compounds,manufactures thereof 0A001(f)-

1C235

Tritium,tritium compounds,mixtures containing tritium in which the ratio oftritium to hydrogen atoms exceeds 1 part in 1o0o,and produets or devices containing any of the foregoing.

1C236

on alpha-n reaction,other than those specified in 0C001 and 1C012.a.,in the followingforms:

• aElemental;
• b.Compounds having a total activity of 37 GBq/kg (l Ci/kg) or greater:
• c.Mixtures having a total activityof37 GBq/kg (1 Ci/kg)orgreater,
• d.Products or devices containing any ofthe foregoing

1C237

Radium-226(226Ra),radium-226 alloys.radium-226 compounds, mixtures containing radium-226,manufactures thereof,and products or devices containingany of the foregoing.

1C238

Chlorine trifluoride (CIFs).

1C239

High explosives,other than those specified in the Military Goods

Controls,or substances or mixtures containing more than 2% by weight thereof,with a crystal density greater than L8 g/em3 and having a detonation velocity greater than 8,ooo m/s.

1C240

Nickel powder and porous nickel metal,other than those specified in 0C005,as follows:

• aNickel powder havingboth ofthe following characteristics:
• 1.A nickelpurity content of99.0% or greater by weight:and
• 2.A mean particle size ofless than 10 μm measured by American Society for Testing and Materials (ASTM) B330 standard;
• b.Porous nickelmetalproducedfrom materials specified in 1C240(a).

1C241

Rhenium,and alloys containing 90% by weight or more rhenium;and alloys ofrhenium and tungsten containing90%by weightor moreof any combination ofrhenium and tungsten,other than those specified in 1C226,havingboth ofthe following characteristies:

• a.In forms with a hollow cylindrical symmetry (including cylinder segments)with an inside diameter between 100 and300 mm:and
• b.Amass greater than 20kg.

1C350

Chemieals,which may be used as precursors for toxic chemical

agents,as follows,and "chemical mixtures"containing one or more thereof:

• 1.Thiodiglycol(CAS 111-48-8):
• 2.
• Phosphorus oxychloride(CAS 10025-87-3):
• 3.Dimethylmethylphosphonate (CAS 756-79-6);
• 4.Methylphosphonyl difluoride(CAS 676-99-3):
• 5.Methyl phosphonyl dichloride(CAS676-97-1)

6. Dimethyl phosphite(DMP)(CAS868-85-9):

• 7.
• Phosphorus trichloride(CAS 7719-12-2):
• 8.
• Trimethyl phosphite (TMP)(CAS 121-45-9):
• 9.Thionyl chloride(CAS 7719-09-7);
• 10.3-Hydroxy-1-methylpiperidine(CAS3554-74-3):
• 11.N,N-Disopropyl-(beta)-aminoethylchloride(CAS96-79-7):
• 12.N,N-Disopropyl-(beta)-aminoethane thiol (CAS5842-07-9):
• 13.3-Quinuclidinol(CAS1619-34-7):
• 14.Potassium fluoride(CAS 7789-23-3):
• 15.2-Chloroethanol(CAS107-07-3):
• 16.Dimethylamine (CAS124-40-3):
• 17.Diethyl ethylphosphonate (CAS 78-38-6);
• 18.Diethyl N,N-dimethylphosphoramidate (CAS 2404-03-7):
• 19.Diethylphosphite (CAS 762-04-9):
• 20.Dimethylamine hydrochloride(CAS506-59-2):
• 21.Ethyl phosphinyl dichloride (CAS 1498-40-4):
• 22.Ethyl phosphonyl dichloride(CAS 1066-50-8);
• 23.Ethylphosphonyl difluoride(CAS 753-98-0):
• 24.Hydrogen fluoride (CAS 7664-39-3);
• 25.Methyl benzilate (CAS 76-89-1);
• 26.Methyl phosphinyl dichloride (CAS 676-83-5);

27.N,N-Diisopropyl-(beta)-amino ethanol(CAS96-80-0);

• 28.Pinacolylalcohol(CAS464-07-3):
• 29.O-Ethyl O-2-diisopropylaminoethyl methylphosphonite (QL) (CAS57856-11-8);
• 30.Triethylphosphite(CAS122-52-1):
• 31.Arsenic trichloride (CAS 7784-34-1):
• 32.Benzilic acid (CAS 76-93-7);
• 33.Diethylmethylphosphonite (CAS 15715-41-0):
• 34.Dimethylethylphosphonate (CAS 6163-75-3):
• 35.Ethyl phosphinyl difluoride (CAS430-78-4):
• 36.Methyl phosphinyl difluoride(CAS 753-59-3):
• 37.3-Quinuclidone(CAS3731-38-2):
• 38.Phosphoruspentachloride(CAS 10026-13-8):
• 39.Pinacolone (CAS 75-97-8);
• 40.Potassium cyanide (CAS 151-50-8):
• 41.Potassium bifluoride(CAS 7789-29-9):
• 42.Ammonium hydrogen fluoride or ammonium bifluoride (CAS 1341-49-7
• 43.Sodium fluoride(CAS 7681-49-4);
• 44.Sodium bifluoride(CAS 1333-83-1):
• 45.Sodium cyanide (CAS143-33-9):
• 46.Triethanolamine(CAS102-71-6);
• 47.Phosphorus pentasulphide (CAS 1314-80-3)
• 48.Di-isopropylamine(CAS 108-18-9):
• 49.Diethylaminoethanol(CAS 100-37-8):
• 50.Sodium sulphide(CAS1313-82-2);
• 51.Sulphurmonochloride(CAS10025-67-9):
• 52.Sulphur dichloride (CAS10545-99-0);
• 53.Triethanolamine hydrochloride(CAS 637-39-8):
• 54.N.N-Disopropyl-(beta)-aminoethyl chloride hydrochloride (CAS 4261-68-1);

• 55.Methylphosphonic acid (CAS993-13-5):
• 56.Diethyl methylphosphonate(CAS683-08-9);
• 57.N,N-Dimethylaminophosphoryl dichloride(CAS 677-43-0);
• 58.Trisopropyl phosphite (CAS 116-17-6):
• 59.Ethyldiethanolamine (CAS139-87-7):
• 60.O.O-Diethylphosphorothioate(CAS 2465-65-8):
• 61.O,O-Diethyl phosphorodithioate(CAS298-06-6):
• 62.Sodium hexafluorosilicate(CAS 16893-85-9):
• 63.Methylphosphonothioic dichloride(CAS676-98-2):
• 64.Diethylamine (CAS109-89-7);
• 65.N,N-Disopropylaminoethanethiolhydrochloride (CAS 41480-755
• 66.Methyl dichlorophosphate (CAS 677-24-7);
• 67.Ethyl dichlorophosphate(CAS1498-51-7)
• 68.Methyl difluorophosphate(CAS 22382-13-4):
• 69.Ethyl difluorophosphate (CAS 460-52-6);
• 70.Diethyl chlorophosphite (CAS589-57-1);
• 71.Methyl chlorofluorophosphate (CAS 754-01-8):
• 72.Ethyl chlorofluorophosphate (CAS 762-77-6);
• 73.N.N-Dimethylformamidine(CAS 44205-42-7);
• 74.N.N-Diethylformamidine(CAS 90324-67-7);
• 75.N,N-Dipropylformamidine (CAS48044-20-8):
• 76.N,N-Diisopropylformamidine(CAS 857522-08-8);
• 77.N,N-Dimethylacetamidine(CAS2909-14-0);
• 78.N,N-Diethylacetamidine(CAS 14277-06-6);
• 79.N,N-Dipropylacetamidine(CAS 1339586-99-0):
• 80.N,N-Dimethylpropanamidine (CAS56776-14-8);
• 81.NN-Diethylpropanamidine (CAS 84764-73-8);
• 82.N,N-Dipropylpropanamidine(CAS1341496-89-6):
• 83.N,N-DimethyIbutanamidine (CAS 1340437-35-5);

• 84.N,N-Diethylbutanamidine (CAS53510-30-8):
• 85.N,N-Dipropylbutanamidine (CAS1342422-35-8):
• 86.N,N-Diisopropylbutanamidine(CAS 1315467-17-4);
• 87.N,N-Dimethylisobutanamidine (CAS321881-25-8):
• 88.N,N-Diethylisobutanamidine (CAS 1342789-47-2):
• 89.N.N-Dipropylisobutanamidine(CAS1342700-45-1):
• 90.Dipropylamine(CAS 142-84-7):

1C351

Human and animal pathogens and "toxins",as follows:

• a.Viruses,whether natural,enhanced or modified,either in the form
• ofisolated live cultures"or as material including living material which has been deliberately inoculated or contaminated with such cultures,as follows:
• I.African horse sicknessvirus;
• 2.African swine fever virus;
• 3.Andes virus;
• 4.Avian influenza virus,which are:
• a.Un-characterised;or
• b.Defined in Annex (2)ECDirective 2005/94/EC
• (O.U.L.1014.1.2006p.16)as havinghigh pathogenicity,as follows-
• I.Type Aviruseswith an VP (intravenous pathogenicity index) in 6-week-old chickens of greater than 1,2:or
• 2 Type A viruses of the subtypes H5 or H7 with genome sequences codified for multiple basic amino acids atthe cleavage site ofthe haemagglutinin molecule similar to that observed for other HPAviruses,indicating that the haemagglutinin molecule can be cleaved by a
• host ubiquitous protease;
• 5.Bluetongue virus;
• 6.Chapare virus;
• 7.Chikungunya virus;

• 8.Choclo virus,
• 9.Crimean-Congo hemorrhagic fever virus;
• 10.Dobrava-Belgrade virus;
• 11.Easterm equine encephalitis vinus;
• 12.Ebola virus:all members of the Ebolavirus genus;
• 13.Foot-and-mouth disease virus;
• 14.Goatpox virus;
• 15.Guanarito virus;
• 16.Hantaan virus;
• 17.Hendra virus (Equine morbillivirus):
• 18.Suid herpesvirus1 (Pseudorabies virus;Aujeszky's
• disease):

19. Classical swine fever virus (Hog cholera virus):

• 20.Japanese encephalitis virus;
• 21.Junin virus;
• 22.Kyasanur Forest disease virus;
• 23.Laguna Negra virus;
• 24.Lassa virus;
• 25.Louping ill virus;
• 26.Lujo virus;
• 27.Lumpy skin disease virus;
• 28.Lymphocytic choriomeningitis virus;
• 29.Machupo virus;
• 30.Marburgvirus:all members of the Marburgvirus genus;
• 31.Monkeypox virus;
• 32.Murray Valley encephalitis virus:
• 33.Newcastle disease virus;
• 34.Nipah virus;
• 35.Omsk hemorrhagic fever virus;
• 36.Oropouche virus;

• 37.Peste-des-petits-ruminants virus;
• 38.Swine vesicular disease virus;
• 39.Powassan virus;
• 40.Rabies virus and all other members of the Lyssavirus genus;
• 41.Rift Valley fever virus;
• 42.Rinderpest virus;
• 43.Rocio virus;
• 44.Sabia virus:
• 45.Seoul virus;
• 46.Sheeppox virus;
• 47.Sin Nombre virus;
• 48.SL Louis encephalitis virus;
• 49.Porcine Teschovirus;
• 50.Tick-borne encephalitis virus(Far Eastern subtype);
• 51.Variola virus;
• 52.Venezuelan equine encephalitis virus;
• 53.Vesicular stomatitis virus;
• 54.Western equine encephalitis virus;
• 55.Yellow fever virus;
• 56.Severe respiratory syndrome-related coronavirus(SARS-relatedcoronavirus);
• 57.Reconstructed 1918 influenza virus:
• 58.Middle East respiratory syndrome-related coronavirus (MERS-related coronavirus):
• b.Bacteria,whether natural,enhanced or modified,either in the form of"isolated live culturesor as material including living material which has been deliberately inoculated or contaminated with such cultures,as follows-
• 1.Bacillus anthracis;
• 2.Brucella abortus;
• 3.Brucella melitensis;

• 4.Brucella suis;
• 5.Burkholderia mallei (Pseudomonas mallei);

6. Burkholderia pseudomallei(Pseudomonas pseudomallei): 7. Chlamydia psittaci (Chlamydophila psittaci): 8. Clostridium argentinense (formerly known as Clostridium botulinum Type G)botulinum neurotoxin producing strains:

• 9.Clostridium baratibotulinum neurotoxin producing strains;
• 10.Clostridium botulinum:
• 11.Clostridium butyricum,botulinum neurotoxin producing strains:
• 12.Clostridium perfringens epsilon toxin producingtypes;
• 13.Coxiella burnetii:
• 14.Francisella tularensis;
• 15.Mycoplasma capricolum subspeciescapripneumoniae (strain F38);
• 16.Mycoplasma mycoides subspecies mycoides SC (small
• 17.Rickeltsia prowazekii;
• 18.Salmonella enterica subspecies enterica serovar Typhi (Salmonella typhi);
• 19.Shigatoxin producingEscherichiacoli (STEC)of serogroups026,045,0103,0104,0111,0121,0145,0157, and other shiga toxin producing serogroups
• 20.Shigella dysenteriae;
• 21.Vibrio cholerae;
• 22.Yersinia pestis;
• c."Toxins",as follows,and"sub-unit of toxins"thereof
• 1.Botulinum toxins;
• 2.Clostridium perfringens alpha.beta 1,beta 2.epsilon and iota toxins:
• 3.Conotoxins;

1C353

'Genetic clements'and'genetically-modified organisms'as follows:

• a.Any genetically-modified organism'which contains,or 'genetic element'that codes for,any of the following:
• 4.Ricin;
• 5.Saxitoxin:
• toxins (shiga-like toxins, verotoxins and
• 6.Shiga verocytotoxins)
• 7.Staphylococcus aureus enterotoxins,hemolysin alpha toxin, andtoxic shocksyndrome toxin (formerly known as Staphylococcus enterotoxin F):
• 8.Tetrodotoxin;
• 9.Microcystins(Cyanginosins);
• 10.Aflatoxins;
• 1l.Abrin;
• 12.Diacetoxyscirpenol;
• 13.T-2 toxin:
• 14.HT-2 toxin;
• 15.Modeccin:
• 16.Volkensin;
• 17.Viscumin(Viscum Album Lectin1):
• 18.Brevetoxins;
• 19.Gonyautoxins;
• 20.Nodularins,
• 21.Palytoxin:
• 22.Neosaxitoxin (NEO).
• d.Fungi,whether natural,enhanced or modified,either in the form of "isolated live cultures"or asmaterial including living material which has been deliberately inoculated or contaminated with such cultures,as follows:
• 1.Coccidioides immitis;
• 2.Coccidioides posadasii.

1C354

Plant pathogens,as follows:

• a.Viruses,whether naturaLenhanced or modified,either in the form of"isolated live culturesor as material including living material which has been deliberately inoculated or contaminated with such cultures,as follows:
• L.Andean potato latent virus(potato Andean latent tymovirus);
• 2.Potato spindle tuber viroid;
• b.Bacteria,whether natural,enhanced or modified,either in the form ofisolated live culturesor as material which has been deliberately inoculated orcontaminated with such cultures.as follows:
• 1.Xanthomonas albilineans;
• 2.Xanthomonas axonopodis pv.citri(Xanthomonas campestris pv.citri A) [Xanthomonas campestris pv.citri];
• 3.Xanthomonas oryzae pv.oryzae (Pseudomonas campestris pv.oryzae):
• 4.Clavibacter michiganensis subsp. sepedonicus (Corynebacterium michiganensis subsp.sepedonicum or Corynebacterium sepedonicum):
• 5.Ralstonia solanacearum,race 3,biovar 2:
• c.Fungiwhether natural,enhanced or modified,either in the form of "isolated live cultures"or as material which has been deliberately
• inoculated or contaminated with such cultures,as follows:
• 1.Any gene or genes specific to any virus specified in 1C35l(a)or1C354(a):
• 2.Any gene or genes specific to bacterium specified in IC351(c)or 1C354(b)or fungus specified in IC351(e)or 1C354(c).and which is any ofthe following:
• i. In itself or through its transcribed or translated products represents a significant hazard to human, animalor plant health;or
• Couldendow or enhance pathogenicity':or
• 3.Any toxins"specified in 1C351(d)or "sub-units of toxins"therefor.

IC450

Toxic chemicals and toxic chemical precnrsors,as follows,and "chemical mixturescontaining one or more thereof.

• a.Toxic chemicals,as follows:
• 1.Amiton O.O-Diethyl S-[2-(diethylamino)ethyl] phosphorothiolate(CAS78-53-5)and corresponding alkylated or protonated salts;
• 2.PFB:1.1,3.3,3-Pentafluoro-2-(trifluoromethyl-1-propene (CAS382-21-8);
• 3.SEEMILITARYGOODSCONTROLS for BZ:3Quinuclidinyl benzilate(CAS6581-06-2):
• 4.Phosgene:Carbonyl dichloride(CAS75-44-5);
• 5.Cyanogen chloride (CAS506-77-4):
• 6.Hydrogen cyanide (CAS 74-90-8);
• 7.Chloropicrin:Trichloronitromethane (CAS 76-06-2);
• b.Toxic chemical precursors,as follows:
• 1.Chemicals,other than those specified in the Military Goods
• Controls or in 1C350,containing a phosphorus atom to
• 1.Colletotrichum kahawae (Colletotrichum coffeanum var.
• virulans);
• 2.Cochliobolus miyabeanus (Helminthosporium oryzae);
• 3.Microcyclus ulei (syn Dothidella ulei):
• 4.Puccinia graminis ssp.graminis var.graminis/puccinia graminis ssp.graminis var. stakmanii (puccinia graminis [syn.Puccinia graminis fsp.tritici]);

5. Puccinia striiformis(syn.Puccinia glumarum): 6. Magnaporthe oryzae(Pyricularia oryzae):

• 7.Peronosclerospora philippinensis sacchari);
• 8.Sclerophthora rayssiae var.zeae;
• 9.Synchytrium endobioticium;
• 10.Tilletia indica;
• I1.Thecaphora solani
• (Peronosclerospora

1D001

• "Software" specially designed or modified for the "development"
• "production"or"use"ofequipment specified in 1B001 to 1B003.

1D002

"Software"for the "development"oforganie "matrix",metal

"Software"specially designed or modified to enable equipment to perform the funetionsofequipment specified in 1A004(e)or1A004.d.

which is bonded one methyl,ethyl or propyl (normal or

• iso)group but not further carbon atoms;
• 2.N,N-Dialkyl [methyl,ethyl or propyl (normal or iso)] phosphoramidic dihalides,other than N.NDimethylaminophosphoryl dichloride:
• 3.Dialkyl [methyl.ethyl or propyl (normal or iso)] N,Ndialkyl[methyl.ethyl or propyl (normalor iso)]phosphoramidates, other than Diethyl-N.Ndimethylphosphoramidate whichis specified in IC350;
• 4.N.N-Dialkyl[methyl,ethyl or propyl (normal or iso)] aminoethyl-2-chloridesand correspondingprotonated salts,otherthan N,N-Diisopropyl-(beta)-aminoethyl chloride or N.N-Diisopropyl-(beta)-aminoethyl chloride hydrochloride which are specified in 1C350;
• 5.N,N-Dialkyl [methyl.ethyl or propyl (normal or iso)] aminoethane-2-ols and corresponding protonated salts. other than N,N-Disopropyl-(beta)-aminoethanol (CAS 96which are specified in 1C350:
• 6.N,N-Dialkyl [methyl,ethyl or propyl (normal or iso)] aminoethane-2-thiols and corresponding protonated salts, otherthan N,N-Diisopropyl-(beta)-aminoethane thiol (CAS 5842-07-9)and N,N-Disopropylaminocthanethiol hydrochloride(CAS 41480-75-5)which are specified in 1C350:
• 7.See 1C350 for ethyldiethanolamine (CAS139-87-7):
• 8.Methyldiethanolamine(CAS 105-59-9).
• ID Sofrware

1D101

"Software"specially designed or modified for the operation or

maintenance ofgoods specified in 1B101,1B102,1B115,1B117,1B118 or1B119.

1D103

"Software"specially designed for analysis ofreduced observables such as radar refleetivity.ultravioletinfrared signatures and acoustic signatures.

1D201

"Software" specially designed for the "use"of goods specified in

IE Technology

1B201.

1E001

• "Technologyaecording to the General Technology Note for the "development"or"produetion"ofequipment or materials specified in 1A002to1A005,1A006(b).1A007,1Bor1C.

1E002

Other"technology"as follows:

• a. "Technology"forthe "developmen"or"production"of

2. polybenzothiazolesorpolybenzoxazoles;

• b. "Technology" forthe"development"or"production"of fluoroelastomer compounds containing at least one vinylether

4. monomer, 5. "Technology"for the design or "production"of the following 6. ceramic powders or non-"compositeceramic materials: 7. 1.Ceramic powders having all of the following: 8. aAny of the following compositions: 1. Single or complex oxides of zirconium and 10. complexoxides ofsilicon or aluminium: 11. Single nitrides of boron (cubic crystalline 2. forms): 3. Single or complex carbides of silicon or 14. 4. 15. boron:or 16. Single or complex nitrides of silicon;

1E101

"Technology"according to the General Technology Note for the"use" ofg00ds specified in 1A102,1B001,1B101,1B102,1B115 to 1B119, 1C001,1C101,1C107,1C111 to1C118,1D101orID103.

1E102

• "Technology"according to the General Technology Note for the "development"of"software"specified in 1D001,1D101 or ID103.

1E103

• "Technology"for theregulation of temperature,pressure or
• atmosphere in autoclaves or hydroclaves, when usedfor the
• b.Any of the following total metallic impurities

(excluding intentional additions):

• Less than 1,oo0 ppm for single oxides or
• carbides;or
• Lessthan5,000ppm for complex compounds or single nitrides;and

c.Being any of the following:

1. Zirconia (CAS 1314-23-4)with an average particle sizc equal to or lessthanl μm and no more than 10% of the particles larger than5μm:or 2. Other ceramic powders with an average particle size equal to or less than5μm and no more than 10%of the particles larger than 10μm: 3. 2.Non-"composite"ceramic materials composed of the 4. materials specified in 1E002(c)l.: 5. d."Technology"for the installation,maintenance or repair of 6. materials specified in-1C001; 7. "Technology"for therepairof"composite"structures,laminates or materials specified in 1A002 or 1C007.c.: 8. "Librariesspecially designed or modified to enable equipment to perform the functions of equipment specified in lA0o4(c)or 1A004(d).

1E104

"Technology"for the"produetionof pyrolytically derived materials formed on a mould,mandrelor other substrate from precursor gases which decompose in the 1573 K(1.300C)to 3173 K(2.900C) temperature range atpressures of130 Pa to 20 kPa for the composition ofprecursor gases,flow-rates and process control schedulesandparameters.

1E201

"Technology"according to the General Technology Note for the "use" ofg00ds specified in 1A002,1A007,1A202,1A225 to 1A227,1B201, 1B225to1B234,1C002(b)3.or(b)4.,1C010.b,1C202,1C210,1C216, 1C225to1C241or1D201.

1E202

"Technologyaccording to the General Technology Note for the "development"or"production"of goods specified in1A007,1A202or 1A225to1A227.

1E203

• "Technology"according to the General Technology Note for the

CATEGORY2:MATERIALSPROCESSING

2A Systems,Equipment and Components

2A001

Anti-friction bearings and bearing systems,(excluding control balls with tolerances specified by the manufacturer in accordance with ISO 3290:2001 as grade G5(or national equivalents) as follows,and components therefor:

• Ball bearings and solid roller bearings,having all tolerances specified bythe manufacturer in accordancewith ISO 492 Tolerance Class 4 or Class 2(or national equivalents),or better, and having bothrings'and'rolling elements',made from monel or beryllium:
• 2.

2A101

Radial ball bearings,other than those specified in 2Aoo1,having all tolerances specified in accordance with ISO 492 Tolerance Class 2 (or ANSl/ABMA Std 20Tolerance ClassABEC-9orother national equivalents).or better and having all of the following characteristies:

• 1.An inner ring bore diameterbetween 12mm and S0 mm;
• 2.Anouter ring outside diameter between 25mm and 100 mm:and
• 3.Awidth between 10 mm and20 mm.

2A225

Crucibles made of materiais resistant to liquid actinide metals,as follows:

• aCrucibleshaving both of the following characteristics:
• 1)Avolume ofbetween150 cm3and8000 cm3:and
• 2)Made of or coated with any of the following materials,orcombinationof the following
• a.Materials with flux densities of 2.0 T or greater and yield
• strengths greater than 414 MPa;
• b.All-electromagnetic 3D homopolar bias designs for
• c.High temperature (450 K(177C)and above)position
• sensors.

2A226

Valves havingall of the following characteristies:

• a)A'nominal size'of 5 mm or greater and for valveswith different inlet and outlet diameters,the'nominal size'refers
• to the smallest diameter,
• b)Having a bellows seal;and
• c)Wholly made ofor lined with aluminium,aluminium alloy. nickel,or nickel alloy containing more than 60%nickel by
• weight.

materials,having an overall impurity level of2% or less by weight:

• a)Calcium fluoride (CaF2):
• b)Calciumzirconate (metazirconate) (CaZrO3):
• c)Cerium sulphide (Ce2S3):
• d)Erbium oxide(erbia)(Er203):
• c)Hafnium oxide (hafnia)(HfO2):
• f)Magnesium oxide (MgO):
• g)Nitrided niobium-titanium-tungsten alloy (approximately 50% Nb,30%Ti 20%):
• h)Yurium oxide(yttria)(Y2O3):or
• i)Zirconium oxide (zirconia)(ZrO2):

b.Crucibles havingboth of the following characteristics:

• 1)Avolumeofbetween 50cm3and2000 cm3:and
• 2)Made of or lined with tantalum,having a purity of99.9%or greater by weight:

c.Crucibles having allof the following characteristics:

• 1)A volume ofbetween 50 cm3 and2.000cm3:
• 2)Made of or lined with tantalum,having a purity of
• 98%orgreaterby weight:and
• 3)Coated with tantalum carbide,nitride,boride,or any
• combination thereof.

2B001

Machine tools and any combination thereof,for removing (or cutting) metals,ceramicsor composites",which,according to the manufacturer's technieal specification,can be equipped with electronic devices for"numerical control",as follows:

• a)Machine tools for turning having two or more axes which can be coordinated simultaneously for"contouring control
• having any ofthe following:
• 1)"Unidirectional positioning repeatabilityequal to orless (better) than 0.9μm along one or more linear axis with a travel length less than 1.0 m;or
• 2)"Unidirectional positioning repeatability"equal to
• orless(better)than 1.lμm alongone or more linear axiswith a travel length equal to or greater than 1.0 m;
• b) Machine tools for milling having any ofthe following:
• 1)Three linear axes plus one rotary axis which can be coordinated simultaneously for"contouring control
• having any ofthe following:
• a)"Unidirectionalpositioningrepeatability"
• equal to or less(better)than 0.9 μm along one or more linear axis with a travel length less than 1.0 m;or
• b)"Unidirectionalpositioningrepeatability equal to or less (better) than l.1 μm along one or more linear axis with a travel length
• equal to orgreater than l.0m:
• 2)Fiveor more axeswhich can be coordinated simultaneously for"contouring controlhaving any of the following:
• a)"Unidirectional positioningrepeatability" equal to or less (better) than 0.9 μm along one or more linear axis with a travel length
• less than1.0m;
• equal to or less (better) than 1.4 μm along one or more linear axis with a travel length

2B Test,Inspection and Production Equpment

• cqual to or greater thanI m and less than 4m.or
• c)"Unidirectionalpositioningrepeatability" equal to or less(better)than 6.0μm(along one or more linear axis with a travel length equal to orgreater than 4m;
• 3)A "unidirectional positioning repeatability"for jig boring machines,equal to or less (better)than I,l μm along
• one or more linear axis:or
• 4)Fly cutting machines having all of the following:
• a)Spindle "run-out"and"camming"less
• (better)than 0.0004 mm TIR:and
• b)Angular deviation of slide movement (yaw. pitch and roll) less(better)than2seconds of arc.T1Rover300 mm oftravel:

c.Machine tools for grinding having any ofthe following:

• 1.Having allofthe following:
• a)"Unidirectionalpositioning repeatability
• equal to or less (better) than I.l μm along one or more linear axis:and
• b)Three or four axes which can be coordinated simultaneously for"contouringcontrol":or
• 2)Five ormore axeswhich can becoordinated simultaneously forcontouring controlhaving any of the following:
• a)"Unidirectionalpositioning repeatability" equal to or less (better) than 1.1 μm along one or more linear axis with a travel length lessthanIm;
• b)"Unidirectional positioningrepeatability"
• equal to or less (better) than 1.4 μm along one or more linear axis with a travel length equal to or greater than Im and less than4 mor
• "Unidirectional positioningrepeatability
• equal to or less (better) than 6.0 μm along

one or more linear axis with a travel length cqual to or greater than 4 m.

• d.Electrical discharge machines (EDM)of the non-wire type which have two or more rotary axes which can be coordinated simultaneously for"contouring control";
• e.Machine tools for removing metals,ceramics or"composites" having all ofthefollowing:
• 1.Removing material by means of any of the following:
• a.Water or other liquid jets,including those employing abrasive additives:
• b.Electron beam:or
• c."Laser"beam:and
• 2.At least two rotary axes having all ofthe following:
• a.Canbecoordinated simultaneouslyfor "contouring control';and
• b.A positioning "accuracy"of less (better) than 0.003°,
• f.Deep-hole-drilling machines and tuming machines modified for deep-hole-drilling.having a maximum depth-of-bore capability
• exceeding5m.

Numerieally controlled optical finishing machine tools equipped for selective materialremoval to produce non-spherieal optieal surfaces having all of the followingcharacteristics:

• aFinishing the form to less(better)than 1.0 μm;
• b.Finishing to a roughness less (better) than lo0 nm rms.
• c.Fourormore axeswhichcanbecoordinated
• simultaneously for"contouring control';and

Using any of the following processes:

• 1.Magnetorheological finishing(MRF);

2. Electrorheological finishing(ERF');

• 3.
• 'Energetic particle beam-finishing':
• 4.Tnflatable membrane tool finishing:or
• 5.'Fluid jet finishing'

2B003

Numerically controlledl machine tools,specially designed for the shaving.finishing.grinding or honing of hardened (Rc=40 or more) spur,helieal and double-helieal gears having all of the following:

• a.Apitch diameter exceeding1.250 mm;
• b.A face width of15%of pitch diameter or larger:and
• c.A finished quality ofAGMA 14or betlter (equivalent to ISO1328class3).

2B004

Hot "isostatie presses"having all of the following.and specially designed components and accessories therefor:

• a.Acontrolled thermal environment within the closed cavity anda chamber cavity with an inside diameterof406 mm or more:and
• b.Having any of the following.
• 1.Amaximum working pressure exceeding 207 MPa;
• 2.A controlled thermalenvironment exceeding 1.773 K(1.500°C):or
• 3.Afacility forhydrocarbon impregnation and removal ofresultant gaseous degradation products.

2B005

Equipment specially designed for the deposition,processing and in-

process control ofinorganic overlays,coatingsand surface modifications,as follows,for substrates specified in column 2,by processes shown in column 1in the Table following 2Eo03(f) and specially designed automated handling.positioning.manipulation and controlcomponents therefor:

• a.Chemical vapour deposition (CVD)production equipment having all of the following:
• 1.A processmodified for one ofthe following:
• a.PulsatingCVD:
• b.Controlled mucleation thermal deposition (CNTD):or
• c.Plasma enhanced or plasma assisted CVD;
• and

2.Having any of the following:

• a Incorporating high vacuum (equal to or less than 0.01 Pa)rotating seals;or
• b.Incorporatingin situ coating thickness
• control:
• b.lon implantation production equipment having beam currents of
• 5mAormore;
• c.Electron beam physical vapour deposition(EB-PVD)production equipment incorporatingpower systemsrated forover 80kW and having any ofthe following:
• 1.A liquid pool level "lasercontrol system which regulates precisely the ingots feed rate;or
• 2.A computer controlled rate monitor operating on the principle of photo-luminescence of the ionised aloms in the evaporant stream to control the depositionrate ofa coating containing two or more
• elements;
• d
• following-

1. Operatingat reduced pressurecontrolled atmosphere (equal to or less than l0 kPa measured above and within 300 mm ofthegun nozzle exit) in a vacuum chamber capable ofevacuation down to 0.01 Pa prior to the spraying process;or

• 2.Incorporating in situ coating thickness control:
• e.Sputter deposition production cquipment capable of current densitiesof0.1mA/mm2orhigherala deposition rateof15um/h
• ormore;
• f.Cathodic arc deposition production equipment incorporatinga gridofelectromagnets for steering controlof the arc spot on the
• cathode;
• g.lon plating production equipment capable of the in situ measurement of any of the following:
• 1.Coating thickness on the substrate and rate control:
• or
• 2.Optical characteristics.

2B006

Dimensional inspection or measuring systems,equipment, position feedback units and "electronic assemblies,as follows:

• aComputer controlled or"numerical controlled"Coordinate Measuring Machines (CMM).having a three dimensional (volumetric)maximumpermissibleerroroflength measurement (Eo,MPE) at any point within the operating range of the machine (ie.,within the length ofaxes)equal toor less(better)than (l.7+L/1000)μm (Listhe measured length in mm).according to ISO 10360-2:2009;
• b. Linear displacement measuring instruments or systems, linear position feedback units,and "electronic assemblies as follows:
• 1.Non-contact type measuring systemswith a "resolutionequal to or less (better) than 0.2 μm within0 to0.2mm ofthe'measuringrange';
• 2.Linear position feedback units specially designed for machine tools and having an overall "accuracy less(better)than(800 +(600xL/1,000))nm(L equals effective length in mm);
• 3.Measuring systems having all of the following:
• a.Containing a"laser:
• b.Aresolutionover their full scale of0.200 nm or less(better):and
• Capableof achieving a "measurement uncertaintyequal to orless(better) than (1,6+L/2.000)nm (Listhe measured length in mm)at any point within a measuring range,when compensated for the refractive index ofair and measured over a period of 30 seconds at a temperature of 20±0,01°C;or
• 4."Electronic assemblies"specially designed to provide feedback capability in systems specified in 2B006(b)x(3):

c.Rotary position feedback units specially designed for machine tools or angular displacement measuring instruments,having an second of arc;

2B007

• "Robots"having any of the following characteristies and specially designed controllers and"end-effectors"therefor:
• b.Specially designed to comply with national safety standards applicable to potentially explosive munitions environments:
• c.Specially designed or rated as radiation-hardened to withstand a totalradiation dose greater than 5x 103 Gy (silicon)without operational degradation;or
• d.Specially designed to operate at altitudes exceeding30.000 m.

'Compound rotary tables'and"tilting spindles",specially designed for machine tools,as follows:

• c.'Compound rotary tables'having all of the following:
• 1.Designed for machine tools for turning.milling or grinding:and
• 2.Tworotaryaxes designedto becoordinated simultaneously for contouring controll;
• d"Titing spindles"having all ofthe following:
• 1.Designed for machine tools for turning.milling or
• grinding:and
• 2.Designedtobe coordinatedsimultaneouslyfor
• "contouringcontrol".

2B009

Spin-forming machines and fow-formingmachines,which,according to the manufacturer's technical specification,can be cquipped with "numerical control"units ora computer control and havingall of the

following:

• aThree or more axes which can be coordinated simutaneously for"contouring control:and
• b.A roller force more than 60 kN.
• d.Equipment for measuring surface roughness(including surface defects)by measuring optical scatter with a sensitivity of
• 0.5nm or less (better).

2B104

"Isostatie presses,other than those specified in 2B004,having all of the following:

• a.Maximum working pressure of69 MPa or greater.
• b.Designed to achieve and maintain a controlled thernal environment of873K(600C)orgreater.and
• c.Possessing a chamber cavity with an inside diameter of254 mm orgreater.

2B105

Chemical vapour deposition (CVD) furnaces,other than those specified in 2B005(a) designed or modified for the densifieation of carbon-carbon composites.

2B109

Flow-forming machines,other than those speeified in 2Boo9,usable in the "produetion"of propulsion components and equipment (e.g. motor cases and interstages) for "missiles",and specially designed components as follows:

• a.Flow-forming machines having all ofthe following:
• 1.Equipped with,or,according to the manufacturer's
• technical specification,are capable ofbeing computer control:and
• 2.More than two axes which can be coordinated simultaneously for"contouring control"
• b.Specialy designed components for flow-forming machines specified in2B009 or2B109(a).

2B116

Vibration test systems,equipment and components therefor,as follows:

• a.Vibration test systems employing feedback or closed loop
• techniques and incorporating a digital controller',capable ofvibrating a system at an acceleration equal to or greater than 10g rms between 20 Hz and 2kHz while imparting forcesequal to or greater than 50kN,measured bare table
• Digital controllers,combined with speciallydesigned
• vibration test software,with a'real-time control bandwidth

2B117

Equipment and process controls,other than those specified in 2Bo04, 2B005a.2B104 or 2B105,designed ormodified fordensifieation and pyrolysis of structuralcomposite rocket nozzles and re-entry vehiele nose tips.

2B119

Balancing machines and related equipment,as follows:

• a.Balancingmachines having allofthefollowing
• characteristics:
• 1.Not capable of balancing rotors/assemblies having a
• mass greater than 3 kg:
• Capable of balancing rotors/assemblies at speeds
• greater than12,500rpm;
• 3.Capable of correcting unbalance in two planes or
• more;and
• 4.Capableofbalancing toaresidualspecific
• unbalance of0.2gmmperkgof rotor mass;

b.Indicator heads designed or modified for use with machines specified in 2B119a

2B120

Motion simulators or rate tables having all of the following characteristies:

• a.Two or more axes

greater than 5 kHz designed for use with vibration test

systems specified in 2B1l6.a

• Vibrationthrusters-(shaker units).with or without associated amplifiers,capable of imparting a force equal to or greater than 50 kN,measuredbare table'.and usable in vibration test systems specified in 2B116.a:
• d.Test piece support structures and electronic units designed
• to combine multiple shaker units in a system capable of providingan effective combined force equal toorgreater than 50 kN,measuredbare table'and usable in vibration systems specified in 2B116a.

2B121

Positioning tables (equipment eapable ofprecise rotary positioning in any axes),other than those speeified in 2B120,having all of the followingcharacteristies:

• a.Two or more axes;and
• b.Apositioning"accuracy"equal to or less (better) than
• 5arc second.

2B122

Centrifuges capable ofimpartingaccelerations greater than 10g and designed or modified to incorporate slip rings or integrated noncontaet devices capable of transferring electrical power,signal information,or both.

2B201

Machine tools and any combination thereof,other than those specified

in 2B0ol,as follows,for removing or cutting metals,ceramics or "composites",which,according to the manufacturer's technical specifieation,canbeequippedwithelectronie devicesfor simultaneous"contouring control" in two or more axes:

• a.Machine tools for milling.having any of the following
• characteristics:
• b.Designed or modifiedtoincorporate slip rings or
• integratednon-contact devices capable of transferring electrical power.signal information,or both:and
• c.Having any ofthe following characteristics:
• 1.For any single axis having all of the following:
• Capable ofrates of400 degrees/s or more, or30 degrees/s or less;and
• b.A rate resolution equal to or less than 6 degrees/sand an accuracy cqual to or less than 0.6 degrees/s;
• 2.Having a worst-caserate stability equal to or better(less)
• than plus orminus 0.05% averaged over I0 degreesor more,or
• 3.A positioning"accuracy"equal to or less (better) than 5
• arc-second.

• 1.Positioning accuracies with "all compensations availableequal to orless (better)than6 μm accordingtoISO230-2:19881(7)ornational equivalents along any linear axis:
• 2.Two or more contouring rotary axes;or
• 3.Five or more axes which can be coordinated
• simulaneously for"contouring control":
• b.Machine tools for grinding,having any of the following characteristics:
• 1.Positioning accuracies with "all compensations availableequal to or less (better)than 4μm according toISO 2302:1988l(7) or national equivalents along any linear axis:
• 2.Two or more contouringrotary axes,or
• 3.Five or more axes which can be coordinated
• simultaneously for"contouring control":
• c.Machine tools for turning. that have positioning accuracies with "all compensations availablebetter(less) than 6 μm according to ISO 230-2:1988(7)along any linear axis (overall positioning)for machines capable of machining diameters greater than 35 mm; manufacturers calculating positioning accuracy in accordance with ISO230-2:1997 or2006 shouldconsul the competent authorities ofthe Member State in which they are established;
• 1.Two or more contouring rotary axes.

2B204

"Isostatic presses,other than those specified in 2B004or 2B104,and related equipment,as follows:

• a"Isostaticpresses" having bothofthe following characteristics:
• 1.Capable of achieving a maximum working pressure of69 MPa or greater;and
• 2.A chamber cavity with an inside diameter in excess
• of152mm:
• b.Dies,moulds and controls,specially designed for "isostatic presses"specified in 2B204(a).

2B206

Dimensional inspection machines,instruments or systems,other than those specified in 2B006,as follows:

• a.Computer controlled ornumerically controlled coordinate measuring machines (CMM) having either ofthe following
• characteristics:
• 1.Having only two axes and having a maximum permissible error of length measurement along any axis(one dimensional).identifiedasany combination ofEOx.MPE,EOy.MPE,or EOz,MPE. equal to orless(better)than (1.25+L/1,000)μm (where L is the measured length in mm) at any point within the operating range of the machine (i.e., within the length of the axis).according to ISO 10360-2:2009:or
• Three or more axes and having a three dimensional (volumetric)maximum permissible error of length measurement (Eo.MPE)equal to or less (better) than (1.7+L/800)μm (where Lis the measured length in mm) at any point within the operating range of the machine (ie.,within the length of the axis),according toISO 10360-2:2009;

b.Systemsfor simultaneouslinear-angularinspectionof hemishells,havingboth of the following characteristics:

• 1."Measurement uncertainty"along any linear axis
• equal to or less (better) than 3.5 μm per 5mm;and
• 2.Angular position deviationequal to or less than 0.020,
• c.Linear displacement'measuring systems having all of the following characteristics:
• 1.Containing a"laser";and
• Capable of maintaining, for at least 12 hours,at a
• temperature of±1K(±1C)):aroundastandard temperature and standard pressure, allof the following:
• a.A'resolution'over their full scale ofo.l μm
• orbetter;and

2B207

"Robots","end-effectors"and control units,other than those specified in 2B007,asfollows:

• "Robots"or"end-effectorsspecially designed to comply with national safety standards applicable to handling high explosives (for example,meeting electrical code ratings for highexplosives):
• b.Control units specially designed for any of the"Robots"or
• "end-effectors"specified in 2B207(a)

2B209

Flow forming machines,spin forming machines capable of flow forming functions,other than those specified in 2B009 or 2B109,and mandrels,as follows:

• aMachines having both ofthe following characteristics:
• 1.Three or more rollers (active or guiding);
• Which,according to the manufacturer's technical specification,can be equipped with numerical controlunits or a computer control;and Which have only a single roller designed to deform metal plus two auxiliaryrollerswhich support the mandrelbut do not participate directly in the deformation process;
• b.With a"measurement uncertainty"equal toor better(less)than(0.2+L/2.000)μm (L is the measured length in mm):

d.Linear variable differential transformer (LVDT)systems;

• 1.Having the following characteristics:
• "Linearity"equal to or less (better) than
• 0.1% measured from 0 to the full operating range,for LVDTs with an operating range upto5mm:or
• b."Linearityequal to or less (better) than 0.1%measured from0to 5mm forLVDTs with an operating range greater than 5mm; and
• 2.Drift equal to or better (less) than 0.1%per day at a standard ambient testroom temperature ±1K(±1°C).

• b.Rotor-forming mandrels designed to form cylindricalrotors of inside diameterbetween 75mm and 650 mm.

2B219

Centrifugal multiplane balancingmachines,fixed or portable,

horizontalor vertieal,as follows:

• a.Centrifugal balancing machines designed for balancing flexible rotors havinga length of600 mm or more and
• havingall ofthe following characteristics:
• 1.Swingorjoumal diameter greater than 75 mm;
• 2.Mass capability of from 0.9 to 23 kg:and
• 3.Capable of balancing speed ofrevolution greater than5.000 r.p.m.:
• b.Centrifugal balancing machines designed for balancing hollow cylindrical rotor components and having all of the following characteristics:
• 1.Journal diameter greater than 75 mm;
• 2.Mass capability of from 0.9 to 23 kg:
• 3.A minimum achievable residual specific unbalance cqual to or less than 10g mm/kgperplane;and
• 4.Belt drive type.

2B225

Remote manipulators that can be used to provide remote actions in radiochemical separation operations or hot cells,having either of the followingcharacteristies:

• a.A capability ofpenetrating 0.6m or more of hot cell wall

2B226

• (through-the-wall operation):or
• b.A capability of bridging over the top of a hot cell wall with a thickness of0.6 m or more(over-the-wall operation).

Controlled atmosphere (vacuum or inert gas) induction furnaces,

other than those specified in 9Bo01 and 3B00l,and power supplies therefor,asfollows:

• a.Funaces having allofthe following characteristics:
• 1.Capable of operation above 1,123K(850°C):

2B227

Vacuum or other controlled atmosphere metallurgical melting and casting furnaces and related cquipment as follows:

• a.Arc remel furnaces,arc mel fumaces and arc melt and castingfurmaces having both ofthe following characteristics:
• 1.Consumable electrode capacities between1.000
• cm3and20.000cm3:and

2. Capable of operating with melting tempcratures above1.973K(1,700oC):

b.Electron beam melting furnaces,plasma atomization furmaces and plasma melting furnaces,having both of the following characteristics:

• 1.Apower of 50kWorgreater:and
• 2.Capable of operatingwithmelting temperatures
• above1,473K(1,200oC):
• c.Computer control and monitoring systems specially configured for any ofthe furmaces specified in2B227(a)or 2B227(b);
• d.Plasma torches specially designed for furnaces specified in 2B227(b) having both ofthe following characteristics:
• 1.Operating at a power greater than 50 kW;and
• 2.Capable ofoperating above 1473K(1.200oC):
• e.Electron beam guns specially designed for the furnaces specified

2B228

Rotor fabrieation orassembly equipment,rotor straightening equipment,bellows-forming mandrels and dies,as follows:

• aRotor assembly equipment including precision mandrels. clamps.and shrink fit machines for assembly of gas centrifuge rotor tube sections,baffles,and end caps;
• 2.Induction coils 600 mm or less in diameter.and
• 3.Designed forpower inputsof 5 kWor more:

b.Power supplies,with a specified power output of 5 kWormore, specially designed for furnaces specified in 2B226(a).

2B230

All types of 'pressure transducers'capable ofmeasuring absolute pressures and having all of the following:

• a.Pressure sensing elements made of or protected by
• aluminium,aluminium alloy.aluminum oxide (alumina or sapphire),nickel,nickel alloy with more than 60% nickel by weight,or fully fluorinated hydrocarbon polymers;
• b.Seals,if any,essential for sealing the pressure sensing
• clement,and in direct contact with the process medium, made of or protected by aluminium,aluminium alloy, aluminum oxide (alumina or sapphire).nickel,nickelalloy with more than 60% nickel by weight,or fully fluorinated hydrocarbon polymers;and Having either of the following characteristics:
• 1.A full scale of less than 13 kPa and anaccuracyof
• better than 1%of full-scale:or
• 2A full scale of13 kPa or greater and anaccuracy'of better than 130 Pa when measured at 13 kPa.

2B231

Vacuum pumps having all of the following characteristies:

• a.Input throat size equal to or greater than 380 mm;
• b.Pumping speed equal to or greater than 15m3/s determined
• at the measurement point with nitrogen gas or air;and
• b.Rotor straightening equipment for alignment of gas
• centrifuge rotor tube sections to a common axis;
• Bellows-forming mandrels and dies for producing singleconvolution bellows having allofthe following characteristics:
• 1:Inside diameter between 75mm and 650mm;
• 2.Length equal to or greater than 12.7mm,
• 3.Single convolution depth greater than 2 mm;and
• 4.Made of high-strength aluminium alloys,maraging
• steel or high strength "fibrous or filamentary materials".

2B232

High-velocity gun systems (propellant,gas,coil,electromagnetic,and electrothermal types,andotheradvanced systems) capable of accelerating projectiles to1.5km/s or greater.

2B233

Bellows-sealed seroll-type compressors and bellows-sealed scroll-type vaeuum pumps havingall of the following:

• a.Capable of an inlet volume flow rate of 50m3/h or greater:
• b.Capable ofa pressure ratio of2:l or greater:and
• C.Having all surfaces that come in contact with the process gas made from any of the following materials:
• 1.Aluminium or aluminium alloy:
• 2.Aluminium oxide;
• 3.Stainless steel;
• 4.Nickelor nickel alloy;
• 5.Phosphor bronze;or
• 6.Fluoropolymers.

2B350

Chemical manufacturing facilities,equipment and components,as follows:

• a.Reaction vessels or reactors,with or without agitators.with total internal (geometric)volume greater than 0.1 m3 (100 liters)andlessthan 20m3(20.000 liters).where all surfaces that come in direct contact with the chemical(s) being processed or contained are made from any ofthe followingmaterials:
• 1.Alloys'with more than 25%nickeland 20% chromium by weight:
• 2.Fluoropolymers (polymericor elastomeric materials with more than 35% fluorine by weight);
• Capable ofproducing an ultimate vacuum better than 13 mPa determined at the input of the pump with the input of the pump blocked off.

• 3.Glass (including vitrified or enamelled coating
• orglasslining):
• 4.Nickel oralloys'with more than 40% nickel by weight;
• 5.Tantalum or tantalum 'alloys'
• 6.Titanium or titanium'alloys";
• 7.Zirconium or zirconium'alloys;or
• 8.Niobium (columbium)or niobium'alloys':

b.Agitators designed for use in reaction vessels or reactors

specified in 2B350.a.:and impellers,blades or shafts designed for such agitators,where all surfaces of the agitator that come in direct contact with the chemical(s) being processed or contained are made from any of the following materials:

• 1.Alloys'with more than 25%nickeland 20% chromium by weight;
• Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight):
• 3.Glass (including vitrified or enamelled coatings or
• glasslining);
• Nickel or alloyswith more than 40% nickel by 4. weight;
• 5.Tantalum or tantalum'alloys';
• 6.Titanium or titanium'alloys:
• 7.Zirconium or zirconium'alloys:or
• 8.Niobium(columbium) or niobium'alloys':
• c.Storage tanks,containers or receivers with a total intemal (geometric)volume greater than 0.1m2(1o0 liters)where all surfaces that come in direct contact with the chemical(s) being processed or contained are made from any of the following materials:
• 1.'Alloys'with more than 25%nickeland 20% chromium by weight;
• 2.Fluoropolymers (polymeric or elastomeric materials with more than 35% fluorine by weight):

• 3.Glass (including vitrified or enamelled coatings orglass lining);
• 4.Nickel or alloys'with more than 40% nickel by weight;
• S.Tantalum or tantalum'alloys
• 6.Titanium or titanium'alloys;
• 7.Zirconium or zirconium'alloys';or
• 8.Niobium (columbium)orniobiumalloys:
• d.Heat exchangers or condensers with a heat transfer surface area greater than 0.15 m2,and less than 20 m2:and tubes,plates,coils or blocks(cores) designed for such heat exchangers or condensers, where all surfaces that come in direct contact with thc chemical(s) being processed are made from any ofthe following materials:
• L.'Alloys'with more than 25%nickeland 20% chromium by weight:
• 2.Fluoropolymers(polymeric orelastomeric materials
• with more than 35% fluorine by weight):
• 3.Glass (including vitrified or enamelled coatings or
• glass lining);
• 4.Graphite or'carbon graphite:
• 5.Nickel oralloyswith more than 40% nickel by
• weight;
• 6.Tantalum or tantalum'alloys':
• 7.Titanium or titanium'alloys;
• 8.Zirconium or zirconium'alloys:
• 9.Silicon carbide;
• 10.Titanium carbide:or
• 11.Niobium (columbium)or niobium'alloys;
• c.Distillation or absorption columns of internal diamcter greater than O.1 m;and liquid distributors,vapour distributors or liquid collectors designed for such distillation or absorption columns, where all surfaces that come in direct contact with the chemicals) beingprocessed are made from any of the followingmaterials:

• 1.Alloys'with more than 25%nickel and 20%
• chromium by weight:
• 2.Fluoropolymers (polymeric orelastomeric materials
• with more than35% fluorine by weight);
• 3.Glass (including vitrified or enamelled coatings or
• glass lining);
• 4.Graphite or'carbon graphite'
• 5.Nickel oralloys'with more than 40%nickel by
• weight;
• 6.Tantalum or tantalum 'alloys':
• 7.Titanium or titanium'alloys':
• 8.Zirconium or zirconium'alloys:or
• 9.Niobium (columbium) orniobium 'alloys':
• f.Remotely operated filling equipment in which all surfaces that
• come in direct contact with the chemical(s) being processed are made from any ofthe following materials:
• 1.'Alloys'withmore than 25%nickeland 20%
• chromium by weight;or
• 2.Nickel oralloys'with more than 40%nickel by
• weight;
• g.Valves and components,as follows:
• 1.Valves,having both of the following:
• a.A'nominal size'greater than DN I0 or NPS
• 3/8;and
• b.All surfaces that come in direct contact with the chemical(s)being produced,processed, orcontainedaremade fromcorrosion
• resistant materials':
• 2.Valves,other than those specified in 2B350.g.1.,having
• allofthe following:
• aAnominal size'equal to or greater than DN 25or NPS1and equal to or less than DN 100prNPS:
• Casings (valve bodies)or preformed casing liners:

• c.A closure element designed to be interchangeable;and
• d.All surfaces of the casing (valve body)or preformed case liner that come in direct contact with the chemical(s) being produced, processed,or contained are made from 'corrosion resistant materials';
• 3.Components,designed for valves specified in 2B350.g.l. or 2B350.g.2.,in which all surfaces that come in direct contact with the chemical(s) being produced,processed,or contained are made from corrosion resistani materials',as follows:
• a.Casing (valve bodies);
• b.Performed casing liners;
• hMuli-walled piping incorporating a leak detection por,in which all surfaces that come in direct contact with the chemical(s) being processed or contained are made from any of the following materials:
• 1.'Alloys'with more than 25% nickeland 20% chromium by weight:
• Elastomeric MaterialsWith More Than 35% Fluorine by
• Fluoropolvmers (Polymeric Or weight);
• 3.Glass (including vitrified or enamelled coatings or glasslining):
• 4.Graphite or'carbongraphite':
• 5.Nickel oralloys'with more than 40% nickel by
• 6.Tantalum or tantalum'alloys:
• 7.Titanium or titanium 'alloys';
• 8.Zirconium or zirconium'alloys'or
• 9.Niobium (columbium) or niobium'alloys;
• LMultiple-seal and seal-less pumps,with manufacturer's specified maximum flow-rate greater than 0.6 m3/hour,or vacuum pumps with manufacturer's specified maximum flow-rate greater than 5 m3/hour(under standard temperature (273K(0oC))and pressure

(101.3 kPa)conditions).other than those specified in 2B233:and casings (pump bodies),preformed casing liners,impellers,rotors or jet pump nozzles designed for such pumps,in which all surfaces that come in direct contact with the chemical(s) being processed are made from any ofthe following materials:

• 1.'Alloys'with more than 25%nickeland 20% chromium by weight;
• 2.Ceramics;
• 3.Ferrosilicon (high silicon iron alloys);
• Fluoropolymers(polymeric or elastomeric materials with more than 35%fluorine by weight);
• 5.Glass (including vitrified or enamelled coatings or glass lining);
• 6.Graphite or'carbon graphite';
• 7.Nickel oralloys'with more than 40%nickel by weight;
• 8.Tantalum or tantalum 'alloys'
• 9.Titanium or titanium'alloys';
• 10.Zirconium or zirconium'alloys;or
• 11.Niobium (columbium) or niobium'alloys':

j.Incinerators designed to destroy chemicals specified in entry 1C350,having specially designed waste supply systems,special handlingfacilitiesandanaverage combustionchamber temperature greater than 1273 K(1000oC),in which all surfaces in the waste supply system that come into direct contact with the waste products are made from or lined with any of the following materials-

• 1.Alloys'withmore than 25%nickeland 20% chromium by weight;
• 2.Ceramics:or
• 3.Nickel or alloys'with more than 40% nickel by weight:

k.Prefabricated repair assemblies having mctallic surfaces that come in direct contact with the chemical(s) being processed which are made from tantalum or tantalum alloys as follows,and specially designed components therefor:

2B351

Toxic gas monitors and monitoring systems and their dedicated detectingcomponents,other than those specified in IAo04,as follows; and detectors;sensor devices; and replaceable sensor cartridges therefor:

• aDesigned for continuous operation and usable for the detection of chemical warfare agents or chemicals specified in 1C350.at concentrationsof less than0.3mg/m3:or
• b.Designed for the detection of cholinesterase-inhibiting
• activity.

2B352

Biologieal manufacturing and handling equipment,asfollows:

• aContainment facilities and related equipment as follows:
• 1.Complete containment facilitiesthatmeet the
• criteriaforP3orP4(BL3,BL4,L3.L4) containment as specified in the WHO Laboratory Biosafety Manual (3rd edition,Geneva,2004):
• 2.Equipment designed forfixedinstallation in containmentfacilities specified in 2B352.a,as
• follows:
• aDouble-door pass-through decontamination
• autoclaves:
• b.Breathing air suit decontamination showers;
• Mechanical-seal or inflatable-seal walkthrough doors;
• b.Fermenters includingbioreactors,single-use (disposable) bioreactors,chemostatsandcontinuous-flowsystemsand componentsasfollows:
• 1.Fermenters capable of cultivation of "microorganisms"or of live cells for the production
• 1.Designed for mechanical attachmen to glasslinedreaction vessels or reactors specifiedin 2B350(a):or
• 2.Designed for mechanical attachment to glass-lined storage tanks,containers or receivers specified in 2B350(c).

ofviruses or toxins,without the propagation of aerosols,having a total intemmal volume of20 liters ormore:

• Components designed for fermenters specified in 2B352(b)l.asfollows-
• aCultivationchambersdesignedtobe
• sterilized or disinfected in situ;
• b.Cultivation chamber holding devices;
• C. Process control joeden simultaneously monitoring and controlling two or more fermentation systemparameters (e.g,temperature,pH,nutrients,agitation, dissolved oxygen,air flow,foam control):
• CCentrifugal separators including decanters,capable of
• continuous separation without the propagation of aerosols,having allofthe followingcharacteristics:
• 1.Flow rate exceeding l00 liters per hour:
• 2.Components ofpolished stainless steelor titanium:
• 3.One or more sealing joints within the steam
• containment area;and
• 4.Capable ofin-situ steam sterilization in a closed
• d.Cross (tangential) flow filtration equipment and components as follows:
• 1.Cross (tangential) flow filtration equipment capable ofseparation of"microorganismsviruses,toxins orcell cultures having all of the following characteristics:
• a.A total filtration area equal to or greater than
• 1m2:and
• b.Having any of the following characteristics:
• 1.Capable ofbeingsterilizedor disinfected in-situ; or Using disposable or single-use filtration components;

• 2.Cross (tangential) flow filtration components (e.g.modules,elements, cassettes,cartridges,units or plates) with filtration area equal to or greater than 0.2m2 foreach component and designed for use in cross (tangential) flow filtration equipment specified in 2B352(d):
• e.Steam.gas or vapour sterilizable freeze-drying equipment with a condenser capacity of 10 kgoficeor more in24 hours and less than 1,000kgof ice in 24hours:
• f.Protective and containment equipment,as follows:
• 1.Protective full or half suits,or hoods dependent upon a tethered extemal air supply and operating under positive pressure;

2. Biocontainment chambers,isolators,or biological safetycabinets having allof the following characteristics,for normal operation:

• aFullyenclosed workspacewhere the
• operator is separated from the work bya physical barrier,
• h.
• Able to operate at negative pressure:
• C Means to safely manipulate items in the
• workspace;
• d.Supply and exhaust air to and from the workspace isHEPA filtered:
• g.Aerosol inhalation equipment designed for aerosol challenge testing with"microorganisms",viruses or"toxins"as follows:
• 1.Whole-body exposure chambers having a capacity of1m3ormore;
• 2.Nose-only exposure apparatus utilizing directed aerosol flow and having capacity for exposure of
• any of the following:
• a12ormore rodents,or
• b.2 or more animals other than rodents;
• 3.Closed animal restraint tubes designed for use with noseonly exposure apparatus utilizing directed aerosol flow;

h.Spray drying equipment capable of drying toxins or pathogenic "microorganisms"having allofthe following:

• 1.Awater evaporation capacity of ≥0.4 kg/h and≤ 400kg/h:
• 2.The ability to generate a typical mean product
• particle size of≤i0 um with existing fittings or by minimalmodificationof the spray-dryer with atomization nozzles enabling generation of the required particle size:and
• 3.Capable of being sterilized or disinfected in situ;
• LNucleic acid assemblers and synthesizers,which are partly or entirely automated,and designed to generate continuous nucleic acids greater than I,5kilobases in length with error rates less than
• 5%in a singlerun.

2CMaterials

2DSofrware

None

2D001

Software",other than that specified in 2D002.as follows:

• a."Sofiware"specially designed ormodified for the "developmentor"production"ofequipmen specified in 2A001or2B001to2B009
• b. "Software" specially designed or modified for the "use"of cquipment specified in 2A001.c.2B001or 2B003 to 2B009.

2D002

• "Software" for electronic devices,even when residing in an electronic device or system,enabling such devices or systems to function as a "numeriealcontrol"unit,capable ofco-coordinating simultaneously more than four axes for"contouring control".

2D003

"Software"designed or modified for the operation of equipment

specifiedin 2B002,thatconverts opticaldesign,work-piece controlcommands to achieve the desired work-piece form.

2D101

• "Software"speclally designed or modified for the "use"ofequipment
• specified in2B104,2B105,2B109,2B116,2B117or2B119to2B122.

2D201

• "Software" specially designed for the "use"ofequipment specified in
• 2B204,2B206,2B207.2B209,2B219or2B227.

2D202

• "Software"specially designed or modified for the "development"

designed for"use"ofequipment specified in 2B351.

synthesisers specified in 2B352.i,that is capable of designing and

building funetionalgenetie elements from digital sequence data.

2E Technology

2E001

• "Technology"according to the General Technology Note for the

2E002

• "Technology"according to the General Technology Note for the
• "production"ofequipment specified in 2Aor2B.

2E003

Other "Technology",as follows"

• a"Technology"for metal-working manufacturing processes,as
• follows:
• 1."Technologyfor the design of tools,dies or fixtures specially designed for any ofthe following processes:
• aSuperplastic forming";
• b."Diffusion bonding":or
• c.Direct-acting hydraulic pressing';
• b."Technology"for the"development"or"Production"of hydraulic stretch-forming machines and dies therefor,for the
• manufacture ofairframe stnuctures;

• c."Technology"for the "development"of integration "soffware"for incorporation ofexpert systems for advanced decision support of shop floor operations into numerical control units;

d"Technology"for the application of inorganic overlay coatings orinorganic surface modification coatings (specified in column 3 ofthe following table)to non-electronic substrates(specified in column 2 of the following table),by processes specified in column Iofthe followingtable.

2E101

• "Technology"according to the General Technology Note for the "use" ofequipment or softwarespecified in 2B004,2B009,2B104,2B109, 2B116.2B119 to2B122or2D101.

2E201

• "Technology"according to the General Technology Note for the"use" ofequipmentor"software"specified in 2A225,2A226,2B00l,2B006. 2B007.b.,2B007(c).2B008,2B009,2B201,2B204,2B206,2B207, 2B209,2B225to2B233,2D201or2D202.

2E301

• "Technology"according to the General Technology Note for the "use" ofgoods specified in 2B350 to 2B352.

TABLE-DEPOSITION TECHNIOUES

| 1.COATING PROCESS | 2.SUBSTRATE | 3.RESULTANT COATING | |------------------------------------|------------------------------------------------------|---------------------------------------------------------------------------------------------------------------------------------| | A.Chemical Vapour Deposition (CVD) | "Superalloys" | Aluminides forinternal passages | | | Ceramics (19)and Low expansion glasses (14) | Silicides Carbides Dielectric layers (15) Diamond Diamond-like carbon (17) | | | Carbon-carbon,Ceramic and Metal"matrix" "composites" | Silicides Carbides Refractory metals Mixtures thereof (4) Dielectric layers(15) Aluminides Alloyed aluminides (2) Boron nitride | | | Cemented tungsten carbide(16).Silicon carbide (18) | Carbides Tungsten Mixtures thereof(4) Dielectric layers(15) | | | Molybdenum and Molybdenum alloys | Dielectric layers(15) | | | Beryllium and BeryliumDielectric layers(15) alloys | Diamond Diamond-like carbon (17) | | | Sensor window materials|Dielectric layers(15) | |

| 1.COATING PROCESS | 2.SUBSTRATE | 3.RESULTANT COATING | |-------------------------------------------------------------|------------------------------------------------------|-----------------------------------------------------------------------------------------------------------------| | | | Diamond Diamond-like carbon (17) | | B.Thermal- Evaporation Physical Vapour Deposition (TE-PVD | | | | B.1.Physical Vapour Deposition (PVD:Electron- Beam (EB-PVD) | "Superalloys' | Alloyed silicides Alloyed aluminides(2) MCrAIX(5) Modifiedzirconia(12) Silicides Aluminides Mixtures thereof(4) | | | Ceramics(19)and Low expansion glasses(14) | Dielectric layers(15) | | | Corrosion resistant steel (7) | MCrAIX(5) Modified zirconia (12) Mixtures thereof (4) | | | Carbon-carbon,Ceramic and Metal“matrix" "composites" | Silicides Carbides Refractory metals Mixtures thereof (4) Dielectric layers (15) Boron nitride | | | Cemented tungsten | Carbides |

| 1.COATING PROCESS | 2.SUBSTRATE | 3. RESULTANT COATING | |-----------------------------------------------------------------------------------|------------------------------------------------------------------------------|-----------------------------------------------------| | | carbide(16). Silicon carbide(18) | Tungsten Mixtures thereof(4) Dielectric layers(15) | | | Molybdenum and Molybdenum alloys | Dielectric layers(15) | | | Beryllium and Beryllium Dielectric layers (15) alloys | Borides Beryllium | | | Sensor window materials|Dielectric layers (15) (6) | | | | Titanium alloys(13) | Borides Nitrides | | B.2.lon assisted resistive heating Physical Vapour Deposition (PVD) (lon Plating) | Ceramics(19)and Low- expansion glasses | Dielectriclayers(15) Diamond-like carbon (17) | | | Carbon-carbon,CeramicDielectric layers (15) and Metal “matrix" "composites" | | | | Cemented tungsten carbide(16), Silicon carbide | Dielectric layers(15 | | | Molybdenum and Molybdenum alloys | Dielectric layers (15) | | | Beryllium and Beryllium|Dielectric layers(15) alloys | | | | Sensor window materials|Dielectric layers(15) (9) | Diamond-likecarbon (17) |

| L. COATING PROCESS | 2.SUBSTRATE | 3.RESULTANT COATING | |----------------------------------------------------------------|------------------------------------------------------------------------------|-----------------------------------------------------------| | B.3.Physical Vapour Deposition (PVD): “Laser"Vaporization | Ceramics(l9)and Low expanston glasses(14) | Silicides Dielectric layers (15) Diamond-like carbon (17) | | | Carbon-carbon, Ceramic Dielectric layers (15) and Metal“matrix" "composites" | | | | Cemented tungsten carbide (16), Silicon carbide | Dielectric layers(15) | | | Molybdenum and Molybdenum alloys | Dielectric layers(15) | | | Beryllium and Beryllium|Dielectric layers(15) alloys | | | | Sensor window materialsDielectric layers (15) (9) | Diamond-like carbon (17) | | B.4.Physical Vapour Deposition(PVD): Cathodic Arc Discharge | "Superalloys" | Alloyed silicides Alloyed aluminides(2) MCrAIX(5) | | | Polymers(ll) and Organic"matrix" "composites" | Borides Carbides Nitrides Diamond-like carbon (17) | | C.Packcementation (seeA above for out-of-pack cementation)(10) | Carbon-carbon,Ceramic Silicides and Metal"matrix" "composites" | Carbides Mixtures thereof (4) |

| 1.COATING PROCESS | 2.SUBSTRATE | 3.RESULTANT COATING | |---------------------|---------------------------------|----------------------------------------------------------------------------------------------------------------------------------------------------------------------------| | | Titanium alloys(13) | Silicides Aluminides Alloyed aluminides (2) | | | Refractory metals and alloys(8) | Silicides Oxides | | D.Plasma spraying | 'Superalloys" | MCrAIX(5) Modified zirconia (12) Mixtures thereof (4) Abradable Nickel- Graphite Abradable materials containing Ni-Cr-Al Abradable Al-Si- Polyester Alloyed aluminides (2) | | | Aluminium alloys(6) | MCrAIX(5) Modified zirconia (12) Silicides Mixtures thereof (4) | | | Refractory metals and alloys(8) | Aluminides Silicides Carbides | | | Corrosion resistant steel (7) | MCrAIX(5) Modified zirconia (12) Mixtures thereof(4) | | | Titanium alloys(13) | Carbides Aluminides |

| 1.COATING PROCESS | 2.SUBSTRATE | 3.RESULTANT COATING | |----------------------|------------------------------------------------------|--------------------------------------------------------------------------------------------------------------------------------------------| | | | Silicides Alloyed aluminides (2) Abradable Nickel- Graphite Abradable materials containingNi-Cr-Al Abradable AI-Si- Polyester | | E.Slurry Deposition | Refractory metals and alloys (8) | Fused silicides Fused aluminides except forresistance heating elements | | | Carbon-carbon,Ceramic and Metal“matrix" "composites" | Silicides Carbides Mixtures thereof(4) | | F.Sputter Deposition | "Superalloys" | Alloyed silicides Alloyed aluminides (2) Noble metal modified aluminides (3) MCrAIX(5) Modified zirconia (12) Platinum Mixtures thereof(4) | | | Ceramicsand Low- cxpansion glasses (14) | Silicides Platinum Mixtures thereof(4) Dielectic layers(15) Diamond-like carbon (17) |

| 1.COATING 2.SUBSTRATE PROCESS | 3. RESULTANT COATING | |-------------------------------------------------------|------------------------------------------------------------------------------------------------| | Titanium alloys (13) | Borides Nitrides Oxides Silicides Aluminides Alloyed aluminides (2) Carbides | | Carbon-carbon,Ceramic and Metal"matrix" "composites" | Silicides Carbides Refractory metals Mixtures thereof (4) Dielectric layers (15) Boron nitride | | Carbon-carbon,Ceramic and Metal "matrix” "composites" | Silicides Carbides Refractory metals Mixtures thereof(4) Dielectric layers (15) Boron nitride | | Cemented tungsten carbide (16), Silicon carbide (18) | Carbides Tungsten Mixtures thereof(4) Dielectric layers(15) Boron nitride | | Molybdenum and Molybdenum alloys | Dielectric layers (15) | | Beryllium andBerylliumBorides alloys | Dielectric layers (15) Beryllium |

| 2.SUBSTRATE | 3.RESULTANT COATING | |---------------------------------------------------|-----------------------------------------------------| | Sensor window materials Dielectric layers(15) (9) | Diamond-like carbon (17) | | Refractory metals and alloys(8) | Aluminides Silicides Oxides Carbides | | High temperature bearing steels | Additionsof Chromium Tantalum or Niobium(Columbium) | | Titanium alloys (13) | Borides Nitrides | | Beryllium and Beryllium Borides alloys | | | Cemented tungsten carbide(16) | Carbides Nitrides |

TABLE-DEPOSITIONTECHNIQUES-KEY

• 1.The term'coating process'includes coating repair and refurbishing as well as original coating.
• 2.The term alloyed aluminide coating'includes single or multiplestep coatings in which an element or elements are deposited prior to or during application of the aluminide coating. even if these clements are deposited by another coating process.It does not. however,include the multiple use of single-step pack cementation processes to achieve alloyed aluminides.
• 3.The term noble metal modified aluminide'coating includes mutiple-step coatings in which the noble metal or noble metals are laid down by some other coatingprocess prior to application of the aluminide coating.
• The term mixtures thereof includes infiltrated material,graded compositions,co-deposits and multilayer deposits and are obtained by one or more of the coating processes specified in the Table.
• 5.MCrAlX'refers to a coating alloy where M equals cobalt,iron,
• nickel or combinations thereof and X equals hafnium, yttrium, silicon,tantalum in any amount or other intentional additions over
• a.CoCrAlYcoatings which contain less than 22% by weight
• of chromium,less than 7 % by weight of aluminium and less than2%by weightofyttrium;
• b.CoCrAlY coatings which contain 22 to 24%by weight of chromium,10 to 12%by weight of aluminium and 0.5 to 0.7%by weightofyttrium;or
• c.NiCrAlYcoatings which contain 21 to 23%by weight of chromium,10 to 12% by weight ofaluminium and 0,9 to
• 1,1%by weight of yttrium.
• 6.The term 'aluminium alloys'refers to alloys having an ultimate
• 7.The termcorrosion resistant steelrefers to AISl (American Iron and Steel Institute) 300 series or equivalent national standard
• steels.
• 8.'Refractory metals and alloysinclude the following metals and their alloys:niobium (columbium),molybdenum,tungsten and tantalum.

• 9.Sensor windowmaterials',asfollows:alumina,silicon germanium,zinc sulphide,zinc selenide,gallium arsenide, diamond,gallium phosphide,sapphire and the following metal halides:sensor window materialsofmore than 40mm diameter for zirconium fluoride and hafnium fluoride.
• 10.Category 2does not include technology"for single-step pack cementation of solid aerofoils.
• L1.Polymers,as follows:polyimide,polyester,polysulphide, polycarbonates andpolyurethanes.
• 12.Modified zirconia'refers to additions of other metal oxides (e.g. calcia,magnesia,yttria,hafnia,rare earth oxides) to zirconia in order to stabilise certain crystallographic phases and phase compositions.Thermal barrier coatings made ofzirconia,modified with calcia or magnesia by mixing or fusion,are not controlled.
• 13.Titanium alloysrefers only to aerospace alloys having an ultimate tensile strengthof900 MPa or more measured at293K(20°C).
• 14.Low-expansion glasses'refers to glasses which have a coefficient ofthermalexpansion of1×10-7Klorlessmeasured at293K(20 °C.
• I5.Dielectric layers'are coatings.constructed of muli-layers of insulator materials in which the interference properties ofa design composed of materials ofvarious refractive indices are used to reflect,transmit or absorb various wavelength bands.Dielectric layers refers to more than four dielectric layersor dielectric/metal "composite"layers.
• 16.Cemented tungsten carbide'does not include cutting and forming toolmaterials consisting of tungsten carbide/(cobalt,nickel), titaniumcarbide/(cobal,nickel).chromiumcarbide/nickelchromium and chromium carbide/nickel.
• 17."Technology"for depositing diamond-like carbon on any of the following isnot controlled:

magnetic disk drives and heads,equipment for the manufacture of disposables,valves for faucets,acoustic diaphragms for speakers, engine parts for automobiles,cutting tools,punching-pressing dies, office automation equipment,microphones or medical devices or moulds,for casting or moulding of plastics,manufactured from alloyscontainingless than 5%beryllium.

• 18.'Silicon carbide' does not include cutting and forming tool materials.
• 19.Ceramie substrates,as used in this entry,does not include ceramic materials containing 5% by weight,or greater,clay or cement content,either as separate constituents or in combination

CATEGORY3:ELECTRONICS

• 34 Systems,Equipment and Components

3A001

Electronie itemsas follows:

• aGeneral purpose integrated circuits.as follows:
• 1.Integrated circuits designed or rated as radiation hardened to withstand any of the following:
• aAtotaldose of5x10Gy(silicon)or
• higher:
• b.A dose rate upset of 5x10Gy (silicon)/sor higher:or
• c.A fluence (integrated flux)ofneutrons(l MeVequivalent)of5x10n/cm2orhigher onsilicon,orits equivalentfor other
• materials;

2. "microprocessor microcircuits", "microcomputer microcircuits", microcontrollermicrocircuits,storage integratedcircuitsmanufacturedfromacompound semiconductor,analogue-to-digital converters,integrated circuits that contain analogue- to-digital converters and store or process thedigitized data,digital-to-analogue designed for"signal processing",field programmable logic devices,custom integrated circuits for which either the function is unknown or the control status of the equipment in which the integrated circuit will be used is unknown Fast Fourier Transform (FFT)processors,Static RandomAccess Memories (SRAMs).or non-volatile memories' having any ofthe following-

• aRatedforoperationatan ambient temperature above398K(125°C):

• b.Ratedforoperation alan ambient temperature below218K(-55C)or
• Rated for operation over the entire ambient temperaturerange from 218K(-55°C)to 398K(125°C):
• 3."Microprocessor microcircuits", "microcomputer microcircuits"and microcontroller microcircuits including digital signal processors,digital array processors and digital coprocessors, manufactured from compound semiconductorandoperatingataclockfrequency exceeding40 MHz,
• 5.Analogue-to-Digital Converter (ADC)and Digital-toAnalogue Converter(DAC)integrated circuits,as follows:
• aADCs having any ofthe following:
• 1.Aresolution of 8 bit or more,but less than l0 bit.with a"sample rate" greater than I,3 Giga Samples Per Second (GSPS):
• 2.A resolution of 10 bit or more,but less than 12 bit,with a"sample rate" greater than 600 Mega Samples Per
• Second (MSPS):
• 3.A resolution of 12 bit or more,but less than 14 bit, with a"sample rate" greater than 400 MSPS:
• 4.A resolution of14bit or more,but less than 16 bit,with a "sample rate" greater than 250 MSPS:or
• 5.Aresolution ofl6 bit or morewith a "sample rate"greater than 65 MSPS;
• b.Digital-to-Analogue Converters (DAC)having any of the following:
• 1.Aresolution of10 bit or more but less than 12 bit with anadjustedupdaterate'exceeding 3.500 MSPS:or
• 2.A resolution of12 bit or more,and having any of the following:

• following:
• aAn 'adjustedupdate rate'ofmore than 1.250 MSPS but notexceeding 3.500 MSPS
• and having any ofthe following:
• 1.A settling time less than 9 ns to arrive at or within 0.024%of full scale from a full scale step:or
• 2.A'Spurious Free Dynamic Range (SFDR)greater than 68 dBc(carrier) analogue signal of 100 MHz or the highest full scale analogue signal frequency specified below 100 MHz: or
• b.Anadjusted update rate'exceeding3.500 MSPS; 6.Electro-optical and "optical integrated circuits",designed
• for"signal processing"and having all of the following:
• a.One or more than one intermal "laser" diode:
• b.One or more than one intermal light detecting
• element:and
• c.Optical waveguides;
• 7.Field programmable logic devices having any of the
• a.A maximum number of single-ended digital input/outputsof greater than 700;or
• b.An 'aggregateone-waypeak serial
• transceiver data rate'of 500 Gb/s or greater;
• 9.Neural network integrated circuits;
• 10.Custom integrated circuits for which the function is unknown,or the control status ofthe equipment in which the integrated circuits will be used isunknown to the
• manufacturer,having any of the following:
• aMore than 1,500 terminals,
• b.A typical "basic gate propagation delay
• timeofless than 0.02 ns;or
• c.An operating frequency exceeding 3 GHz;
• 11.Digital integrated circuits,other than those described in
• 3A001.a.3.to 3A001.a.10.and3A001.a.12.based upon

any compound semiconductor and having any of the following:

• aAn equivalent gate count ofmore than 3.000 (2input gates));or
• b.A toggle frequency exceeding 1.2 GHz:
• I2.Fast Fourier Transform (FFT)processors having a rated execution time for an N-point complex FFT of less than (N log2N)/20,480 ms,where N is the number of points;
• 13.Direct Digital Synthesizer(DDS) integrated circuits
• having any ofthe following:
• a.ADigital-to-Analogue Converter (DAC) clock frequency of3.5 GHzormore and a DAC resolution of 10 bit or more,but less than 12 bit;or
• b.A DAC clock frequency of 1.25 GHz or more and a DACresolution of 12bit or more:
• 14.Integrated circuitsthat perform or are programmable to perform all of the following:
• a.Analogue-to-digital conversions meeting any ofthe following:
• 1.A resolution of 8 bit ormore,but less than l0 bit,with a"sample rate" greater than 1,3 Giga Samples Per Second (GSPS):
• 2.Aresolution ofl0 bit or more,but less than 12 bit,with a"sample rate" greater than1,0 GSPS:
• 3.A resolution of 12bit or more,but less than 14 bit,with a"sample rate" greater than I0 GSPS;
• 4.Aresolution of14 bit or more,but less than 16 bit,with a"sample rate greater than 400 Mega Samples Per
• Second (MSPS).or
• 5.Aresolution of l6 bit or morewith a "sample rate" greaterthan180 MSPS:and

b.Any of the following:

• 1.Storage of digitized dataor
• 2.Processing of digitized data;

b.Microwave or millimeter wave items as follows:

• 1."Vacuum electronic devices"and cathodes, as follows:
• a.Travelling-wave."vacuum clcctronic devices",pulsed or continuous wave. as follows:
• 1.Devices operating at frequencies exceeding 31.8
• GHz,

2. Deviceshaving acathode heater with a turn on time to rated RF power of less than 3 seconds:

• Coupled cavity devices,or derivativesthereofwitha "fractionalbandwidth"of morethan7%orapeak power exceeding2.5kW:

4. Devices based on helix. folded waveguide, or serpentine circuits, or derivatives thereof.having any of the following:

• a.An "instantancous bandwidth"ofmore than one octave,and average power (expressedinkW) times frequency (expressed in GHz) of more than 0.5:
• b.An "instantaneous bandwidth"ofone octave or less,and average power

(expressed in kW) times frequency (expressed in GHz)of more than I;

• Being "spacequalified":or
• d gridded
• Havinga electron gun;
• 5.Devices with a"fractional bandwidth"greater than or equal to
• 10%.with any ofthe following:
• a.An annular electron beam;
• b.Anon-axisymmetric
• electron beam:or
• Multiple electron beams;
• "vacuum electronic
• b.Crossed-field amplifier deviceswith a gain of more than 17 dB;
• c.Thermioniccathodes designedfor"vacuum electronic devices"producing an emission current density at rated operating conditions exceeding5 A/cm2or a pulsed (non-continuous) current density
• at rated operating conditions cxceeding 10 A/em2:
• d.Vacuum electronic devices"with the capability
• to operate in a'dual mode'.
• 2."Monolithic MicrowaveIntegrated Circuits"(MMIC") amplifiers that are any ofthe following:
• a. Rated for operation at frequencies exceeding
• 2.7GHz upto andincluding6.8 GHz witha "fractionalbandwidth"greater than 15%,and having any of the following:
• 1.A peak saturated power output greater than 75W(48.75dBm)atanyfrequency exceeding 2.7 GHz up to and including 2.9
• GHz,
• 2.A peak saturated power output greater than

• 55W(47.4dBm)at anyfrequency exceeding 2.9 GHz up to and including 3.2 GHz;
• 3.Apeak saturated power outpu greater than 40 W(46 dBm)atany frequency exceeding
• 3.2GHz up to and including 3.7 GHz,or
• 4.Apeak saturated power output greater than 20 W(43 dBm)at any frequency exceeding
• 3.7GHz up to and including 6.8 GHz;
• b.Rated for operation at frequencies exceeding 6.8 GHz up to and including l6 GHzwith a"fractional bandwidth" greater than lo%,and having any ofthe following:
• 1.A peak saturated power output greater than 10 W(40 dBm)at any frequency exceeding 6.8GHzup toandincluding8.5 GHz:or
• Apeak saturated power output greater than5 W(37 dBm)at any frequency exceeding 8.5
• GHz up to and including 16 GHz:
• c.Rated for operation with a peak saturated power output greater than 3 W(34.77 dBm)at any frequency exceeding 16GHz up to and including 3.18 GHz,and with a
• "fractional bandwidth"of greater than 10%;
• d.Rated for operation with a peak saturated power output 31.8 GHzup toand including37 GHz;
• e.Rated for operation with a peak saturated power output GHz up to and including 43.5 GHz,and with a"fractional
• bandwidth"ofgreater than 10%;
• f.Rated for operation with a peak saturated power output ) exceeding 43.5 GHz up to and including 75 GHz,and with
• a"fractional bandwidthofgreater than 10%;
• g.Rated for operation with a peak saturated power output greater than 10 mW(10 dBm) at any frequency exceeding 75GHzup to and including90 GHzand with afractional bandwidth"of greater than 5%;or
• h.Rated for operation with a peak saturated power output

greater than 0.1 nW (-70 dBm)at any frequency exceeding 90 GHz; 3.Discrete microwave transistors that are any ofthe following:

• a.Rated for operation at frequencies exceeding 2.7 GHz up to and including 6.8 GHz and having any of thefollowing:
• 1.A peak saturated power output greater than 400W(56dBm)atanyfrequency cxceeding 2.7 GHz up to and including 2.9
• ZHD
• 2.A peak saturated power output greater than 205W(53.12dBm)alanyfrequency exceeding 2.9 GHz up to and including 3.2 ZHO
• 3.A peak saturated power output greater than 115W(50.6l dBm)at any frequency exceeding 3.2 GHz up to and including 3.7
• GHz.or
• 4.A peak saturated power output greater than 60W(47.78dBm)at any frequency exceeding 3.7 GHz up to and including 6.8 GHz
• b.Rated for operation at frequencies exceeding 6.8 GHz up to and including 31.8 GHz and having any ofthe following:
• 1.Apeak saturated power output greater than 50 W(47 dBm)at any frequency exceeding 6.8GHzup to and including8.5 GHz;
• 2.A peak saturated power output greater than
• 15W(4l.76 dBm)atany frequency exceeding 8.5GHz up to and including 12 ZHD
• 3.A peak saturated power output greater than 12 GHz up to and including 16GHz,or
• 4.A peak saturated power output greater than 7W(38.45dBm)atanyfrequency exceeding16 GHz up to and including 31.8
• ZHD
• c.Rated for operation with a peak saturated power output

• greater than 0.5 W(27dBm)at anyfrequency
• exceeding 31.8 GHz up to and including37 GHz;
• d.Rated for operation with a peak saturated power output
• GHz up to and including 43.5 GHz
• c.Rated for operation with a peak saturated power output
• 43.5GHz:0r
• f.Other than those specified in 3A001b.3.a.to 3A001.b.3.e and rated for operation with a peak saturated power output greater than 5 W(37.0 dBm)at all frequencies exceeding 8.5GHz up to and including31.8 GHz.

4. Microwavesolidstateamplifiers and microwave assemblies/modules containing microwave solid state amplifiers,

• that are any ofthe following:
• L Rated for operation at frequencies exceeding 2.7 GHz up to and including 6.8 GHz with afractional bandwidthgreater than 15%,and having any ofthe following:
• 1.Apeak saturated power output greater than 500W(57dBm)atany frequency
• cxceeding 2.7 GHz up to and including 2.9 ZHD
• 2.A peak saturated power output greater than
• 270W(54.3dBm)atany frequency cxceeding2.9 GHz up to and including 3.2 GHz:
• A peak saturated power output greater than
• 200W(53 dBm)atanyf frequency exceeding 3.2 GHz up to and including 3.7 GHz,or
• 4.Apeak saturated power output greater than 90W(49,54dBm)atanyfrequency exceeding3.7 GHz up to and including 6.8
• GHz
• b.Rated for operation at frequencies exceeding 6.8 GHz up toand including 31.8 GHz with a"fractional bandwidth"
• greater than l0%,and having any ofthe following
• 1.A peak saturated power output greater than

• 70W(48.54dBm)at any frequency exceeding 6.8 GHz up to and including 8.5 ZHO
• 2 Apeak saturated power output greater than 50 W(47dBm)at any frequency exceeding 8.5 GHzup to and including 12 GHz;
• 3.A peak saturated power output greater than 30W(44.77 dBm)atanyfrequency exceeding 12 GHz up to and including 16 GHz,or
• 4.A peak saturated power output greater than 20 W(43 dBm)at any frequency exceeding 16GHzup to and including31.8 GHz;
• c.Rated for operation with a peak salurated power output 31.8 GHz up to and including37 GHz:
• d.Rated for operation with a peak saturated power output GHz up to and including 43.5 GHz,and with a"fractional bandwidth"ofgreater than 10%;
• e.Rated for operation at frequencies exceeding 43.5 GHz
• and having any ofthe following:
• 1.A peak saturated poweroutput greater than 0.2 W(23 dBm)at any frequency exceeding 43.5GHz up to and including 75 GHz,and with a"fractional bandwidth"of greater than
• %01
• 2.A peak saturated power output greater than 20mW(l3 dBm)at any ffequency exceeding 75 GHz up to and including90 GHzand with a"fractional bandwidth"of greaterthan 5%:or
• 3.A peak saturated power output greater than 0.1nW(-70dBm) at amy frequency cxceeding 90 GHz.
• 5.Electronically or magnetically tunable band-pass or band-stop filters,having more than 5 tunable resonators capable of tuning
• across a 1.5:1 frequency band (fmax/fimin)in less than 10 μs and

having any of the following:

• a.A band-pass bandwidth of more than 0.5%of center
• frequency,or
• b.A band-stop bandwidth of less than 0.5%of center
• frequeney:
• 7.Converters and harmonic mixers that are any of the following:
• Designed to extend the frequency range of"signal analysers"beyond 110 GHz:

6. Designed to extend the operating range of signal generators as follows:

• 1.Beyond 110 GHz
• 2.To an output power greater than 100 mW (20 dBm) anywhere within the frequency rangeexceeding43.5GHzbutnot exceeding 110 GHz;
• c.Designed to extend the operating range ofnetwork analysers as follows:
• 1.Beyond H0 GHz
• 2.To an output power greater than 100m W(20 dBm) anywhere within the frequency range exceeding43.5 GHzbut not exceeding 1100 GHz
• d.Designed to extend the frequency range of microwave
• test receiversbeyond 110 GHz.
• 8.Microwave power amplifiers containing"vacuum electronic
• devicesspecified in3A00ib.l.and havingall of the following:
• a.Operating frequencies above3 GHz:
• b.An average output power to mass ratio exceeding 80 W/kg:and
• c.A volume of less than 400 cm2:
• 9.Microwave power modules (MPM) consisting of,at least,a microwaveintegratedcircuit(MMiC)andanintegrated electronic power conditioner and having all of the following:
• a.Atum-on time'from off to fully operational in less
• than 10 seconds;
• b.A volume less than the maximum rated power in

• ≤10kHz.

Watts multiplied by10 cm3/W;and

• c.An"instantaneous bandwidth"greater than l octave
• (fmax>2fmin)and having any ofthe following:
• 1.For frequencies equal to or less than 18 GHz,an RF output power greater than 100 W:or
• 2.A frequency greater than 18 GHz.
• 10.Oscillators or oscillator assemblies,specified to operate with a single sideband(SSB)phase noise,in dBc/Hz,less(better)than(126+2010F-2010f)anywherewithin therangeof10Hz≤F
• I1.Frequency synthesizer'"electronic assemblies"having a
• aLessthan 143ps;
• b.Less than 100μs for any frequencychange exceeding2.2GHzwithinthesynthesized frequencyrange exceeding 4,8GHzbutnot exceeding31.8 GHz,
• D.Less than 5o0 μs for any frequency change C exceeding550 MHzwithin the synthesized frequencyrange exceeding 31.8 GHz but not exceeding37 GHz
• dLessthan lo0 μs for anyfrequencychange
• frequencyrange exceeding37GHzbutnot exceeding75 GHz
• Lessthan100μsfor any frequency change exceeding 5.0 GHz within the synthesized frequency exceeding90 GHz;0r
• Less than 1 ms within the synthesized frequency range exceeding90 GHz.
• 12.Transmit/receive modules',transmit/receive MMICs',transmit modules'and'ransmit MMICs',rated for operation at frequencies above 2.7 GHz and having all of the following:
• a.A peak saturated power output (in watts),Psat, operating frequency (in GHz) squared [Psat>505.62

W*GHz2/fGHz2|forany channel;

• b.A"fractional bandwidth"of 5% or greater for any channel;
• Any planar side with length d (in cm)equal to or lessthan I5 divided bythe lowest operating frequency in GHz[d≤15cm*GHz+N/fGHz]where N is the number of transmit or transmit/receive channels:and
• d.An electronically variable phase shifter per channel
• c.Acoustic wave devices as follows and specially designed components therefor-
• 1.Surface acousticwave and surfaceskimming (shallow bulk) acoustic wave devices,having any of the following:
• A carrier frequency exceeding 6 GHz;
• b.A carrier frequency exceeding I GHz,but notexceeding 6 GHz and having any of the following:
• 1.Afequency side-lobe rejection exceeding 65 dB;
• 2.Aproduct of the maximum delay time and the bandwidth (time in μs and bandwidth in MHz)ofmore than 100:
• 3.A bandwidth greater than 250 MHz
• or
• 4.A dispersive delay ofmore than 10
• Jotsr
• c.A carrier frequency of 1 GHz or less and having
• anyofthe following:
• I.A product of the maximum delay time and the bandwidth (time in μs and bandwidth in MHz)ofmore than
• :001
• 2.A dispersive delay of more than 10
• Jo:s

• 3.A'frequency side-lobe rejection' exceeding 65 dB and abandwidth greater than 100 MHz;
• 2.Bulk (volume)acoustic wave devices which permit the direct processing of signals at frequencies exceeding 6 ZHD
• 3.Acoustic-optic "signal processing"devices employing
• interaction between acoustic waves (bulk wave or surface wave) and light waves which permit the direct processing of signals orimages,including spectral analysis,correlation or convolution;
• d.Electronicdevices and circuits containing components, manufactured from "superconductive"materials,specially designed for operation at temperatures below the"critical temperature" ofatleastoneofthe "superconductive" constituents and having any ofthe following-
• 1.Current switching for digital circuits using "superconductive"gates with a product of delay time per gate (in seconds)and power dissipation per gate (in watts) of less than 10-14J:or
• 2.Frequency selection at all frequencies using resonant circuits with Q-values exceeding 10,000;

High energy devices as follows:

• 1.Cells'as follows:
• aPrimary cells'having any of the following at 20°C:
• L.Energy density'exceeding power densityexceeding 50
• 550 Wh/kg and a'continuous W/kg:o
• Energy density'exceeding 50 Wh/kganda'continuous power density'exceeding350
• W/kg:or

b.'Secondary cells' having an 'energy density'exceeding 350Wh/kg at20°C.

2.High energy storage capacitors as follows:

• a.Capacitors with a repetition rate of lessthan 10 Hz(single shot capacitors) and having all of the following:
• 1.A voltage rating equal to or morethan5kV:
• 2.An energy density equal to or more than 250 J/kg:and
• 3.A total energy equal to or more than 25kJ;
• b.Capacitors with a repetition rate of 10 Hz
• or more (repetition rated capacitors)and having all ofthe following:
• 1.A voltage rating equal to or more than 5kV:
• 2.An energy density equal to or more than 50 J/kg:
• 3.A total energy equal to or more than 100 J;and
• 4.A charge/discharge cycle life
• equal to or more than 10,000.
• 3."Superconductive"electromagnets and solenoids specially designed tobe fully charged or discharged inless than one second and having all of the
• following:
• Energy deliveredduring the discharge exceeding 10 kJ in the first second;
• b. Innerdiameterof the current carrying windings of more than 250 mm:and
• Rated for a magnetic induction of more than 8Tor"overallcurrent density"in the winding of more than
• 300A/mm2.

• 4.Solar cells,cell-interconnect-cover glass (CIC)assemblies,solar qualified",having-a minimum average efficiency cxceeding 20% at an operating temperature of 301 K(28C)under simulated"Air Mass Zero(AM0) illumination with an irradiance of 1 367 watts per square meter(W/m2).
• f.Rotary input type absolute position encoders having an "accuracy"equal to or less(better) than 1.0 second of arc and specially designed encoder rings.discs or scales therefor.
• g.Solid-state pulsedpower switching thyristor devices and thyristor modules',using either electrically.opticaily.or electron radiation controlled switch methods and having any ofthe following:
• 1.A maximum tum-on current rate of rise (di/dt)greater than 30.000 A/us and off-state voltagegreater than 1,100 V;or
• 2.A maximum tum-on current rate of rise (didt)greater than 2,000 A/us and having all ofthe following:
• a.An off-state peak voltage equal to or greater than 3.000 V;and
• b.A peak (surge)current equal to or greater than 3,000 A.
• h.Solid-state power semiconductor switches,diodes,or 'modules',having all ofthe following:
• 1.Rated for a maximum operating junction temperature greater than 488K(215°C):
• Repetitive peak off-state voltage (including drain to source voltage.collector to emitter voltage,repetitive peak reverse voltage and peak repetitive off-state blocking voltage) exceeding300 ;and
• 3.Continuous current greater than 1 A.
• iIntensity,amplitude,or phase electro-optic modulators including electro-optic modulators having optical input and output connectors,designed for analogue signals and having any of the following:

3A002

General purpose"electronie assemblies",modules and equipment, asfollows:

• a.Recording cquipment and oscilloscopesas follows:
• 6.Digital data recorders having all of the following:
• aA sustainedcontinuous throughput'ofmore
• than 6.4 Gbit/s to disk or solid-state drive
• b. "Signal processingof the radio frequency signal data while it isbeing recorded;
• 7.Real-time oscilloscopes having avertical root-meansquare(rms) noise voltage of less than 2% of full-scale at the vertical scale setting that provides the lowest noise per channel
• c."Signal analyzers"as follows:
• 1."Signalanalyzershavinga3dBresolution
• bandwidth (RBW) exceeding 40 MHz anywhere
• 1.Amaximum operating frequencyof more than 10 GHz but less than 20 GHz,an optical insertion lossequal to or less than 3
• dBand having any ofthe following:
• a.A"half-wave voltage(Vπ')less than 2.7.Vwhen measured ata frequency of1 GHzorbelow,or
• b.AVπoflessthan 4Vwhcn measured at a frequency of more than1GHzor
• 2.Amaximum operating frequeney cqual to or
• greater than 20 GHz,an optical insertion loss equal toor less than 3 dB and having any of the following:
• aAVπ'lessthan3.3Vwhen measured at a frequency ofI GHz or below:or
• b.A'V'less than 5Vwhen measured at afrequency ofmore than I GHz

within the frequency range exceeding 31.8 GHz but not exceeding37 GHz;

• "Signal analyzers"having a Displayed Average NoiseLevel(DANL)less (better)than-160 dBm/Hz anywhere within the frequency range exceeding 43.5 GHz but not exceeding 110 GHz;
• 1I0GHz:
• 4."Signal analyzers"having all ofthe following:
• a.Real-time bandwidth'exceeding 520 MHz: and
• b.Having any of the following:
• 1.100%probability ofdiscovery with less than a 3 dB reduction from full amplitude due to gaps or windowing effects ofsignals having a duration of8μsorless;or
• 2.Afrequency mask triggerfunction with 100% probability of trigger (capture)for signals havinga duration of 8us or less:
• d.Signal generators,including arbitrary waveform and function generators,having any of the following:
• 1.Specifiedtogencratepulse-modulatedsignals having all of the following,anywhere within the frequency range exceeding 31.8 GHz but not exceeding 37 GHz:
• a.Pulse duration'of less than 25 ns:and
• b.On/offratio equal to or exceeding 65dB;
• 2.An outputpowerexceeding 100mW(20 dBm) anywhere within the frequency range exceeding 43.5 GHz but not exceeding110 GHz;
• following:
• b.Less than 1o0 μs for any frequency change exceeding 2.2 GHz within the frequency range exceeding 4.8 GHzbut nol exceeding 31.8 GHz;

• d.Less than 5o0 us for any frequency change exceeding 31.8 GHz but nol exceeding37 GHz,
• exceeding 550 MHz within the frequency range or
• e.Less than lo0 μs for any frequency change excceding 2.2 GHz within the frequency range exceeding37 GHzbut notexceeding75 GHz:
• g.Less than 100 μs for any frequency change
• exceeding 5,0 GHz within the frequency range exceeding 75GHzbutnot exceeding110 GHz
• 4.Single sideband (SSB)phase noise,in dBc/Hz.specified
• asbeing any ofthe following:
• a.Less(better)than -(126+20logoF 20logiof) anywherc within the range of 10 HzFI0 kHz anywhere within the frequency range exceeding 3.2 GHz but not exceeding110 GHzor
• Less(better)than-(206-20logiof)anywhere within the-range of 10 kHz<F≤100 kHz exceeding 3.2 GHz but not exceeding 110
• anywherewithinthefrequencyrange GHz,
• 5.An 'RF modulation bandwidth"of digital baseband
• signals as specified by any of the following:
• a. Exceeding 2.2 GHz within the frequency
• range exceeding 4.8 GHz but not exceeding 31.8GHz;
• b.Exceeding 550 MHz within the frequency rangeexceeding 31.8 GHzbutnot
• exceeding37 GHz,or
• Exceeding 2.2 GHz within the frequency range exceeding 37 GHz but not exceeding
• 75GHz
• d.Exceeding 5.o GHz within the frequeney range exceeding 75 but not exceeding 110 GHz,or
• 6.A maximum frequency excceding 110 GHz; e.Network analyzers having any of the following:

• 1.An output power exceeding 1mW(0 dBm) anywhere within the operating frequency range exceeding 43.5 GHz but not exceeding I10 GHz;
• 3.Nonlinear vector measurement functionality at frequencies exceeding 50 GHz but not exceeding 1I0 GHz;or
• 4.A maximum operating frequencyexceeding110 GHz,
• fMicrowave test receivers having allof the following:
• 1.A maximum operating frequency exceeding 110
• GHz,and

2. Being capable of measuring amplitude and phase simultaneously:

• g.Atomic frequency standards being any of the following:
• I."Space-qualified":
• 2.Non-rubidium and having a long-term stability less (beuter)than1x10-11/month;or
• 3.Non-space-qualified"and having all of the following:
• aBeing a rubidium standard;
• b.Long-term stability less (better)than Ix 10-
• 11/month;and
• c.Total power consumption of less thanI W:
• h"Electronic assemblies",modules,or equipment including ADC
• cards,waveform digitizers,data acquisition cards,signal acquisition boards and transient recorders.specified to perform all ofthe following:
• 1.Analogue-to-digital conversions meeting any of the
• following:
• a.A resolution of 8 bit or more,but less than 10 bit,with a"sample rategreater than 1.3
• Giga Samples Per Second(GSPS):
• b.A resolution of 10 bit or more,but less than 12 bit, with a sample rate" greater than 1.0 GSPS:
• c.Aresolution ofI2 bit or more,but less than 14 bit,with a"sample rate"greater than 1.0 GSPS:

3A003

Spray cooling thermal management systems employing closed loop nuid handling and reconditioning equipment in a sealed enclosure where a dielectrie fluid is spraved onto electronic components using specially designed spray nozzlesthat are designed to maintain electronie components within their operating temperature range. and specially designed components therefor.

3A101

Electronic cquipment, devices and components,other than those

specified in3A001,as follows:

• Analogue-to-digitalconverters,usablein"missiles" designed to meet military specifications for ruggedized
• b.Acceleratorscapable ofdeliveringelectromagnetic radiation produced by bremsstrahlungfrom accelerated electrons of 2 MeV or greater,and systems containing
• those accelerators.

3A102

Thermal batteries'designed or modified for'missiles'.

3A201

Electronic components,other than those specified in 3A0ol,as

follows:

• Capacitors havingeitherofthe following sets of characteristics:
• 1.a.Voltagerating greater than l.4kV:
• b.Energy storage greater than 10 J;
• d.Aresolution ofI4 bit or more but less than 16 bit,with a"sample rategreater than 400 Mega Samples Per Second (MSPS):or
• e.Aresolution ofl6 bitor more witha "sample rate"greater than 180 MSPS:and

2.Any ofthe following:

• aOutput of digitized data;
• b.Storage of digitized data; or
• c.Processing of digitized data;

3A225

Frequency changers or generators,other than those specified in 0Bo0l.b.13.,usable as a variable or fixed frequency motor drive,

having all of the following characteristies:

• a.Multiphase output providing a power of 40 VA or greater,
• Operating at a frequency of 600 Hz or more:and
• c.Frequency control better (less) than 0.2%

3A226

High-power direct current power supplies,other than those specified in 0Bool.j.6.,having both of the following characteristies:

c.capacitance greater than 0.5 μF:and

• d.Series inductance less than 50 nH;or
• 2.a.Voltage rating greater than 750 V:
• b.Capacitance greater than 0.25 μF:and
• c.Series inductance less than I0 nH:

b.Superconducting solenoidal electromagnets having all of the following characteristics:

• 1.Capable of creating magnetic fields greater than 2 T:
• 2.Aratio oflength to inner diameter greater than 2:
• 3.Inner diameter greater than 300 mm:and
• 4.Magnetic field uniform to better than 1%over the central 50%of the inner volume;
• c.Flash X-ray generators or pulsed electron accelerators having either ofthe following sets of characteristics:
• 1.a.An accelerator peak electron energy of500 keV orgreater but less than 25 MeV;and
• b.With a'figure ofmerit2(K)of0.25 or greater:
• 2.aAn accelerator peak electron energy of 25 MeV or greater;and
• b.Apeak power'greater than 50 MW.

or

3A227

High-voltage direct current power supplies,other than those specified in 0Boo1.j.5.havingboth of the following characteristies:

• a.Capable ofcontinuously producing.over a time period of 8
• hours,20 kVor greater with current output ofIAor greater:and
• b.Current or voltage stability better than 0.1% over a time
• periodof8hours;

3A228

Switehing devices includinggaskrytron tubes andvacuum sprytron tubes,as follows

• a.Cold-cathode tubes,whether gas filled or not,operating similarly to a spark gap.having all of the following characteristics:
• 1.Containing three or more electrodes;
• 2.Anode peak voltage rating of2.5 kV or more,
• 3.Anode peak current rating of 100 A or moreand
• 4.Anode delay time of10 μsor less:
• Triggered spark-gaps having both of the following characteristics:
• 1.An anode delay time of 15 μs or less:and
• 2.Rated for a peak current of 5o0 A ormore;
• c.Modules or assemblies with a fast switching function,other than those specified in 3A001.g.or 3A001.h.,having all of
• the following characteristics:
• 1.Anode peak voltage rating greater than 2 kV;
• 2.Anode peak current rating of 500 A or more;and
• 3.Turn-on time of1 μs or less.3A229
• b.
• a.Capable of continuously producing.over a time period
• of8hours,100 Vorgreaterwith current output of500A or greater;and
• b.Current or voltage stability belter than O.l% over a time
• periodofShours.

3A229

High-current pulse generators as follows:

• a.Detonator firing sets (initiator systems,firesets), including electronically-charged,cxplosively-driven and opticallydriven firing sets,other than those specified in 1Ao07.a designed to drive multiple controlled detonators specified in1A007.b.:
• b.Modular electrical pulse generators (pulsers)having all of the following characteristics:
• 1.Designed for portable,mobile,or ruggedized-use;
• 2.Capable of delivering their energy in less than 15μs into loads of less than 40 ohms;
• 3.Having an output greater than 100 A:
• 4.No dimension greater than 30 cm;
• 5.Weight less than 30 kg:and
• Specified for use over an extended temperature range 223K(-50°C)to373K(100°C)or specified as suitable for aerospace applications;
• c.Micro-firing units having all ofthe following characteristics:
• 1.No dimension greater than 35 mm;
• 2.Voltage rating of equal to or greater than1kV: and
• 3.Capacitance ofequal toor greater than l00 nF.

3A230

High-speed pulse generators,and 'pulse heads'therefor,having both ofthe following characteristies:

• a.Output voltage greater than 6V into a resistive load of less than 55ohms,and
• b.Pulse transition time'less than 500 ps

3A231

Neutron generator systems, including tubes,having both of the following characteristics:

• a.Designed for operation without an external vacuum system: pue

3A232

Multipoint initiation systems,other than those specified in 1A007. with arrangements using single or multiple detonators designed to nearly simultancously initiate an cxplosive surface over an area greater than 5,ooo mm2from a single firing signal with an initiation timing spread over the surface ofless than 2.5μs.

3A233

Mass spectrometers,other than those specified in 0B002.g.capable ofmeasuring ions of 230 u or greater and having aresolution of

better than 2 parts in 230,as follows,and ion sources therefor:

• aInductively coupled plasma mass spectrometers(ICP/MS);
• b.Glow discharge mass spectrometers (GDMS):
• Therimal ionization mass spectrometers(TIMS):
• d.Electron bombardment mass spectrometers having both of
• the following features:
• L..A molecular beam inlet system that injects a collimated beam of analyte molecules into a region of the ion source where the molecules are ionized by an electron-beam:and
• 2.One or morecold trapsthat can be cooled to a temperatureof193K(-80°C)):
• f.Mass spectrometers equipped with a microfluorination ion
• source designed for actinides or actinide fluorides.

3A234

Strip lines to provide low inductance path to detonators with the following characteristics:

• a.Voltage rating greater than 2kV;and
• b.Inductance of less than 20 nH.

b.Utilizing any of the following:

• 1.Electrostaticacceleration toinduceatritium-
• deuterium nuclear reaction:or
• 2.Electrostatic acceleration to induce a deuteriumdeuterium nuclear reaction and capable ofan output. of3x 10neutrons/sorgreater.

3BTest,Inspection and Production Equipment

3B001

Equipment for the manufacturing of semiconductor devices or

materials,as follows and specially designed components and accessories therefor:

• aEquipment designed for epitaxial growth as follows:
• L.Equipment designed or modified to produce a layer ofany material other than silicon with a thickness uniform to less than±2.5%across a distance of75 mm or more.including Atomic Layer Epitaxy (ALE)equipment;
• 2.Metal OrganicChemical VapourDeposition (MOCVD)reactorsdesignedforcompound semiconductor epitaxial growth of material having two or more of the following elements:aluminium, gallium,indium,arsenic,phosphorus,antimony,or nitrogen:
• 3.Molecular beam epitaxial growth equipment using gas or solid sources;
• b.Equipment designed for ion implantation and having any of the following:
• 1.Being designed and optimized to operate at a beam energy of20keVormore and a beam currentof10 mA or more for hydrogen,deuterium or helium
• implant;
• Direct write capability;
• 3.A beam energy of 65keV or more and a beam current of45mA or more for high energy oxygen implantintoa heated semiconductor material "substrate":or
• 4.Being designed andoptimized to operate at a beam energy of20 keVor more and a beam current of 10 mAormoreforsiliconimplantintoa semiconductor material"substrate"heated to 600°C
• orgreater,
• e.Automatie loading multi-chamber central wafer handling
• systems having all of the following:

• 1.Interfaces for wafer input and output,to which more than two functionally different'semiconductor process tools'specified in 3B001.a.1.3B001.a.2. 3B00l.a3.or3B001.b.aredesignedtobe
• connected;and
• Designed to form an integrated system in a vacuum environment for'sequentialmultiple wafer
• processing':

f.Lithography equipment as follows:

• 1.Align and expose step and repeat (direct step on wafer)or step and scan (scanner) equipment for wafer processing using photo-opticalor X-ray
• methods and having any of the following:
• aA light source wavelength shorter than 193 nm:or
• b.Capable of producing a pattem witha
• 'Minimum Resolvable Feature size'(MRF) of45nmorless;
• 2.Imprint lithography equipment capable of producing printingtools;Hot embossing tools;Nano-imprint
• featuresof 45nm or less including:Micro contact lithography tools;and Step and flash imprint lithography (S-FIL)tools,
• 3.Equipment specially designed for mask making having allofthe following:
• a.Adeflected focusedelectron beam,ion beam or"laser"beam; and
• b.Havingany ofthe following:
• full-width half-maximum (FWHM) spot size smaller than 65 nm and an image placement less than
• 1.A 17nm(mean+3sigma):or
• 2.A second-layer overlay error of less than 23nm(mean +3 sigma)on the
• mask;
• 3.Equipment designedfordevice
• processing usingdirectwriting methods,having allof the following:

3B002

Test equipment specially designed for testing finished or unfinished semiconductor devlces as follows and specially designed components and accessories therefor:

• aFor testing S-parameters of items specified in 3A001.b.3.:
• b.For testing items specified in 3A001.b.2.
• 3C Materials

3C001

Hetero-epitaxial materials consisting ofa"substrate"having stacked

• aSilicon(Si:
• b.Germanium (Ge);
• C.. Silicon carbide(SiC):
• d."ll/V compounds"of gallium or indium;
• a.A deflected focused electron beam:and

b.Having any ofthe following:

• 1.Minimum beam size equal to or smaller than 15 nm;or
• 2.An overlay error less than 27nm (mean+3sigma):
• g.Masksand reticles,designed for integrated circuits specified in 3A001:
• h.Multi-layer masks with a phase shif layer not specified in 3B00l.g.and designed to be used by lithography equipment havingalight sourcewavelength less than 245nm:
• iImprint lithography templates designed for integrated circuits specified in3A001.
• j.Mask"substrate blankswith multilayer reflector structure consisting ofmolybdenum and silicon,and having all ofthe following:
• 1.Specially designed forExtreme Ultraviolet'(EUV) lithography,and
• 2.Compliant with SEMI Standard P37.

3C002

Resistmaterials as follows and "substratescoated with the following resists:

• a.Resists designed for semiconductor lithography as follows:
• 1.Positive resists adjusted (optimized) for use at wavelengths less than 193.nm but equal to or greater than 15nm;
• 2.Resists adjusted (optimized) for use at wavelengths lessthan 15 nm but greater than1nm:
• b.All resists designed for use with electron beams or ion beams, with a sensitivity of0.0l μcoulomb/mm2or-better;
• d.All resists optimized for surface imaging technologies,
• e.All resists designedor optimized for use with imprint lithography equipment specified in 3B001.f.2.that use either a thermal orphoto-curable process.

3C003

Organo-inorganic compounds as follows:

• Organo-metalliccompounds ofaluminium,gallium or
• indium,having a purity (metal basis) better than 99.999%:
• b.Organo-arsenic,organo-antimony and organo-phosphorus compounds.having a purity (inorganic element basis) better than 99.999%.

3C004

Hydrides ofphosphorus,arsenic or antimony,having a purity better than 99.999%,even diluted in inert gases or hydrogen.

3C005

High resistivity materials as follows:

• aSilicon carbide (SiC).gallium nitride (GaN)aluminium nitride (AIN) or aluminium gallium nitride (AlGaN) galliumoxide (GaOs)ordiamondsemiconductor substrates"or ingots,boules,or other preforms of those materials,having resistivities greater than 10 000 ohm-cm
• at20°C;
• Gallium Oxide(GaO):or
• .Diamond

3C006

Materials,not specified in 3Co01,consisting ofa "substrate"

specified in 3C005 with at least one epitaxial layer ofsilicon carbideSiC).galliumnitride(GaN),aluminiumnitride(AIN). aluminium gallium nitride(AlGaN),gallium oxide (Ga:Os)or diamond.

3DSoffware

3D001

• "Software" speciallydesignedforthe"development"or "productionofequipment specified in 3A001.b.to 3A002.h.or 3B. 3D002
• in 3B001.a.to f.3B002or3A225 3D003Physics-based'simulation "software"specially designed for the"development"of lithographie, etching or deposition processes for translating masking patterns into specifictopographicalpatternsin conductors,dielectriesor

semiconductor materials.

3D003

• "Computational lithography","software"specially designed for the "development"ofpatterns on EUV-lithography masks orreticles.

3D004

• "Software" speciallydesigned for the"development"of equipment specified in3A003.

3D005

"Software"specially designed to restore normal operation ofa microcomputer,"mieroprocessor microcircuit"or"microcomputer microcireuit"within 1 ms after an Electromagnetic Pulse(EMP) or ElectrostaticDischarge(ESD)disruption,without lossof continuation ofoperon.

• b.Polycrystalline"substrates"or polverystalline ceramic substrates",having resistivities greater than 10,000 ohmcm at 20C and having at least one non-epitaxial single crystal layer of silicon(Si),silicon carbide (SiC).gallium nitride (GaN),aluminium nitride (AIN).or aluminium gallium nitride (AlGaN).gallium oxide (GazOs)or diamond on the surface ofthe"substrate"

3D006

Electronic Computer-Aided Design"(ECAD) "softwarespecially designed for the "development"of integrated circuits having any "Gate-All-Around Field-Effect Transistor"("GAAFET")structure, and having any of the following.

• a.Specially designed for implementingRegister Transfer Level"RTL)to"GeometricalDatabaseStandard
• II(GDSl)or eqyuvalent standard;or
• b.Specially designed for optimization of power or timing rules.

3D101

"Software" specially designed or modified for the "use"of

equipment specified in3Al01.b.

3D225

"Software"specially designed to enhance orrelease the performance of frequency changers or generators to meet the characteristicsof3A225.

3E Technology

3E001

• "Technology"aecording to the General Technology Note for the "development"or"production"ofequipment or materials
• specified in 3A,3B or3C;

3E002

"Technology"according to the General Technology Note,other thanthat specifiedin3Eool,forthe"development"or "uoganpoud, of "microprocessor microcircuit" "microcomputer mierocircuitor mierocontroller microcireuit core,or of digital signal processors and digital array processors, having an arithmetie logic unit with an access width of32 bits or more and any of the following features or characteristies:

• a.Avector processor unit'designed to perform more than two calculations on floating-point vectors (one-dimensional arrays of32-bit or larger numbers) simultaneously:
• b.
• Designed to perform more than four 64-bit or larger floating-point operation results per cycle;or
• Designed to perform more than eight 16-bit fixed-point multiply-accumulate resuls per cycle (e.g.digital manipulation of analogue information that has been

3E004

"Technologyrequired"for the slicing.grinding and polishing of

300 mm diameter.silicon wafers to achieve a"Site Front least squares Range(SFQR") less than or equal to 20nm at any site of 26nm x Smm on the front surface ofthe water and an edge exclusion less than or equal to 2mm.

3E101

"Technology"aecording to the General Technology Note for the "use"ofcquipment or "software" specified in 3A0ol.a.l.or 2, 3A101,3A1020r3D101.

3E102

• "Technologyaccording to the General Technology Note for the
• "development"of"software"specified in 3D101.

3E201

"Technology"according to the General Technology Note for the

"useofequipment specified in 3A001.e.2.,3A001.e.3,3A001.g 3A201,3A225to3A234.

3E225

Technology",in the form of codes or keys,to enhance or release the performance of frequeney changers or generators to meet the characteristics of3A225.

• d.

previously converted into digital form,also known as digital "signal processing").

3E003

thefollowing:

• a.Vacuum microelectronic devices;
• b. Hetero-structure semiconductor clectronic devices such as high electron mobility transistors (HEMT),hetero-bipolar transistors(HBT),quantum well and super lattice devices;
• "Superconductive"electronic devices;
• Substratesof diamond for electronic components.
• e. Substrates ofsilicon-on-insulator (SOl)for integrated circuits in which the insulator is silicon dioxide:
• f Substrates ofsilicon carbide for electronic components;
• 品
• "Vacuum clectronic devicesoperating at frequencies of 31.8 GHzor higher:
• h.Substrates of gallium oxide for electronic components

CATEGORY4:COMPUTERS

4A Systems,Equipment and Components

4A001

Electronic computers and related equipment,having any of the followingand"electronieassembliesandspeciallydesigned componentstherefor:

• a.Specially designed to have any ofthe following:
• 1.Rated for operation at an ambient temperature below 228K(45°C)orabove358K(85°C):or
• 2.Radiationhardened toexceedanyof thefollowing specifications:
• Total dose 5x102Gy(silicon):
• b.Dose rate upset 5x 10°Gy (silicon)/s;or
• c.Single event upset IxloEror/bit/day:

4A003

• "Digital computers","eleetronic assemblies",and related equipment therefor,as follows and specially designed components therefor, including the following:
• Array processors:
• Digital signalprocessors;
• Logic processors:
• Equipment designed for"image enhancemen"
• a."Digital computers" having "Adjusted Peak Performance" ("APP") exceeding 29 Weighted
• TeraFLOPS(WT):
• b."Electronic assemblies" specially designed or modified for enhancing performance by aggregation of processors so that the "APPof the aggregation exceds the limit specified in4A003.b.:
• c.Equipment speciallydesigned for aggregating the performance of"digital computers"by providing external interconnectionswhichallowscommunicationsat unidirectional data rates exceeding2,0 Gbyte/s per link.

4A004

"electronie assemblies"and components therefor:

• a.'Systolic array computers':
• b.Neural computers':
• c.'Optical computers'

4A005

Systems,equipment,and components therefor,specialy designed or modified for the generation,command and controlor delivery of "intrusion software"

4A101

Analogue computers,"digital computers"or digital differential analyzers,other than those specified in 4Aoo1(a)i.which are ruggedized and designed or modified for use in space launch

4A102

Hybrid computers specially designed for modeling.simulation or design integration of space launch vehicles specified in 9A004or sounding rocketsspecified in 9Ai04.

4B Test,Iuspection and Production Equipment

None

4CMaterials

None

4DSofrware

4D001

"Software"as follows:

• "Software"specially designed or modified for the"development" 4A004,or4D.
• b. "Soffware",other than that specified in 4D0ol(a),specially designed or modified for the"development"or"production"of equipment as follows:
• 1."Digital computers"having an"Adjusted Peak Performance" (APP")exceeding15 Weighted TeraFLOPS(WT);

• 2."Electronic assemblies"specially designed or modified for the "APP"of the aggregation exceeds the limit in 4D001(b)i

4D004

• "Software"specially designed or modified for the generation, command and control,or delivery of"intrusion software

4E Technology

4E001

"Technology"as follows:

• a."Technologyaccording to the General Technology Note,for the "developmen","production"or"use" ouudnbjo
• "softwarespecified in 4A or 4D.
• b."Technology"according to the General Technology Note,other
• thanthat specifiedin 4Eool(a).for the developmentor "produetion"ofequipment as follows:
• 1."Digital computers"having an"Adjusted Peak Performance"
• ("APP")exceeding15 Weighted TeraFLOPS(WT):

2. "Electronic assemblies"specially designed or modified for

• the"APP"of the aggregation exceeds the limit in 4Eool(b)i
• c."Technology"for the"development"of"intrusion software".

CATEGORY 5: TELECOMMUNICATIONS AND "INFORMATIONSECURITY

PART1-TELECOMMUNICATIONS

5A1 Systems,Equipment and Components

5A001

Telecommunications systems,equipment,components and accessories as follows:

• a.Any type of telecommunications equipment having any of the
• following characteristics,functions or features:
• 1.Specially designed to withstand transitory electronic effects or electromagnetic puise effects,both arising from a nuclear explosion;
• 2.Specially hardened to withstand gamma,neutron or ion radiation;

• 3.Electronic equipment specially designed to operate below
• 218K(-55°C)r
• 4.Electronic equipment specially designed to operate above 397
• K(124°C):
• b.Telecommunicationsystems and equipment,and specially designed components and accessories therefor,having any of the
• following characteristics,functions or features:
• I.Being underwater untethered communications systems
• having any ofthe following:
• a.An acoustic carrier frequency outside the range
• from20kHzto60kHz:
• b.Using an electromagnetic carrier frequency below
• 30kHz;
• c.Using electronic beam steering techniques:or
• d.Using"lasers"or light-emitting diodes (LEDs)with an output wavelength greater than 400 nm and less than 700nm,in a"local area network:
• 2.Being radio equipment operating in the 1.5 MHz to 87.5 MHzband and having all ofthe following:
• aAutomatically predicting and selecting frequencies andtotal digital transferratesper channel to
• optimize the transmission:aod
• b.Incorporating a linear power amplifier configuration havinga capabilityto supportmultiple signals simultaneously at anoutput power of1 kWormore in the frequency range of 1.5 MHz or more but less than 30 MHz,or250 Wor more in the frequency range of 30 MHz or more but notcxcceding 87.5 MHz,over an"instantaneous bandwidth"of one octave or more and with an output harmonic and distortion content of betterthan-80 dB:
• 3.Beingradio equipment employing"spread spectrum" techniques,including"frequency hopping"techniques, other than those specified in 5Ao01.b.iv.and having any ofthe following:
• a.User programmable spreading codes;or
• b.A total transmitted bandwidth which is 1o0 or more times the bandwidth ofany one information channel
• and inexcessof50-kHz;

• 4.Beingradioequipment employingultra-wideband modulation techniques,havinguser programmable channelizing codes.scramblingcodesornetwork identification codes and having any of the following:
• a.A bandwidth exceeding 500 MHzor
• b.A"fractional bandwidth"of20%or more,
• 5.Being digitally controlled radio receivers having all of the following:
• aMore than10o0 channels:
• b.A 'channel switching time'(the time (ie.,delay) to change from one receiving frequency to another,to arrive ator within0.05%ofthe final specified receiving frequency)ofless than I ms,
• Automatic searching or scanning ofa part of the electromagnetic spectrum:and
• d.Identification of the received signals or the type of transmitter,or
• 6.Employing functionsof digitalsignalprocessingto provide'voice coding'(the technique to take samples of signal,taking into account specific characteristics of human speech)output ofcontinuous speech at rates of less than 700 bit/s.
• c.Optical fibers ofmore than 500 m in length and specified by the manufacturer as being capable of withstandingaprooftest'tensile stressof2x 109 N/m2ormore:
• d.'Electronically steerable phased array antennae which forms a beam by means of phase coupling. (the beam direction is controlled by the complex excitation coefficients ofthe radiating elements) and the direction of that beam can be varied (both in transmission and reception) in azimuth or in elevation,or both,by application ofan electrical signal as follows:
• 1.Rated for operation above 31.8 GHz,but not exceeding 57 GHz,and having an Effective Radiated Power(ERP) equal to orgreater than +20 dBm(22.15 dBm Effective Isotropic Radiated Power(EIRP)):

• 2.Rated for operation above 57 GHz,but not exceeding 66GHz,and having anERPequal to or greater than +24 dBm(26.15dBmEIRP):

3. Rated for operation above 66 GHz,but not exceeding 90 GHz,and having an ERP equal to or greater than +20

• dBm(22.15dBmEIRP):
• 4.Rated for operation above90 GHz
• e.Radiodirection finding equipmentoperatingat frequencies above 30 MHz and having all of the following.and specially designed components therefor:
• "Instantaneous bandwidth"of 10 MHz or more;and

2. Capable of finding a Line Of Bearing (LOB)to noncooperating radio transmitters with a signal duration of lessthan I ms:

• f.Mobile telecommunications interception Or jamming equipment,and monitoring cquipment therefor,as follows.and speciallydesigned components therefor:
• Interception equipment designed for the extraction of voice or data,transmitted over the air interface;
• 2.Interception equipmem not specified in 5A0ol.fi. designed for the extraction of client device or subscriber identifiers (e-g.IMSI.TIMSI or IMEI),signaling.or
• other metadata transmitted over the air interface;
• 3.Jamming equipment specially designed or modified to intentionally and selectively interfere with,deny.inhibit degrade or seduce mobile telecommunication services
• and performing any ofthe following:
• a.Simulate the functions of Radio Access Network (RAN)equipment;
• b.Detect and exploit specific characteristics of the mobile telecommunications protocol employed (e.g.GSM):gr
• Exploit specific characteristics of the mobile telecommunications protocolemployed(e.g. GSM);:

• RF monitoring equipment designed or modified to identify the operation ofitems specified in 5A0ol.fi. 5A001.fiLor5A00L.fil:
• g.Passive Coherent Location (PCL) systems or equipment,specially designed for detecting and tracking moving objects by measuring reflections ofambient radio frequency emissions,supplied by non-radartransmitterswhich may include commercial radio,television or cellular telecommunications base stations;
• hCounter Improvised ExplosiveDevice (IED) equipment and related cquipment,as follows:
• 1.Radio Frequency(RF)transmitting equipment,not specifiedin5A0o1.f,designedormodified for prematurely activating or preventing the initiation of Improvised Explosive Devices:
• 2.Equipment using techniques designed to enable radio
• communications in the same frequency channels on which co-located equipment specified in 5A001.h.i.is transmitting:
• Intemet Protocol (IP)network communications surveillance systems or equipment,and specially designed components therefor,having all of the
• following:
• 1.Performing all ofthe followingon acarrier class Internet Protocol(IP)network(e.g.,national grade IP backbone):
• aAnalysis at the application layer (e.g.,Layer 7 of Open SystemsInterconnection (OSI)model (ISO/IEC7498-1):
• b. Extraction of selected metadata and application content (voice,video,messages,attachments);
• and
• C Indexing ofextracted data:and
• 2.Being specially designed to cary out allof the following:
• aExecution of searches on the basis of'hard selectors that are either data or set of data,related to an
• individual;and
• b.Mapping ofthe relationalnetworkofan individual orof agroup ofpeople.

5A101

Telemetry and telecontrolequipment,including ground equipment, designed or modified formissiles'which inleude complete rocket systems and unmanned aerial vehicle systems capable ofa range exceeding300km.

SBI Test,Inspection and Production Equipment

5B001

Telecommunications test,inspeetion and production equipment, components and aecessories,as follows:

• a.Equipment and specially designed components or accessories therefor,speciallydesignedforthe"development"or "production"of equipment,functions or features,specified in 5A001:
• b.Equipment and specially designed components or accessories therefor.specially designed for the "development"of any of the following telecommunication transmission or switching equipment:
• L.Equipment employinga"laserand havingany of the
• following:
• aTransmission wavelength exceeding1.750nm:or
• b.Employing analogue techniques and having a bandwidth exceeding 2.5 GHz;or
• c.Radio equipment employing QuadratureAmplitude-Modulation (QAM) techniques above
• level1.024:

5CI Materials

None

5D1 Sofrware

5D001

"Software"as follows:

• a"Sofware"specially designed or modified for the"development" "production"or"useofequipment,functions or features, specified in SA00l;
• b.Specific"softwarespecially designed or modified to provide characteristics,functions or features of equipment,specified in 5A00lor5B001:

• C. "Software" specially designed forthe "developmentofanyofthefollowingtelecommunication transmission or switching cquipment;

2. 1.Equipment employing a "laser"and having any of the following: 3. a.A transmission wavelength exceeding 1,750 nm; 4. b.Employing analogue techniques and havinga 5. bandwidth exceeding2.5 GHz 6. 2.Radioequipment employingQuadrature-AmplitudeModulation (QAM)techniques above level 1.024. 7. "Soffware".other than that specified in 5D001.a or 5D001.b., specially designed or modified for monitoring or analysis for law enforcementpurposes,providingall of the following: 8. 1.Execution of searches on the basis of"hard selectorsof either the content ofcommunication or metadata acquired from a communications service provider using a handover interface':and 9. 2.Mappingoftherelationalnetworkortrackingthe movement or location of targcted individuals based on the results of searches on contentof communication or 10. metadata or searches as described in 5D001.d.i

5D101

• "Software"specially designed or modified for the "use"of
• equipment specified in 5A101.

SEI Technology

SE001

"Technology"as follows:

• "Technology"according to the General Technology Note for the "development"","production"or"use"(excluding operation) of equipment,functions or features specified in5Aool or "software" specified in5D001.a.or 5D001.d;
• b.Specific"technology"as follows:
• 1."Technology""required"forthe"developmen"or "production"of telecommunications equipmen specially designed to be used on board satellites:
• 2."Technology"for the "development"or"use"of"laser"
• communicationtechniqueswiththecapabilityof

automaticallyacquiringandtrackingsignals and maintaining communications through exoatmosphere or sub-surface (water) media;

• 3."Technology"for the "development"of digital cellular radio base station receiving cquipment whose reception capabilities that allowmulti-band,multi-channel,mulimode,multi-coding algorithm or muti-protocol operation can be modified by changes in"software";
• "Technology"for the"development"of"spread spectrum"
• techniques,including"frequeney hopping"techniques;
• c.Technologyaccording to the General Technology Note for the
• "development"or"production"of any of the following
• 1.Equipment employing a "laser"and having any of the
• following:
• a.A transmission wavelength exceeding1.750 nm:or
• b.Employing wavelengthdivisionmuhiplexing techniques ofoptical carriers at less than lo0 GHz spacing:or
• Employing analogue techniques and having a
• bandwidth exceeding2.5 GHz;
• 2.Equipment employing "optical switchingand having a switchingtime lessthan lms;
• 3.Radio equipment having any of the following:
• Quadrature-Amplitude-Modulation (QAM)
• techniques above level 1,024:
• b. Operating at input or output frequencies exceeding
• 31.8GHzor
• C. Operating in the 1.5 MHz to 87.5MHz band and
• incorporating adaptive techniques providingmore than 15 dB suppression ofan interfering signal;
• 4.Mobile equipment having all ofthe following:
• a.Operating at an optical wavelength greater than or
• and
• b.Operating as a"local area network";
• dTechnology"according to the General Technology Note for the "development"or "production"of"MonolithicMicrowave Integrated Circuit(MMIC)amplifiers specially designed for telecommunications and that are any of the following:

• 1.Rated for operation at frequencies exceeding 2.7 GHz up to and including 6.8 GHzwith a"fractional bandwidth" greater than 15%,and having any ofthe following:
• a.A peak saturated power output greater than 75W (48.75 dBm) at any frequency exceeding 2.7 GHz up to and including2.9 GHz,
• b.Apeak saturated power output greater than 55 W (47.4 dBm)at any frequency exceeding 2.9 GHz up to and including 3.2 GHz
• c.A peak saturated power output greater than 40 W (46 dBm)at any frequency exceeding 3.2 GHz up to and including3.7 GHz:or
• d.Apeaksaturated power output also referred to as output power,saturated power output,maximum power output,peak power output,or peak envelope frequency exceeding 3.7 GHz up to and including 6.8GHz:
• 2.Rated for operation at frequencies exceeding 6.8 GHz up to andineluding 16 GHzwith a"fractionalbandwidth" greater than 10%,and having any of the following:
• aApeak saturated power output greater than low and including 8.5 GHz,or
• b.A peak saturated power output greater than 5W(37 dBm)at any frequency exceeding 8.5 GHz up to and including 16GHz
• 3.Rated for operation with a peak saturated power output greater than 3 W(34.77 dBm) at any frequency exceeding 16GHz up to and including 31.8 GHzandwitha "fractional bandwidthofgreater than 10%;
• 4.Rated for operation with a peak saturated power output 31.8 GHzup toand including 37 GHz,
• 5.Rated for operation with a peak saturated power output GHz up to and including 43.5 GHz,and with a"fractional bandwidth"ofgreater than 10%;

SE101

• "Technology"according to the General Technology Note for the
• 5A101.

PART2-INFORMATIONSECURITY

5A2Systems,Equipment and Components

5A002

• "Information securitysystems,equipment and components,as
• follows:
• aDesigned or modified to usecryptography for data confidentiality having a'described security algorithm',where that cryptographic function or capability is usable,has been activated,or can be
• 6.Rated for operation with a peak saturated power output greater than 31.62mW(15 dBm)at any frequency exceeding 43.5 GHzup to and including 75 GHz.and with a"fractional bandwidth"ofgreater than 10%:
• 7.Rated for operation with a peak saturated power output
• 75GHz up to and including 90 GHz,and witha"fractional bandwidth"ofgreater than 5%;or
• 8.Rated for operation witha peak saturated power output
• ZHD06
• "Technologyaccording to the General Technology Note for the "development"or"production"ofelectronic devices and circuits. speciallydesigned fortelecommunicationsand containing specially designed foroperation al temperatures below the"critical
• and having any of the following:
• 1.Current switching for digital circuits using "superconductive"gates with a product of delay time per gate (in seconds) and power dissipation per gate (in watts)
• oflessthan10-J:or
• 2.Frequency selection at all frequencies using resonant circuits with Q-values exceeding 10.000.

activated bymeans of"cryptographicactivationnot employing a secure mechanism,as follows:

• L.ltems having"information securityas a primary function;
• 2.Digital communication or networking systems、cquipment or.components.not specified in 5A002.a.i.;
• 3.Computers,other items having information storage or therefor,not specified in 5A002.a.i.or 5A002.a.ii.:
• 4.ltems,not specified in 5A002.a.i. to 5A002.a.iil.,where the cryptography for data confidentiality'having a'described security algorithm'meets all of the following:
• i.lt supports a non-primary function of the item;
• iiIt is performed by incorporated equipment or "soffware that would,as a standalone item,be specified in Category 5,Part 2:
• b.Being acryptographic activation token',an item designed or modified for anyofthe following:
• 1.Converting.by means of "cryptographic activation" an item not specified in Category 5,Part 2 into an item specifiedin 5A002.a.or 5D002.c.i:or
• Enabling.bymeans of"cryptographic activation" additional functionality specified in 5A002.a.ofan item already specified in Category 5,Part 2;
• c.Designedormodifiedtouseorperform "quantum cryptographyalso known as QuantumKeyDistribution (QKD):
• d.Designed or modified touse cryptographic techniquesto generate channelizing codes,scrambling codes or network identification codes,forsystemsusingultra-wideband modulation techniques and having any of the following:
• L.A bandwidthexceeding 500 MHz,or
• 2.A"fractional bandwidth"of20% ormore:
• e.Designed or modified to use cryptographic techniques to generate the spreading code for"spread spectrum systems,other than those specified in 5A002.d.,including the hopping code for "frequency hopping'systems.

5A003

Systems,equipment and components,for non-cryptographic "information security",as follows:

• a.Communications cable systems and in particular.physical layer security (including Layer I of the Reference Model of Open Systems interconnection)designedormodifiedtouse mechanical.electrical or electronic means to detect surreptitious intrusion:
• b.Specially designed or modified to reduce the compromising emanations of information-bearing signals beyondwhatis necessary for health,safetyor electromagneticinterference standards.

5A004

Systems,cquipment and components for defeating.weakening or bypassing"information security"asfollows:

• a.Designed or modified to perform 'cryptanalytic functionswhich are designed to defeat cryptographic mechanisms in order to derive confidential variables or sensitive data,comprising clear text.passwords or cryplographic keys,including systems or equipment by means of reverse engineering.
• b.Items,not specified in 4A005or 5A004.a.,designed to perform allofthe following:
• 1.Extract raw data'from a computing or communications device,meaning.to retrieve binary data from a storage medium (e.g,RAM,flash or hard disk)of the device without interpretation by the device's operating system orfilesystem;and

2. Circumvent"authentication"or authorisation controls of the device,in order to perform the function described in 5A004.b.i.

5B2Test,Inspection andProduction Equipment 5B002

"Information security" test,inspectionand equipment,asfollows:

• a.Equipment speciallydesignedforthedevelopmentor "productionofequipment specified in5A002,5A003,5A004or 5B002.b.:
• b.Measuring equipment specially designed to evaluate and validate the"information security"functions of the equipment specified

in5A002,5A003 or 5A004,or of"sofiware"specified in 5D002.a.or5D002.c.

5C2Materials

None

5D2Software

5D002

"Software"as follows:

• a"Software"specially designed or modified for the"development" "productionor"use"ofany ofthe following:
• 1.Equipment specified in 5A002 or"software" specified in
• 5D002.c.i:
• 2.Equipment specified in 5A003 orsoftware"specified in
• 5D002.c.ii.:or
• 3.Equipment or"software",asfollows:
• aEquipment specified in 5A004.a.or"software" specified in 5D002.c.ili.a.
• b.Equipment specified in 5A004.b.or "software specified in 5D002.c.ii.b.
• b."Software"having the characteristics ofa'cryptographic activation
• token' specified in 5A002.b.
• c."Software"havingthe characteristics of,orperformingor simulating the functions of,any of the following:
• 1.Equipmenl specified in 5A002.a.,5A002.c.,5A002.d.or
• 5A002.e.:
• 2.Equipment specified in 5A003:or
• 3.Equipment,as follows:
• a.Equipment specified in 5A004.a:
• b.Equipment specified in 5A004.b

5E2Technology 5E002

• "Technology"includes"information security"techniealdata resulting from procedures carried out to evaluate or determine the implementation of functions,features or techniques specified in

CATEGORY6:SENSORSANDLASERS

• 6A Systems,Equipment and Components

6A001 Acoustic systems,equipment and components,as follows:

• Marine acoustic systems,equipmen and specially designed components therefor,as follows:
• 1.Active (transmitting transmitting-and-receiving) systems,cquipment and specially designed components therefor,as follows:
• a.Acoustic seabed survey equipment as follows:
• 1.Surface vessel survey equipmen designed forseabedtopographicmapping and having all ofthe following:
• a.Designed to take measurements at an angle exceeding 20° from the vertical;
• b.Designed to measure seabed topography seabed depths exceeding600m;
• 'Sounding resolution'less than 2:and
• d."Enhancement' of the depth ononoenoe compensation for all the following:
• 1.Motionoftheacoustic sensor:

2. In-water propagation from sensor to the seabed and back:and

• 3.Sound speed at the sensor;
• 2.Underwater survey equipment,whose depth rating is determined by acoustic sensor /pressure,designed for seabed topographic mapping and having any of the following:
• a.Having all ofthe following:
• 1.Designed or modified to operate at depths exceeding 300 m:and

• 2.Sounding rategreater than3 800m/s.
• b.Survey equipment,not specified in 6A00l.a.la.2.a,having allof the following:
• 1.Designedormodifiedto operate at depths exceeding 100m;

2. Designed to take measuremenis at an agnle exceeding 20 from the vertical:

• 3.Having any ofthe following:
• a Operating frequency
• below350 kHz:or
• b.Designedto measure seabed topography ata range exceeding200m from the acoustic sensor, and
• 4.'Enhancement' ofthe depth"accuracy"through compensation ofall of the
• following:
• aMotion of the acoustic
• sensor,
• b. In-water propagation from sensor to the seabed and back;and
• C. Sound speed a
• the sensor,
• 3.SideScan Sonar (SSS)or Synthetic
• Aperture Sonar (SAS).designed for seabed imaging and having all of the following.and specially designed transmitting pue receiving acoustic arrays therefor.
• a.Designed ormodified to operate at
• depthsexceeding 500m,

• b.An area coverage rate'which is twice the product of the sonar range and the maximum speed at which the sensor can operate at that range,of greater than570m/swhile operating at the maximum range that itcan operate with an 'along track resolution' for SSS only.being the product of azimuth (horizontal) beam width (degrees)and sonar range (m) and0.873,of less than 15 cm:and
• c.An across track resolution'which is 75 divided by the signal bandwidth (kHz)of less than15 cm.
• b.Systems or transmitting and receiving arrays,designed for object detection or location.having any of the following:
• 1.A transmitting frequency below 10 kHz
• 2.Sound pressure level exceeding 224 dB (reference lμPa at 1m) for equipment with an operating frequency in the band from 10kHz to 24kHzinclusive:
• 3.Sound pressure levelexceeding 235 dB (reference l μPa at Im) for equipment with an operating frequency in the band between 24kHz and 30 kHz;
• 4.Forming beams of less than I°on any axis and having an operating frequency ofless than100kHz;
• 5.Designed to operate with an unambiguous display range exceeding 5,120m;or
• 6.Designed to withstandpressure during normal operation at depths exceeding 1,000 m and having transducers with any ofthefollowing:
• aDynamic compensation for pressure; Or

• ofthe following:
• b.Incorporating other than lead zirconate titanate as the transduction
• element.
• C.Acousticprojectors,(includingtransducers) specially designed for other equipment not specified in 6Aooi is determined by the control status of the other equipment incorporating piezoelectric(include those made from leadmagnesium-niobateilead-titanate,single crystals grown from. solid solutionorlead-indium-niobateileadmagnesium niobateilead-titanate,single crystalsgrown from solid solution).magnetostrictive,electrostrictive, electrodynamic or hydraulicelements operating individually or in a designed combination and having any
• L.Operating at frequencies below 10 kHz and
• having any of the following:
• a.Not designed for continuous operation at 100% duty cycle and having a radiated free-field SourceLevel(SLRMS) exceeding(10log(f)+169.77)dB (reference 1 μPa atI m)where fis the frequency inHertzofmaximum Transmitting Voltage Response (TVR) below 10kHz:or
• b.Designed for continuous operation at 100%dutycycleandhavinga continuously radiated free-field Source Level(SLRMS)definedalongthe maximum response axis and in the far field of the acoustic projector,at 100% duty cycle exceeding (10log(f)+159.77) dB(reference lμPa at 1m)where fis the frequency in Hertzof maximum Transmitting Voltage Response (TVR) below10kHz:or
• 2.Side-lobe suppression exceeding 22 Db.
• d.Acoustic systems and equipment capable of automatically correctingspeed-ofsound propagationerrorsfor calculationofapointandusingcoherent"signal processing"between two or more beacons andthe

hydrophone unit.designed to determine the position of surface vessels or submersible vehicles and having all the following.and specially designed components therefor:

• 1.Detection range exceeding 1,000 m:and
• 2.Determined position error ofless than 10 m mms 000
• 3.Transmitted pulse signal bandwidth excceding 3 kHz;
• e.Active individual sonars,specially designed or modified to detect and where multiple detection ranges are specified for various environments,the greatest detection range is used locate and automatically classify swimmers or divers, havingall of thefollowing.and specially designed transmitting and receiving acoustic arrays therefor.
• 1.Detection range exceeding 530 m;
• 2.Determined position error of less than 15 mrms (root mean square) when measured at a range of530m:and
• 3.Transmitted pulse signal bandwidth exceeding3kHz,
• 2.Passive systems,equipment,receiving equipment,whether equipment,and specially designed components therefor,as follows:
• aHydrophones, including underwateracoustic transducers designed to operate as passive receivers having any of the following:
• 1.Incorporating continuous flexible sensing elements;
• 2 Incorporating flexible assemblies of discrete sensing elements with either a diameter or length lessthan20mm andwitha separation between elements of less than 20 mm:
• 3.Having any of the following sensing elements:

aOptical fibers;

• b.'Piezoelectric polymer films,sensing
• clements which consist ofpolarized polymer film that is stretched over and attached to a supporting frame or spool(mandrel), other than polyvinylidene-fluoride (PVDF)and itsco-polymers {P(VDF-TrFE)and P(VDF-TFE)):
• c.Flexiblepiezoelectric composites
• which are sensing elements,consist ofpiezoelectric ceramic particles or fibers combined with an electrically insulating.acousticallytransparent rubber.polymer or epoxy compound, where the compound is an integral part of the sensingelements:
• d.Lead-magnesium-niobate/leadPbTiO3,or PMN-PT) piezoelectric
• titanate(ie.,Pb(Mgl/3Nb2/3)O3single crystals grown from solid solution,or
• eLead-indium-niobate/leadmagnesium niobate/lead-titanate (ie., Pb(In1/2Nb1/2)O3Pb(Mg1/3Nb2/3)O3-PbTiO3,
• or PIN-PMN-PT)
• Piezoelectric single crystals grown from solid solution:
• 4.Ahydrophone sensitivity'being twenty timesthelogarithm to the basel0 of the ratio ofrms output voltage toaIVms reference,when the hydrophone sensor, without a pre-amplifier,is placed in a plane wave acoustic field with an rms pressure of IμPa.and greater[better]than-I80 dB at any depth with no acceleration compensation;
• 5.Designed to operate at depths exceeding 35 m with acceleration compensation,or

• foroperationatdepths exceeding1,0o0mandhavinga hydrophone sensitivity'better than-230 dB
• 6.Designed below4kHz,
• b.Towed acoustic hydrophone arrays,consist ofa number of hydrophones providing multiple acoustic output channels,having any of the following:
• 1.Hydrophone group spacing of less than 12.5 morabletobe modifiedtohave hydrophone group spacing of less than 12.5 m
• 2.Designed or able to be modifiedwhere there are provisions to allow a change ofthe wiring o interconnectionstoalter hydrophonc group spacing to operateat depths exceeding35m:
• 3.Heading sensors specified in 6A001.a.2.d:
• 4.Longitudinally reinforced array hoses:
• 5.An assembled array of less than 40 mm in diameter;
• 6.Hydrophonecharacteristicsspecifiedin 6A001.a.2.a.:or
• 7.Accelerometer-based hydro-acoustic sensors
• specified in 6A001.a.2.g;
• c.Processing equipment,specially designed for towed acoustic hydrophone arrays,having"user-accessible programmabilityand time or frequency domain processingandcorrelation,includingspectral analysis,digital filtering and beam forming using
• Fast Fourier or other transforms or processes.
• d.Heading sensors having all of the following:
• 1.An"accuracy"of less(better) than 0.5°:and
• 2.Designed to operate at depths exceeding 35 m or having an adjustable or removable depth sensing device in order to operate at depths exceeding 35m:
• e.Bottom or bay-cable hydrophone arrays,having any

ofthe following:

• 1.lncorporating hydrophonesspecifiedin 6A001.a.2.a:
• 2.Incorporating multiplexed hydrophone group signal modules having all of the
• following characteristics:
• aDesignedtooperateatdepths exceeding 35m orhaving an adjustableorremovabledepth sensing device in order to operate at depths exceeding35 m:and
• b.Capable of being operationally interchanged with towed acoustic hydrophone array modules;or
• 3.Incorporating accelerometer-basedhydro-
• acoustic sensors specified in 6A001.a.2.g;
• fProcessing equipment,speciallydesigned for bottom orbaycable systems,havinguseraccessible programmabilityand time or frequency domain processing and correlationincluding spectral analysis,digital filtering and beam forming using Fast Fourier or other transforms or processes
• g.Accelerometer-based hydro-acousticsensors or
• vector sensors having all of the following:
• 1.Composed of three accelerometers arranged
• along three distinct axes;
• 2.Having an overall 'acceleration sensitivitywhichistwentytimesthe logarithm to the basel0of theratio ofrms output voltage to aIVrms reference when the hydro-acoustic sensor,without a preamplifier,is placed in a plane wave acoustic field with an rms acceleration of1 .greater [better] than 48 dB (reference i.000 mVrmsper1g)
• 3.Designed to operate at depths greater than 35meters:and
• 4.Operating frequency below 20kHz.
• b. Correlation-velocity and Doppler-velocity sonar log cquipment designed to measure the horizontal speed of the equipment

6A002

Optieal sensors or equipment and components therefor,as follows:

• a. Optical detectors as follows:

2. "Space-qualified"solid-state detectors including "focal plane arrays"as follows: 3. "Space-qualified"solid-state detectors having all of the following: 4. L.A peak response in the wavelength range exceeding 10 nm but notexceeding 300 nm; and 5. 2.A response of less than 0.1%relative to the peak response at a wavelength exceeding 6. 400nm:

• b. "Space-qualified solid-state detectors having all of the following:

8. 1.A peak response in the wavelength range exceeding 900 nm but not exceeding 1,200nmand 9. 2.Aresponsetime constantof 95ns or less; 10. Space-qualifiedsolid-state detectors having a peak response in the wavelength range exceeding 1.200nm but notexceeding30,000nm; 11. "Space-qualified""focal plane arrays"having more than 2,048 elements per array and having a peak response in the wavelength range exceeding300 nm but not exceeding 900 nm:

carrier relative to the sea bed,as follows:

• 1:Correlation-velocity sonar log equipment having any of the followingcharacteristics:
• a.Designed to operate at distances between the carrier and the sea bed exceeding 500 m:or
• b.Having speed"accuracy"better than 1% of speed;
• 2.Doppler-velocitysonarlogequipment Ihaving speed accuracy"less(better) than I%of speed.

• 2.Image intensifier tubesandspeciallydesigned components therefor,as follows:
• 1.Image intensifier tubes having all of the following:
• 1.A peak response in the wavelength range exceeding 400nm butnotexceeding 1,050 nm:
• 2.Electron image amplification using any of
• the following:
• aA microchannel plate with a hole pitch (center-to-center spacing)of12 μmorless;or
• b.An electron sensing device with a non-binnedpixel pitch of500 um or less,specially designed or modified toachievechargemultiplication other than by a microchannel plate; and

3.Any of the following photocathodes:

• aMulti-alkali photocathodes having a luminous sensitivity excceding 350
• b.
• μA/Im;
• GaAs or GalnAs photocathodes;or
• C. Other "III/V compound" semiconductor photocathodes having amaximum radiant sensitivity exceeding 10mA/W;
• 2.Image intensifier tubes having all ofthe following:
• 1.A peak response in the wavelength range exceeding 1,050 nm but not exceeding 1,800
• nm;
• 2.Electron image amplification using any of
• the following:
• aA microchannel plate with a hole
• pitch (center-to-center spacing)of12 μm or less;or
• b. An electron sensing device with a non-binned pixelpitch of500 μm or

less,specially designed

or modifiedto achieve 'charge mukiplication'other thanbya microchannelplate,and

• 3.V punodoo semiconductor(e.g GaAs orGalnAs)photocathodesand transferred electron photocathodes,having a maximum"radiant sensitivity"exceeding15 mA/W:
• 3.Specially designed components as follows:
• 1.Microchannel plates having a hole pitch (center-to-center spacing)of12μm or less:
• 2.An electron sensing device with a nonbinned pixel pitch of 500 μm or less, speciallydesignedormodifiedto achieve'charge multiplication'other than by a microchannel plate:
• WIIL compound" semiconductor photocathodes and transferred electron photocathodes;
• 3.Non-space-qualified focal plane arrays as follows:
• all ofthe following:
• Individual elements with a peak response in the wavelength range cxceeding1050 nm but not exceeding1200nm;and
• 2.Anyofthe following:
• A response time constant"of 95 ns or less;
• or
• b. Specially designed or modified to achieve charge maximum"radiant sensitivity"exceeding 10
• multiplicationandhavinga mA/W;
• b. Non"space-qualifiedlnon-linear" focalplane arraysl having all of the following:
• 1.Individual elements with a peak response

within the wavelength range exceeding 900nm but notexceeding1.050nm;and

2.Any ofthefollowing:

• Aresponse"time constant"of less
• than 0.5ns:or
• b. Specially designed or modified to achieve charge multiplication'and having maximum "radiant sensitivity"exceeding 10mA/W
• C Non-"space-qualified"non-linear(2-dimensional) "focal plane arrays"having individual elements with a peak responsein the wavelength range exceeding1200 nmbutnotexceeding30000 nm;
• d. Non-"space-qualified"linear(1-dimensional)"focal plane arrays"having all of the following:
• l.Individual elements with a peak response in the wavelength range exceeding 1.200 nm but not exceeding 3.000 nm:and
• 2.Any ofthe following:
• a. Aratio of'scan direction'being the axis perpendicular to the linear array dimension of the detector element to the cross-scan direction'being axis parallel to linear array of dimension ofthe detector element of less than 3.8:or
• b. Signal processing in the detector
• elements:
• Non-"space-qualified" linear(1-dimensional)"focal plane arrays"having individual clements with a peak response in the wavelength range exceeding
• 3.000 nm butnotexceeding30.000 nm;
• Non-"space-qualified"non-linear (2-dimensional) infrared "focal planearrays" basedon microbolometer(a thermal imaging detector that, as a result ofa temperature change in the detector caused by the absorption ofinfrared radiation,is used to generate any usable signal) material having individual elements with an unfiltered response in

thewavelength range equal to or exceeding 8.000 nm butnotexceeding14.000 nm:

• g. allofthe following:

2. 1.Individual detector elements with a peak response inthewavelengthrange exceeding400nmbut not exceeding900 3. nm: 4. Speciallydesignedormodifiedto 5. achievechargemultiplication'and having a maximum"radian sensitivity" exceeding 10 mA/W for wavelengths exceeding 760nm:and 6. 3.Greater than 32elements; 7. "Monospectralimaging sensors"and "multispectralimaging

• b. sensors.designed for remote sensing applications and having any ofthe following:

9. 1.An Instantaneous-Field-Of-View (IFOV)of less than 200 μrad (microradians);or 10. 2.Specified for operation in the wavelength range exceeding 400 nm but notexceeding 30.000 nm and 11. having all the following: 12. L 13. Providing output imaging data in digital format:and

• b. Having any ofthe following characteristics:

15. 1."Space-qualified";or 16. 2.Designed forairborne operation using other than silicon detectors, and having an IFOVof less than 2.5 mrad(milliradians); 17. Direct view'imaging equipment that presents a visual image to a human observer without converting the image into an electronic signal for television display.and that cannot record or store the image photographically,electronically or by any other means, incorporating anyof the following: 18. 1.Image intensifiertubesspecifiedin6A002.a.2.aor 19. 6A002.a.2.b.:

6A003

Cameras,systems or equipment,and components therefor,as follows:

• a.Instrumentation cameras and specially designed components therefor,as follows:
• 1.Electronic streak cameras having temporal resolution better than 50ns:
• Electronic framing cameras having a speed exceedingl, 000,000 frames/s;
• 3.Electronic cameras having all ofthe following:
• a.An electronic shutter speed (gating capability)of less than I μsper full frame:and
• b.A read-out time allowing a framing rate ofmore than 125 full framesper second;
• 4.Plug-ins having all of the following characteristics:
• a.Specially designed for instrumentation cameras
• 2."Focal plane arraysspecified in 6A002.a.3.:or
• 3.Solid state detectors specified in 6A002.a.I:
• d. Special support components for optical sensorsas follows:
• L."Space-qualified"cryocoolers;
• 2.Non-"space-qualified"cryocoolers having a cooling source temperaturebelow 218K(-55C).asfollows:
• a.Closed cycle type with a specified Mean-Time-ToFailure (MTTF)or Mean-Time-Between-Failures (MTBF).exceeding2.500 hours;
• b.Joule-Thomson (JT) self-regulating mini-coolers having bore (outside) diameters of less than 8mm:
• 3.Opticalsensing fibersspecially fabricatedeither compositionally or structurally,or modified by coating.to be acoustically.thermally.inertially,electromagnetically or nuclear radiation sensitive.
• Read-out integrated circuits'(ROlC) is an integrated circuit designed to underlie and used to read-out signals produced by the detector elements spccially designed for "focal plane arrays" specified in 6A002.a.3.

which have modular structures and which are

• specified in 6A003.a.:and
• b.Enabling these cameras to meet the characteristies specified in 6A003.a.1.,6A003.a.2,or 6A003.a.3
• according to the manufacturer's specifications
• b.Imaging cameras as follows:
• 1.Video cameras incorporating solid state sensors,having
• peak response in the wavelength range exceeding 10 nm, but not exceeding 30.000 nm andhaving all ofthe following:
• aHaving any of the following:
• 1.More than 4x 106"active pixels"per solid state array for monochrome (black and
• white)cameras;
• 2.More than 4x 106"active pixelsper solid state array for colour cameras incorporating
• three solid state arrays:or
• 3.More than 12x106"active pixels"for solid state array colour cameras incorporating one solid state array:and
• b.Having any ofthe following:
• 1.Opticalmirrors specified in 6A004.a;
• 6A004.d:or
• 2.Opticalcontrolequipment specifiedin
• 3.The capability for annotating internally generated camera tracking data'being the information necessary to define camera line
• ofsight orientation with respect to the earth:
• 2.Scanning cameras and scanning camera systems,having all ofthe following:
• a. A peak response in the wavelength range exceeding
• 10nm,butnot exceeding30.000 nm:
• Linear detector arrays with more than 8,192
• b. elements per array: and
• C. Mechanical scanning in one direction
• 3.Imaging cameras incorporating image intensifier tubes specified in 6A002.a 2.a.or 6A002.a.2.b.:

6A004

Opticalequipment and components,as follows:

• a. Optical mirrors (reflectors) incorporating Laser Induced Damage Threshold(LIDT)measured according toISO 21254-1:2011 as follows:

2. 1.Deformable mirrors'having an active optical aperture greater than 10mm and having any of the following.and specially designed component therefor; 3. a.Having all the following: 4. 1.A mechanical resonant frequency of 750 Hz 5. ormore,and 6. 2.More than 200 actuators,or 7. b.A Laser Induced Damage Threshold (LIDT)being 8. anyofthe following: 9. 1.Greater than 1 kW/cm2usinga"CWlaser"; or 10. 2.Greater than 2/cm2using 20ns"laser" 11. pulses at 20 Hz repetition rate; 12. 2.Lightweight monolithic mirrors having an average "equivalent density"of less than 30kg/m2 and a totalmass exceeding 10kg: 13. 3.Lightweight "composite"or foam mirror structures having 14. 4.Imaging cameras incorporating"focal planc arrays" combined with suflicient "signal processingelectronics, beyond the read out integrated circuit,to enable asa minimum the output of an analogue or digital signal once 15. a Incorporating "focal planearraysspecified in 16. 6A002.a.3.a.to 6A002.a.3.e.:

• b. Incorporating"focal plane arraysspecifiedin 6A002.a.3.f:or

18. Incorporating focal plane arrays"specified in 6A002.a.3.g-: 19. incorporatingsolid-statedetectors 20. 5.Imaging cameras specified in 6A002.a.1.

total mass exceeding2kg:

• 4.Mirrors specially designed for beam steeringmirror stages specified in 6A004.d.2.a.with a flatnessof/10 or better (2
• isequal to 633 nmjand having any ofthe following:

8. Diameter or major axis length greater than or equal to 100mm.or

• b.
• Having all of the following:
• 1.Diameter or major axis length greater than
• 50mm but less than 100 mm:and
• 2.A Laser Induced Damage Threshold (LIDT)
• being any ofthe following:
• Greater than 10 kW/em2usinga
• a. "CW laser';or
• b. Greater than 20 J/cm2using 20 ns "laserpusesat 20 Hz repetition
• rate,
• b. Optical components made from zinc selenide (ZnSe)or zinc sulphide (ZnS)with transmission in the wavelength range exceeding 3.000 nm but not exceeding25.000 nm andhaving any ofthe following:
• 1.Exceeding 100 cm3 in volume:or

2. Excceding 80 mm in diameter or length of major axis and 20mm in thickness(depth):

• Space-qualifiedcomponents foroptical systems,as follows:
• 1.Components light-weighted to less than 20%equivalent
• density"compared with a solid blank of the same aperture and thickness:
• 2.Raw substrates,processed substrates having surface coatings (single-layer or multi- layer,metallic or dielectric, conducting.semiconductingor insulating)or having protective films;
• 3.Segments or assemblies ofmirrors designedtobe assembled in space into an optical system with a collecting aperture equivalent to or larger than a single optic 1m in
• diameter;
• 4.Componentsmanufactured from"composite"materials

having a coefficient of linear thermal expansion equal to orless than 5x 10-6 in any coordinate direction;

• d. Optical control equipment as follows:

2. Equipment specially designed to maintain the surface figure or orientation ofthe"space-qualified"components specified in 6A004.c.l.or6A004.c.3. 3. 2.Steering.tracking.stabilization and resonator alignmen equipment as follows: 4. aBeam steering mirror stages designed to camry mirrors having diameter ormajor axis length greater than 50 mm and having all of the following.and specially designed electronic control equipment therefor: 5. 1.A maximum angular travel of±26 mrad or more: 6. 2.A mechanical resonant frequency of 500 Hz or more:and 7. 3.Anangular "accuracy" of10μrad (microradians)or less(better); 8. b.Resonator alignment equipment having bandwidths 10μradorless(better); 9. 3.Gimbals having all ofthe following: 10. a.Amaximum slew exceeding5°, 11. b.A bandwidth of100 Hz or more;

• C. Angular pointing errors of200 μrad(microradians) orless;and

13. d.Having any ofthe following: 14. 1.Excceding 0.15 m but not exceeding 1m in diameter or major axis length and capable of angular accelerations exceeding 2rad;or 15. 2.Exceeding 1m in diameter or major axis length and capable of angular accelerations exceeding 0.5 rad; 16. e.Aspheric optical elements'used in an optical system whose imaging surface or surfaces are designed to depart from the shape ofan ideal sphere having all 17. ofthe following:

6A005

• "Lasers",other than those specified in 0B001.g.5.or 0B001.h.6, components and opticalequipment,as follows:
• a)Non-tunable"continuous wave "(Cw) lasers"having any of the
• following:

1. Output wavelength less than 150 nm and output power exceedingIW;

• 2 Output wavelength of 150 nm or more but not cxceeding
• 510nm and output power exceeding30w;

3. Output wavelength exceeding 510 nm but not exceeding

• 540nm and any of the following:
• a)Single transversemode'being abeam profile having an M2-factor ofless than l,3,output and
• output powerexceeding 50 W;or
• b)Multiple transverse mode'being "lasers"with a beam profile having an M2-factor of1.3or higher
• output and output power exceeding150 W;

1. Largest dimension of the optical-aperture greaterthan400 mm;

• Surface roughness where the optical element is designed or manufactured with the intem tomeet,or exceed,the control parameter less than Inm (rms) for sampling lengths
• equal to or greater than Imm:and
• 3 Coefficient of linear thermal expansion's absolute magnitude less than 3xl0-6/K at 25°C.
• f.Dynamic wavefront measuring equipment having
• allofthefollowing:

1. 'Frame rates'being a frequency at which all -active pixelsl in the-focal plane arrayl areintegratedforrecording images protected by the wav-efront sensor optics, equal to ormore than IkHz:and

• Awavefront accuracy equal to or less (better)than A20atthedesigned

3.

• wavelength.

• Output wavelength exceeding 540nm but not exceeding 800nm andoutput power exceeding30 W:
• Output wavelength exceeding 8o0 nm but not exceeding
• 975nm and any of the following:
• a)Single transverse mode'being a beam profile having an M2-factor ofless than 1.3.output and outputpower exceeding50 W:or
• b)Multiple transverse mode'being"laserswith a beam profile having an M2- factorof1.3 or output and output power exceeding 80 W:
• Output wavelength exceeding 975 nm but not exceeding
• 6 1.150 nm and any ofthe following:
• a)Single transverse mode'output and any of thc following:

1. Output power exceeding1,000 W:or

• 2.
• Having all ofthe following:
• a)Output power exceeding 500 W:and
• b)Spectralbandwidth less than 40
• GHzor
• b)Multiple transverse mode'output and any ofthe
• following:
• 1.Wall-plug efficiency'being the ratio of "laser"output power(or average output power)tototal clectricalinputpower required to operate the"laser",including the powersupply/conditioningandthermal conditioning/heat exchanger,exceeding 18% and output power exceeding 1.000 W;or
• 2.Output power exceeding 2kW;
• Output wavelength exceeding 1,150 nm but not exceeding
• 1,555 nm and any of the following:
• a)'Single transverse mode'andoutputpower exceeding 50 W:or
• b)Multiple transverse mode'and output power
• exceeding 80 W:

8. Output wavelength exceeding 1,555 nm but not exceeding

• 1,850 nm and output power exceeding1 W:

9. Output wavelength exceeding 1,850 nm but not exceeding 2,100nm,and any of the following: 2. a)'Singletransverse mode'andoutputpower exceeding1W;or 3. b)"Multiple transverse mode'output and output power exceeding120 W:or 10. Output wavelength exceeding 2.100 nm and output power exceedingI W: 5. b)Non-tunable""pulsed lasers"having any of the following: 1. Output wavelength less than 150 nm and any of the following: 7. aOutput energy exceeding 50 mJper pulse andpeak 8. power"exceeding1 W:or 9. b."Average output power"exceeding 1 W: 2. Output wavelength of 150 nm or more but not exceeding 510nm and any ofthe following: 11. a.Output energy exceeding 1.5 Jper pulse andpcak 12. powerexceeding30 W;or 13. b."Average output power"exceeding 30 W 3. Output wavelength exceeding 510 nm but not exceeding 540nm and any of the following: 15. aSingle transverse mode'output and any of the 16. following: 1. Output energy exceeding1.5Jperpulse and peakpowerexceeding50 W;or 2. "Average output power"exceeding 50 W;or 19. b.Multiple transverse mode'output and any of the 20. following: 21. Output energy exceeding l.5 J per pulse and "peakpower"exceeding 150 W;or 22. "Average output power"exceeding 150 W; 23. Output wavelength exceeding 540 nm but not exceeding 800nm and any of the following: 24. aPulse durationless than Ips and any of the following:

1. Output energy exceeding 0.oo5 Jper pulse and"peak power"exceeding5 GW:or 2. "Average output power"exceeding 20 W;or 3. b."Pulse duration"equal to or exceeding|ps and any ofthe following: 1. Output energy exceeding1.5 J per pulse and peak power"exceeding30 W;or 2. "Average output power"exceeding 30 W; 6. Output wavelength exceeding 800 nm but not exceeding 5. 975nm and any of the following: 8. a."Pulse duration"less than I ps and any of the following: 1. Output energy exceeding 0.0osJper pulse 10. andpeakpowerexceeding5GW:or 11. Single transverse mode'output and"average 12. output power"exceeding 20 W: 13. b."Pulse duration"equal to or exceeding l ps and not exceeding| μs and any ofthe following: 14. Output energy exceeding 0.5 J per pulse and 15. "peakpower"exceeding50 W; 16. 'Single transverse mode'output and "average 17. 2 output powerexceeding20 W:or 3. Multiple transversemode'outputand "average output power"exceeding 50 W;or 19. "Pulse durationexceeding lμs and any of the 电 following: 1. Output energy exceeding 2Jper pulse and 21. "peak powerexceeding 50 W; 22. Single transverse mode'output and "average 2. output powerexceeding 50 W;or

'Multiple transverse mode'output and "average output power"exceeding 80 W

6. Output wavelength exceeding 975 nm but not exceeding 2. 1,150 nm and any of the following: 3. "Pulse duration"of less than | ps,and any of the 4. following:

1. Output "peak power"cxceeding 2GW per pulse: 2. "Average output powerexceeding 30 W:or 3. Output energy exceeding 0.002Jper pulse 4. b."Pulse duration"equal to or exceeding 1 ps and less than I ns and any ofthe following: 1. Output"peak power"exceeding 5 GWper pulse: 6. 2. 7. "Average output powerexceeding 50 W;or 3. Output energy exceeding 0.1 Jper pulse; 9. "Pulse durationequal to or exceeding I ns but not exceedingl μs,and any ofthe following; 10. d."Pulse duration"exceedingI μs and any of the following: 1. 'Single transverse mode'output and any of the following: 12. L "Peak powerexceeding 500kW;

• b. "Wall-plugefficiency exceeding 12% and"average outpul power exceeding100 W:or

14. "Average output power"exceeding 150W:or 15. 'Multiple transverse mode'output and any of thefollowing: 16. a"Peak power"exceeding 1 MW; 17. b.Wall-plugefficiencyexceeding 18%and"average output power 18. exceeding500 W:or 19. "Average output power"exceeding2 kW: 7. Output wavelength exceeding 1,150 nm but not exceeding 1,555nm,and any ofthe following: 21. a"Pulse duration"not exceeding l μs and any of the following:

10. following: 2. ilOutput energy exceeding 100 mJper pulse and "peakpower"exceeding1 W;or 1. Output energy exceeding 0.5 Jper pulse and"peak power"exceeding50 W: 2. Single transverse mode'output and"average output power"exceeding 20 W;or 3. 'Multipletransversemode'output and "average output power"exceeding 50 W;or 6. b."Pulse duration"exceeding 1 μs and any of the following: 1. Output energy exceeding 2Jper pulse and "peak power"exceeding 50 W; 2. Single transverse mode'output and"average output power"exceeding 50 W;or 3. Multipletransverse mode'outputand "average output power"exceeding 80 W; 8. Output wavelength cxceeding 1.555 nm but not exceeding 1,850 nm,andany ofthe following: 11. a.Output energy exceeding 100 mJper pulse and "peak power"exceeding 1 W;or 12. b."Average output power"exceeding 1 W; 13. 9 Output wavelength exceeding 1,850 nm but nol exceeding 2,100 nm,and any ofthe following: 14. a.Single transverse mode'and any ofthe following: 15. Output energy exceeding 100 mJ per pulse 1. and"peak power"exceeding1 W;or 17. "Average output power"exceeding I W;or 18. b..Muhiple transverse mode'and any of the following: 19. 1. 20. Output energy exceeding 100 mJ per pulse and"peak power"exceeding 10kW:or 2. "Average output power"exceeding 120 W; 22. or

• 3.

ii"Average outpul power"exceeding 1 W:

• c)"Tunable"-lasers"having any ofthe following:
• Output wavelength less than 600 nm and any of the following:
• a.Output energy exceeding 50 mJper pulse and peak power"exceeding|W;or
• b.Average or CWoutput power exceeding 1 W:
• Output wavelength of 600 nm or more but not exceeding 1,400 nm.and any ofthe following:
• aOutput energy exceeding 1 J per pulse and"peak power exceeding20 W;0r
• b.Average or CWoutput power exceeding 20 W;or
• Output wavelength exceeding 1,400 nm and any ofthe following:
• powerexceeding1W;or
• b.Average or CWoutput power exceeding 1 W:
• d)Other"lasers",not specified in 6A005.a.6A005.b.or 6A005.c.as
• follows:
• L Semiconductor "lasers"having optical output connectors like,fiber optic pigtails as follows:
• a. Individual single-transverse mode semiconductor "lasers"having any ofthe following:
• Wavelength equal to or less than 1,510 nm and average or CWoutput power,exceeding
• 1.5W:or
• Wavelength greater than 1,510 nm and average or CWoutput power,excceding 500 mW:
• b.Individual multiple-transverse mode semiconductor "lasers"having any ofthe following:

1. Wavelength ofless than 1 400 nm and average or CW output power,exceeding

• 15W:
• 2 Wavelength equal to or greater than 1,400 nm and less than 1,900 nm and average or CWoutput power,exceeding2.5 W;or

• 3.Wavelength equal to or greater than
• 1,900 nm and average or CWoutput power. exceeding1.W:
• Individual semiconductorlaser"bars,having any
• ofthe following:

1. Wavelength of less than 1,400nm and average or CWoutput power,exceeding 100 W:

• Wavelength equal to or greater than 1,400 nm and less than 1,900 nm and average or
• CWoutput power,exceeding25 W:or

3. Wavelength equal to or greater than 1,900 nm and average or CW output power, exceeding 10 W:

• d. Semiconductor"laser"'stackedarrays'(two-
• dimensional arrays)having any ofthe following:
• Wavelength less than I,400 nm and having
• anyofthefollowing:
• Average or CW total output power less than 3kWand having average or CWoutputpower density'greater
• than500 W/cm2;
• 口 Average or CWtotal output power equal to or exceeding3kWbut less than or equal to 5 kW,and having averageorCwoutputpower density'greater than350 W/cm2:
• Average or CW total output power exceeding5kW:
• d. Peak pulsedpower density exceeding2.500 W/cm2:or
• e. Spatially coherent average or CW total output power.greater than 150
• w:
• Wavelength greater than or equal to 1,400 nm but less than I,900 nm,and having any ofthe following:

• 3.
• a.Average orCWtotaloutput powerlessthan 250 Wandaverage or CWoutputpower density'greater than 150 W/em2;
• b.Average or CW total output power cqual to orexceeding250 Wbut less than or equal to 500 W,and having averageor CWoutpupower
• density'greater than50 W/cm2;
• C Average or CW total output power exceeding500 W:
• pulsed 'power density'
• d.Peak exceeding 500 W/cm2:or
• e.
• Spatially coherent average or CW total output power,exceeding 15 W;
• Wavelength greater than or equal to 1.900 nm and having any of the following:

1. Average or CWoutput power densitygreater than 50 W/cm2;

• 2 Average or Cwoutput power greater
• than 10 W;or

3. Spatially coherent average or CW total output power,exceeding 1.5 W;

• or
• 6A005.d.l.C.
• Semiconductor "laser"or"laser"diode,'stacked arrays,other than those specified in 6A005.d.I.d,
• having all ofthe following:
• 1 Speciallydesignedor modifiedtobe combined with other'stacked arrays'to form a larger'stacked array:and
• Integrated connections,common for both
• electronics and cooling:

2. Carbon monoxide (CO)"lasers"having anyof the

• following:
• a.Output energy exceeding 2J per pulse and "peak

power"exceeding5kW:or

• b.Average orCWoutput power exceeding 5 kW;
• Carbon dioxide (CO2)"lasers"having anyof the
• following:
• a CWoutput power exceeding15kW;
• b.
• Pulsed output with a"pulse duration"exceeding 10 μs and any ofthe following:

1. "Average output powerexceeding 10 kW:

• or

2. "Peak powerexceeding 100kW:or

• Pulsed output with a"pulse duration"equal to or less than l0 μs and any of the following:
• 1.Pulse energy exceeding 5 J per pulse; or
• 2."Average output power"exceeding 2.5 kW;

4. Excimer"lasers"having any of the following:

• Output wavelength not exceeding 150 nm and any ofthefollowing:
• 1.
• Output energy exceeding 50mJper pulse;or

2. "Average output power"exceeding1 W:

• Outputwavelength exceeding 150 nm but not exceeding190 nm and any ofthe following:
• 1.
• Output energy exceeding1.5 Jper pulse;or
• 2.
• "Average output power"exceeding 120 W;
• Output wavelength exceeding 190 nm but not exceeding360 nm and any ofthe following:
• 1.
• Output energy excceding 10 J per pulse;or

2. "Average output powerexceeding 500 W:

• or
• Output wavelength exceeding 360 nm and any of thefollowing:
• 1.Output energy exceeding 1.5 Jper pulse;or
• 2.
• "Average output power"exceeding 30 W;
• 5.
• "Chemical lasers"as follows:
• Hydrogen Fluoride(HF)"lasers":

• b. Deuterium Fluoride(DF)"lasers":

2. 'Transfer lasers' being"lasers"in which the lasting

• C. species are excited through the transfer of energy by collision ofa non-lasting atom or molecule with a lasting atom or molecule species,as follows:

4. Oxygen lodine(O2-1)"lasers"; 5. 2 Deuterium Fluoride-Carbon dioxide (DFCO2)"lasers"; 6. single output pulse or that have a time interval between pulses exceeding one minute,Nd:glass "lasers"having any of the following: 7. "Pulse durationnot exceeding 1 μs and output energy exceeding50Jperpulse;or 8. b. 9. "Pulse duration exceeding| μs and output energy exceeding 100Jperpulse: 10. e)Components asfollows: 1. Mirrors cooled either by'active cooling'or by heat pipe cooling: 2. Optical mirrors or transmissive or partially transmissive optical or electro-opticalcomponents,other thanfused tapered fiber combiners and Multi-Layer Dielectric gratings 13. (MLDs),specially designed for use with specified "lasers"; 14. 3.Fiber"laser"components as follows: 15. Multimodetomultimodefusedtaperedfiber combiners having all of the following: 16. 1.An insertion loss better (less)than or equal to 0.3 dB maintained at a rated total average orCWoutpul power (excluding output power transmitted through the single mode core ifpresent)exceeding 1,0o0 W;and 17. 2 Number ofinput fibers equal to or greater than3; 18. b.Single mode tomultimode fused tapered fiber 19. combiners having all of the following: 20. 1.An insertion loss better (less)than 0.5 dB

• 3.

maintained at a rated total average or CW outputpowerexceeding 4.600 W;

• Number of input fibers equal to or greater

2. than 3:and 3. Having any ofthe following:

• a.ABeam Parameter Product (BPP) measured at the output not exceeding 1.5 mm mrad for a number ofinput fibers less than or equal to 5:or
• A BPP measured at the output not
• excceding.2.5mmmradfora number of input fibersgreater than 5:
• MLDs having all ofthe following:

1. Designed for spectral or coherent beam

• combination of5or more fiber"lasers:and

2. CW"LaserInduced DamageThreshold (LIDT)greater than or equal to I0kW/cm2.

• f)Opticalequipment as follows:
• 1."Laserdiagnosticequipment speciallydesigned for dynamic measurement of"SHPL"system angular beam
• (microradians)or less(better):
• Optical equipment and components.specially designed for
• system and having any of the following:
• a. An "accuracy"of 0.l μm or less, for wavelengths greater than lum:or
• b. An"accuracy"of /l0 orless (better)at the designed wavelength,for wavelengths equal to or
• lessthanIum:
• Projection telescopes specially designed for use with "SHPL"systems;
• g)Laser acoustic detection equipment/ILaserl Microphone/Particle
• FlowDetection Microphone having all ofthe following:
• CW"laser"output power equal to or exceeding20mW;

2. "Laser"frequency stability equal to or better (less) than 10

• MHz:

6A006

• "Magnetometers","magnetic gradiometers","intrinsicmagnetic gradiometers", underwater electricfield sensors,"compensation systems,and specially designed components therefor,as follows:
• a."Magnetometers and subsystems as follows:
• "Magnetometers" using"superconductive" (SQUID)
• "technology"and having any of the following:
• SQUID systems designed for stationary operation, without specially designed subsystems designed to reduce in-motion noise,and having a 'sensitivity equal to or lower (better)than 50 fT(rms)per
• a. square root Hz at a frequency of1 Hzor
• SOUiD systems having an in-motion-magnetometer sensitivitylower (better)than 20 pT (rms)per square root Hz at a frequency of 1 Hz and specially
• designed to reduce in-motion noise;
• "Magnetometers"usingopticallypumpedornuclear precession (proton/Overhauser)"technology"havinga sensitivity'lower (better) than 20 pT(rms)per square root

3. "Magnetometers"using fluxgate "technology"having a sensitivity'equal to or lower (better) than 10 pT (rms)per

• square root Hz at a frequency of I Hz;
• Induction coil"magnetometershaving a'sensitivity'lower (better)than any of the following:
• 0.05nT (rms)per square root Hz at frequencies of
• b.
• lessthan1 Hz;
• 1x 10-3nT (rms)per square root Hz at frequeneies of1 Hzor more but not exceeding 10 Hzor
• 1x10-4 nT (rms)per square root Hz at frequencies exceeding10Hz;fiberoptic"magnetometers having a'sensitivity'lower (better) than InT (rms)
• per square root Hz

3. "Laser"wavelengths equal to or exceeding 1,000 nm but

• not exceeding2.000 nm;

4. Optical system resolution better(less) than I nm:and 5. Optical Signal to Noise ratio equal to or exceeding 103.

• 5.Fibre optic "magnetometers"having asensitivity less(better)than InT (rms)per square root Hz
• b. Underwater electric field sensors having a sensitivity'(noise level) being the root mean square of the device-limited noise floor,lower (better)than 8nanovolt per meter per square root Hz when measured at I Hz:
• "Magnetic gradiometers"as follows:

1. "Magnetic gradiometers"usingmultiple "magnetometers" specifiedin 6A006.a; 2. Fiber optic "intrinsic magnetic gradiometers"having a magnetic gradient field 'sensitivity'lower (better) than 0.3 nT/m rms per square root Hz; 3. "Intrinsicmagnetic gradiometers",using "technology" gradient field sensitivitylower(better)than 0.015nT/m rmsper square root Hz:

• d. "Compensation systems" for magnetic or underwater clectric field sensors resulting in a performance equal to or better than the specifiedparameters of6A006.a.,6A006.b.or 6A006.c.:
• Underwater electromagnetic receivers incorporating magnetic field sensors specified in 6A006.aor underwater electric field sensors specified in 6A006.b.

6A007

Gravity meters (gravimeters) and gravity gradiometers,as follows:

• Gravity meters designed or modified for ground use and having a static"accuracy"of less(better) than I0μGal;
• b. Gravity meters designed for mobile platforms and having all of the following:
• 1.A static"accuracy"of less(better)than 0.7 mGal;and

2. An in-service (operational)"accuracy"of less (better) than 0.7mGal having a"time-to- steady-state registration"of less than 2minutes under any combination ofattendant

• corrective compensations and motional influences;
• C
• Gravity gradiometers.

6A008

Radar systems,equipment and assemblies,having any of the

following.and specially designed components therefor:

• Operating at frequencies from40 GHz to 230 GHz andhavingany ofthe following:

1. An average output power exceeding 100 mW:or

• Locatingaccuracy"of 1 m or less(better) in range and 0.2 degree or less(better) in azimuth;
• b. A tunable bandwidth exceeding ±6.25% of thecenter operating frequency'which cqual one halfof the sum ofthe highest plus the lowest specified frequencies;
• Capable ofoperating simultaneously on more than two carrier frequencies;
• d. Capable ofoperating in synthetic aperture (SAR).inverse synthetic aperture (ISAR)radar mode,or side-looking airborne (SLAR) radar mode:
• e Incorporating electronically scanned array antennae/electronically steerable array antennae;
• f. Capable of height findingnon-cooperative targets;
• Specially designed for airborne (balloon or airframe mounted) operation and having Doppler"signal processing" for the detection ofmoving targets;
• Employing processing of radar signals and using any of the following:
• 1.
• "Radar spread spectrum"techniques;or
• 2."Radar frequency agility"techniques;
• Providing ground-based operation with a maximum "instrumented rangeexceeding 185km;
• Being "laser"radar or Light Detection and Ranging (LIDAR) equipment and havingany of the following:
• "Space-qualified";
• Employing coherent heterodyne or homodyne detection techniques and having an angular resolution of less (better) than 20μrad (microradians);or

3. Designed for carrying out airborme bathymetric littoral surveys to International Hydrographic Organization (IHO) for Hydrographic Surveys or better,and using one or more "lasers"with a wavelength exceeding 400 nm but not exceeding 600 nm;

• k.Having signal processing" sub-systems using "pulse compression"and havingany of the following:
• 1.A"pulse compressionratio exceeding 150;or
• 2.Compressed pulse width ofless than 200 ns;or
• 1.Having data processing sub-systems and having any of the
• following:
• 1.'Automatic target tracking'providing.at any antenna rotation, the predicted target position beyond the time of the next antenna beam passage:or
• Configured to provide superposition and correlation,or fusion,of target data within six seconds from two or more geographically dispersedradar sensors to improve the aggregate performance beyond that of any single sensor specified in 6A008.f.or 6A008.i.

6A102

Radiation hardened'detectors',mechanical,eleetrieal,optical or astimulus such as anenvironmental change in pressure or

chemical device that automatically identifies and records,or registers temperature,an clectricalorelectromagnetic signal or radiation from radioactive material including devices that sense by one time operation or failure).other than those specified in 6A002,specially electromagnetic pulse (EMP),X-rays,combined blast and thermal effects)and usable for "missiles",designed or rated to withstand radiation levels which meet or exceed a total irradiation dose of5x 105rads(silicon).

6A107

Gravity meters(gravimeters)and components for gravity meters and gravity gradiometers,as follows:

• 山 Gravity meters,other than those specified in 6A007.b,designed or modified for airborne or marine use,and having a static or operational accuracy equal to or less (better) than 0.7milligal (mgal).andhaving atime-to-steady-state registration oftwo
• b..
• minutesor less:
• Specially designed components for gravity meters specified in 6A007.bor 6A107.a.andgravity gradiometers specifiedin 6A007.c.

6A108

Radar systems,tracking systems and radomes,other than those

specified in entry 6A008,as follows:

• a Radar and laser radar systems designed or modified for use in space launch vehicles specified in 9Ao04 or sounding rockets specified in9A104
• h. Precision tracking systems,usable for missiles' that complete rocket systems and unmanned aerial vehicle systems capable ofa range exceeding300km as follows:
• Tracking systemswhich useacode translator in conjunction with either surface or airbome references or navigationsatellite systemstoprovidereal-time measurements of in-flight position and velocity:
• Range instrumentationradarsincluding associated optical/infrared trackers with all ofthefollowing capabilities:
• a Angularresolution better than I.5 milliradians;
• b. Range of 30 km or greater with a range resolution
• better than I0 m rms;and
• C. Velocity resolution better than 3 m/s;
• Radomes designed to withstanda combined thermal shock greater than4.184x106 J/m2accompained bya peakover pressureof greater than 50 kPa,and usable in"missiles"for protecting against nuclear effects(e.g.electromagnetic pulse(EMP).X-rays, combined blast and thermaleffects).

6A202

Photomultiplier tubeshavingboth of the following characteristics:

• 1.Photocathode area of greater than 20 cm2;and
• 2.Anode pulse rise time ofless than I ns.

6A203

Cameras and components,other than those specified in 6A003,as follows:

• Streak cameras,and specially designed components therefor,as follows:
• L. Streak cameras with writing speeds greater than 0.5 mm/us;

2. Electronic streak cameras capable of 50 ns or less time resolution;

• 3.Streak tubes for cameras specified in 6A203.a.2.;

• 4.Plug-ins specially designed for use with streak cameras which have modular structures andthat enable the performance specifications in 6A203.a.l.or6A203.a.2.
• Synchronizing electronics units,rotor assemblies consisting of turbines,mirrors and bearings specially designed for cameras specified in 6A203.a.1;
• b. Framing cameras,and specially designed components therefor,as
• follows.:

Framing cameras with recording rates greater than 225,000 frames persecond;

Framing cameras capable of 50 ns or less frame exposure time;

Framing tubes and solid-state imaging devices having a fast image gating(shutter) time of 5o ns or less specially designed for cameras specified in 6A203.b.l.or 6A203.b.2.:

Plug-ins specially designed for use with framing cameras which

havemodularstructuresand that enable the performance specifications in 6A203.b.1.or 6A203.b.2.

Synchronizing electronics units,rotor assemblies consisting of

turbines,mirrors and bearings specially designed for cameras specifiedin 6A203.b.1.or6A203.b.2

• Solid state or electron tube cameras,and specially designed components therefor,as follows:
• Solid-state cameras or electron tube cameras with a fast

1. image gating (shutter)time of 50 ns or less; 2. Solid-state imaging devices and image intensifiers tubes having a fast Image gating (shutter)time of 50 ns or less specially designed for cameras specified in 6A203.c.1.: 3. Electro-optical shuttering devices (Kerr or Pockels cells) with a fast image gating (shutter) time of 50 ns or less;

• Plug-ins specially designed for use with cameras which have modular structures and that enable the performance specifications in 6A203.c.1.
• d. Radiation-hardenedTVcameras,or lenses therefor,specially designedor rated asradiation hardened to withstand a total radiation dose greater than 50 x103 Gy(silicon)which is the encrgy in Joules per kilogram absorbed by an unshielded silicon sample when exposed to ionizing radiation,(5x 106rad (silicon)) without operational degradation.

6A205

"Lasers","laser"amplifiers and oscillators,other than those specified in0B001.g.5.0B001.h.6.and 6A005:as follows:

• a.Argon lon"lasers"having both of the following characteristics:
• Operating at wavelengths between 400 nm and 515nm: pue
• 2.
• b. Tunable pulsed single-mode dye laser oscillators having all of the following characteristics:
• Operating at wavelengths between 300 nm and 800nm;

2. An average output power greater than I W: 3. A repetition rate greater than I kHz;and

• 4.
• Pulse width less than 100 ns:
• C. Tunable pulsed dye laser amplifiers and oscillators.having all of the following characteristics:

1. Operating at wavelengths between 300 nm and 800 nm: 2. An average output power greater than 30 W; 3. A repetition rate greater than I kHz and 4. Puse width less than 100 ns;

• d. Pulsed carbon dioxide (CO2)"lasers"having all of the following characteristics:
• L. Operating at wavelengths between 9,000 nm and 11.000 nm;
• 2.
• 3.
• Arepetition rate greater than 250 Hz;
• An average output power greater than 500 W;and

4. Pule width ofless than 200 ns;

• Para-hydrogen Raman shifters designed to operate at 16 μm output wavelength and at a repetition rate greater than 250 Hz;
• f Neodymium-doped (other than glass)"lasers"with an output wavelength between 1,000 and1100 nm having either of the following:

1. Pulse-excited and Q-switched with a pulse duration equal

• aA single-transverse mode output with an average
• to or more than Ins,and having either of the following:

6A225

Velocity interferometers such as Velocity lnterferometer Systems for any Reflector,Doppler laser Interferometers and Photonic Doppler Velocimeters,also known as Heterodyne Velocimeters for measuring microseconds.

6A226

Pressure sensors,as follows:

• 10 GPa,including gauges made with manganin,ytterbium,and polyvinylidene fluoride/polyvinyl difluoride;
• b.

6B002

Masks and reticles,specially designed for optical sensors specified in 6A002.a.1.b.or6A002.a.1.d.

10089

Optieal equipment as follows:

• equal to or better than 0.I% of the reflectance value;
• b. Equipment other than optical surface scattering measurement equipment,having an unobscured aperture ofmore than 10 cm, specially designed for the non-contact optical measurement ofa non-planar optical surface figure(profile)to an"accuracy"of2nm
• Quartz pressure transducers for pressures greater than l0 GPa.

6B Test,Inspection and Production Equipment

outputpower greater than 40W;or

• b.Amultiple-transversemodeoutputhavingan averagepower greater than 50 W:or
• Incorporatingfrequencydoublingto givean output wavelength between 500and S50nm withan average outputpowerof more than40 W:
• Pulsed carbon monoxide (CO)"lasers"other than those specified in 6A005.d.2.,having all ofthe following:

1. Operating at wavelengths between 5.000 and 6,000 nm; 2. Arepetition rate greater than 250 Hz; 3. An average output power greater than 200 W:and

• 4.
• Pulse width of less than 200 ns.

6B007

Equipment to produce,align and calibrate land-based gravity meters

6B008

Pulse radar cross-section measurement systems having transmit pule widths of 1o0 ns or less,and speclally designed components therefor.

Systems,other than those specified in 6B0o8,specially designed for radar cross section measurement usable for'missiles',which complete roeket systems and unmanned aerial vehicle systems capable ofa range exceeding300 km'and their subsystems.

6CMaterials

6C002

Optieal sensor materiasasfollows:

• a Elemental tellurium ofpurity levelsof999,995%or more;
• b. Single crystal (including epitaxial wafers)of any of the following:
• Cadmium zinc telluride,with zinc content of less than 6% by'mole fraction'present in the crystal and;

2. Cadmium telluride of any purity level;or 3. Mercury cadmium telluride of any purity level.

6C004

Optical materials asfollows:

• P Zinc selenide and zinc sulphide-substrate blanks.produced by the chemical vapour deposition process and having any of the following:
• 1.Avolume greater than 100 cm3;or

2. Adiameter greater than 80 mm and a thickness of20 mm ormore;

• b.Electro-opticmaterials and non-linear optical materials,as follows:
• Potassium titanyl arsenate,

2. Silver gallium selenide; 3. Thallium arsenic selenide:

4. Zinc germanium phosphide. zinc germanium biphosphide or zinc germanium diphosphide):or 2. 5.Gallium selenide: 3. Non-linear opticalmaterials. other than those specified in 4. 6C004.b.,having any ofthe following: 5. 1.Having all of the following: 6. Dynamic (also known as non-stationary) third order non-linear susceptibility or more;and 7. b.Response time ofless than 1ms,or 8. Second order non-linear susceptibility or more: 9. d "Substrate blanksof silicon carbide or beryllium beryllium (Be/Be)deposited materials,excecding 300 mm in diameter or major axis length; 10. Glass,including fused silica.phosphate glass,fluorophosphate glass,zirconium fluoride and hafnium fluoride and having all of the following: 11. 1.A hydroxyl ion (OH-) concentration of less than 5ppm; 12. 2 Integrated metallic purity levels of less than 1 ppm;and 3. High homogeneity (index of refraction variance) less than 5 x10-6

• f. Synthetically produced diamond material with an absorption of less than 10-5 cm-1 for wavelengths exceeding 200nm but not exceeding 1.000 nm.

6C005

"Laser"materials as follows:

• Synthetic crystalline"laser"host material in unfinished form made of'Titanium doped sapphire'
• b.Rare-earth-metal doped double-clad fibers having any of the
• following:

1. Nominal"laser"wavelength of975nm to 1,150nm and

• having allofthefollowing:
• aAverage core diameter equal to or greater than 25 μm,and
• b.Core Numerical Aperture'(NA) includes fibers assembled with end caps,measured at the emission wavelengthsof the fiber of less than 0.065;or

• 2.Nominal "laser"wavelength exceeding 1,530 nm and having all of the following:
• a.Average core diameter equal to or greater than 20 μm;and
• b.Core NA'less than 0.1.

6DSoftware

6D001

• "Software"specially designed for the"development"or"produetion"
• ofequipment specified in 6A004,6A005,6A008or6B008.

20009

• 6A002.b.6A008or6B008.

6D003

Other"software"as follows:

• a"Software"as follows:

1. "Software" specially designed for acoustic beam forming for thereal-time processing"of acoustic data for passive

• reception using towed hydrophone arrays;
• "Source code"for the "real-time processing"of acoustic
• data forpassive reception using towed hydrophone arrays:

3. "Software" specially designed for acoustic beam forming for "real-time processingof acoustic data for passive reception using bottom or bay cable systems;

• "Source code" for"real-time processing"of acoustic data for passive reception using bottom or bay cable systems;

5. "Softwareor "source code",specially designed for all of the following:

• a. "Real-time processingofacoustic data from sonar systems specified in 6A001.a.l.e.;and
• b.Automatically detecting. classifying and
• determining the location of divers or swimmers;
• plane arraysspecified in 6A002.a.3.fand designed ormodified to remove a frame rate restriction and allow the camera to exceed the framerate specified in 6A003.b.4.
• c.Software"specially designed to maintain the alignment and

6D102

"Software"specially designed or modified for the "use"of goods specifiedin6A108.

6D103

phasing of segmented mirror systems consisting ofmirror

thanlm;

d."Soffware"as follows:

1. "Software" specially designed for magnetic and electric field"compensation systemsfor magneticsensors designed to operate onmobileplatforms 2. "Sofware"specially designed for magnetic and electric 3. field anomaly detection on mobile platforms; 3. "Software"specially designed for"real-time processing"of electromagnetic data usingunderwater electromagnetic receivers specified in 6A006.e.; 5. "Sourcecode" forrealtimeprocessing"of electromagnetic data using underwater electromagnetic receivers specified in 6A006.e.:

• e. "Software specially designed to correct motional influences of gravitymeters orgravity gradiometers;

7. "Softwareas follows: 8. AirTrafficControl(ATC)"software"application "programs"designed to be hostedon general purpose computers located at Air Traffic Control centers and capable of acceptingradar target data from more than four primaryradars; 9. "Software"for the design or"production"of radomes havingall ofthe following: 10. a.Specially designed to protect the clectronically 11. scanned array antennae specified in 6A008.e.:and 12. Resuting in an antenna pattern having an average side lobe level,measured over the array excluding the angular extent of the main beam and the first two side lobes on either side of the main beam, more than 40 dB below the peakofthe main beam level.

"Software"which processes post-flight,recorded data,enabling

determination ofvehicle position throughout its flight path,specially designed or modified for 'missiles'that complete rocket systems and unmanned aerial vehicle systems capable ofa range exceeding 300 km.

6D203

"Software" specially designed to enhance or release the performance ofcameras or imaging devices to meet the characteristies of 6A203.a.

to6A203.c.

6ETechnology

6E001

"Technology"according to the General Technology Note for the "development"of equipment,materials or."software"specified in 6A,

6B,6Cor6D.

6E002

• "Technology"aecording to the General Technology Note for the "productionof equipment or materials specified in 6A,6B or 6C.

6E003

Other"technology"as follows:

• a.A"Technology"as follows:
• 1."Technology""required" for the coating and
• treatment of optical surfaces to achieve an optical thickness'uniformity of 99,5% or better for optical coatings5o0 mm ormore in diameter or major axis length and with a total loss (absorption and scatter)of less than5x10-3:
• 2 "Technology"for the fabrication ofoptics using single pointdiamondtuming techniquestoproducesurface finish "accuracies"ofbetter than 10 nm rms on non-planar surfaces exceeding 0.5m2:
• "Technology""required"for the"development" "production" oruse"ofspeciallydesigned diagnostic instruments or targets in test facilities for "SHPL" testing or testing or evaluation of materials iradiated by"SHPL"beams;

6E101

"Technology"according to the General Technology Note for the "use"ofequipment or "software"specified in6A002,6A007.b.and c., if the items were designed for airborne applications and are usable in "missiles",6A008,6A102,6A107,6A108,6B108,6D1020r6D103. 6E201

"Technology"according to the General Technology Note for the"use" ofequipment specified in 6A003 for camerasif they are also specified by any of the controlparameters of 6A203,6A005.a.2.,6A005.b.2. 6A005.b.3.,6A005.b.4.,6A005.b.6 for lasers that are ncodymium6A005.c.2.,6A005.d.3.c.,6A005.d.4.c.,6A202,6A203,6A205,6A225or

6A226.

6E203

"Technology",in the form of codes or keys, to enhance or release the performance of cameras or imaging devices to meet the characteristicsof6A203.a.to 6A203.c.

CATEGORY8-MARINE

8A Systems,Equipment and Components 8A001

Submersible vehicles and surface vessels,as follows:

• a.Manned,tethered submersible vehicles designed to operate at
• depthsexceeding1000m;
• b.Manned,untethered submersible vehicles having any of the
• following:
• 1.Designed to 'operate autonomouslyand having a lifting
• capacity of all of the following:
• a.10 % ormore oftheir weight in airand
• b.15kNormore;
• 2.Designed to operate al depths exceeding1 000m;or
• 3.Having all of the following:
• a.Designed to continuouslyoperate autonomouslyfor 10
• hours or more:and
• b.Range'of25 nautical miles or more;
• c.Unmanned submersible vehicles,as follows:

8A002

Marine systems,equipment and components,as follows:

• aSystems,equipment and components,specially designed or
• modified for submersible vehicles and designed to operate at depths exceeding1 000m,as follows:
• 1.Pressure housings or pressure hulls with a maximum inside chamber diameter exceedingl,5m;
• 2.Direct current propulsionmotors or thrusters;
• 1.Unmanned submersible vehicles having any of the following:
• a.Designed for decidinga course relativeto any geographicalreferencewithout real-timehuman assistance,
• b.Acoustic data or command link:or
• C. Wireless optical data or command link exceeding1
• wo00
• 2.Unmannedsubmersiblevehicles,not specified in
• 8A00l.c.l.having all of the following:
• aDesigned to operate with a tether:
• b.
• Designed to operate at depths exceeding1 000m;
• Having any ofthe following:
• 1.Designed forself-propelled manoeuvreusing propusionmotorsorthrustersspecifiedin 8A002.a.2.or
• 2.Fibre optic data link:
• Ocean salvagesystems with alifting capacity exceeding5MN for salvaging objectsfrom depths exceeding 250m and having any ofthe following:
• 1.Dynamic positioning systems capable of position keeping within 20 m of a givenpoint provided by the navigation system:or
• 2.Seafloor navigation andnavigation integration
• systems,for depths exceeding 10o0m and with positioningaccuraciestowithin10 mofa predetermined point.

• 3.Umbilical cables,and connectors therefor,using optical
• fibre and having synthetic strength members;
• 4.Components manufactured from material specified in 8C00l:
• b Systems specially designed or modified for the automated control of the motion of submersible vehicles specified in 8Aoo1,using navigation data,having closed loop servo-controls and having any ofthe following:
• L.Enabling a vehicle to move within I0 m ofa predetermined point in the water column:
• 2.Maintaining the position ofthe vehicle within l0 m ofa predetermined point in the water column:or
• 3.Maintaining the position of the vehicle within lo m while
• following a cable on or under the seabed:
• c.Fibre optic pressure hull penetrators;
• dUnderwatervision systems having all of the following:
• 1.Specially designed or modified for remote operation with a
• submersible vehicle:and
• 2.Employing any of the following techniques to minimise the effects ofback scatter:
• aRange-gated illuminators;or
• b.Range-gated laser systems;
• e.Light systems specially designed or modified for underwater use
• as follows:
• 1.Stroboscopic light systems capable ofa light output energy of
• more than 300 Jper flash and a flash rate ofmore than 5 flashes per second;
• 2.Argon arc light systems specially designed for use below1 000m:
• E. Robotsspecially designed for underwater use,controlled by
• using a dedicated computer and having any of the following:
• 1.Systems that control the"robotusing information from sensors
• which measure force or torque applied to an external object, distance to an external object,or tactile sense between the "robot"and an extemal object; or

• 2.The ability to exert a force of 250 Normore or a torque of 250Nm ormoreandusing titanium-based alloys or "composite"fibrousorfilamentarymaterialsintheir structural members:
• g.Remotely controlled articulated manipulators specially designed or modified for use with submersible vehicles and having any ofthe following:
• 1.Systems which control the manipulator using information from sensors which mcasure any ofthe following:
• a.Torque or force applied to an extemal object:or
• b.Tactile sense between the manipulator and an extemal object;or
• 2.Controlled by proportional master-slave techniques and having5 degreesof'freedom ofmovement'ormore:
• h.Air independent power systems specially designed for underwater use,as follows:
• 1.Brayton or Rankine cycle engine air independent power systemshaving any of the following:
• a.Chemical scrubber or absorber systems,specially designed toremovecarbon dioxide,carbonmonoxide and particulates from recirculated engine exhaust;
• b.Systems specially designed to use a monoatomic gas;
• c.Devices or enclosures,specially designed for underwater noise reduction in frequencies below 10 kHzor special mounting devices for shock mitigation:or
• d.Systems havingallof the following:
• 1.Specially designed to pressurise the products of reaction or forfuelreformation;
• 2.Specially designed to store the products of the reaction;
• and
• 3.Specially designed todischarge the products of the reaction againstapressureof 1o0kPa or more;
• 2.Diesel cycle engine air independent systems having all of the
• following:

• a.Chemicalscrubber orabsorber systems.specially designed to remove carbon dioxide,carbon monoxide and particulates from recirculated cngine exhaust;
• b.Systems specially designed to use a monoatomic gas;
• c.Devices or enclosures,specially designed for underwater noise reduction in frequencies below I0 kHz,or special mounting devices for shock mitigation:and
• d.Specially designed exhaust systems that do not exhaust continuously the products of combustion;
• 3."Fuel cellair independent power systems with an output exceeding2kW and having any of the following:
• a.Devices or enclosures.specially designed for underwater noise reduction in frequencies below Io kHz,or special mounting devices for shock mitigation:or
• b.Systems having all ofthe following:
• 1.Specially designed to pressurise the products of reaction or for fuel reformation;
• 2.Specially designed to store the products of the reaction:
• and
• 3.Specially designed to discharge the products of the
• reaction against a pressure of Io0 kPa ormore;
• 4.Stirling cycle engine air independent power systems having all ofthe following:
• a.Devices or enclosures,specially designed for underwater
• noise reduction in frequencies below 10 kHz,or special mounting devices for shockmitigation;and
• b.Specially designed exhaust systems which discharge the products of combustion against a pressure of 100 kPa or
• aou
• Propellers,power transmission systems,power generation systems and noise reduction systems and related equipment,as follows:
• 1.Water-screwpropeller,powergenerationsystemsor transmission systems,designed for use on vessels,as follows:
• a.Controllable-pitch propellers and hub assemblies,rated at more than30 MW;

• b. Internally liquid-cooled electric propulsionmotors with a power output exceeding2,5 MW:

2. c."Superconductive"propulsion motors,with a power output 3. exceeding 0,1 MW: 4. d.Powertransmission systemsincorporating"composite shafts and designed to transmit power exceeding 10 MW: 5. e.Ventilated or base-ventilated propeller systems,rated at more than2.5Mw: 6. 2.Noise reduction systems and related equipment.designed for use on vessels of Ioootonnes displacement or more,as follows: 7. aSystems that attenuate underwater noise at frequencies below 5oo Hz and consist ofcompound acoustic mounts forthe acoustic isolation ofdieselengines.diesel generator sets,gas turbines, gas turbine generator sets, propusion motors or propulsion reduction gears.specially designed for sound or vibration isolation and having an intermediate massexceeding 30%of the equipmem to be mounted; 8. b.'Activenoise reductionor cancellation systems'or magnetic bearings,speciallydesignedforpower transmission systems; 9. 3.Permanent magnet electricpropulsion motors specially designed for submersible vehicles,having a power output exceeding0,1 Mw. 10. j.Pump jet propulsion systems having all of the following: 11. 1.Power oulput exceeding2.5MW;and 12. 2.Using divergent nozzle and flow conditioning vane techniques toimprovepropulsive efficiencyorreducepropulsiongeneratedunderwater-radiatednoise; 13. k.Underwater swimming and diving equipment as follows: 14. 1.Closed circuit rebreathers; 15. 2.Semi-closed-circuit rebreathers; 16. Diver deterrent acoustic systems specially designed or modified to disrupt divers and having a sound pressure level equal to or exceeding190 dB (reference1μPa at1m)at frequcnciesof200 17. Hzand below.

8B Test,Inspeetion and Production Equipment

8B0o1 Water tunnels designed to have a backgroundnoise of less than 100 dB (reference1 μPa,1 Hz) within the frequency range exceeding 0 Hz but not exceeding 5o0 Hz and designed for measuring acoustic fields generated bya hydro-flow around propulsion system models.

8CMaterials

8C001

following:

• a.Designed for marine depths exceeding 10oOm:and
• b.A density less than 561 kg/m3

SDSoftware

8Dooi "Software"specially designed or modified for the "development" "production"or"useof equipment or materials,specified in 8A,8B or

8C.

8Doo2 Specific "software"specially designed or modified for the "development","production",repair,overhaul or refurbishing(remachining)of propellers speciallydesigned for underwaternoise

reduction.

SETechnology

8E0o1 "Technology"according to the General Technology Note for the "developmenor"production"of equipment or materials, specified in

8A.8Bor8C.

8E002

Other"technology"as follows:

• a"Technology"for the"development""production",repair,overhaul or refurbishing (re-machining)ofpropellers specially designed for underwater noise reduction;
• b.Technology"for the overhaul or refurbishing of equipment specified
• in8A001,8A002.b.8A002.j.,8A002.0.0r8A002.p.
• c."Technologyaccording to the General Technology Note for the
• "development"or"production"ofany of the following:
• 1.Surface-effect vehicles (fully skirted variety) having all of the following:

9A001

Aero gas turbine engines having any of the following:

• aIncorporating any of the technologiesspecified in 9E003.a, 9E003.h.or9E003.i;

9A002

Marine gas turbine engines' designed to use liquid fuel and having all ofthe following.and specially designed assemblies and components therefor:

• aMaximum continuous power when operating in "steady state modeat standard reference conditions specified by ISO 39772:1997(ornationalequivalent)of24245kWor more:and
• b.Corrected specific fuel consumption'not exceeding0.219 kg/kWh at 35% of themaximum continuous power whenusing liquid fuel

9A003

• a.Maximum design speed,fully loaded,exceeding 30 knots in a significant wave heightof1.25m ormore;
• b.Cushion pressure exceeding3830 Pa;and
• c.Light-ship-to-full-load displacement ratio of less than O.70:
• 2.Surface-effect vehicles (rigid sidewalls)with a maximum design speed,fully loaded,exceeding 40knots in a significant wave heightof3.25mormore;
• 3.Hydrofoil vessels with active systems for automatically controlling foil systems,with a maximum design speed,fully loaded,of40 knots or more in a significant wave height of3.25mormore;or
• 4.Small waterplane area vessels'having any of the following:
• a.Full load displacement exceeding 500 tonnes with a maximum design speed,fully loaded,exceeding 35 knots in a significant wave height of3.25m ormore:or
• b.Full load displacement exceeding1 500tonnes with a maximum design speed.fully loaded,exceeding 25 knots in a significant wave.height of4 mormore.

PART XI

CATEGORY9:AEROSPACEANDPROPULSION

9A Systems,Equipment and Components Specially designed assemblies or components,incorporating any of the"technologies"specified in 9E003.a,9E003.h.9E003.i,or 9Eoo3.k,forany ofthe following aero gas turbine engines:

• aSpecified in9A001:or
• b.Whose design or production is unknown to the manufacturer.

9A004

payloads","spacecraft"on-board systems or equipment,terrestrial cquipment,air-launch platforms and"sub-orbital craft"as follows:

• a. a.Space launch vehicles;

2. b. 3. b."Spacecraff": 4. C. 5. c."Spacecraf buses"

• d. d"Spacecraffpayloads"incorporatingitemsspecifiedin 3A001.b.1.a4.3A002.g.5A001.a.l.5A001.b.3.5A002.c 5A002.e.,6A002.a.1.,6A002.a.2.,6A002.b.,6A002.d,6A003.b, 6A004.c.6A004.e.,6A008.d.6A008.e.,6A008.k.6A008.Lor 9A010.c.:

7. e.On-board systems or equipment,specially designed for 8. spacecraf"and having any ofthe following functions: 1. 'Command and telemetry data handling'including bus data 10. management,storage,and processing 11. 2 Payloaddatahandling' including payload data management,storage,and processing:or 3. 'Attitude and orbit control'including sensing and actuation to determine and control the position and orientation ofa 13. "spacecraft; 14. follows: 1. Telemetry and telecommand equipment specially designed for any ofthe following data processing functions: 16. Telemetry data processing of frame synchronisation and error corrections,for monitoring ofoperational status (aiso known as health and safe status)of the "spacecraft bus";or

• b. Command data processing for formatting command data being sent to the "spacecraffto control the 'spacecraft bus":

18. f.

• 2.Simulators speciallydesigned for'verificationof operational procedures'of"spacecraff":
• g"Aircraftspecially designedor modified to be air-launch platforms for space launch vehicles or"sub-orbital craf":
• 1."Sub-orbitalcrafi".

9A005

Liquid rocket propulsion systems containing any of the systems or

components,specified in9A006.

9A006

Systems andcomponents,specially designed for liquid rocket propulsion systems,as follows:

• a Cryogenic refrigerators,flightweight dewars,cryogenic heat pipes or cryogenic systems,designed to restrict cryogenic fluid losses to
• less than 30% per year;
• b. Cryogenic containers or closed-cycle refrigeration systems. designed to maintain or produce temperatures less than or equal to
• 100K(-173,15°C):
• C. Slush hydrogen storage or transfer systems;
• d. High pressure (exceeding17.5MPa)turbo pumps.pump components or their associated gas generator or expander cycle turbine drive systems:
• e. High-pressure (exceeding 10,6 MPa) thrust chambers and nozzles
• therefor,
• f Propellant storage systems using the principle of capillary
• containment or positive expulsion (ie.,with flexible bladders):
• B Liquid propellant injectors with individual orifices of0,381 mm or smaller in diameter(an area of1.14x 10-3 cm2or smaller for non-
• circular orifices) and specially designed for liquid rocket engines;
• h. One-piece carbon-carbon thrust chambers or one-piece carboncarbon exit cones,with densities exceeding 1,4 g/cm3 and tensile strengths exceeding 48 MPa.

9A007

Solid rocket propulsion systems having any of the following:

• Total impulse capacity exceeding 1,1 MNs;
• b. Specific impulse of 2,4 kNs/kg or more,when the nozzle flow is
• expanded to ambient sea level conditions for an adjusted chamber

9A009

pressure of7 MPa;

• Stage mass fractions exceeding 88% and propellant solid loadings C exceeding86%;
• d
• Components specified in 9A008;or
• e. Insulation and propellant bonding systems,using direct-bonded motor designs to provide a'strong mechanical bondor a barrier to chemicalmigration between the solidpropellant and case insulation material.

9A008

Components specially designed for solid rocket propulsion systems,as

follows:

• a Insulation and propellant bonding systems,using liners to provide a'strong mechanical bondor a barrier tochemical migration
• between the solid propellant and case insulation material;
• b, Filament-wound "composite"motor cases exceeding 0.6l m in diameter or having'structural efficiency ratios(PV/W)exceeding
• 25km,
• Nozzles with thrust levels exceeding 45 kN or nozzle throat erosion ratesofless than 0.o75mm/s;
• Movable nozzle or secondary fluid injection thrust vector control
• d systems,capable of any ofthe following:
• 1.Omni-axial movement exceeding±5°;
• 2.
• Angular vectorrotations of20/sormore:or
• 3.Angular vector accelerations of40°/s2ormore.

Hybrid rocket propulsion systems having any of the following:

• a. Total impulse capacity exceeding 1,1 MNs;or

2. b. 3. Thrust levels exceeding 220 kN in vacuum exit conditions.

9A010

Specially designed components,systems and structures,for launch

vehicles,launch vehicle propulsion systems or"spacecraf",as follows:

• a Components and structures,each exceeding 10 kg and specially designed for launch vehicles manufactured using any of the following:
• 1."Composite"materials consisting of"fibrous or filamentary

materialsspecified in 1C010.e.and resins specified in 1C008or1C009.b.;

• Metal"matrix"composites"reinforced by any of the following:
• a Materials specified in lO007:
• b. "Fibrous or filamentarymaterials"specifiedin
• IC010;or
• Aluminides specified in 1C002.a.:or
• 3.Ceramic "matrix""composite"materials specifiedin
• 1C007:
• b. Components and structures,specially designed for launch vehicle propulsion systems specified in 9A005 to 9A009 manufactured
• using any ofthe following:

1. "Fibrous or filamentary materials"specified in 1Col0.e. and resinsspecified in 1C008 or 1C009.b.;

• following:
• a.
• b.
• Materials specified in ICo07:
• "Fibrous or filamentary materials"specifiedin 1C010:or
• C. Aluminides specified in 1C002.a.:or
• 3.Ceramic"matrix""composite"materials specified in 1C007:
• C. Structural components and isolation systems,specially designed to control actively the dynamic response or distortion of"spacecraf"
• structures;
• d. Pulsed liquid rocket engines with thrust-to-weight ratios equal to
• ormore than 1 kN/kg and aresponse time'ofless than 30 ms.

9A011

Ramjet,seramjet or'combined cycle engines',and specially designed components therefor.

9A012

• "Unmanned aerial vehicles"("UAVs"),unmanned "airships",related cquipmentand components,as follows:
• a. "UAVs"or unmanned"airships",designed to have controlled

• b.

9A101

Turbojet and turbofan engines,other than those specified in 9Ao01, as follows;

• a. Engines having allofthe following characteristics:

1. Maximum thrust value'greater than 400 N excluding civil certified engineswith a'maximum thrust value'greater than 3. 2. 4. N0688 5. Specific fuel consumption of0.15 kgN-1 h-1 or less: 3. Dry weight'less than 750 kg:and 4. 7. 4. 8. First-stage rotor diameterless than I m;

• b. Engines designed or modified for use in"missiles"or unmanncd aerial vehicles specified in 9A012or9A112.a.

9A102

'Turboprop engine systems'specially designed for unmanned aerial

vehicles specified in 9A012 or 9A112.a,and specially designed components therefor,having a'maximum power'greater than 10 kW.

9A104

Sounding rockets,capable ofa range of at least 300 km.

fligh out ofthe direct natural vision'of the operatorand

having any ofthe following:

• 1.Having all ofthe following:
• a A maximumendurance'greater than or equal to 30
• minutes but less than l hour:and
• Designed to take-off and have stable controlled flight in wind gusts equal to or exceeding 46,3 km/h
• b. (25knots);or
• 2.Amaximumenduranceof1 hour or greater
• Related equipment and components,as follows:
• Equipment or components,specially designed to convert a manned "aircrafl"or manned "airship",to a"UAV"or
• unmanned "airship",specified in 9A012.a:

2. Airbreathingreciprocating orrotary internal

• combustiontype engines,speciallydesignedor altitudes above 15240metres(50000 feet).

9A105

Liquid propellant rocket engines or gel propellant rocket motors,as follows:

• Liquid propellant rocketengines or gel propellant rocket motors, usable in "missiles"other thanthose specified in 9A005. integrated,or designed ormodified to be integrated,into a liquid propellant or gel propellant propulsion system which has a total impulse capacity equal to orgreater than 1,1 MNs;
• Liquid propellant rocket engines or gel propellant rocket motors, usable in complete rocket systems or unmanned aerial vehicles capable of a range of300km,other than those specified in 9A005 or9A105.a.,integrated,or designed or modified to be integrated intoa liquid propellant or gel propellant propulsion system which has a total impuise capacity cqual to or greater.than 0,841 MNs.

9A106

Systems or components,other than those specified in 9A006 as follows,specially designedfor liquid roeket propusionor gel propellantrocketsystems:

• a.
• Thrust vector control sub-systems,usable in"missiles"
• b. Liquid.slurry and gel propellant (including oxidisers)control systems,and specially designed components therefor,usable in missiles",designedormodifiedtooperate invibration environmentsgreater than 10grms between20 Hz and2kHz
• Combustion chambers and nozzles for liquid propellant rocket engines or gel propellant rocket motors specified in 9Aoo5or 9AI05.

9A107

Solid propellant rocket motors,usable in complete rocket systems or unmanned aerial vehicles,capable ofa range of300 km,other than those specified in 9A0o7,having total impulse capacity equal to or greaterthan 0,841 MNs.

9A108

Components,other than those specified in 9A008,as follows,specially designed forsolid and hybrid rocket propulsion systems:

• a. Rocket motor cases and insulation components therefor,usable in

2. subsystems specifiedin9A007,9A009,9A107or9A109.a;

• b. Rocket nozzles,usable in subsystems specified in 9A007.

9A109

Hybrid rocket motors and specially designed components as follows:

• a. Hybridrocket motors usable in complete rocket systems or unmanned aerial vehicles,capable of 300 km,other than those specified in 9A009,having a total impulse capacity equal to or greater than 0.841 MNs,and specially designed components therefor:
• b. Specially designed components for hybrid rocket motors specified in 9A009 that are usable in"missiles"

9A110

Composite structures,laminates and manufactures thereof,other than those specified in 9A010,specially designed for use inmissiles orthe subsystems specifiedin 9A005,9A007,9A105,9A106.c.,9A107. 9A108.c.9A116or9A119.

9A111

Pulse jet or detonation engines,usable in "missilesor unmanned aerialvehicles specified in9A012or 9A112.a.,and specially designed components therefor.

9A112

• "Unmanned aerial vehicles"(UAVs"),other than those specified in 9A012,asfollows:
• a. km,
• b, "Unmanned aerial vehicles"(UAVs")having all of the following:
• I.Having any ofthe following:
• a An autonomousflight control and navigation capability:or
• b. Capability of controlled flight out of the direct vision range involving ahuman operator;and having any of the following:
• 2.Havingany ofthe following:
• a. Incorporating an aerosol dispensing system/mechanism with a capacity greater than 20 litres;or
• b. Designed or modified to incorporate an aerosol greater than 20 litres.

9A115

Launch support equipment as follows:

• a. Apparatus and devices forhandling.control,activation or launching.designed or modified for space launch vehicles 'missiles':
• b. Vehicles for transport,handling.control. activation or launching. designed or modified for space launch vehicles specified in9A004, s

9A116

Reentry vehicles,usable in "missiles",and equipment designed or modified therefor,as follows:

• Reentry vehicles;
• b. Heat shields and components therefor, fabricated of ceramic or ablative materials,
• Heat sinks and components therefor,fabricated of light-weight. G.
• d.
• high heat capacity materials;
• Electronic equipment specially designed for reentry vehicles.

9A117

Staging mechanisms,separation mechanisms,and interstages,usable in "missiles".

9A118

Devices to regulate combustion usable in engines,which are usable in "missiles"or unmanned aerial vehicles specified in 9A012or9A112.a, specified in9A011or9A111.

9A119

Individualrocket stages,usable in complete rocket systems or unmanned aerial vehicles,capable ofa range of 300 km,other than those specified in9A005,9A007,9A009,9A105,9A107and 9A109.

9A120

Liquid or gel propellant tanks,other than those specified in 9A006, specially designed for propellants specified in 1Ci11 or'other liquid orgel propellants'used in rocket systems capable of delivering at least a 500 kg payload to a rangeofat least 300 km.

9A121

Umbilical and interstage electrical connectors specially designed for"missiles",space launch vehicles specified in 9A004 or sounding rocketsspecified in9A104.

9A350

Sprayingor fogging systems,specially designed or modified for fitting to aireraft,"lighter-than-air vehicles"or unmanned aerial vehicles, and specially designed components therefor,as follows:

• a. Complete spraying or fogging systems capable of delivering.from a liquid suspension,an initial dropletVMD'of less than 50 μm at a flowrate ofgreater than two litresper minute;
• b. Spray booms or arrays of aerosol generating units capable of delivering.from a liquid suspension,an initial dropletVMD"of less than 50μm at a flow rate ofgreater than two litresperminute;

3. Aerosol generating units specially designed for fitting to systems specified in9A350.a.and.b.

9B Test,lnspection and Production Equipment

Manufacturingequipment,tooling or fixtures,as follows:

• a. Directional solidification or single crystal casting equipment designed for"superalloys":
• b. Casting tooling. specially designed for manufacturing gas turbine engine blades,vanes or "tip shrouds",manufactured from refractory metalsor ceramics,as follows:

1. Cores; 2. Shells(moulds); 3. Combined core and shell (mould)units; 6. Directional-solidification or single-crystal additive-manufacturing C. equipment,designed for"superalloys"

9B002

On-line (real time) control systems,Instrumentation (including sensors)or automated data acquisition and processingequipment, having all of the following:

• a. Specially designed for the"development"of gas turbine engines, assemblies or componenis;and
• b. Incorporating any of the"technologies specified in 9E003.h.or 9E003.L

Equipment specially designed for the "production"or test of gas turbine brush seals designed to operate at tip speeds exceeding 335 m/s and temperatures in excess of 773 K (500C).and specially

designed components or accessories therefor.

Tools,dies or fixtures,for the solid state joining of "superalloy"

titanium or intermetallic aerofoil-to-disk combinations described in 9E003.a.3.or9E003.a.6.forgasturbines.

9B005

On-line (real time) control systems, instrumentation (including specially designed for use with any of the following:

• 8.
• Wind tunnels designed for speeds of Mach 1.2or more:
• b. Devices for simulating flow-environments at speeds exceeding Mach 5,including hot-shot tunnels,plasma arc tunnels,shock
• tubes, shock tunnels,gas tunnels and light gas guns; or
• Wind tunnels.or devices,other than two-dimensional sections.
• capable of simulating Reynoldsnumber flowsexceeding 25x 106.

9B006

Acoustic vibration test equipment capable of producing sound

pressure levels of 160 dBor more(referenced to 20μPa)with a rated outputof4kWor more at a testcell temp

9B007

Equipment specially designed for inspecting the integrity ofrocket

motors and using Non-Destructive Test (NDT) techniques other than planar x-ray orbasic physicalorchemical analysis.

Direct measurement wall skin frietion transducers specially designed to operate at a test flow total (stagnation) temperature exceeding 833 K(560°C).

9B009

metallurgy rotor componentshaving all of the following:

• Designed to operate at stress levelsof 60%of Ultimate Tensile Strength (UTS)or more measured at a temperature of 873 K (600°C):and

• b. Designed to operate a873K(600°C)or more.

9B010

Equipment specially designed for the"produetionof items specified in9A012.

9B105

Aerodynamic test facilities for speedsof Maeh 0,9 or more,usable for 'missiles'and their subsystems.

9B106

Environmental chambers and anechoic chambers,as follows:

• a. Environmental chambers having all of the following:

1. Capable of simulating any of the following flight conditions:

• a. Altitude equal to orgreater than 15km;or
• b. Temperature range from below 223K(-50°C)to above398K(125°C):and

5. Incorporating.ordesigned or modifiedto incorporate,a shaker unit or other vibration test equipment to produce vibration environments cqual to or greater than 10 g rms, measured bare table,between 20 Hz and 2 kHz while imparting forces equal to orgreater than 5kN;

• b. Environmental chambers capableofsimulating the following flight conditions:

7. Acoustic environments at an overall sound pressure level of 140 dB or greater (referenced to 20 μPa)or witha total rated acousticpower output of4kWorgreater,and 2. Altitude equal to or greater than 15km;or 3. Temperaturerange from below223K(-50°C)to above 398 K(125°C).

9B107

Aerothermodynamic testfacilities,usable for 'missiles','missile rocket propulsion systems,andreentry vehicles and equipment specified in 9All6,having any of the following characteristics:

• a. An electrical power supply equal to or greater than5MW;or
• b. Agas supply total pressure equal to or greater than 3 MPa

9B115

Specially designed "produetion cquipment"for the systems,subsystemsand components specified in 9A005 to 9A009,9A011,9A101, 9A102.9A105t09A109,9A11L,9A116 to9A120.

9B116

Specially designed "production faeilities"for the space launch vehicles specified in 9A004,or systems,sub-systems,and components specified in 9A005 to 9A009,9A011,9A101.9A102,9A104 to 9A109, 9A111,9A116 to9A120 ormissiles'.

Test benches or test stands for solid or liquid propellant rockets or rocket motors,havingeitherofthe following characteristics:

• L
• The capacity to handlemore than 68kN of thrust;or
• b. Capable of simultaneously measuring the three axial thrust components.

9CMaterials

9C108

Insulation material in bulk form and "interior lining,other than those specified in 9A0o8,for rocket motor cases usable in "missiles" or specially designed for solid propellant rocket engines specified in 9A007or9A107.

9C110

Resin impregnated fibre prepregs and metal coated fibre preforms therefor. for composite structureslaminates and manufactures specified in 9A110,made either with organie matrix or metal matrix utilising fibrous or filamentary reinforcements having a"specifie tensile strength"greater than 7,62x 104 m and a"specific modulus" greater than3,18x106m.

9D Software

10006

• "Software",not specified in 9D003 or 9D004,specially designed or
• specified in9A001 to 9A119,9Bor9E003.

9D002

"Software",not specified in 9D003 or 9D004,specially designed or

9A119 or9B. 50006

speeified in 9B.

9D004

Other"software"as follows:

• a. 2Dor 3Dviscous"software",validated with wind tunnel or flight

2. test datarequired for detailed engine flow modelling: 3. "Software"for testing aero gas turbine engines,assemblies or

• b. components,having all of the following:

5. I.Specially designed for testing any of the following:

• a. Aero gasturbine engines,assemblies components,incorporatingtechnologyspecified

7. in9E003.a,9E003.h.or9E003.L:or

• b. Multi-stage compressors providing either bypass or core flow,specially designed for aero gas turbine engines incorporating"technology"specified in 9E003.a.or9E003.h:and

9. 2.Specially designed for all of the following: 10. a Acquisition and processing of data,in real time;and 11. Feedback control ofthe test article or test conditions (e.g. temperature,pressure,flow rate)while the test

• b. isin progress:
• C. "Software" specially designed to control directional solidification or single crystal material growth in equipment specified in 9B001.a.or9B001.c.:

14. d. 15. "Software" specially designed or modified for the operation of itemsspecified in 9A012: 16. "Software" specially designed to design the internal cooling passages of aero gas turbine blades,vans and "tip shrouds": 17. "Software"having all of the following: 1. Specially designed to predict aero thermal,aeromechanical 19. and combustion conditions in aero gas turbine engines;and 20. Theoretical modelling predictions of the aero thermal, 21. aeromechanical and combustion conditions,which have

9D005

(experimental or production)performance data

"Software" specially designed or modified for the operation of items specified in9A004.e.or9A004.f.

9D101

"Software" specially designed or modified for the "use"of goods speciiedin9B105,9B106,9B116or9B117.

9D103

"Software" specially designed for modelling.simulation or design integration of the space launch vehicles specified in 9A004,sounding rockets specified in 9A104ormissiles,or the subsystems specified in 9A005,9A007,9A105,9A106.c.,9A107,9A108.c.,9A116or9A119.

F0106

"Software"as follows:

• I."Software"specially designed or modified for the"use"of goods specified in 9A001,9A005,9A006.d,9A006.g.9A007.a 9A009.a.,9A010.d,9A011:9A101,9A102,9A105,9A106.d,
• 9A107.9A109,9A111,9A115.a,9A1170r9A118.

2. "Software"specially designed or modified for the operation or maintenance of subsystems or equipment specified in 9A0o8.d, 9A106.c.,9A108.c.or9A116.d.

9D105

• "Software" specially designed or modified to coordinate the function ofmore than onesubsystem,other than that specified in 9D004.e.in space launch vehicles specified in9A004 or sounding rockets specified in9A104or'missiles'.

9ETechnology

• "Technology"according to the General Technology Note for the "development"ofequipment or "software",specified in 9A004 to 9A012,9A350,9B0r9D.

9E002

"Technology"according to the General Technology Note for the "produetion"ofequipment specified in 9A004 to 9A011,9A350or9B.

been validated with actual aero gas turbine engine

9E003

Other"technology"as follows:

• a. "Technology""required"for the"development"or"production"of any ofthe following gas turbine engine components or systems:

1. Gas turbine blades,vanes or "tip shrouds",made from directionally solidified(DS)or single crystal (SC)alloys and having (in the 0ol Miller Index Direction) a stressrupture life exceeding400 hours at1273K(1 000°C)at a stress of 200 MPa.based on the average property values, 2. Combustors having any of the folowing:

• a. Thermally decoupled liners'designed to operate at combustor exit temperatureexceeding| 883K(1 610°C);
• b. Non-metallic liners;
• C. Non-metallic shells;
• d. Liners designed tooperate atcombustor exit tempcrature'exceeding1883K(1 6l0C)and having holes that meet the parameters specified in
• e. Utilising pressure gain combustion;9E003.a.2. continued

9. 3.Components that are any of the following:

• a. Manufactured from organic"composite"materials designed tooperate above588K(315°C);
• b. Manufactured from any of the following:

12. Metal "matrix""compositesreinforced by any ofthe following:

• a. Materials specified in IC007:
• b. "Fibrous or filamentary materials" specified in 1C010;or
• C. Aluminides specified in 1C002.a.:or

16. Ceramic"matrix""composites"specified in 1C007.or9B003 17. Stators,vanes,blades, tip seals (shrouds),rotating blings,rotating blisks,orsplitter ducts,that are all ofthe following:

• b.
• Not specified in 9E003.a.3.a:

2. Designed for compressors or fans:and 3. Manufacturedfrom material specified in

• ICo10.e.with resins specified in lC008;
• Uncooled turbine blades,vanes or"tip shrouds",designed to operate at agas path temperature'of1 373 K(1 100°C)
• ormore

5. Cooled turbine blades,vanes,"tip shrouds"other than those described in 9E003.a.l.,designed to operate at agas path temperature'of1693K(1420°C)ormore; 6. Aerofoil-to-disk blade combinations using solid state joining: 7. Damage tolerant' gas turbine engine rotor components using powder metallurgy materials specified in 1Co02.b.:

• or
• 8.Fan blades'having all ofthe following:
• 20%ormore of the total volume being one or more closed cavities containing vacuum or gas only: and
• b. One or more closed cavities having a volume of5
• cm3orlarger,
• "Technology""required"for the"development"or"production"of any of the following:
• 1 Wind tunnel aero-models equippedwith non-intrusive sensors capable of transmitting data from the sensors to the data acquisition system;or

2. "Composite"propeller blades or propfans,capable of absorbing more than 2 0o0 kW at flight speeds exceeding Mach0,55:

• "Technology""required"for manufacturing cooling holes in gas
• turbine engine components incorporating any of the"technologies" specified in 9E003.a.1.9E003.a.2.or9E003.a.5.and having any ofthe following:
• 1.Havingall ofthe following:
• a Minimum cross-sectional area'less than 0,45mm2;
• b.
• Hole shape ratio'greater than 4,52:and
• c. Incidence angle'cqual to or less than 25°:or

• Having all of the following:
• a. Minimum'cross-sectional area'less than 0,12mm2;
• b. Hole shape ratio'greater than 5.65:and
• C. Tncidence angle'more than 25°:
• d. "Technology""required"for the"development"or"production"of helicopter power transfer systems or tilt rotor or tilt wingaircrafl power transfer systems;
• "Technology"forthe"development"or"production"of reciprocating diesel engine ground vehicle propulsion systems having allof thefollowing:

1. Boxvolume'of1.2m3or less; 2. Anoverall power output ofmore than 750kW based on 80/1269/EEC,ISO2534ornationalequivalents;and

• 3.Power density of more than 700 kW/m3 ofbox volume'
• "Technology""required"forthe"production"ofspecially designed components for"high output diesel engines",as follows:
• "Technology""required"for the"production"of engine systems having all of the following components employing ceramics materials specified in 1C007:
• a. Cylinder liners,
• b.
• Pistons;
• c. Cylinder heads:and
• d. One or more other components (including exhaust ports,turbochargers,valve guides,valve assemblies orinsulated fuel injectors);
• "Technology" "required"forthe"production"of having all of the following:
• a
• Operating at pressure ratios of4:1or higher;
• b. Mass flow in the range from 30 to 130 kg per minute;and
• C. Variable flow area capability within the compressor
• orturbine sections

3. "Technology""required"for the"production"of fuel injection systems with a specially designed multifuel (e.g. diesel or jet fuel) capability covering a viscosity range from

dieselfuel(2.5cStat310.8K(37.8°C))downto

gasoline fuel (0,5cSt at 310,8K(37,8°C))and having all of the following:

• Injectionamount in excess of 230mm3per
• a injection per cylinder,and
• b. Electronic control features specially designed for switching governor characteristics automatically depending on fuel property to provide the same torque characteristics byusingthe appropriate sensors;
• "Technology"""required"for the"development"or"production"of
• "high outpul diesel engines"for solid,gas phase or liquid film (or combinations thereof) cylinder wall lubrication and permitting operation to temperatures exceeding 723K(450°C).measured on the cylinder wall at the top limit of travel of the top ringof the piston:
• h "Technology"for gas turbine engine"FADEC systems"as follows:
• 1 "Development""technology"for deriving the functional requirements for the components necessary for the "FADEC system to regulate engine thrust or shaff power (e.g-.feedback sensor time constants and accuracies,fuel valve slewrate):
• "Development"or"production""technology"for control and diagnostic components unique to the"FADEC system" and used to regulate engine thrust or shafi power,

3. "Development""technology" forthecontrollaw algorithms,including"source code"uniquetothe "FADEC system"and used to regulate engine thrust or shaftpower: 1. "Technology"for adjustable flow path systems designed to maintain engine stability for gas generator turbines,fan or power turbines,or propelling nozzles,as follows:

• a. "Development""technology"for deriving the functional requirements for the components that maintain engine stability:
• "Development" or"production" "technology" for components unique to the adjustable flow path system and
• that maintain engine stability:

9E101

"Technology"as follows:

• aTechnology"according to the General Technology Note for the "development"of g0ods specified in 9A101,9A102,9A104 to
• 9A111,9A112.a.or9A115 to9A121.
• b. b."Technologyaccording to the General Technology Note for the "productionofUAV's specified in 9A012or goods specified in 9A101,9A102,9A104to9A111,9A112.a.or9A115t09A121.

9E102

"Technology"aecording to the General Technology Note for the"use" ofspace launch vehicles specified in 9A004.goods specified in 9A005 to9A01l,UAV's specified in 9A012 or goods specified in 9A101, 9A102,9A104to9A11L,9A112.a.,9A115to9A12L,9B105,9B106, 9B115,9B116,9B117,9D1010r9D103.

• c."Development""technology"forthe controllaw algorithms,including"source code"uniquetothe adjustable flow path system and thal maintain engine
• stability.
• "Technology""required"for the"developmentofwing-folding engines;
• Technology,nol specified in 9E003.a.,9E003.h,or 9E003.i, "required"for the"development"of anyofthe following components or systems,specially designed for aero gas turbine engines to enable"aircraf" to cruise at Mach | or greater for more than 30 minutes:
• 1
• 2.
• 3.
• Propulsion inlet systems;
• Propulsion exhaust systems:
• 'Reheat systems':
• 4 'Active thermal management systems' to condition fluids used to lubricate or cool'engine rotor supports;

5. Oil-free'engine rotor supports';or 6. Systems to remove heat fromcompression system'coregas pathflow.

MEMORANDUMOFOBJECTSANDREASONS

Statement of the Objects and Reasons for the Bill

The principal object of the Bill is to provide for the control of trade in strategic goods and related services,to prevent the proliferation ofnuclear,

chemical or biological weapons and their means of delivery.

The Bill is divided into six Parts consisting of 54 clauses.

Part I (Clauses I-4)of the Bill provides for the preliminary matters. including the title,interpretation and application.Clause 3 provides for the who handles a strategic good. Clause 4 provides for the Cabinet Secretary to publish a National Control List which will specify the strategic goods that are subject to the provisions of the Act.

Part Il (Clauses 5-8)ofthe Bill establishes the Stralegic Goods Control Committee,sets out the functions of the Committee in relation to the management of trade in strategic goods and related services and puts in place a Secretariat of the Committee which shall be headed by a Director. The functions of the Committee include the oversight in the controlof trade in strategic goods and related services,formulation and review ofthe National Control List,issuance,suspension or revocation of licences or a certificate issued under the Act and establishment and operation ofenduse controls and compliance checks.

Part Ill (Clauses9-23)of the Bill sets out the procedures related to registration and licensing under the Act.It provides for registration of persons intending to engage in strategic trade,a register of persons cngaged in strategic trade,cancellation,suspension or restoration of registration,licencing and conditions for the issuance of the license among others.The Part also provides for end-use controls on strategic goods

listed in the National Control List.

Part IV (Clauses 24-37) of the Bill provides for enforcement measures.lt sets out the compliance requirements for persons engaged in strategic trade.the appointment ofinspectors to ensure compliance with the Act as well as disposal and forfeiture of seized strategic goods.The Part also sets out offences which include fraudulent misrepresentation obstruction of the Committee or its representatives,forgery of registration licence or any other document issued under the Act,engagement in strategic trade or provision of related services without being duly registered and licenced by the Committee and use of strategic goods ina manner inconsistent with the registration certificate and licence issued by the Committee.

PARTV(Clauses 38-43)ofthe Bill contains miscellaneous provisions that provide for the general penalty.confidentiality,voluntary disclosure and thepower ofthe Cabinet Secretary to make regulations.

PARTVI (Clauses 44-54)of the Bill contains consequential amendments to the Firearms Act,Cap.1l4;the Pharmacy and Poisons Act,Cap.244;the Fertilizers and Animal Foodstuffs Act,Cap.345;the Pest Control Products Act, Cap.346;the Nuclear Regulatory Act.Cap. 243;the Mining Act,Cap.306 and the Explosives Act.Cap.115.

The Schedule to the Bill provides for the National Control List which specifies the strategicgoods that are subject to the provisions of the Bill.

Statement on the delegation of legislative powers and limitation of

fundamentalrightsand freedoms

The Bill confers on the Cabinet Secretary the powers to make regulations under the Act for the purposes of operationalizing the Act in order to implement the objectives.The Bill does not limit any fundamental rights and freedoms.

Statement ofhow the Bill concerns county governments

The Bill does not concem county governments in terms of Article

Schedule to the Constitution.

110 of the Constitution as it does not contain provisions that affect the functions and powers of county governments as set out in the Fourth

Paragraph 6ofPart1 of the Fourth Schedule to Constitutionprovides

that National defence and the use of the national defence services is a function oftheNational Government.

Statement whether the Bill is a money Bill within the meaning of Article ll4oftheConstitution

The enactment ofthis Bill shall occasion additional expenditure of public funds which shall beprovided for in the annualestimates.

Dated the 19th February,2026.